633 - 634 |
A word from the new Editor Cristoloveanu S |
635 - 638 |
Properties of GaAs MOSFET with gate dielectric grown by liquid-phase selective oxidation method Wu JY, Sze PW, Deng YM, Huang GW, Wang YH, Houng MP |
639 - 644 |
Electrical and gas-sensing properties of WO3 semiconductor material Wang YD, Chen ZX, Li YF, Zhou ZL, Wu XH |
645 - 653 |
The effect of different transport models in simulation of high frequency 4H-SiC and 6H-SiC vertical MESFETs Bertilsson K, Nilsson HE, Hjelm M, Petersson CS, Kackell P, Persson C |
655 - 661 |
The effects of channel boron-doping on the performance and hot electron reliability of N-channel trend UMOSFETs Suliman SA, Awadelkarim OO, Fonash SJ, Dolny GM, Hao J, Ridley RS, Knoedler CM |
663 - 667 |
A simple procedure to extract the threshold voltage of amorphous thin film MOSFETs in the saturation region Ortiz-Conde A, Cerdeira A, Estrada M, Sanchez FJG, Quintero R |
669 - 676 |
Estimation of hole mobility in strained Si1-xGex buried channel heterostructure PMOSFET Kar GS, Ray SK, Kim T, Banerjee SK, Chakrabarti NB |
677 - 682 |
Calculation of minimum noise figure using the simple Fukui equation for gallium nitride (GaN) HEMTs Oxley CH |
683 - 688 |
Study of the leakage drain current carriers in silicon-on-insulator MOSFETs at high temperatures Bellodi M, Martino JA |
689 - 696 |
Silicon controlled recitfiers type electrostatic discharge protection circuits with variable holding voltage Jang SL, Li SH, Lin LS |
697 - 702 |
Band gap narrowing in strained Si1-xGex base on (001) Si substrate Jin HY, Zhang LC |
703 - 709 |
A general-purpose software for optical characterization of thin films: specific features for microelectronic applications Bosch S, Ferre-Borrull J, Sancho-Parramon J |
711 - 715 |
Hall mobility and carrier concentration in free-standing high quality GaN templates grown by hydride vapor phase epitaxy Huang D, Yun F, Reshchikov MA, Wang D, Morkoc H, Rode DL, Farina LA, Kurdak C, Tsen KT, Park SS, Lee KY |
717 - 720 |
Low-resistance Ni/Au ohmic contact to Mg-doped of Al0.15Ga0.85N/GaN superlattices Kuo CH, Sheu JK, Chi GC, Huang YL, Yeh TW |
721 - 725 |
Vertical AlGaAs/GaAs heterojunction bipolar transistors with 106 V breakdown Baca AG, Chang PC, Klem JF, Ashby CIH, Martin DC |
727 - 734 |
Analysis of reliability of AlGaAs/GaAs HBTs based on device simulation Tan Y, Liou JJ, Gessner J, Schwierz F |
735 - 741 |
Dielectric loss and related noise of pyroelectric modified lead titanate arrays Leonov VN, Butler DP, Celik-Butler Z, Udayakumar KR, Hanson CM, Beratan HR |
743 - 749 |
Characterization of MOSFETs fabricated on large-grain polysilicon on insulator Jagar S, Chan MS, Wang HM, Poon VMC, Myasnikov AM |
751 - 754 |
The keys to get high transconductance of AlGaAs/InGaAs/GaAs pseudomorphic HEMTs devices Cao X, Zeng YP, Kong MY, Pan L, Wang BQ, Zhu ZP |
755 - 760 |
A study into the broadening of the quantized inversion layer states in deep submicron MOSFETs Rahman A, Haque A |
761 - 765 |
Impact-ionization-induced avalanche multiplication effect and Early effect in the selectively implanted collector n-p-n bipolar junction transistors Su AYK, Gong J |
767 - 771 |
Simulation of electron storage in Ge/Si hetero-nanocrystal memory Yang HG, Shi Y, Bu HM, Wu J, Zhao B, Yuan XL, Shen B, Han P, Zhang R, Zheng YD |
773 - 776 |
Numerical analysis for the effects of SiO2/Si interface roughness on quantum oscillations in ultrathin MOSFETs Mao LF, Tan CH, Xu MZ |