L1 - L1 |
EIS studies of porous oxygen electrodes with discrete particles - I. Impedance of oxide catalyst supports (vol 150, pg E423, 2003) Chen GY, Waraksa CC, Cho HG, Macdonald DD, Mallouk TE |
L2 - L2 |
Magnetohydrodynamic analysis of silver electrocrystallization from a nitric and tartaric solution (vol 151, C112, 2004) Aaboubi O, Amblard J, Chopart JP, Olivier A |
L3 - L3 |
Structural changes in electrochromic WO3 thin films induced by the first electrochemical cycles (vol 151, pg H21, 2004) Pauporte T, Bernard MC, Soldo-Olivier Y, Faure R |
F93 - F97 |
Comparison of FTIR transmission spectra of thermally and LPCVD SiO2 films grown by TEOS pyrolysis Vamvakas VE, Davazoglou D |
F98 - F104 |
Properties of oxide film atomic layer deposited from tetraethoxy silane, hafnium halides, and water Kukli K, Ritala M, Leskela M, Sajavaara T, Keinonen J, Hegde RI, Gilmer DC, Tobin PJ |
H97 - H100 |
Novel structural behavior of strontium aluminate doped with europium Shi WS, Yamada H, Nishikubo K, Kusaba H, Xu CN |
J27 - J32 |
Determining extremely low sodium activities at elevated temperatures Nafe H |
J33 - J37 |
Manipulation of metal dispersions inside glass by adjusting potential distributions using ion-conducting microelectrodes Kamada K, Yamashita S, Matsumoto Y |
A661 - A665 |
Effects of water removal on the performance degradation of PEMFCs repetitively brought to < 0 degrees C Cho EA, Ko JJ, Ha HY, Hong SA, Lee KY, Lim TW, Oh IH |
A666 - A671 |
Synthesis and electrochemical properties of vanadium oxide aerogels prepared by a freeze-drying process Sudant G, Baudrin E, Dunn B, Tarascon JM |
A672 - A681 |
Study of the capacity fading mechanism for Fe-substituted LiCoO2 positive electrode McLarcn VL, West AR, Tabuchi M, Nakashima A, Takahara H, Kobayashi H, Sakaebe H, Kageyama H, Hirano A, Takedac Y |
A682 - A688 |
Heat-treated transition metal hexacyanometallates as electrocatalysts for oxygen reduction insensitive to methanol Sawai K, Suzuki N |
A689 - A697 |
Mechanistic and bifurcation analysis of anode potential oscillations in PEMFCs with CO in anode feed Zhang JX, Fehribach JD, Datta R |
A698 - A702 |
Nanocrystalline and thin film germanium electrodes with high lithium capacity and high rate capabilities Graetz J, Ahn CC, Yazami R, Fultz B |
A703 - A709 |
Enhancement of CO tolerance of platinum catalysts using metal macrocycle complexes Venkataraman R, Kunz HR, Fenton JM |
A710 - A715 |
CO-tolerant, sulfided platinum catalysts for PEMFCs Venkataraman R, Kunz HR, Fenton JM |
A716 - A719 |
Gas-diffusion process in a tubular cathode substrate of an SOFC - I Theoretical analysis of gas-diffusion process under cylindrical coordinate system Huang K |
A720 - A727 |
Synthesis and electrochemical characteristics of Li[CoxLi(1/3-x/3)Mn(2/3-2x/3)]O-2 compounds Park YJ, Hong YS, Wu XL, Kim MG, Ryu KS, Chang SH |
A728 - A730 |
A comparison of dry plasma and wet chemical etching of GaSb photodiodes Bhagwat V, Langer JP, Bhat I, Dutta PS, Refaat T, Abedin MN |
A731 - A738 |
Liquid-solid phase diagrams of ternary and quaternary organic carbonates Ding MS |
A739 - A747 |
A stochastic structure model for liquid-electrolyte fuel cell electrodes, with special application to MCFCs - I. Electrode structure generation and characterization Hong SG, Selman JR |
A748 - A755 |
A stochastic structure model for liquid-electrolyte fuel cell electrodes, with special application to MCFCs - II. Effect of structure on performance Hong SG, Selman JR |
A756 - A762 |
The Air/Platinum/Nafion triple-phase boundary: Characteristics, scaling, and implications for fuel cells O'Hayre R, Prinz FB |
A763 - A768 |
