VI - VI |
Proceedings of the Third International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium J: III-V Semiconductors for Microelectronic and Optoelectronic Applications - Singapore, July 3-8, 2005 - Preface Radhakrishnan K, Lourdudoss S, Ing NG |
4313 - 4320 |
InP-based IC technologies Murata K, Sano K, Fukuyama H, Kosugi T, Nakamura M, Sugahara H, Tokumitsu M, Enoki T |
4321 - 4326 |
Ballistic nano-devices for high frequency applications Bollaert S, Cappy A, Roelens Y, Galloo JS, Gardes C, Teukam Z, Wallart X, Mateos J, Gonzalez T, Vasallo BG, Hackens B, Berdnarz L, Huynen I |
4327 - 4332 |
Nanometer transistors for emission and detection of THz radiation Lusakowski J |
4333 - 4339 |
Concepts for diamond electronics Kohn E, Denisenko A |
4340 - 4343 |
Parametric investigation of laser diode bonding using eutectic AuSn solder Teo JWR, Li GY, Ling MS, Wang ZF, Shi XQ |
4344 - 4347 |
Emission wavelength trimming of self-assembled InGaAs/GaAs quantum dots with GaAs/AlGaAs superlattices by rapid thermal annealing Djie HS, Wang DN, Ooi BS, Hwang JCM, Fang XM, Wu Y, Fastenau JM, Liu WK |
4348 - 4351 |
Metamorphic InGaAs quantum wells for light emission at 1.3-1.6 mu m Wang SM, Tangring I, Gu QF, Sadeghi M, Larsson A, Wang XD, Ma CH, Buyanova IA, Chen WM |
4352 - 4355 |
Interdiffusion effect on quantum-well structures grown on GaSb substrate Wang Y, Djie HS, Ooi BS, Rotella P, Dowd P, Aimez V, Cao Y, Zhang YH |
4356 - 4361 |
MOVPE growth of GaN on Si - Substrates and strain Dadgar A, Veit P, Schulze F, Blasing J, Krtschil A, Witte H, Diez A, Hempel T, Christen J, Clos R, Krost A |
4362 - 4364 |
Important aspects for the mass production of GaN-based quantum devices grown by MOCVD Soellner J, Schoen O, Alam A, Schineller B, Kaeppeler J, Heuken M |
4365 - 4368 |
Studies of electron trapping in GaN doped with carbon Lopatiuk O, Chernyak L, Feldman Y, Gartsman K |
4369 - 4372 |
Improved DC performance of AlGaN/GaN high electron mobility transistors using hafnium oxide for surface passivation Liu C, Chor EF, Tan LS |
4373 - 4377 |
50 nm metamorphic GaAs and InPHEMTs Thayne I, Elgaid K, Moran D, Cao X, Boyd E, McLelland H, Holland M, Thoms S, Stanley C |
4378 - 4383 |
Recent achievements in the reliability of InP-based HEMTs Suemitsu T |
4384 - 4386 |
Temperature dependence of strain in Al0.22Ga0.78N/GaN heterostructures with and without Si3N4 passivation Chen DJ, Shen B, Zhang KX, Tao YQ, Wu XS, Xu J, Zhang R, Zheng YD |
4387 - 4389 |
Increase in electron mobility of InGaAs/InP composite channel high electron mobility transistor structure due to SiN passivation Liu YW, Wang H, Radhakrishnan K |
4390 - 4392 |
Profiling the hot carrier induced damage in InP/InGaAs/InP double heterojunction bipolar transistors by using a current transient technique Ng CW, Wang H |
4393 - 4396 |
Effect of growth temperature on polytype transition of GaN from zincblende to wurtzite Suandon S, Sanorpim S, Yoodee K, Onabe K |
4397 - 4400 |
Structural and photoluminescence study of thin GaN film grown on silicon substrate by metalorganic chemical vapor deposition Zhang JX, Qu Y, Chen YZ, Uddin A, Chen P, Chua SJ |
4401 - 4404 |
Luminescence and ultrafast phenomena in InGaN multiple quantum wells Viswanath AK, Lee JI, Kim ST, Yang GM, Lee HJ, Kim D |
4405 - 4407 |
Structural and optical characteristics of InN/GaN multiple quantum wells grown by metalorganic chemical vapor deposition Kim JW, Lee KH, Hong S |
4408 - 4411 |
Growth of InN and its effect on InGaN epilayer by metalorganic chemical vapor deposition Hartono H, Chen P, Chua SJ, Fitzgerald EA |
4412 - 4418 |
Raman and luminescence probes for the study of compound semiconductors Jimenez J, Avella M, Martinez O |
4419 - 4422 |
Reduction of thermal oxide desorption etching on gallium arsenide Pun AF, Wang X, Durbin SM, Zheng JP |
