| 6637 - 6638 |
The 10th Asia-Pacific conference on Plasma Science and Technology (APCPST 2010) The 153rd symposium on Plasma Science for Materials (SPSM 2010) Preface
[Anonymous] |
| 6639 - 6644 |
Characteristics and applications of plasma enhanced-atomic layer deposition
Kim H |
| 6645 - 6648 |
Analysis of gate oxide damage by ultraviolet light during oxide deposition in high density plasma
Kim DK, Lee J, Kim DH, Shin K, Kim MC, Choi S, Kang C |
| 6649 - 6653 |
The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition
Roh KM, You SJ, Kim DW, Han JH, Kim JH, Seong DJ |
| 6654 - 6657 |
Substrate temperature effect on the SiC passivation layer synthesized by an RF magnetron sputtering method
Seo JK, Joung YH, Park Y, Choi WS |
| 6658 - 6661 |
Effect of catalyst for nickel films for NiSi formation with improved interface roughness
Kang HS, Ha JB, Lee JH, Choi CK, Lee JY, Lee KM |
| 6662 - 6666 |
Suppressing methods of cracking on inter-metallic silicon oxide films
Kim JG, Cho WW, Lee BS, Kim JW |
| 6667 - 6672 |
Effects of neutral particle beam on nano-crystalline silicon thin films, with application to thin film transistor backplane for flexible active matrix organic light emitting diodes
Jang JN, Song BC, Lee DH, Yoo SJ, Lee B, Hong M |
| 6673 - 6677 |
Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching
Bin Xiao Y, Kim EH, Kong SM, Chung CW |
| 6678 - 6682 |
Adhesion property of SiOx-doped Diamond-like Carbon Films Deposited on Polycarbonate by Inductively Coupled Plasma Chemical Vapor Deposition
Baek SM, Shirafuji T, Saito N, Takai O |
| 6683 - 6687 |
Comparative study on the properties of amorphous carbon layers deposited from 1-hexene and propylene for dry etch hard mask application in semiconductor device manufacturing
Lee S, Won J, Choi J, Park J, Jee Y, Lee H, Byun D |
| 6688 - 6692 |
Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD
Sung TL, Chao YA, Liu CM, Teii K, Teii S, Hsu CY |
| 6693 - 6697 |
Effect of annealing on diamond-like carbon characteristics by electron spin resonance spectral analysis
Yamauchi Y, Kuzuya M, Sasai Y, Kondo S |
| 6698 - 6702 |
The erosion behaviors of Y2O3 and YF3 coatings under fluorocarbon plasma
Kim DM, Oh YS, Kim S, Kim HT, Lim DS, Lee SM |
| 6703 - 6707 |
Influence of argon neutral beam energy on the structural properties of amorphous carbon thin films grown by neutral particle beam assisted sputtering
Lee D, Jang J, Kwon K, You S, Lee B, Hong M |
| 6708 - 6711 |
HfO2 etching mechanism in inductively-coupled Cl-2/Ar plasma
Kim M, Efremov A, Lee HW, Park HH, Hong M, Min NK, Kwon KH |
| 6712 - 6715 |
Investigation of aperiodic W/C multi-layer mirror for X-ray optics
Wang ZS, Cheng XB, Zhu JT, Huang QS, Zhang Z, Chen LY |
| 6716 - 6720 |
High temperature oxidation resistance of multilayered AlxTi1-xN/CrN coatings
Chang YY, Chang CP, Kao HY |
| 6721 - 6726 |
Plasma processing of soft materials for development of flexible devices
Setsuhara Y, Cho K, Takenaka K, Shiratani M, Sekine M, Hori M |
| 6727 - 6731 |
Dual etch processes of via and metal paste filling for through silicon via process
Ham YH, Kim DP, Park KS, Jeong YS, Yun HJ, Baek KH, Kwon KH, Lee K, Do LM |
| 6732 - 6736 |
Ultraviolet irradiation effect on the properties of leakage current and dielectric breakdown of low-dielectric-constant SiOC(-H) films using comb capacitor structure
