Thin Solid Films

Thin Solid Films, Vol.515, No.11 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (48 articles)

4527 - 4537	Simulation of growth dynamics in atomic layer deposition. Part I. Amorphous films Nilsen O, Karlsen OB, Kjekshus A, Fjellvag H
4538 - 4549	Simulation of growth dynamics in atomic layer deposition. Part II. Polycrystalline films from cubic crystallites Nilsen O, Karlsen OB, Kjekshus A, Fjellvag H
4550 - 4558	Simulation of growth dynamics in atomic layer deposition. Part III. Polycrystalline films from tetragonal crystallites Nilsen O, Karlsen OB, Kjekshus A, Fjellvag H
4559 - 4564	Electrochemical investigation and characterization of thin-film porosity Sittner F, Ensinger W
4565 - 4569	Influence of aluminum nitride interlayers on crystal orientation and piezoelectric property of aluminum nitride thin films prepared on titanium electrodes Kamohara T, Akiyama M, Ueno N, Nonaka K, Kuwano N
4570 - 4579	Characterization of asymmetric rhombohedral twin in epitaxial alpha-Cr2O3 thin films by X-ray and electron diffraction Mandar H, Uustare T, Aarik J, Tarre A, Rosental A
4580 - 4587	Structural and electrical properties of room temperature pulsed laser deposited and post-annealed thin SrRuO3 films Gautreau O, Harnagea C, Normandin F, Veres T, Pignolet A
4588 - 4595	Complex electrical (impedance/dielectric) properties of electroceramic thin films by impedance spectroscopy with interdigital electrodes Kidner NJ, Meier A, Homrighaus ZJ, Wessels BW, Mason TO, Garboczi EJ
4596 - 4602	Characterization of the silicon oxide thin films deposited on polyethylene terephthalate substrates by radio frequency reactive magnetron sputtering Lin MC, Tseng CH, Chang LS, Wuu DS
4603 - 4608	Preparation of micropatterned poly(silsesquioxane) thin films using adamantylphenol molecules Cha BJ, Choi YJ, Kim B, Kim H
4609 - 4613	Crystallization of chemically vapor deposited molybdenum and mixed tungsten/molybdenum oxide films for electrochromic application Gesheva KA, Cziraki A, Ivanova T, Szekeres A
4614 - 4618	Lithium cobalt oxide thin films deposited at low temperature by ionized magnetron sputtering Chiu KF
4619 - 4623	Structural and optical properties of wurtzite InN grown on Si(111) Ji XH, Lau SP, Yang HY, Zhang QY
4624 - 4628	Preparation and characterization of ultra-thin sol-gel films Shapiro L, Marx S, Mandler D
4629 - 4635	Nanowire array fabricated by Al-Ge phase separation Fukutani K, Ishida Y, Tanji K, Den T
4636 - 4639	Pulsed laser deposition of crystalline ZrC thin films Craciun V, Craciun D, Howard JM, Woo J
4640 - 4648	Hemispherical and diffuse reflectance and transmittance of a slightly inhomogeneous film bounded by rough, unparallel interfaces Nichelatti E, Montecchi M, Montereali RM
4649 - 4661	Bis-(4-(2-pyridylmethyleneiminophenyl))disulfide - A chelating ligand capable of self assembly on gold surface and its complexes with M(BF4)(2) and M(ClO4)(2); M=CO, Cu and Ni. Experimental and theoretical study Beloglazkina EK, Majouga AG, Zyk NV, Rakhimov RD, Yaminsky IV, Gorelkin PV, Kiselev GA, Kutateladze AG
4662 - 4665	Screening effect in contactless electroreflectance spectroscopy observed for AlGaN/GaN heterostructures with two dimensional electron gas Motyka M, Kudrawiec R, Syperek M, Misiewicz J, Rudzinski M, Hageman PR, Larsen PK
4666 - 4669	A modified Wenzel model for hydrophobic behavior of nanostructured surfaces Han TY, Shr JF, Wu CF, Hsieh CT
4670 - 4680	Electronic and thermal reaction pathways in the synchrotron radiation-excited modification and epitaxy of silicon-based materials Akazawa H
4681 - 4685	Argon ion beam and electron beam-induced damage in Cu(In,Ga)Se-2 thin films Yan YF, Jones KM, Noufi R, Al-Jassim MM
4686 - 4690	Fabrication of super-hydrophobic film with dual-size roughness by silica sphere assembly Sun C, Ge LQ, Gu ZZ
4691 - 4695	Oxidation study of polycrystalline InN film using in situ X-ray scattering and X-ray photoemission spectroscopy Lee IJ, Yu C, Shin HJ, Kim JY, Lee YP, Hur TB, Kim HK
