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Proceedings of the Eighth International Conference on the Formation of Semiconductor Interfaces, Sapporo, Japan, June 10-15, 2001 - Preface Okumura T, Fukui T, Hasegawa H |
2 - 10 |
Band structures and band offsets of high K dielectrics on Si Robertson J |
11 - 15 |
Effect of patterning on thermal agglomeration of ultrathin silicon-on-insulator layer Ishikawa Y, Kumezawa M, Nuryadi R, Tabe M |
16 - 19 |
Evolution of step-terrace structure at Si-SiO2 interface in SIMOX substrate during annealing Ishiyama T, Nagase M, Omura Y |
20 - 25 |
Time evolution of interface roughness during thermal oxidation on Si(001) Takakuwa Y, Ishida F, Kawawa T |
26 - 29 |
Competing thermal relaxation processes in response to intrinsic defects produced by exposing SiO2 to synchrotron radiation Akazawa H |
30 - 34 |
Monte Carlo study of interfacial silicon suboxide layers and oxidation kinetics da Silva EF, de Vasconcelos EA, Stosic BD |
35 - 38 |
The role of multiple damaged layers at the Si/SiO2 interface on the dielectric breakdown of MOS capacitors Sombra SS, Costa UMS, Freire VN, de Vasconcelos EA, da Silva EF |
39 - 42 |
Compositional depth profiling of ultrathin oxynitride/Si interface using XPS Kato H, Nishizaki K, Takahashi K, Nohira H, Tamura N, Hikazutani K, Sano S, Hattori T |
43 - 47 |
Fixed charge and interface traps at heterovalent interfaces between Si(100) and non-crystalline Al2O3-Ta2O5 alloys Johnson RS, Lucovsky G, Hong JG |
48 - 55 |
A molecular orbital model for the electronic structure of transition metal atoms in silcate and aluminate alloys Lucovsky G, Whitten JL, Zhang Y |
56 - 59 |
Penetration of electronic states from silicon substrate into silicon oxide Takahasi K, Seman MB, Hirose K, Hattori T |
60 - 65 |
Real time observation of oxygen chemisorption states on Si (001)-2 x 1 during supersonic oxygen molecular beam irradiation Yoshigoe A, Teraoka Y |
66 - 74 |
Characterization of high-k gate dielectric/silicon interfaces Miyazaki S |
75 - 79 |
Si 2p and O 1s photoemission from oxidized Si(001) surfaces depending on translational kinetic energy of incident O-2 molecules Teraoka Y, Yoshigoe A |
80 - 87 |
Observation of triangular terraces and triangular craters of CaF2 film on Si(111) substrate Horio Y, Satoh S |
88 - 95 |
Structural and electrical properties of crystalline (1-x)Ta2O5-xTiO(2) thin films fabricated by metalorganic decomposition Salam KMA, Konishi H, Mizuno M, Fukuda H, Nomura S |
96 - 102 |
In-phase step wandering on vicinal Si(111) surfaces Natori A, Suga N |
103 - 107 |
Semiconductor-metal-semiconductor transition: valence band photoemission study of Ag/Si(111) surfaces Zhang HM, Sakamoto K, Uhrberg RIG |
108 - 112 |
Changes of phase and intensity of optical SHG with Ag deposition on Si (111)-7 x 7 surfaces Hirayama H, Komizo T, Kawata T, Takayanagi K |
113 - 120 |
Strain due to nickel diffusion into hydrogen-terminated Si(111) surface Emoto T, Akimoto K, Ichimiya A, Hirose K |
121 - 128 |
Core-level photoemission of the Si(111)-root 21 x root 21-Ag surface using synchrotron radiation Tong X, Ohuchi S, Tanikawa T, Harasawa A, Okuda T, Aoyagi Y, Kinoshita T, Hasegawa S |
129 - 133 |
Theoretical investigation on the electronic states localized at grain boundaries in semiconductors Uchida K, Tsuneyuki S |
134 - 138 |
Surface structure evolution during Sb adsorption on Si(111)-In(4 x 1) reconstruction Gruznev DV, Rao BV, Tambo T, Tatsuyama C |
139 - 143 |
Influence of interface structures on Sn thin film growth on Si(111) surface Ryu JT, Fujino T, Katayama M, Kim YB, Oura K |
144 - 150 |
Single-electron devices formed by pattern-dependent oxidation: microscopic structural evaluation Nagase A, Horiguchi S, Fujiwara A, Ono Y, Yamazaki K, Namatsu H, Takahashi Y |
151 - 156 |
Structural, chemical and optical features of nanocrystalline Si films prepared by PECVD techniques Park MB, Cho NH |
157 - 160 |
STM and LEED observations of erbium silicide nanostructures grown on Si(100) surface: atomic-scale understandings Cai Q, Yang JS, Fu Y, Wang YY, Wang XD |
161 - 165 |