Kim CY, Navamathavan R, Lee HS, Woo JK, Hyun MT, Lee KM, Jeung WY, Choi CK |
| 6737 - 6740 |
Preparation and analysis of amorphous carbon films deposited from (C6H12)/Ar/He chemistry for application as the dry etch hard mask in the semiconductor manufacturing process
Lee S, Won J, Choi J, Jang S, Jee Y, Lee H, Byun D |
| 6741 - 6745 |
The effects of gas flow rates on the etch characteristics of silicon nitride with an extreme ultra-violet resist pattern in CH2F2/N-2/Ar capacitively coupled plasmas
Kwon BS, Lee JH, Lee NE |
| 6746 - 6749 |
Large area ashing process using an atmospheric pressure plasma
Yoo S, Lho T, Seok DC, Hong YC, Lee B |
| 6750 - 6754 |
Oxygen plasma treatment of SiOxCy(-H) films polymerized by atmospheric pressure dielectric barrier discharge using hexamethylcyclrotrisiloxane
Kim YK, Kim GT |
| 6755 - 6758 |
Comparison of line edge roughness and profile angles of chemical vapor deposited amorphous carbon etched in O-2/N-2/Ar and H-2/N-2/Ar inductively coupled plasmas
Park YR, Kwon BS, Jung CY, Heo W, Lee NE, Shon JW |
| 6759 - 6762 |
Low temperature silicon epitaxy from trichlorosilane via mesoplasma chemical vapor deposition
Fukuda J, Kambara M, Yoshida T |
| 6763 - 6768 |
Surface energy modification of SiOxCyHz film using PECVD by controlling the plasma processes for OMCTS (Si4O4C8H24) precursor
Jin SB, Choi YS, Choi IS, Han JG |
| 6769 - 6772 |
Fast release process of metal structure using chemical dry etching of sacrificial Si layer
Ahn JH, Heo W, Lee NE, Cho HJ |
| 6773 - 6777 |
High-rate reduction of copper oxide using atmospheric-pressure inductively coupled plasma microjets
Tajima S, Tsuchiya S, Matsumori M, Nakatsuka S, Ichiki T |
| 6778 - 6782 |
Raman scattering and Rutherford backscattering studies on InN films grown by plasma-assisted molecular beam epitaxy
Chung YL, Peng XY, Liao YC, Yao SD, Chen LC, Chen KH, Feng ZC |
| 6783 - 6786 |
Chromizing of plasma nitrided AISI 1045 steel
Hakami F, Sohi MH, Ghani JR, Ebrahimi M |
| 6787 - 6791 |
Corrosion protection of CrN/TiN multi-coating for bipolar plate of polymer electrolyte membrane fuel cell
Nam ND, Jo DS, Kim JG, Yoon DH |
| 6792 - 6796 |
Duplex surface treatment of AISI 1045 steel via plasma nitriding of chromized layer
Hakami F, Sohi MH, Ghani JR |
| 6797 - 6800 |
Pulsed-DC sputtering of molybdenum bottom electrode and piezoelectric aluminum nitride films for bulk acoustic resonator applications
Cherng JS, Chen TY, Lin CM |
| 6801 - 6805 |
Role of the crystallinity of ZnO films in the electrical properties of bottom-gate thin film transistors
Lee JH, Ahn CH, Hwang S, Woo CH, Park JS, Cho HK, Lee JY |
| 6806 - 6809 |
Effect of acetic acid on wet patterning of copper/molybdenum thin films in phosphoric acid solution
Seo BH, Lee SH, Park IS, Seo JH, Choe H, Jeon JH, Hong M, Lee YU, Winkler J |
| 6810 - 6814 |
Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers
Cho K, Setsuhara Y, Takenaka K, Shiratani M, Sekine M, Hori M |
| 6815 - 6819 |
Effect of hafnium addition on the electrical properties of indium zinc oxide thin film transistors
Son DH, Kim DH, Kim JH, Sung SJ, Jung EA, Kang JK |
| 6820 - 6823 |
Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma
Kim EH, Bin Xiao Y, Kong SM, Chung CW |
| 6824 - 6828 |
Surface treatments of indium tin oxide films by using high density plasma
