Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.30, No.2 Entire volume, number list

ISSN: 0272-4324 (Print)

213 - 239	Effect of C2H4/N-2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H) Sarra-Bournet C, Gherardi N, Glenat H, Laroche G, Massines F
241 - 255	Excitation of Species in an Expanded Argon Microwave Plasma at Atmospheric Pressure Garcia MC, Varo M, Martinez P
257 - 266	Dry Reforming of Methane with Carbon Dioxide Using Pulsed DC Arc Plasma at Atmospheric Pressure Yan BH, Wang Q, Jin Y, Cheng Y
267 - 279	Carbon Blacks Produced by Thermal Plasma: the Influence of the Reactor Geometry on the Product Morphology Pristavita R, Mendoza-Gonzalez NY, Meunier JL, Berk D
281 - 286	CCl4 Decomposition in RF Thermal Plasma in Inert and Oxidative Environments Kovacs T, Turanyi T, Szepvolgyi J
287 - 297	Time Resolved Microwave Interferometry Measurement of the Electron Density in a Pulsed 1,3-Butadiene Discharge Jindal AK, Overzet L, Goeckner M
299 - 309	Scavenging Effects of Aliphatic Alcohols and Acetone on H-aEuro cent Radicals in Anodic Contact Glow Discharge Electrolysis: Determination of the Primary Yield of H-aEuro cent Radicals Gangal U, Srivastava M, Sen Gupta S
311 - 332	Influence of Rubber Formulation on Surface Modifications Produced by RF Plasma Ortiz-Magan AB, Pastor-Blas MM