Thin Solid Films

Thin Solid Films, Vol.517, No.9 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (38 articles)

2825 - 2839	Magnetron sputter deposition: Linking discharge voltage with target properties Depla D, Mahieu S, De Gryse R
2840 - 2844	Alternating 2,7-and 3,6-linked carbazole copolymers as wide band gap energy transfer donors Pickup DF, Yi HN, Kun H, Iraqi A, Stevenson M, Lidzey DG
2845 - 2850	Vapor phase deposition of copper films with a Cu(I) beta-diketiminate precursor Thompson JS, Zhang L, Wyre JP, Brill DJ, Lloyd KG
2851 - 2854	Nickel diffusion in polycrystalline CuInSe2 thin films with a < 112 > fiber texture Celik A, Cevik U, Bacaksiz E, Celik N
2855 - 2858	Fabrication of cobalt-organic composite thin film via plasma-enhanced chemical vapor deposition for antibacterial applications Jeong YM, Lee JK, Ha SC, Kim SH
2859 - 2864	ZnO crystals obtained by electrodeposition: Statistical analysis of most important process variables Cembrero J, Busquets-Mataix D
2865 - 2870	High resolution transmission electron microscopy study of iron-silicide nanodot structures grown on faintly oxidized Si (111) surfaces Cho SP, Nakamura Y, Ichikawa M, Tanaka N
2871 - 2877	Electrochemical and spectroscopic characterization of a Benzo[c]cinnoline electrografted platinum surface Isbir-Turan AA, Uestuendag Z, Solak AO, Kilic E, Avseven A
2878 - 2881	Large area Ba1-xSrxTiO3 thin films for microwave applications deposited by pulsed laser ablation Varanasi CV, Leedy KD, Tomich DH, Subramanyam G
2882 - 2885	Characterization of 3C-SiC micro-pillars on Si(100) substrate grown by vapor-liquid-solid process Chen YF, Liu XZ, Deng XW, Li YR
2886 - 2891	Factorial design preparation of transparent conducting oxide thin films Ronconi CM, Alves OL, Bruns RE
2892 - 2895	Use of water vapor for suppressing the growth of unstable low-k interlayer in HfTiO gate-dielectric Ge metal-oxide-semiconductor capacitors with sub-nanometer capacitance equivalent thickness Xu JP, Zou X, Lai PT, Li CX, Chan CL
2896 - 2899	Type and formation mechanism of thermal etch pit on annealed (111) CdZnTe surface Zeng DM, Jie WQ, Wang T, Zhang JJ, Zha GQ
2900 - 2904	Micro-fabrication techniques applied to aluminosilicate glass surfaces: Micro-indentation and wet etching process Saito Y, Okamoto S, Inomata H, Kurachi J, Hidaka T, Kasai H
2905 - 2911	Study of adsorption behaviors of meso-tetrakis (4-N-Methylpyridyl) porphine p-Toluenesulfonate at indium-tin-oxide electrode/solution interface by in-situ internal reflection spectroscopy and cyclic voltammetry Qiu SJ, Sun LX, Chu HL, Zou YJ, Xu F, Matsuda N
2912 - 2919	Mechanical and deformation behaviour of titanium diboride thin films deposited by magnetron sputtering Rupa PKP, Chakraborti PC, Mishra SK
2920 - 2923	Synthesis and characterization of Nb2AlC thin films Scabarozi TH, Roche J, Rosenfeld A, Lim SH, Salamanca-Riba L, Yong G, Takeuchi I, Barsoum MW, Hettinger JD, Lofland SE
2924 - 2929	Modeling of creep deformation and its effect on stress distribution in multilayer systems under residual stress and external bending Chen QQ, Xuan FZ, Tu ST
2930 - 2935	Mechanical properties of porous silicon by depth-sensing nanoindentation techniques Fang ZQ, Hu M, Zhang W, Zhang XR, Yang HB
2936 - 2940	Competition between dislocation nucleation and void formation as the stress relaxation mechanism in passivated Cu interconnects Zhang J, Zhang JY, Liu G, Zhao Y, Sun J
2941 - 2944	Mechanism of droplet generation in silver thin films for organic light-emitting diode displays Li FJ, Roh BG, Lim HT, Kim JS, Park JY, Yu HW, Park SC, Tak YH, Ahn BC
2945 - 2952	Modelling the limits of coating toughness in brittle coated systems Chen JJ, Bull SJ
2953 - 2958	Electrical conduction in 10-20 nm thick polycrystalline tin oxide thin films deposited by chemical vapor deposition Matsui Y, Yamamoto Y
2959 - 2962	Enhance current injection of organic light emitting diodes by inserting an organic superlattice Cheng YH, Lin KY, Lee MCM
2963 - 2967	Simulation of the spectra and determination of the optical constants of online low-emission glass from visible to mid-infrared region Huang SIP, Wang ZZ, Xu J, Wang L, Lu DX, Yuan TSO
2968 - 2973	Effect of substituents on electronic properties, thin film structure and device performance of dithienothiophene-phenylene cooligomers Zhang SM, Guo YL, Xi HX, Di CA, Yu J, Zheng K, Liu RG, Zhan XW, Liu YQ
2974 - 2978	Ferroelectric and pyroelectric properties of (Na0.5Bi0.5)TiO3-BaTiO3 based trilayered thin films Guo YP, Li M, Zhao W, Akai D, Sawada K, Ishida M, Gu MY
2979 - 2983	Penetration of the high-frequency electromagnetic field through thin films of Sr-doped lanthanum manganites Nosov A, Rinkevich A, Vassiliev V, Vladimirova E, Szymczak H, Lewandowski S, Gierlowski P, Abaloshev A, Ranno L
2984 - 2987	Origin on amorphization of Co-Mo magnetic thin films: Experiments and thermodynamic calculation Qin GW, Yang B, Xiao N, Ren YP, Jiang M, Zhao X, Oikawa K
2988 - 2993	Photoinduced charge transfer through films containing poly(hexylthiophene), phthalocyanine, and porphyrin-fullerene layers Kaunisto K, Vahasalo H, Chukharev V, Tkachenko NV, Vivo P, Niemi M, Tolkki A, Efimov A, Lemmetyinen H
2994 - 2996	Accelerated resistive humidity sensing properties of silicon nanoporous pillar array Jiang WF, Jia M, Wang YS, Li LY, Li XJ
2997 - 3000	Sensitive detection of biological species through localized surface-plasmon resonance on gold nanodisks Barbillon G, Bijeon JL, Plain J, Royer P
3001 - 3004	Improved performance of fluorinated copper phthalocyanine thin film transistors using an organic pn junction: Effect of copper phthalocyanine film thickness Ye RB, Baba M, Suzuki K, Mori K
3005 - 3010	Structures and electronic properties of thin-films of polycyclic aromatic hydrocarbons Natsume Y, Minakata T, Aoyagi T
3011 - 3019	Plasma deposition of fluorocarbon thin films using pulsed/continuous and downstream radio frequency plasmas Liu DP, Gu JD, Feng ZQ, Li DM, Niu JH
3020 - 3023	Calorimetric and optical study of amorphous Se85-xTe15Bix glassy alloy Sharma A, Barman PB
3024 - 3027	Patterning of hydrogen-bonded assembly film through ionization in vapor Yang SG, Li YF, Li XF, Li YF, Zhang XL, Xu J
3028 - 3035	On the etching of silica and mesoporous silica films determined by X-ray reflectivity and atomic force microscopy Minhao Y, Henderson MJ, Gibaud A