Wi JH, Woo JC, Kim CI |
| 6829 - 6833 |
Effect of electron beam irradiation on the electrical and optical properties of ITO/Ag/ITO and IZO/Ag/IZO films
Hong CH, Jo YJ, Kim HA, Lee IH, Kwak JS |
| 6834 - 6839 |
Atmospheric-pressure argon plasma etching of spin-coated 3,4-polyethylenedioxythiophene:polystyrenesulfonic acid (PEDOT:PSS) films for cupper phtalocyanine (CuPc)/C-60 heterojunction thin-film solar cells
Ino T, Hayashi T, Ueno K, Shirai H |
| 6840 - 6843 |
Improved thermal stability of ZnO transparent conducting films with a ZnO overlayer
Kang JH, Kim DW, Kim JH, Lim YS, Lee MH, Seo WS, Choi HJ, Seo KH, Park MG |
| 6844 - 6848 |
Properties of indium tin oxide thin films prepared on the oxygen plasma-treated polycarbonate substrate
Jung YS, Kim WJ, Choi HW, Park YS, Kim KH |
| 6849 - 6852 |
Improvement in the negative bias temperature stability of ZnO based thin film transistors by Hf and Sn doping
Kim WS, Moon YK, Kim KT, Shin SY, Du Ahn B, Lee JH, Park JW |
| 6853 - 6857 |
Effect of UV/ozone treatment on interactions between ink-jet printed Cu patterns and polyimide substrates
Lee YI, Goo YS, Lee KJ, Hwang YG, Byun Y, Park HJ, Park DY, Myung NV, Choa YH |
| 6858 - 6862 |
Study for amorphous silicon etching process using dielectric barrier discharge
Seok DC, Lho T, Yoo SR, Hong YC, Lee BJ |
| 6863 - 6867 |
Fluorine doped gallium tin oxide composite films as transparent conductive oxides on polyethylene terephthalate film prepared by electron cyclotron resonance metal organic chemical vapor deposition
Park JH, Jang S, Byun D, Lee JK |
| 6868 - 6871 |
Effects of the composition of sputtering target on the stability of InGaZnO thin film transistor
Huh JY, Jeon JH, Choe HH, Lee KW, Seo JH, Ryu MK, Park SHK, Hwang CS, Cheong WS |
| 6872 - 6875 |
Surface potential behaviors of UV treated of Ag anode for high-performance T-OLED by nanotribology
Kim SI, Oh HW, Huh JW, Ju B, Lee CW |
| 6876 - 6880 |
Structure and mechanical properties of Mo-N/Cu films produced by inductively coupled plasma reactive sputtering
Kim JN, Park S, Kim T, Lee JJ |
| 6881 - 6883 |
Improvement of bias stability of indium zinc oxide thin film transistors by the incorporation of hafnium fabricated by radio-frequency magnetron sputtering
Chong E, Chun YS, Kim SH, Lee SY |
| 6884 - 6886 |
Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162 MHz, using a large area, scalable, multi-tile-electrode plasma source
Monaghan E, Michna T, Gaman C, O'Farrel D, Ryan K, Adley D, Perova TS, Drews B, Jaskot M, Ellingboe AR |
| 6887 - 6891 |
Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells
Ko J, Gong D, Pillai K, Lee KS, Ju M, Choi P, Kim KR, Yi J, Choi B |
| 6892 - 6895 |
Numerical modeling of SiH4 discharge for Si thin film deposition for thin film transistor and solar cells
Joo J |
| 6896 - 6898 |
Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film
Koga K, Matsunaga T, Nakamura WM, Nakahara K, Kawashima Y, Uchida G, Kamataki K, Itagaki N, Shiratani M |
| 6899 - 6902 |
Enhanced photocatalytic activity of TiO2-incorporated nanofiber membrane by oxygen plasma treatment
Park SY, Lee HU, Ahn K, Kim JP, Jin JS, Lee J, Jeong SY, Cho CR |
| 6903 - 6909 |
Chemical activity of oxygen atoms in the magnetron sputter-deposited ZnO films
Morita A, Watanabe I, Shirai H |
