1 - 7 |
The suppression of water-diffusion in polycarbonate through Ar- and He-plasma as a new model for the origin of improved adhesion of Al Schafer MM, Seidel C, Fuchs H, Voetz M |
8 - 14 |
The interaction of cesium-oxide overlayers with Ge (111) as a function of annealing temperature Wu JX, Ma MS, Zhu JS, Ji MR |
15 - 21 |
Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures Aarik J, Aidla A, Mandar H, Uustare T, Kukli K, Schuisky M |
22 - 29 |
Photoemission study of the stainless steel surface interacting with oxygen Cho B, Chung S, Kim K, Kang T, Park C, Kim B |
30 - 39 |
Argon ion treatment of the Dow Cyclotene 3022 surface and its effect on the adhesion of evaporated copper Yang DQ, Sacher E |
40 - 43 |
An expanding thermal plasma for deposition of surface textured ZnO : Al with focus on thin film solar cell applications Groenen R, Linden JL, van Lierop HRM, Schram DC, Kuypers AD, van de Sanden MCM |
44 - 53 |
Interaction of vapours of mercury with PbS(001): a study by X-ray photoelectron spectroscopy, RHEED and X-ray absorption spectroscopy Genin F, Alnot M, Ehrhardt JJ |
54 - 61 |
Correlation between the corrosion behavior and corrosion films formed on the surfaces of Mg82-xNi18Ndx (x=0, 5, 15) amorphous alloys Yao HB, Li Y, Wee ATS, Pan JS, Chai JW |
62 - 68 |
Control of two-step growth processes of chalcopyrite thin films by X-ray fluorescence spectroscopy Klenk M, Schenker O, Alberts V, Bucher E |
69 - 75 |
Photoelectron spectroscopy study of surface alloying in the Au/Ni (s) 5(001) x (111) system Zafeiratos S, Kennou S |
76 - 83 |
Pulsed laser ablation of dense sintered AlN and AlN powder samples studied by time-of-flight mass spectroscopy Gunster J, Gorke R, Heinrich JG, Souda R |
84 - 90 |
Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering Gao PT, Meng LJ, dos Santos MP, Teixeira V, Andritschky M |
91 - 94 |
The effect of rare earth catalyst on carburizing kinetics in a sealed quench furnace with endothermic atmosphere Yan MF, Pan W, Bell T, Liu ZR |
95 - 102 |
Adsorption and reaction of NH3 on Ti/Si(100) Siew HL, Qiao MH, Chew CH, Mok KF, Chan L, Xu GQ |
103 - 114 |
Effect of annealing on the optical properties of Ag33Sb31Se36 thin films Abd El-Wahabb E, Bekheet AE |
115 - 121 |
Mass density determination of thin organosilicon films by X-ray reflectometry van der Lee A, Roualdes S, Berjoan R, Durand J |
122 - 133 |
Hydrogen adsorbed on palladium during water formation studied with palladium membranes Johansson M, Ekedahl LG |
134 - 139 |
The estimation of the average dimensions of deposited clusters from XPS emission intensity ratios Yang DQ, Meunier M, Sacher E |
140 - 150 |
Amorphous oxysulfide thin films MOySz (M = W, Mo, Ti) XPS characterization: structural and electronic pecularities Dupin JC, Gonbeau D, Martin-Litas I, Vinatier P, Levasseur A |
151 - 163 |
Characterisation of adsorbed intermediates in the CH3OH/O/Cu(100) system by secondary ion mass spectrometry Karolewski MA, Cavell RG |
164 - 169 |
Successful fabrication of nanostructures of convex shape on the as-prepared surfaces of Nd1Ba2Cu3Oy single crystals Wu AT, Koshizuka N |