화학공학소재연구정보센터

Solid-State Electronics

Solid-State Electronics, Vol.46, No.4 Entire volume, number list
ISSN: 0038-1101 (Print) 

In this Issue (25 articles)

451 - 458 An investigation on RF CMOS stability related to bias and scaling
Su JG, Wong SC, Chang CY
459 - 466 Comparison of the electrical behavior in the subthreshold region between laser and solid phase crystallized polysilicon thin film transistors
Pichon L, Mercha A, Carin R, Mohammed-Brahim T, Bonnaud O, Helen Y
467 - 476 Surface passivation of AlGaN/GaN HEMTs using MBE-grown MgO or Sc2O3
Luo B, Johnson JW, Gila BP, Onstine A, Abernathy CR, Ren F, Pearton SJ, Baca AG, Dabiran AM, Wowchack AM, Chow PP
477 - 480 Organic light-emitting diode on indium zinc oxide film prepared by ion assisted deposition dc sputtering system
Lee WJ, Fang YK, Ho JJ, Chen CY, Chiou LH, Wang SJ, Dai F, Hsieh T, Tsai RY, Huang D, Ho FC
481 - 485 Observation of photoinduced shot noise in planar Mo/n-Si/Mo structures with undepleted region
Niemcharoen S, Ando T, Supadech S, Yasumura Y, Sato K
487 - 496 A critical review of thermal models for electro-thermal simulation
d'Alessandro V, Rinaldi N
497 - 500 High-gain MOS tunnel emitter transistors
Aderstedt E, Medugorac I, Lundgren P
501 - 504 Release of multi-layer metal structure in MEMS devices by dry etching technique
Das NC
505 - 512 Determination of semiconductor resistance under a contact
Ahmad M, Shah AP, Sharma DK, Roy NR, Arora BM
513 - 523 Comparison of AlGaN/GaN high electron mobility transistors grown on AlN/SiC templates or sapphire
Johnson JW, Han J, Baca AG, Briggs RD, Shul RJ, Wendt JR, Monier C, Ren F, Luo B, Chu SNG, Tsvetkov D, Dmitriev V, Pearton SJ
525 - 528 Current rise time constants in switch-on process of SiC thyristors
Mnatsakanov TT, Levinshtein ME, Yurkov SN, Ivanov PA, Tandoev AG, Palmour JW, Agarwal AK
529 - 537 Body charge modelling for accurate simulation of small-signal behaviour in floating body SOI
Benson J, Redman-White W, D'Halleweyn NV, Easson CA, Uren MJ
539 - 544 The 1.3-1.6 nm nitrided oxide prepared by NH3 nitridation and rapid thermal annealing for 0.1 mu m and beyond CMOS technology application
Chen CH, Fang YK, Yang CW, Tsair YS, Wang MF, Yao LG, Chen SC, Yu CH, Liang MS
545 - 553 Changes in carrier profiles of bonded SOI wafers with thermal annealing measured by the spreading resistance method
Ichimura M, Ito S, Arai E
555 - 558 Observation of dislocation etch pits in epitaxial lateral overgrowth GaN by wet etching
Wen TC, Lee WI, Sheu JK, Chi GC
559 - 566 Full-band matrix solution of the Boltzmann transport equation and electron impact ionization in GaAs
Cavassilas N, Aniel F, Fishman G, Adde R
567 - 572 Factors limiting the current gain in high-voltage 4H-SiC npn-BJTs
Ivanov PA, Levinshtein ME, Rumyantsev SL, Ryu SH, Agarwal AK, Palmour JW
573 - 576 High breakdown M-I-M structures on bulk AlN
Luo B, Johnson JW, Kryliouk O, Ren F, Pearton SJ, Chu SNG, Nikolaev AE, Melnik YV, Dmitriev VA, Anderson TJ
577 - 579 Modeling of direct tunneling for thin SiO2 film on n-type Si(100) by WKB method considering the quantum effect in the accumulation layer
Matsuo N, Takami Y, Kitagawa Y
581 - 584 High-speed InGaP/InGaAsN/GaAs NpN double heterojunction bipolar transistors with low turn-on voltage
Chang PC, Monier C, Baca AG, Li NY, Newman F, Armour E, Hou HQ
585 - 588 DX centers in Si-doped InxAl1-xAs (0.3 <= x <= 0.5)
Isler M
589 - 591 Generalization of Moll-Ross relations for heterojunction bipolar transistors
Mohammad SN
593 - 595 Quantitative analysis of high frequency performance of modified Darlington pair
ElAhl AMHS, Fahmi MME, Mohammad SN
597 - 599 Improved current drivability and poly-gate depletion of submicron PMOSFET with poly-SiGe gate and ultra-thin nitride gate dielectric
Chen CH, Fang YK, Yang CW, Ting SF, Tsair YS, Chang CN, Hou TH, Wang MF, Yu MC, Lin CL, Chen SC, Yu CH, Liang MS
601 - 603 Simple determination of the profile of bulk generation lifetime in semiconductor
Ding KB