| 2605 - 2616 |
Friction and Energy-Dissipation at the Atomic-Scale - A Review
Singer IL |
| 2617 - 2624 |
Sensitivity of 2nd-Harmonic Generation to Space-Charge Effects at Si(111) Electrolyte and Si(111)/SiO2 Electrolyte Interfaces
Fischer PR, Daschbach JL, Gragson DE, Richmond GL |
| 2625 - 2629 |
Si/SiO2 Interface Studies by Spectroscopic Immersion Ellipsometry and Atomic-Force Microscopy
Liu Q, Wall JF, Irene EA |
| 2630 - 2640 |
In-Situ Pulsed Laser-Induced Thermal-Desorption Studies of the Silicon Chloride Surface-Layer During Silicon Etching in High-Density Plasmas of Cl2 and Cl2/O2 Mixtures
Cheng CC, Guinn KV, Donnelly VM, Herman IP |
| 2641 - 2645 |
Surface-Roughness Formation in Si During Cs+ Ion-Bombardment
Matsuura Y, Shichi H, Mitsui Y |
| 2646 - 2652 |
Investigation of Roughened Silicon Surfaces Using Fractal Analysis .1. 2-Dimensional Variation Method
Spanos L, Irene EA |
| 2653 - 2661 |
Investigation of Roughened Silicon Surfaces Using Fractal Analysis .2. Chemical Etching, Rapid Thermal Chemical-Vapor-Deposition, and Thermal-Oxidation
Spanos L, Liu Q, Irene EA, Zettler T, Hornung B, Wortman JJ |
| 2662 - 2671 |
Surface Modification of Fluoropolymers with Vacuum-Ultraviolet Irradiation
Matienzo LJ, Zimmerman JA, Egitto FD |
| 2672 - 2679 |
Improved Determination of the Ultrathin Structural Parameters of Co/Pd Multilayered Film, and Its Magnetic and Magnetooptical Properties
Lee YP, Kim SK, Kang JS, Jeong JI, Hong JH, Koo YM, Shin HJ |
| 2680 - 2684 |
Extraction of Inelastic Mean Free-Path Data from Elastic Electron Backscattering Data
Dwyer VM |
| 2685 - 2691 |
Measurement and Modeling of Moisture Adsorption Properties of 316 Stainless-Steel Tubing Samples
Siefering KL, Whitlock WH |
| 2692 - 2700 |
Low-Energy Ion-Induced Electron-Emission from Gas-Covered Surfaces
Smith PC, Hu B, Ruzic DN |
| 2701 - 2704 |
X-Ray-Absorption Near-Edge Structures of Sulfur on Gas-Phase Polysulfide Treated InP Surfaces and at Sinx/InP Interfaces
Kwok RW, Huang LJ, Lau WM, Kasrai M, Feng X, Tan K, Ingrey S, Landheer D |
| 2705 - 2710 |
X-Ray Photoelectron-Spectroscopy and Secondary-Ion Mass-Spectrometry Studies of Some Surface-Modified Hydrocarbon Films
Loh FC, Tan KL, Kang ET, Neoh KG, Pun MY |
| 2711 - 2715 |
Development of a High-Resolution Quadrupole Mass-Spectrometer Capable of Detecting He-3 and He-4 in a Hydrogen Isotope Atmosphere
Hiroki S, Abe T, Murakami Y, Yanagishita K, Nakamura S |
| 2716 - 2722 |
Main Features of Electron-Cyclotron-Resonance Ion-Source Vacuum-Systems
Pivarc J |
| 2723 - 2727 |
Effect of Deposition Parameters on the Microstructure of Ion-Beam-Assisted Deposition Tin Films
Kheyrandish H, Colligon JS, Kim JK |
| 2728 - 2732 |
Ion-Beam-Induced Chemical-Vapor-Deposition Procedure for the Preparation of Oxide Thin-Films .1. Preparation and Characterization of TiO2 Thin-Films
Leinen D, Espinos J, Fernanfdez A, Gonzalezelipe AR |
| 2733 - 2738 |
Influence of Charge-Exchange on Ion-Neutral Arrival Rates in an Ion-Assisted Deposition System
Kim JK, Kheyrandish H, Colligon JS |
| 2739 - 2744 |
New High-Power Fast Atom Beam Source
Shimokawa F, Kuwano H |
| 2745 - 2753 |
Microprofile Simulations for Plasma-Etching with Surface Passivation
Hamaguchi S, Dalvie M |
| 2754 - 2761 |
Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated-Optics Applications
Giroultmatlakowski G, Charles C, Durandet A, Boswell RW, Armand S, Persing HM, Perry AJ, Lloyd PD, Hyde SR, Bogsanyi D |
| 2762 - 2766 |
Growth of Er-Doped Si Films by Electron-Cyclotron-Resonance Plasma-Enhanced Chemical-Vapor-Deposition
Rogers JL, Varhue WJ, Adams E, Lavoie MA, Frenette RO |
| 2767 - 2774 |
Comparison of Ar Electron-Cyclotron-Resonance Plasmas in 3 Magnetic-Field Configurations .1. Electron-Temperature and Plasma-Density
Junck KL, Getty WD |
| 2775 - 2779 |
Spatially-Resolved Optical-Emission for Characterization of a Planar Radio-Frequency Inductively-Coupled Discharge
Beale DF, Wendt AE, Mahoney LJ |
| 2780 - 2783 |
Investigation of the Energy-Transfer to the Substrate During Titanium Deposition in a Hollow-Cathode Arc
Steffen H, Kersten H, Wulff H |
| 2784 - 2789 |
Molecular-Beam Epitaxy Cell Optimized for Organic-Compounds and Preparation of a Cu Phthalocyanine Thin-Film
Hattori S, Ishitani A, Kuroda H |
| 2790 - 2794 |
Compact Metalorganic Molecular-Beam Epitaxy Growth System
Hamm RA, Ritter D, Temkin H |
| 2795 - 2797 |
Electron-Gun for Producing a Low-Energy, High-Current, and Uniform Flux Electron-Beam
Lin JL, Yates JT |
| 2798 - 2802 |
Fabrication of Cylindrical, Microcellular Foam-Filled Targets, Containing Aluminum Spheres, for Sphere Drag Experiments
Falconer JW, Nazarov W, Horsfield CJ, Sutton DW, Rothman SD, Freeman NJ |
| 2803 - 2807 |
Processing and Characterization of Large-Grain Thin-Film CdTe
Nelson AJ, Hasoon F, Levi D |
| 2808 - 2813 |
Characterization of Defect Geometries in Multilayer Optical Coatings
Tench RJ, Chow R, Kozlowski MR |
| 2814 - 2819 |
Thermal-Desorption of Co and H2 from Degassed 304 and 347 Stainless-Steel
Rezaieserej S, Outlaw RA |
| 2820 - 2824 |
Investigation About the Incorporation of Hydrogen into Amorphous-Carbon
Schelz S, Kania P, Frauenheim T, Stephan U, Oelhafen P |
| 2825 - 2829 |
Buried Reconstruction Inhibition of Solid-Phase Epitaxy of Ge on Si(111)
Hellman O |
| 2830 - 2833 |
End-Point Detection by Sputtered Neutral Mass-Spectrometry in Ion Milling of Prepatterned Semiconductor and High-T(C) Superconductor Films
Jaekel C, Barth R, Roskos HG, Kurz H |
| 2834 - 2839 |
Low-Voltage and High-Speed Operating Electrostatic Wafer Chuck Using Sputtered Tantalum Oxide Membrane
Nakasuji M, Shimizu H, Kato T |
| 2840 - 2845 |
Model of Lead Loss in Pb(Mgxnb1-X)Oz Ion-Beam Sputtered Thin-Films
Pignolet A, Roy RA, Doyle JP, Cuomo JJ |
| 2846 - 2854 |
Mass and Energy-Resolved Detection of Ions and Neutral Sputtered Species Incident at the Substrate During Reactive Magnetron Sputtering of Ti in Mixed Ar+n2 Mixtures
Petrov I, Myers A, Greene JE, Abelson JR |
| 2855 - 2858 |
Epitaxial-Growth and Characterization of Ni Films Grown on MgO(001) by Biased Direct-Current Sputter-Deposition
Qiu H, Nakai H, Hashimoto M, Safrahn G, Adamik M, Barna PB, Yagi E |
| 2859 - 2866 |
Characterization of Hydrogen and Oxygen-Atoms in Sin Films Produced by Plasma-Enhanced Reactive Sputtering
Sugimoto I, Yanagisawa K, Kuwano H, Nakano S, Tago A |
| 2867 - 2872 |
Hybrid Modeling of Deposition Profiles in Magnetron Sputtering Systems
Stache J |
| 2873 - 2878 |
Modeling of Deposition and Resputtering Rate Profiles in Planar Face-to-Face Sputtering Systems
