화학공학소재연구정보센터

Solid-State Electronics

Solid-State Electronics, Vol.46, No.5 Entire volume, number list
ISSN: 0038-1101 (Print) 

In this Issue (26 articles)

605 - 613 A review of SiC static induction transistor development for high-frequency power amplifiers
Sung YM, Casady JB, Dufrene JB, Agarwal AK
615 - 619 Extraction of Schottky diode parameters including parallel conductance using a vertical optimization method
Ferhat-Hamida A, Ouennoughi Z, Hoffmann A, Weiss R
621 - 630 An accurate charge control model for spontaneous and piezoelectric polarization dependent two-dimensional electron gas sheet charge density of lattice-mismatched AlGaN/GaN HEMTs
Rashmi, Kranti A, Haldar S, Gupta RS
631 - 638 Scaling of pseudomorphic high electron mobility transistors to decanano dimensions
Kalna K, Roy S, Asenov A, Elgaid K, Thayne I
639 - 643 Field programmable spin-logic realized with tunnelling-magneto resistance devices
Richter R, Boeve H, Bar L, Bangert J, Rupp G, Reiss G, Wecker J
645 - 650 A model for exciton formation in organic electroluminescent devices
Kwok HL, Xu JB
651 - 654 Reduction of dark current in an n-type In0.3Ga0.7As/GaAs quantum well infrared photodetector by using a camel diode structure
Park J, Jo SJ, Hong S, Song JI
655 - 659 Electric field effects associated with the backside Ge profile in SiGeHBTs
Zhang G, Cressler JD, Lanzerotti L, Johnson R, Jin ZR, Zhang SM, Niu GF, Joseph A
661 - 664 Bulk-limited conduction of Ge-implanted thermally grown SiO2 layers
Zhao J, Rebohle L, Gebel T, von Borany J, Skorupa W
665 - 673 The influence of geometric structure on the hot-carrier-effect immunity for deep-sub-micron grooved gate PMOSFET
Ren HX, Hao Y
675 - 683 The effects of scaling on the performance of small-signal MOS amplifiers
Fiegna C
685 - 688 Optimization of gas flow and etch depth uniformity for plasma etching of large area GaAs wafers
Lee JW, Jung PG, Devre M, Westermann R, Pearton SJ
689 - 693 Morphological study of the Al-Ti ohmic contact to p-type SiC
Mohney SE, Hull BA, Lin JY, Crofton J
695 - 698 Fabrication of AlGaN/GaN heterostructure field effect transistor using room-temperature ohmic contact
Jeon CM, Jang HW, Choi KJ, Bae SB, Lee JH, Lee JL
699 - 704 Finite difference analysis of thermal characteristics of CW operation 850 nm lateral current injection and implant-apertured VCSEL with flip-chip bond design
Mehandru R, Dang G, Kim S, Ren F, Hobson WS, Lopata J, Pearton SJ, Chang W, Shen H
705 - 710 Effect of plasma enhanced chemical vapor deposition of SiNx on n-GaN Schottky rectifiers
Luo B, Johnson JW, Ren F, Baik KW, Pearton SJ
711 - 714 Transient response of highly doped thin channel GaN metal-semiconductor and metal-oxide-semiconductor field effect transistors
Pala N, Rumyantsev SL, Shur MS, Hu X, Tarakji A, Gaska R, Khan MA, Simin G, Yang J
715 - 719 Study on ZnSnO3 sensitive material based on combustible gases
Wu XH, Wang YD, Tian ZH, Liu HL, Zhou ZL, Li YF
721 - 734 Substrate-triggered ESD clamp devices for use in power-rail ESD clamp circuits
Ker MD, Chen TY, Wu CY
735 - 742 Analysis of the diode characteristics using the thermodynamic theories
Maa YJ, Abdel-Motaleb IM
743 - 746 DC and microwave performance of recessed-gate GaN MESFETs using ICP-RIE
Lee C, Lu W, Piner E, Adesida I
747 - 751 Device simulation of surface quantization effect on MOSFETs with simplified density-gradient method
Matsuzawa K, Takagi S, Takayanagi M, Tanimoto H
753 - 757 Current-voltage characteristics of an integrated Schottky diode
Tarplee M, Madangarli V, Sudarshan TS
759 - 767 A macro model of silicon spiral inductor
Su CY, Chen LP, Chang SJ, Tseng BM, Lin DC, Huang GW, Ho YP, Lee HY, Kuan JF, Wen WY, Liou P, Chen CL, Leu LY, Wen KA, Chang CY
769 - 772 De-embedding length-dependent edge-leakage current in shallow trench isolation submicron MOSFETs
Zhou X, Lim KY
773 - 775 Development of advanced plasma process with an optical emission spectroscopy-based end-point technique for etching of AlGaAs over GaAs in manufacture of heterojunction bipolar transistors
Lee JW, Jeon MH, Cho GS, Yim HC, Chang SK, Kim KK, Devre M, Johnson D, Sasserath JN, Pearton SJ