469 - 472 |
Variable range hopping conductivity and negative magnetoresistance in n-type InP semiconductor Abdia R, El Kaaouachi A, Nafidi A, Biskupski G, Hemine J |
473 - 477 |
Effects of electrodes on the properties of sol-gel PZT based capacitors in FeRAM Zhang MM, Jia Z, Ren TL |
478 - 482 |
Current conduction models in the high temperature single-electron transistor Dubuc C, Beaumont A, Beauvais J, Drouin D |
483 - 489 |
Parasitic electrostatic capacitance of high-speed SiGe Heterojunction Bipolar Transistors Zerounian N, Aniel F, Barbalat B, Chevalier P, Chantre A |
490 - 496 |
A new compact subthreshold behavior model for dual-material surrounding gate (DMSG) MOSFETs Chiang TK |
497 - 503 |
Effect of strain on the performance of MOSFET-like and p-i-n carbon nanotube FETs Nia IH, Sheikhi MH |
504 - 513 |
Continuous model for independent double gate MOSFET Reyboz M, Martin P, Poiroux T, Rozeau O |
514 - 519 |
Analytical model of short-channel gate enclosed transistors using Green functions Lopez P, Hauer J, Blanco-Filgueira B, Cabello D |
520 - 525 |
Small-signal modeling of MOSFET cascode with merged diffusion Yun Y, Jhon HS, Jeon J, Lee J, Shin H |
526 - 529 |
Laser lift-off transfer of AlGaN/GaN HEMTs from sapphire onto Si: A thermal perspective Ji HF, Das J, Germain M, Kuball M |
530 - 539 |
Capacitance and conductance characteristics of silicon nanocrystal metal-insulator-semiconductor devices Flynn C, Konig D, Perez-Wurfl I, Conibeer G, Green MA |
540 - 547 |
Analytical models of front- and back-gate potential distribution and threshold voltage for recessed source/drain UTB SOI MOSFETs Svilicic B, Jovanovic V, Suligoj T |
548 - 556 |
Symmetric linearization method for double-gate and surrounding-gate MOSFET models Dessai G, Dey A, Gildenblat G, Smit GDJ |
557 - 561 |
Improvement of operational stability in SET states of phase-change-type nonvolatile memory devices using Sb-rich phase of Ge-Sb-Te alloys Yoon SM, Lee SY, Jung SW, Park YS, Yu BG |