1 - 4 |
Dielectric-Constants of Ta2O5 Thin-Films Deposited by RF-Sputtering Shibata S |
5 - 6 |
Studies on Metal Contact to Polyaniline Films Lokhande CD, Kale SS, Jadhav US, Wagh BG |
7 - 78 |
Thin-Films Including Layers - Terminology in Relation to Their Preparation and Characterization - IUPAC Recommendations 1994 Terminassiansaraga L, Vincent B, Adler M, Barraud A, Churaev NV, Eaton DF, Kuhn H, Misono M, Platikanov D, Ralston J, Silberberg A, Zemel JN |
79 - 82 |
Deposition of BN Coatings by Spraying a Powder Accelerated Electrodynamically in a Coaxial Pulse Plasma Generator Olszyna A |
83 - 89 |
Characterization of Quasi-Rugate Filters Using Ellipsometric Measurements Tikhonravov AV, Trubetskov MK, Hrdina J, Sobota J |
90 - 97 |
Transmission Electron-Microscopy Characterization of Ion-Beam Synthesized Fesi2 Layers Tavares J, Bender H, Maex K |
98 - 100 |
Preparation of Transition-Metal Chalcogenide Thin-Films by Pulsed-Laser Ablation Lee H, Kanai M, Kawai T |
101 - 114 |
Time-Dependent Dielectric-Breakdown Measurements on Rpecvd and Thermal Oxides Silvestre C, Hauser JR |
115 - 120 |
Dynamic Actinometric Optical-Emission Spectroscopy for the Elucidation of Plasma Processes in the Production of Fluorinated Amorphous Hydrogenated Carbon-Films from Glow-Discharges Durrant SF, Demoraes MA |
121 - 127 |
Investigation of Grain-Boundary Chemistry in Al-Li-2195 Welds Using Auger-Electron Spectroscopy Sanders JH |
128 - 131 |
Treatment of MoS2 Films by High-Energy Heavy-Ion Beams Jain A, Srivastav S |
132 - 137 |
Ar/H-2 Sputtering Deposition of 350 Mu-M Thick Si-H/SiO2-X-H Multilayers Having Flat Interfaces for Optical Applications Takahashi H, Nagata H, Kataoka H |
138 - 143 |
Stability of Interfaces in Mo/Cu Multilayered Metallization Luby S, Majkova E, Jergel M, Brunel M, Leggieri G, Luches A, Majni G, Mengucci P |
144 - 146 |
Design and Fabrication of a Double Bandstop Rugate, Filter Grown by Plasma-Enhanced Chemical-Vapor-Deposition Lim S, Shih S, Wager JF |
147 - 154 |
Sol-Gel Preparation and Photoelectrochemical Properties of TiO2 Films Containing Au and Ag Metal Particles Zhao G, Kozuka H, Yoko T |
155 - 161 |
On Some Important Care to Take When Making Spectrophotometric Measurements on Semiconductor Thin-Films Laaziz Y, Bennouna A |
162 - 168 |
Preparation and Properties of Spin-Coated Nb2O5 Films by the Sol-Gel Process for Electrochromic Applications Ozer N, Chen DG, Lampert CM |
169 - 174 |
Ion-Bombardment Effect on Electronic States in CdS Fine Particles Asai K, Yamaki T, Ishigure K, Shibata H |
175 - 179 |
Crystallinity for Epitaxial Thin-Films of Bi-Based Oxide Superconductor Prepared at Low-Temperature Mizuno K, Setsune K |
180 - 184 |
Preparation of Uniaxially Oriented Polyamide Films by Vacuum Deposition Polymerization Sakata J, Mochizuki M |
185 - 191 |
Optimum Thickness Determination to Maximize the Spectral Selectivity of Black-Pigmented Coatings for Solar Collectors Gunde MK, Logar JK, Orel ZC, Orel B |
192 - 195 |
Deviations from Matthiessens-Rule in Continuous Metal-Films Broitman E, Alonso P, Zimmerman R |