Nanoparticle-induced multi-functionalization of silicon: A plug and play approach Prabhakaran K, Shafi KVPM, Yamauchi Y, Tsubaki K, Ulman A, Homma Y, Ogino T |
166 - 170 |
The influence of graded interfaces in the electronic spectrum of nanometer silicon dots de Sousa JS, Caetano EWS, Goncalves JR, Farias GA, Freire VN, da Silva EF |
171 - 175 |
Nanostructural and photoluminescence features of nanoporous silicon prepared by anodic etching Lee JS, Cho NH |
176 - 183 |
III-V quantum devices and circuits based on nanoscale Schottky gate control of hexagonal quantum wire networks Kasai S, Hasegawa H |
184 - 190 |
Formation of nanoscale heterointerfaces by selective area metalorganic vapor-phase epitaxy and their applications Motohisa J, Nakajima F, Fukui T |
191 - 194 |
Interface-related effects on confined excitons in GaAs/AlxGa1-xAs single quantum wells Ferreira EC, da Costa JAP, Freire JAK, Farias GA, Freire VN |
195 - 199 |
Acoustic phonons localized at an interface between superlattice and liquid Mizuno S |
200 - 204 |
Anomalous delay of phonons reflected from the surface of a superlattice Mizuno S, Tamura S |
205 - 211 |
Photoluminescence of charged magneto-excitons in InAs single quantum dots Natori A, Ohnuma S, Quang NH |
212 - 217 |
Size-shrinkage effect of InAs quantum dots during a GaAs capping growth Yamaguchi K, Saito Y, Ohtsubo R |
218 - 221 |
Annealing effect on InAs islands on GaAs(001) substrates studied by scanning tunneling microscopy Suekane O, Hasegawa S, Tanaka M, Okui T, Nakasima H |
222 - 225 |
Current instabilities in GaAs/InAs self-aggregated quantum dot structures Horvath ZJ, Frigeri P, Franchi S, Van Tuyen V, Gombia E, Mosca R, Dozsa L |
226 - 230 |
Molecular beam epitaxy growth and characterization of self-assembled InAs quantum dots on (100) InAlAs/InP substrates Koo BH, Park YG, Makino H, Chang JH, Hanada T, Shindo D, Yao T |
231 - 235 |
Formation of high-density hexagonal networks of InGaAs ridge quantum wires by atomic hydrogen-assisted selective molecular beam epitaxy Ito A, Muranaka T, Jiang C, Hasegawa H |
236 - 241 |
Formation of AlxGa1-xAs periodic array of micro-hexagonal pillars and air holes by selective area MOVPE Takeda J, Akabori M, Motohisa J, Fukui T |
242 - 246 |
Gate control characteristics in GaAs nanometer-scale Schottky wrap gate structures Yumoto M, Kasai S, Hasegawa H |
247 - 251 |
Exciton energy broadening due to interface fluctuations in ZnSe/ZnSxSe1-x strained quantum wells Maia FF, Freire JAK, Farias GA, Freire VN, da Silva EF |
252 - 257 |
Thin layers of GaInP, GaP and GaAsP in metalorganic vapour phase epitaxy-grown resonant tunnelling diodes Wernersson LE, Gustafson B, Gustafsson A, Borgstrom M, Pietzonka I, Sass T, Seifert W, Samuelson L |
258 - 263 |
Determination of the outward relaxation of cleaved strained InAs structures by scanning tunneling microscopy Bruls DM, Koenraad PM, Hopkinson M, Wolter JH, Salemink HWM |
264 - 268 |
GaAs(001) surface reconstructions: geometries, chemical bonding and optical properties Schmidt WG, Bechstedt F, Bernholc J |
269 - 274 |
Scanned-probe topological and spectroscopic study of surface states on clean and Si-deposited GaAs (001)-c(4 x 4) surfaces Negoro N, Kasai S, Hasegawa H |
275 - 278 |
Diffusion process of electrons injected from STM tip into AlGaAs/GaAs quantum wells Tsuruoka T, Ohizumi Y, Tanimoto R, Arafune R, Ushioda S |
279 - 283 |
Decomposition mechanism of triethylindium (TEI) on a GaP(001)-(2 x 1) surface studied by LEED, AES, TPD and HREELS Fukuda Y, Kobayashi T, Yoshida H, Sekizawa T, Sanada N |
284 - 287 |
An investigation of multi-quantum barriers for band offset engineering in AlGaInP/GaInP lasers Teng KS, Brown M, Kestle A, Smowton P, Blood P, Pinches S, Mawby PA, Wilks SP |
288 - 293 |
A study of estimation method for conduction band offset in semiconductor heterostructure by using triple-barrier resonant tunneling diodes Ohki S, Funato H, Suhara M, Okumura T, Wernersson LE, Seifert W |
294 - 297 |
Valuing of the critical layer thickness from the deading time constant of RHEED oscillation in the case of InxGa1-xAs/GaAs heterojunction Nemcsics A |
298 - 301 |
Gated photoluminescence study of oxide-free InP MIS structure having an ultrathin silicon interface control layer Fu ZW, Kasai S, Hasegawa H |