4696 - 4701	Immersion nickel deposition on blank silicon in aqueous solution containing ammonium fluoride Zhang X, Chen Z, Tu KN
4702 - 4708	Initial reaction of HfO2 atomic layer deposition on silicon surfaces with different oxygen levels: A density functional theory study Ren H, Liu FY, Zhang YT, Zhang DW
4709 - 4716	Fixtureless superlayer-driven delamination test for nanoscale thin-film interfaces Zheng HT, Sitaraman SK
4717 - 4721	Electrochromism of the electroless deposited cuprous oxide films Neskovska R, Ristova M, Velevska J, Ristov M
4722 - 4726	Characterization of TiCr(C,N)/amorphous carbon coatings synthesized by a cathodic arc deposition process Chang YY, Yang SJ, Wang DY
4727 - 4737	Enhancement of corrosion resistance of a biomedical grade 316LVM stainless steel by potentiodynamic cyclic polarization Bou-Saleh Z, Shahryari A, Omanovic S
4738 - 4744	Effect of pressure and substrate temperature on the deposition of nano-structured silicon-carbon-nitride superhard coatings by magnetron sputtering Mishra SK, Shekhar C, Rupa PKP, Pathak LC
4745 - 4752	A method to evaluate mechanical performance of thin transparent films for flexible displays Grego S, Lewis J, Vick E, Temple D
4753 - 4757	Photoelectrochemical properties of thin Bi2WO6 films Zhao X, Wu Y, Yao WQ, Zhu YF
4758 - 4762	Thin film passivation of organic light emitting diodes by inductively coupled plasma chemical vapor deposition Kim HK, Kim SW, Kim DG, Kang JW, Kim MS, Cho WJ
4763 - 4767	Determination of optical constants and inhomogeneity of optical films by two-step film envelope method Lai FC, Wang Y, Li M, Wang HQ, Song YZ, Jiang YS
4768 - 4773	Ion beam deposition of alpha-Ta films by nitrogen addition and improvement of diffusion barrier property Bae JW, Lim JW, Mimura K, Isshiki M
4774 - 4777	Thermally-induced optical property changes of sputtered PdOx films Arai T, Shima T, Nakano T, Tominaga J
4778 - 4782	Preparation of CuIn1-xGaxSe2 films by metalorganic chemical vapor deposition using three precursors Choi IH, Lee DH
4783 - 4787	Monitoring interface traps in operating organic light-emitting diodes using impedance spectroscopy Pingree LSC, Russell MT, Marks TJ, Hersam MC
4788 - 4793	Dielectric properties of sol-gel derived high-k titanium silicate thin films Sarkar DK, Brassard D, El Khakani MA, Ouellet L
4794 - 4800	Design of diffusion barriers Gill WN, Plawsky JL
4801 - 4807	Influence of the glycosylphosphatidylinositol anchor in the morphology and roughness of Langmuir-Blodgett films of phospholipids containing alkaline phosphatases Caseli L, Masui DC, Prazeres R, Furriel M, Leone FA, Zaniquelli MED
4808 - 4811	Degradation characteristics and light-induced effects of polymer thin-film transistors Liu YR, Peng JB, Laic PT, Yang K, Cao Y
4812 - 4818	Influence of heat treatment on indium-tin-oxide anodes and copper phthalocyanine hole injection layers in organic light-emitting diodes Fenenko L, Adachi C
4819 - 4825	Deposition characterization of reactive magnetron sputtered aluminum nitride thin films for film bulk acoustic wave resonator Chiu KH, Chen JH, Chenc HR, Huang RS
4826 - 4833	Characteristic curves of hydrogenated amorphous silicon based solar cells modeled with the defect pool model Khmovsky E, Sturiale A, Rubinelli FA
4834 - 4837	Influence of thermal annealing on photoluminescence and structural properties of N,N'-diphenyl-N,N'-bis(1-naphthylphenyl)-1, 1'-biphenyl-4,4'-diamine (alpha-NPD) organic thin films Osipov KA, Pavlovskii VN, Lutsenko EV, Gurskii AL, Yablonskii GP, Hartmann S, Janssen A, Johannes HH, Caspary R, Kowalsky W, Meyer N, Gersdorff A, Heuken A, van Gemmern P, Zimmermann C, Jessen F, Kalisch H, Jansen RH
4838 - 4842	Area selective epitaxy of indium phosphide on silicon (100) substrates without buffer layers by liquid phase epitaxy Kochiya T, Oyama Y, Sugai M, Nishizawa JI