4423 - 4426 |
Optical properties of GaInNAs/GaAs quantum well structures Zhao QX, Willander M, Wang SM, Wei YQ, Gu QF, Sadeghi M, Larsson A |
4427 - 4429 |
Investigation of deep level traps in dilute GaAsN layers grown by liquid phase epitaxy Dhar S, Halder N, Mondal A |
4430 - 4434 |
Spectroscopic evaluation of the structural and compositional properties of GaNxAs1-x superlattices grown by molecular beam epitaxy Barker SJ, Williams RS, Mulcahy CPA, Steer MJ, Hopkinson M, Ashwin MJ, Newman RC, Stavrinou PN, Parry G, Jones TS |
4435 - 4440 |
Interdiffusion effect on GaAsSbN/GaAs quantum well structure studied by 10-band k center dot p model Dang YX, Fan WJ, Ng ST, Wicaksono S, Yoon SF, Zhang DH |
4441 - 4444 |
1.31 mu m GaAs-based heterojunction p-i-n photodetectors using InGaAsNSb as the intrinsic layer grown by molecular beam epitaxy Cheah WK, Fan WJ, Yoon SF, Zhang DH, Ng BK, Loke WK, Liu R, Wee ATS |
4445 - 4449 |
Growth and defects of GaAs and InGaAs films on porous GaAs substrates Buzynin AN, Buzynin YN, Belyaev AV, Luk'vanov AE, Rau EI |
4450 - 4453 |
InGaAsP/InP long wavelength quantum well infrared photodetectors Sun L, Zhang DH, Yuan KH, Yoon SF, Radhakrishnan K |
4454 - 4458 |
MOVPE growth of AlxIn1-xP using tertiarybutylphosphine in pure N-2 ambient Zhao JH, Tang XH, Yin ZY, Sentosa D |
4459 - 4461 |
Influences of silicon doping in quantum dot layers on optical characteristics of InAs/GaAs quantum dot infrared photodetector Huang CY, Ou TM, Chou ST, Tsai CS, Wu MC, Lin SY, Chi JY, Hsu BY, Chi CC |
4462 - 4466 |
Influence of GaNAs strain compensation layers upon annealing of GaIn(N)As/GaAs quantum wells Liu HF, Xiang N |
4467 - 4470 |
(In)GaSb/AlGaSb quantum wells grown on Si substrates Akahane K, Yamamoto N, Gozu SI, Ueta A, Ohtani N |
4471 - 4475 |
Effects of chemical and plasma surface treatments on the O-2-annealed Ni/Au contact to p-Gan Lim J, Chor EF, Tan LS |
4476 - 4479 |
AlGaN/GaN high electron mobility transistors with implanted ohmic contacts Wang HT, Tan LS, Chor EF |
4480 - 4483 |
Impact of forward bias on electroluminescence efficiency in blue and green InGaN quantum well diodes: A comparative study Hori A, Yasunaga D, Fujiwara K |
4484 - 4487 |
GaN-based semiconductor saturable absorber mirror operating around 415 nm Xiang N, Lin F, Li HP, Liu HF, Liu W, Ji W, Chua SJ |
4488 - 4491 |
Band offsets of InXGa1-xN/GaN quantum wells reestimated Biswas D, Kumar S, Das T |
4492 - 4495 |
The self-assemble GaN : Mg inverted hexagonal pyramids formatted by photoelectrochemical wet-etching process Lin CF, Yang ZJ, Dai JJ, Zheng JH, Chang SY |
4496 - 4500 |
Investigation of V-defects formation in InGaN/GaN multiple quantum well grown on sapphire Yong AM, Soh CB, Zhang XH, Chow SY, Chua SJ |
4501 - 4504 |
Thermoelectric properties and thermoelectric devices of free-standing GaN and epitaxial GaN layer Kaiwa N, Hoshino M, Yaginuma T, Izaki R, Yamaguchi S, Yamamoto A |
4505 - 4508 |
Nanoheteroepitaxy of GaN on a nanopore array of Si(111) surface Zang KY, Wang YD, Wang LS, Tripathy S, Chua SJ, Thompson CV |
4509 - 4513 |
Deep level centers in InGaN/GaN heterostructure grown on sapphire and free-standing GaN Soh CB, Chua SJ, Chen P, Chi DZ, Liu W, Hartono H |
4514 - 4516 |
Temperature dependent study on the microwave noise performance of metamorphic InP/InGaAs heterojunction bipolar transistors Yang H, Wang H, Radhakrishnan K |
4517 - 4521 |
Temperature dependent microwave performance of AlGaN/GaN high-electron-mobility transistors on high-resistivity silicon substrate Arulkumaran S, Liu ZH, Ng GI, Cheong WC, Zeng R, Bu J, Wang H, Radhakrishnan K, Tan CL |
4522 - 4525 |
Low threshold current density, highly strained InGaAs laser grown by MOC-ND Chen IL, Hsu WC, Lee TD, Chiou CH |