| 6910 - 6915 |
Electrical mechanism analysis of Al2O3 doped zinc oxide thin films deposited by rotating cylindrical DC magnetron sputtering
Park H, Jang K, Kumar K, Ahn S, Cho J, Jang J, Ahn K, Yeom J, Kim D, Yi J |
| 6916 - 6919 |
Effect of plasma treatment on chemical bonding states of porous TiO2 thin films prepared from polymer-blended solution
Kim JP, Lee HU, Yang JE, Bae JS, Park ES, Yoon JH, Kim JM, Cho CR |
| 6920 - 6927 |
Rapid thermal-plasma annealing of ZnO:Al films for silicon thin-film solar cells
Ohta N, Ohba D, Sato S, Tang Z, Shimizu H, Shirai H |
| 6928 - 6930 |
Simulation of a pulse-modulated radio-frequency atmospheric pressure glow discharge
Li XC, Wang H, Ding ZF, Wang YN |
| 6931 - 6934 |
Control of large area VHF plasma produced at high pressure
Nishimiya T, Yamane T, Takeuchi Y, Yamauchi Y, Takatsuka H, Muta H, Uchino K, Kawai Y |
| 6935 - 6939 |
Optical properties of TiO2 thin films after Ag ion implantation
Chang YY, Shieh YN, Kao HY |
| 6940 - 6943 |
Photocatalytic performance of iron (III) and niobium (V)-codoped TiO2 nanopowders synthesized by a radio frequency thermal plasma process
Zhang CN, Ikeda M, Uchikoshi T, Li JG, Watanabe T, Ishigaki T |
| 6944 - 6950 |
Comparison of hydrophilic properties of TiO2 thin films prepared by sol-gel method and reactive magnetron sputtering system
Nam SH, Cho SJ, Jung CK, Boo JH, Sicha J, Herman D, Musil J, Vlcek J |
| 6951 - 6954 |
Effect of pulse duration on characteristics of modulated radio-frequency SiH4/N-2/NH3 discharges
Liu XM, Wang Y, Song YH, Wang YN |
| 6955 - 6959 |
The characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton
Lee HS, Lee YS, Seo SH, Chang HY |
| 6960 - 6963 |
Effect of temperature on the decomposition of trifluoromethane in a dielectric barrier discharge reactor
Kim DH, Mok YS, Lee SB |
| 6964 - 6968 |
Film thickness dependence of microstructures and magnetic properties in single-layered FePt films by in-situ annealing
Chen SC, Sun TH, Chang CL, Shen CL, Kuo PC, Chen JR |
| 6969 - 6973 |
Characterization of ceramic plasma-sprayed coatings, and interaction studies between U-Zr fuel and ceramic coated interface at an elevated temperature
Kim KH, Lee CT, Lee CB, Fielding RS, Kennedy JR |
| 6974 - 6980 |
Various microplasma jets and their sterilization of microbes
Uhm HS, Hong YC |
| 6981 - 6989 |
Role of transverse magnetic field in the capacitive discharge
You SJ, Hai TT, Park M, Kim DW, Kim JH, Seong DJ, Shin YH, Lee SH, Park GY, Lee JK, Chang HY |
| 6990 - 6993 |
Discharge characteristics of a radio-frequency capacitively coupled Ar/O-2 glow discharge at atmospheric pressure
Li SZ, Wu Q, Zhang JL, Wang DZ, Uhm HS |
| 6994 - 6998 |
Simultaneous removal of odor and particulate using plasma-treated polymer filters
Okubo M, Kuroki T, Saeki N |
| 6999 - 7004 |
Chemical filters by non-thermal atmospheric pressure plasmas for reactive fields
Sakai O, Morita T, Ueda Y, Sano N, Tachibana K |
| 7005 - 7008 |
In-flight melting behavior of different glass raw materials by hybrid heating of twelve-phase ac arc with oxygen burner
Liu YP, Tsuruoka Y, Tanaka M, Ichihashi T, Yano T, Watanabe T |
| 7009 - 7013 |
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
Lee HC, Bang JY, Chung CW |
| 7014 - 7019 |
Modeling of high frequency atmospheric pressure Ar/H-2/SiH4 glow discharges
