Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.12, No.3 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (46 articles)

607 - 616	Rational Pattern Design for in-Vitro Cellular Networks Using Surface Photochemistry Hickman JJ, Bhatia SK, Quong JN, Shoen P, Stenger DA, Pike CJ, Cotman CW
617 - 619	Chlorine-Enhanced F-Atom Etching of Silicon Coburn JW
620 - 635	Simulation of Surface-Topography Evolution During Plasma-Etching by the Method of Characteristics Arnold JC, Sawin HH, Dalvie M, Hamaguchi S
636 - 647	Dynamics of Ion-Assisted Etching in the Si(100)/Xef2/Ar+ System on a Time-Scale 100-Mu-S-1000-S Joosten GJ, Vugts MJ, Spruijt HJ, Senhorst HA, Beijerinck HC
648 - 657	Etching of Si Surfaces with Hot Chlorine Beams - Translational and Vibrational-Excitation of the Incident Chlorine Particles Szabo A, Engel T
658 - 664	Fluorocarbon High-Density Plasma .5. Influence of Aspect Ratio on the Etch Rate of Silicon Dioxide in an Electron-Cyclotron-Resonance Plasma Joubert O, Oehrlein GS, Zhang Y
665 - 670	Fluorocarbon High-Density Plasma .6. Reactive Ion Etching Lag Model for Contact Hole Silicon Dioxide Etching in an Electron-Cyclotron-Resonance Plasma Joubert O, Oehrlein GS, Surendra M
671 - 676	Combined Instrument for the Online Investigation of Plasma-Deposited or Etched Surfaces by Monochromatized X-Ray Photoelectron-Spectroscopy and Time-of-Flight Secondary-Ion Mass-Spectrometry Jahn PW, Petrat FM, Wolany D, Deimel M, Gantenfort T, Schmerling C, Wensing H, Wiedmann L, Benninghoven A
677 - 680	Adverse-Effects on Plasma-Polymerized Films Due to Previous Oxygen Etching in an Electrodeless Reactor Wymore T, Nichols MF
681 - 689	Synchrotron-Radiation (5-50 eV) Induced Degradation of Fluorinated Polymers Simons JK, Frigo SP, Taylor JW, Rosenberg RA
690 - 698	Study of the NF3 Plasma Cleaning of Reactors for Amorphous-Silicon Deposition Bruno G, Capezzuto P, Cicala G, Manodoro P
699 - 706	Chemical and Morphological-Changes on Silver Surfaces Produced by Microwave Generated Atomic Oxygen Bhan MK, Nag PK, Miller GP, Gregory JC
707 - 713	Characterization of Silver Films Deposited by Radio-Frequency Magnetron Sputtering Marechal N, Quesnel E, Pauleau Y
714 - 717	CdTe Oxide-Films Grown by Radio-Frequency Sputtering Utilizing Argon Nitrous-Oxide Plasma Zapatanavarro A, Zapatatorres M, Sosa V, Bartoloperez P, Pena JL
718 - 722	Study of the Time-Dependence of Differentially Sputtered Currents from Multiphase Powder Targets Cohen Y, Riess I
723 - 726	Planar Magnetron Glow-Discharge on Copper - Empirical and Semiempirical Relations Escrivao ML, Moutinho AM, Maneira MJ
727 - 732	Thickness-Dependent Stress in Sputtered Carbon-Films Puchert MK, Timbrell PY, Lamb RN, Mckenzie DR
733 - 736	Properties of Ticn Coatings Prepared by Magnetron Sputtering Deng JG, Braun M, Gudowska I
737 - 745	Loss of Selectivity During W-Chemical Vapor-Deposition on Si Using the Wf6/SiH4 Process Groenen PA, Tekcan OF, Holscher JG, Brongersma HH
746 - 750	Adhesion Between Polycarbonate Substrate and SiO2 Film Formed from Silane and Nitrous-Oxide by Plasma-Enhanced Chemical-Vapor-Deposition Shinoda M, Nishide T, Shichi Y
751 - 753	Preparation of Amorphous BaTiO3 Thin-Films on Indium Tin Oxide-Coated Soda Lime Glass by Metalorganic Chemical-Vapor-Deposition Yoon YS, Lee DH, Kim TS, Oh MH, Yom SS
