Thin Solid Films

Thin Solid Films, Vol.341, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (52 articles)

1 - 8	Detection by emission spectroscopy of active species in plasma-surface processes Ricard A, Czerwiec T, Belmonte T, Bockel S, Michel H
9 - 12	Properties of the plasma produced by multi-cathode electron beam plasma sources Kang YB, Jeon H, Kim TY, Chung KH, Ko DK, Jung JK, Noh SJ
13 - 17	Sol-gel derived (La,Sr)CoO3 thin films on silica glass Kim BJ, Lee J, Yoo JB
18 - 21	A two-dimensional simulation of electron cyclotron resonance plasma and comparison with experimental data Shin CB, Hur JS, Oh SG
22 - 26	Development of a large-area transformer coupled plasma source Kim HJ, Han KH, Yoon NS, Hwang YS
27 - 30	Measurements of the loss probability of nitrogen atoms versus temperature on various surfaces Belmonte T, Lefevre L, Czerwiec T, Michel H, Ricard A
31 - 36	Effects of substrate bias voltage on properties of CoCrTa/Cr media Kim SH, Shin KH, Lee TD
37 - 41	In situ ellipsometry studies of temperature-dependent Au thin-film growth Lee S, Hong J, Oh SG
42 - 46	beta-SiC thin film growth using microwave plasma activated CH4-SiH4 sources Kim HS, Park YJ, Choi IH, Baik YJ
47 - 51	Properties of silicon oxide films deposited by plasma-enhanced CVD using organosilicon reactants and mass analysis in plasma Inoue Y, Takai O
52 - 54	RuO2 thin film fabrication with plasma-enhanced chemical vapor deposition Park SE, Kim HM, Kim KB, Min SH
55 - 58	Correlation between silicon particles and modulated crossed magnetic field in silane plasmas Tazoe K, Yang SC, Maemura Y, Ohtsu M, Fujiyama H
59 - 62	Control of silicon particle behavior using a low frequency electromagnetic field in silane plasma chemical vapor deposition Yang SC, Fujiyama H
63 - 67	Growth of magnesium oxide thin films using single molecular precursors by metal-organic chemical vapor deposition Boo JH, Lee SB, Yu KS, Koh W, Kim Y
68 - 72	Structure and optical properties of Si incorporated diamond-like carbon films deposited by rf plasma-assisted chemical vapor deposition Lee S, Kim DS, Rhee SG, Oh SE, Lee KR
73 - 78	Characterization of alpha-Fe2O3 thin films processed by plasma enhanced chemical vapor deposition (PECVD) Lee ET, Kim BJ, Jang GE
79 - 83	Phase transformation phenomena from alpha type to gamma type one of Fe2O3 thin film deposited by PECVD Kim BJ, Lee ET, Jang GE
84 - 90	SiO2 etching using high density plasma sources Tsukada T, Nogami H, Nakagawa Y, Wani E, Mashimo K, Sato H, Samukawa S
91 - 93	Lateral force microscopy study of functionalized self-assembled monolayer surfaces Kim Y, Kim KS, Park M, Jeong J
94 - 100	Electrical properties of reactively sputtered CNx films Monclus MA, Cameron DC, Chowdhurry AKMS
IX - IX	Proceedings of the 1st Asian-European International Conference on Plasma Surface Engineering, Seoul, Korea, October 5-9, 1997 - Preface Chung KH, Han JG
101 - 104	ECWR-plasma CVD as a novel technique for phase controlled deposition of semiconductor films Oechsner H, Scheib M, Goebel H
105 - 108	Analysis of electrically non-conducting sample structures with electron and mass spectroscopic methods Oechsner H
109 - 111	Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor Yun SM, Chang HY, Kang MS, Choi CK
112 - 119	Advanced plasma technology in microelectronics Jung CO, Chi KK, Hwang BG, Moon JT, Lee MY, Lee JG
120 - 125	Nanotechnology towards the 21st Century Tanaka K