Zhuang J, Sun JZ, Wang DZ, Sang CF, Liu LY |
| 7020 - 7024 |
Nonlinear behaviors in a pulsed dielectric barrier discharge at atmospheric pressure
Zhang J, Wang YH, Wang DZ |
| 7025 - 7029 |
Numerical analysis of AC tungsten inert gas welding of aluminum plate in consideration of oxide layer cleaning
Tashiro S, Miyata M, Tanaka M |
| 7030 - 7035 |
Solution plasma for template removal in mesoporous silica: pH and discharge time varying characteristics
Pootawang P, Saito N, Takai O |
| 7036 - 7041 |
Discharge dynamics and characteristics of atmospheric glow discharge excited by sub-microsecond high voltage pulses
Huang XJ, Sun LQ, Liu XK, Zhang L, Shi JJ |
| 7042 - 7044 |
Harmonic analysis of sideband signals generated in plasmas
Jang SH, Kim GH, Chung CW |
| 7045 - 7049 |
Surface characteristics of hydroxyapatite/titanium composite layer on the Ti-35Ta-xZr surface by RF and DC sputtering
Kim WG, Choe HC |
| 7050 - 7056 |
Hydroxyapatite coating on the Ti-35Nb-xZr alloy by electron beam-physical vapor deposition
Jeong YH, Choe HC, Eun SW |
| 7057 - 7059 |
Electrical characteristics of oxygen doped DNA molecules
Kim K, Yoon M, Koo J, Roh Y |
| 7060 - 7064 |
A study on the plasma polymer thin film surface modification for DNA alignment by using high energy electron beam irradiation
Cho SJ, Kim HJ, Hong B, Boo JH |
| 7065 - 7070 |
Study on bioactivity and bonding strength between Ti alloy substrate and TiO2 film by micro-arc oxidation
Hong MH, Lee DH, Kim KM, Lee YK |
| 7071 - 7078 |
A study on characterization of atmospheric pressure plasma jets according to the driving frequency for biomedical applications
Seo YS, Lee HW, Kwon HC, Choi J, Lee SM, Woo KC, Kim KT, Lee JK |
| 7079 - 7085 |
Antimicrobial silver-containing titanium oxide nanocomposite coatings by a reactive magnetron sputtering
Song DH, Uhm SH, Lee SB, Han JG, Kim KN |
| 7086 - 7089 |
Generation of Si:H nanoparticles by a combination of pulse plasma and hydrogen gas pulses
Ahn C, Kim K, Choi H, Kulkarni A, Kim T |
| 7090 - 7094 |
Effect of plasma treatment on surface chemical-bonding states and electrical properties of polyacrylonitrile nanofibers
Kang YH, Ahn K, Jeong SY, Bae JS, Jin JS, Kim HG, Hong SW, Cho CR |
| 7095 - 7099 |
Investigation of electrical transport characteristics of nanoscale stacks fabricated on thin graphite layer
Venugopal G, Kim SJ |
| 7100 - 7105 |
Influence of coil current modulation on TiO2 nanoparticle synthesis using pulse-modulated induction thermal plasmas
Tanaka Y, Sakai H, Tsuke T, Uesugi Y, Sakai Y, Nakamura K |
| 7106 - 7110 |
Formation of Sn metal spheres by plasma treatment
Han DH, Kwon SH, Lee JJ |
| 7111 - 7115 |
Direct synthesis of nano-sized glass powders with spherical shape by RF (radio frequency) thermal plasma
Seo JH, Kim JS, Lee MY, Ju WT, Nam IT |
| 7116 - 7119 |
Synthesis and characterization of Ag-Ni bimetallic nanoparticles by laser-induced plasma
Xiao QM, Yao Z, Liu JH, Hai R, Oderji HY, Ding HB |
| 7120 - 7123 |
Uniform formation of Au coated polystyrene core-shell structure using metallization process
Kim K, Koo J, Roh Y |
| 7124 - 7128 |
Optical studies on sputter-deposited Ag-SiO2 nanoparticle composites
Hsieh JH, Li C, Wu YY, Jang SC |
| 7129 - 7132 |
Plasma functionalization of as grown carbon nanotubes for efficient dispersion
Shin EC, Jeong GH |