754 - 759	Deposition of Amorphous Hydrogenated Silicon-Carbide Films Using Organosilanes in an Argon Hydrogen Plasma Maya L
760 - 768	Comparison of Argon Electron-Cyclotron-Resonance Plasmas in 3 Magnetic-Field Configurations .2. Energy-Distribution of Argon Ions Junck KL, Getty WD
769 - 771	Electric-Field in Surface-Wave-Produced Plasmas Komachi K
772 - 782	Valence-Band Structure of Pmda-Oda Polyimide Studied by X-Ray Photoelectron-Spectroscopy and Theoretical Calculations Nakayama Y, Baltzer P, Wannberg B, Gelius U, Stafstrom S, Lunell S
783 - 789	Characterization by Auger-Spectroscopy of Niobium Aluminum-Oxide Niobium Sandwiches for Josephson-Junctions Lacquaniti V, Bergoglio M, Steni R
790 - 793	Depth Profile Optimization Naumkin AV, Vasilyev LA
794 - 801	Dependence of Resolution on Sample Material in Rotational Auger Depth Profiling Tanemura M, Okuyama F
802 - 806	Core-Valence Auger-Spectra of Lial Zintl Intermetallic Compound Jang GE, Curelaru IM, Kim HG
807 - 812	Metallization of Teflon PFA .2. Interactions of Ti, Ag, and Au Measured by X-Ray Photoelectron-Spectroscopy Shi MK, Lamontagne B, Selmani A, Martinu L, Sacher E, Wertheimer MR, Yelon A
813 - 819	Thin Gold Film Strain-Gauges Li CS, Hesketh PJ, Maclay GJ
820 - 825	Atomic Release of Hydrogen from Pure and Boronized Graphites Franzen P, Vietzke E
826 - 830	Reduction of Photodesorption Yield by Oxygen Discharge Cleaning Ota N, Saitoh M, Kanazawa K, Momose T, Ishimaru H
831 - 834	2-Photon Laser-Induced Fluorescence Measurements of Absolute Atomic-Hydrogen Densities and Powder Formation in a Silane Discharge Czarnetzki U, Miyazaki K, Kajiwara T, Muraoka K, Okada T, Maeda M, Suzuki A, Matsuda A
835 - 838	Precise Property Determinations of Arsenosilicate Glass Thin-Films Using Infrared-Spectroscopy Niemczyk TM, Wangmaneerat B, Haaland DM
839 - 845	Infrared-Absorption Spectroscopy for Monitoring Condensable Gases in Chemical-Vapor-Deposition Applications Oneill JA, Passow ML, Cotler TJ
846 - 853	Gas Desorption from an Oxygen-Free High-Conductivity Copper Vacuum Chamber by Synchrotron-Radiation Photons Grobner O, Mathewson AG, Marin PC
854 - 860	Small Ultrahigh-Vacuum Compatible Hyperthermal Oxygen-Atom Generator Outlaw RA, Davidson MR
861 - 866	Pumping of Helium and Hydrogen by Sputter-Ion Pumps .2. Hydrogen Pumping Welch KM, Pate DJ, Todd RJ
867 - 872	Thermal Outgassing Behavior and Photoemission-Studies of Haynes Alloy-214 Sharma PK, Hickey GS
873 - 875	Reaction-Mechanism Between BN-Sprayed Graphite and Molten Al in Vacuum, and Its Application to the Evaporation Source for Reactive Metals Including Al Jeong JI, Lim BM, Moon JH, Hong JH, Kang JS, Lee YP
876 - 878	New Technique for Coprecipitation of Organic-Dye with Polymer Under High-Vacuum Hiraga T, Tanaka N, Takarada S, Hayamizu K, Kikuchi N, Moriya T
879 - 882	Vacuum-Ultraviolet Emission from Microwave Plasmas of Hydrogen and Its Mixtures with Helium and Oxygen Hollander A, Wertheimer MR
883 - 885	In-Situ Bend Fixture for Deformation and Fracture Studies in the Environmental Scanning Electron-Microscope Kalnas CE, Mansfield JF, Was GS, Jones JW
886 - 888	Effect of Anode Bias on Plasma-Confinement in Direct-Current Magnetron Discharges Doyle JR, Nuruddin A, Abelson JR
889 - 891	Instrument for the Measurement of Adhesion Forces in Ultrahigh-Vacuum Surface-Analysis Apparatuses Takahashi K, Iiyama T, Katoh N, Onzawa T