126 - 131	Thermal stability of TiN/AlN superlattices Setoyama M, Irie M, Ohara H, Tsujioka M, Takeda Y, Nomura T, Kitagawa N
132 - 135	Preparation of YBCO/ZrO2 thin films on Si by MOCVD using a mode converting type of microwave plasma apparatus Komatsu Y, Sato T, Ito S, Akashi K
136 - 139	The analysis of thermal stress effect on electromigration failure time in Al alloy thin-film interconnects Lee SH, Kwon D
140 - 147	TFT-LCD technology Katayama M
148 - 151	Poly-Si thin film transistors with a source overlap and a drain offset: leakage current characteristics Jang HK, Lee CE, Noh SJ
152 - 155	ITO/Ag/ITO multilayer films for the application of a very low resistance transparent electrode Choi KH, Kim JY, Lee YS, Kim HJ
156 - 159	Alkali metal promoted oxidation of the Si(113) surface Hwang C, An KS, Park RJ, Kim JS, Lee JB, Park CY, Kimura A, Kakizakia A
160 - 164	Effects of the different heat treatments on the growth and formation of iron silicide on Si(100) Oh JH, Lee SK, Han KP, An KS, Park CY
165 - 167	Dependence of the properties of Co/Ti multilayered films on the ferromagnetic sublayer thickness Lee GM, Kim KW, Kudryavtsev YV, Smardz L, Lee YP
168 - 171	Etch-induced damage in single crystal Si trench etching by planar inductively coupled Cl-2/N-2 and Cl-2/HBr plasmas Lee YJ, Hwang SW, Yeom GY, Lee JW, Lee JY
172 - 175	Effects of CdS substrates on the physical properties of polycrystalline CdTe Films Lee YH, Lee WJ, Kwon YS, Yeom GY, Yoon JK
176 - 179	A study on the characteristics of inductively coupled plasma using multidipole magnets and its application to oxide etching An KJ, Kim HS, Yoo JB, Yeom GY
180 - 183	A study of GaN etch mechanisms using inductively coupled Cl-2/Ar plasmas Kim HS, Yeom GY, Lee JW, Kim TI
184 - 187	Investigation of surface polymerization on silicon exposed to C4F8 helicon wave plasmas Lee WJ, Kim HS, Yeom GY, Baek JT
188 - 191	Inductively coupled plasma etching of SiO2 layers for planar lightwave circuits Jung ST, Song HS, Kim DS, Kim HS
192 - 195	Evaluation of fluorinated polyimide etching processes for optical waveguide fabrication Kim JH, Kim EJ, Choi HC, Kim CW, Cho JH, Lee YW, You BG, Yi SY, Lee HJ, Han K, Jang WH, Rhee TH, Lee JW, Pearton SJ
196 - 201	Advanced PECVD processes for highly electron emitting diamond-like-carbon Jang J, Moon JH, Han EJ, Chung SJ
202 - 206	Large area deposition of thick diamond film by direct-current PACVD Baik YJ, Lee JK, Lee WS, Eun KY
207 - 210	Determination of elastic modulus and Poisson's ratio of diamond-like carbon films Cho SJ, Lee KR, Eun KY, Hahn JH, Ko DH
211 - 215	The nucleation of highly oriented diamond on silicon using a negative bias Kim YK, Lee KH, Lee MJ, Lee JY
216 - 220	Fabrication of gated diamond field emitter array using a selective diamond growth process Ha SC, Kang DH, Kim KB, Min SH, Kim IH, Lee JD
221 - 224	Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide Muta M, Ohgushi S, Matsuda Y, Fujiyama H
225 - 229	Low resistivity indium tin oxide films deposited by unbalanced DC magnetron sputtering Shin SH, Shin JH, Park KJ, Ishida T, Tabata O, Kim HH
230 - 233	Ion beam sputtering of SnO2 with low energy oxygen ion beams Choe YS, Chung JH, Kim DS, Baik HK
234 - 237	Effect of cohesive energy on atomic transport in ion beam mixed Co/Pt bilayer film Chang GS, Son JH, Kim TG, Chae KH, Whang CN, Jeong JI, Lee YP
238 - 245	Reduction of intrinsic stress in cubic boron nitride films Ullmann J, Kellock AJ, Baglin JEE