Nonalloyed carbon-supported PtRu catalysts for PEMFC applications Papageorgopoulos DC, de Heer MP, Keijzer M, Pieterse JAZ, de Bruijn FA |
A769 - A773 |
Supercapacitors prepared from carbon nanofibers electrospun from polybenzimidazol Kim C, Kim JS, Kim SJ, Lee WJ, Yang KS |
A774 - A780 |
Study on aging of tetragonal zirconia by coupling impedance and Raman spectroscopies in water vapor atmosphere Djurado E, Boulc'h F, Dessemond L, Rosman N, Mermoux M |
A781 - A790 |
Self-discharge of graphite electrodes at elevated temperatures studied by CV and electrochemical impedance spectroscopy Levi MD, Wang C, Aurbach D |
B245 - B251 |
Application of a straining electrode to high-temperature corrosion Nishikata A, Yamamuro J, Tsuru T |
B252 - B259 |
Covalent bonding of organic molecules to Cu and Al alloy 2024 T3 surfaces via diazonium ion reduction Hurley BL, McCreery RL |
B260 - B264 |
Effect of tensile stress on growth of self-organized nanostructures on anodized aluminum Sulka GD, Stroobants S, Moshchalkov VV, Borghs G, Celis JP |
B265 - B270 |
Relationship between Al2O3 film dissolution rate and the pitting potential of aluminum in NaCl solution Boxley CJ, White HS |
B271 - B283 |
Effect of Cu content on corrosion behavior of 7xxx series aluminum alloys Meng QJ, Frankel GS |
B284 - B289 |
Anodic oxidization of aluminum at high current densities and mechanism of film formation Deng PY, De Bai X, Chen XW, Feng QL |
C283 - C291 |
Metallorganic CVD of high-quality PZT thin films at low temperature with new Zr and Ti precursors having MMP ligands Zhao JS, Park DY, Seo MJ, Hwang CS, Han YK, Yang CH, Oh KY |
C292 - C296 |
Plasma-enhanced atomic layer deposition of SrTa2O6 thin films using Sr[Ta-OC2H5)(5)(OC2H4OCH3)](2) as precursor Shin WC, Ryu SO, You IK, Yu BG, Lee WJ, Choi KJ, Yoon SG |
C297 - C306 |
Electrodeposition and characterization of sacrificial copper-manganese alloy coatings - I. Electrochemical and morphological characterization Gong J, Zangari G |
C307 - C314 |
Self-standing porous silicon films by one-step anodizing Solanki CS, Bilyalov RR, Poortmans J, Celis JP, Nijs J, Mertens R |
C315 - C317 |
Microstructural investigation of Co-P by TEM Ruythooren W, De Boeck J, Celis JP |
C318 - C325 |
Cathodic Behavior of n-InP modified by a thin anodic oxide Quach NC, Simon N, Gerard I, Van PT, Etcheberry A |
C326 - C332 |
Porous SiGe nanostructures formed by electrochemical etching of thin poly-SiGe films Del Cano T, Sanz LF, Martin P, Avella M, Jimenez J, Rodriguez A, Sangrador J, Rodriguez T, Torres-Costa V, Martin-Palma RJ, Martinez-Duart JM |
C333 - C341 |
Effects of ethoxylated alpha-naphtholsulfonic acid on tin electroplating at iron electrodes Lee JY, Kim JW, Chang BY, Kim HT, Park SM |
C342 - C347 |
Electrical waveform mediated through-mask deposition of solder bumps for wafer level packaging Kim B, Ritzdorf T |
C348 - C357 |
New facets of CdTe electrodeposition in acidic solutions with higher tellurium concentrations Lepiller C, Lincot D |
E179 - E185 |
Physicochemical properties of molten alkali metal carbonates coexisting with inorganic powder Mizuhata M, Harada Y, Cha GJ, Beleke AB, Deki S |
E186 - E193 |
AC impedance spectra arising from mixed ionic electronic solid electrolytes Atkinson A, Baron SA, Brandon NP |
E194 - E198 |
Effect of thermal annealing on structural properties and electrochemical performance of carbon films with porous microstructure Kiema GK, Brett MJ |
F105 - F112 |
Organosilicon thin films deposited from cyclic and acyclic precursors using water as an oxidant Burkey DD, Gleason KK |
F113 - F117 |
Performance and reliability of low-temperature processed SrBi2Ta2O9 capacitors for FeRAM applications Oh SH, Noh KH, Lee SS, Kang HB, Yang YH, Lee KN, Hong SK, Park YJ |
F118 - F122 |