Hamerich A, Wunderlich R, Muller J |
| 2879 - 2886 |
Tribochemistry at Lubricated Interfaces
Novotny VJ, Pan XH, Bhatia CS |
| 2887 - 2895 |
Studies on Thermionic Cathode Anodic Vacuum Arcs
Musa G, Mausbach M |
| 2896 - 2902 |
Preventing Vacuum Leaks in the Continuous Electron-Beam Accelerator Facility Cavity Pair Bellows
Henkel DP, Doolittle LR |
| 2903 - 2910 |
Clean Ultrahigh-Vacuum System with Single-Structure Diffusion Pumps
Gay TJ, Brand JA, Fritts MC, Furst JE, Khakoo MA, Mell ER, Sieger MT, Wijayaratna WM |
| 2911 - 2916 |
Influence of the Filament Potential Wave-Form on the Sensitivity of Glass-Envelope Bayard-Alpert Gauges
Abbott PJ, Looney P |
| 2917 - 2921 |
Investigation of Synchrotron-Radiation-Induced Photodesorption in Cryosorbing Quasiclosed Geometry
Anashin VV, Malyshev OB, Osipov VN, Maslennikov IL, Turner WC |
| 2922 - 2924 |
In-Situ Scanning Electron-Microscopy Observation of Hillock and Whisker Growth on Al-Ta Alloy-Films for Interconnections of Thin-Films Transistor Liquid-Crystal Displays
Imura E, Ohnishi T, Yoshikawa K, Itayama K |
| 2925 - 2930 |
Filling of Micron-Sized Contact Holes with Copper by Energetic Cluster-Impact
Haberland H, Mall M, Moseler M, Qian Y, Reiners T, Thurner Y |
| 2931 - 2932 |
Observation of Cryopump Fluorescence During Operation of Electron-Beam Evaporator
Erck RA |
| 2933 - 2935 |
Rarefied-Gas Flow-Through a Long Tube at Any Pressure Ratio
Sharipov FM, Seleznev VD |
| 2936 - 2937 |
Influence of the Ratio of the Electron Temperatures at the Electrodes on the Current Oscillations in a Radiofrequency Plasma Reactor
Deutsch R, Erz U, Pohle M, Rauchle E, Schwarz J |
| 2938 - 2939 |
Noninvasive Infrared-Based Measurement of the Temperature of GaAs Semiconductors Crystals
Malam SC, Pell T, Nix RM |
| 2940 - 2942 |
Simple Pulsed-Plasma-Beam Gun for Ultrahigh-Vacuum Applications
Yamada C, Kimura T |
| 2943 - 2945 |
Increased Precision in Strain-Measurement of Diamond by Microraman Spectroscopy
Alexander WB, Holloway PH, Simmons J, Ochoa R |
| 2946 - 2947 |
Glass and Polymer-Based Dosing System for the Introduction of Reactive Gases into Ultrahigh-Vacuum
Apen E, Wentz R, Pompei F, Gland JL |
| 2949 - 2955 |
Protein-Interaction with Surfaces - Separation Distance-Dependent Interaction Energies
Lee SJ, Park K |
| 2956 - 2961 |
Effect of Surface Microphase-Separated Structure on Interaction Between Biological Components and Multiphase Polymer Surface
Takahara A, Korehisa K, Ge SR, Kajiyama T |
| 2962 - 2965 |
Inorganic Pathways for Biosynthesis - A Molecular-Orbital Modeling Approach
Hench LL, West JK |
| 2966 - 2970 |
Examination of Wax on Surface of Extruded Pellethane by Scanning Electron-Microscopy Attenuated Total Reflection-Infrared and X-Ray Photoelectron-Spectroscopy and Its Importance in Blood Compatibility
Sawyer A, Bandekar J, Li H |
| 2971 - 2974 |
Evaluation of Molecular Arrangement in Fatty-Acid Monolayers with Transmission Electron and Atomic-Force Microscope
Oishi Y, Hirose F, Kuri T, Kajiyama T |
| 2975 - 2980 |
Molecular Films from the Polymerizable Lipid Ethyl Morpholine Pentacosadiynoic Amide
Sullivan B, Ribi HO, Tillmann RW, Hofmann UG, Gaug HE |
| 2981 - 2987 |
Control of Purple Membrane Adsorption to a Glass-Surface Using Self-Assembled Monolayers
Brizzolara RA, Beard BC |