The changing effect of N-2/O-2 gas flow rate ratios on ultrathin nitrogen-enriched oxynitride gate dielectrics Chang KM, Yang WC, Chen CF, Hung BF |
F123 - F127 |
Synthesis and characterization of templating low dielectric constant organosilicate films Yu SZ, Wong TKS, Hu X, Pita K, Ligatchev V |
F128 - F131 |
Temperature-dependent current transport in low-k inorganic dielectrics Tringe JW, Solomon JS, Devine RAB |
G285 - G288 |
Ultraviolet emission in ZnO films controlled by point defects Lin CC, Hsiao CS, Chen SY, Cheng SY |
G289 - G296 |
Quantitative evaluation of iron at the silicon surface after wet cleaning treatments Caputo D, Bacciaglia P, Carpanese C, Polignano ML, Lazzeri P, Bersani M, Vanzetti L, Pianetta P, Moro L |
G297 - G301 |
The possibility of carbonyl fluoride as a new CVD chamber cleaning gas Mitsui Y, Ohira Y, Yonemura T, Takaichi T, Sekiya A, Beppu T |
G302 - G306 |
Pit formation induced by copper contamination on silicon surface immersed in dilute hydrofluoric acid solution Mitsugi N, Nagai K |
G307 - G318 |
Low-frequency noise assessment for deep submicrometer CMOS technology nodes Claeys C, Mercha A, Simoen E |
G319 - G322 |
The microstructure and chemical state of W-Si-N layers formed in W/WNx/poly-Si systems during postannealing Kang SK, Min BG, Ko DH, Kang HB, Yang CW, Lim KY |
G323 - G327 |
Removal of the metallorganic polymer residues formed at via holes Song J, Kim JS, Seo H, Kim Y, Jeon H |
G328 - G337 |
MOS-diode characteristics with HfO2 gate insulator deposited by ECR sputtering Saito K, Jin Y, Shimada M |
G338 - G342 |
Particle precipitation in connection with KOH etching of silicon Nielsen CB, Christensen C, Pedersen C, Thomsen EV |
G343 - G346 |
Planar inductively coupled BCl3 plasma etching of III-V semiconductors Lim WT, Baek IK, Lee JW, Jeon MH, Park WW, Cho GS, Pearton SJ |
G347 - G352 |
Etching AlAs with HF for epitaxial lift-off applications Voncken MMAJ, Schermer JJ, van Niftrik ATJ, Bauhuis GJ, Mulder P, Larsen PK, Peters TPJ, de Bruin B, Klaassen A, Kelly JJ |
G353 - G359 |
Characterization of low-temperature silicon nitride LPCVD from bis(tertiary-butylamino)silane and ammonia Gumpher J, Bather W, Mehta N, Wedel D |
G360 - G367 |
Effect of additives on copper outplating onto silicon surface from dilute HF solutions Chen Z, Singh RK |
G368 - G372 |
Estimation of fractional surface coverage of particles for oxide CMP Choi W, Lee SM, Abiade J, Singh RK |
G373 - G376 |
High-precision analysis of oxygen depth profile in O-16(+)-implanted silicon substrates by spectroscopic ellipsometry Iikawa H, Nakao M, Gruska B, Izumi K |
H101 - H104 |
Sodium activity in the heterogeneous phase system Na-beta-Al2O3/borate glass, MeO/Me Nafe H, Gollhofer S |
H105 - H112 |
Investigation of fluorescence yield of phosphors in vacuum ultraviolet region Mishra KC, Raukas M |
H113 - H116 |
Total nitrogen oxides gas sensor based on solid electrolytes with refractory oxide-based auxiliary electrode Imanaka N, Oda A, Tamura S, Adachi G |
H117 - H121 |
Gas-diffusion process in a tubular cathode substrate of a SOFC - II: Identification of gas-diffusion process using AC impedance method Huang KQ |
H122 - H127 |
Amperometric solid-state gas sensor using LaGaO3 based perovskite oxide electrolyte for detecting hydrocarbon in exhaust gas - II. Improvement of inactive electrode performance Dutta A, Ishihara T, Nishiguchi H, Takita Y |
H128 - H132 |
Thin AC-PDP vacuum in-line sealing using direct-joint packaging method Lee DJ, Moon SI, Lee YH, Ju BK |
H133 - H139 |
Sensing mechanism of potentiometric gas sensors based on stabilized zirconia with oxide electrodes - Is it always mixed potential? Di Bartolomeo E, Grilli ML, Traversa E |