302 - 306 |
Acceptor- and donor-like interfacial states at ZnSe/GaAs heterovalent interfaces Lu F, Zhu ZQ, Kimura K, Yao T |
307 - 310 |
Reflectance difference spectroscopy during CdTe/ZnTe interface formation Balderas-Navarro RE, Hingerl K, Stifter D, Bonanni A, Sitter H |
311 - 317 |
Surface and interface electronic properties of group III-nitride heterostructures Rizzi A |
318 - 321 |
ICTS measurements for p-GaN Schottky contacts Shiojima K, Sugitani S, Sakai S |
322 - 325 |
Mechanism of current leakage through metal/n-GaN interfaces Oyama S, Hashizume T, Hasegawa H |
326 - 329 |
Characterization of metal/GaN Schottky interfaces based on I-V-T characteristics Sawada T, Ito Y, Kimura N, Imai K, Suzuki K, Sakai S |
330 - 338 |
Localized exciton dynamics in InGaN quantum well structures Chichibu SF, Azuhata T, Okumura H, Tackeuchi A, Sota T, Mukai T |
339 - 342 |
Low-temperature activation of mg-doped GaN with thin Co and Pt films Waki I, Fujioka H, Oshima M, Miki H, Okuyama M |
343 - 347 |
Photoluminescence and capacitance-voltage characterization of GaAs surface passivated by an ultrathin GaN interface control layer Anantathanasarn S, Hasegawa H |
348 - 351 |
Electrical characteristics of Mg-doped GaN activated with Ni catalysts Kamii Y, Waki I, Fujioka H, Oshima M, Miki H, Okuyama M |
352 - 355 |
Characterization of hetero-interfaces between group III nitrides formed by PLD and various substrates Ohta J, Fujioka H, Takahashi H, Oshima M |
356 - 360 |
Photoemission study of samarium on GaN (0001) and CdTe(100) Guziewicz E, Orlowski BA, Kowalski BJ, Grzegory I, Porowski S |
361 - 365 |
Effects of nitrogen addition on methane-based ECR plasma etching of gallium nitride Jin Z, Hashizume T, Hasegawa H |
366 - 370 |
Soft X-ray emission study of thermally treated Ni(film)/4H-SiC(substrate) interface Ohi A, Labis J, Morikawa Y, Fujiki T, Hirai M, Kusaka A, Iwami M |
371 - 375 |
Surface-enhanced Raman scattering study of silver deposition on thin Alq(3) layers Salvan G, Sakurai Y, Kobitski AY, Scholz R, Astilean S, Kampen TU, Zahn DRT, Ishii H, Seki K |
376 - 381 |
Interaction of metals with an organic semiconductor: Ag and In on PTCDA Park S, Kampen TU, Kachel T, Bressler P, Braun W, Zahn DRT |
382 - 385 |
Vibration spectroscopic study of the interaction of tris-(8-hydroxyquinoline) aluminum (Alq(3)) with potassium Sakurai Y, Salvan G, Hosoi Y, Ishii H, Ouchi Y, Seki K, Kampen TU, Zahn DRT |
386 - 389 |
Raman spectroscopy of the PTCDA-inorganic semiconductor interface: evidence for charge transfer Kobitski AY, Salvan G, Scholz R, Tenne D, Kampen TU, Wagner HP, Zahn DRT |
390 - 394 |
Fabrication of high quality silicon-polyaniline heterojunctions Laranjeira JMG, Khoury HJ, de Azevedo WM, da Silva EF, de Vasconcelos EA |
395 - 402 |
Spin injection into semiconductors using dilute magnetic semiconductors Gould C, Schmidt G, Richter G, Fiederling R, Grabs P, Molenkamp LW |
403 - 407 |
Electrical peculiarities in Al/Si/Ge/... /Ge/Si and Al/SiGe/Si structures Horvath ZJ, Jarrendahl K, Adam M, Szabo I, Van Tuyen V, Czigany Z |
408 - 415 |
X-ray diffraction characterization of MBE grown Pr1-xSrxMnO3 thin films on NGO(110) Liu G, Wang H, Makino H, Ko HJ, Hanada T, Yao T |
416 - 421 |
Phase transition and dielectric characteristics of nano-grained BaTiO3 ceramics synthesized from surface-coated nano-powders Park MB, Kim CD, Lee SK, Cho NH |
422 - 427 |
Evolution of stress and strain relaxation of Ge and SiGe alloy films on Si(001) Koch R, Wedler G, Wassermann B |
428 - 436 |
Surface/interface issues in THz electronics Hartnagel HL, Ichizli V, Rodriguez-Girones M |
437 - 440 |
Solid-phase epitaxy of CaSi2 on Si(111) and the Schottky-barrier height of CaSi2/Si(111) Wurz R, Schmidt M, Schopke A, Fuhs W |
441 - 444 |
Modification of Al/Si interface and Schottky barrier height with chemical treatment Horvath ZJ, Adam M, Szabo I, Serenyi M, Van Tuyen V |
445 - 449 |
Identity of defect causing nonideality in nearly ideal Au/n-Si Schottky barriers Maeda K |
450 - 454 |
High performance of thin nano-crystalline ZrN diffusion barriers in Cu/Si contact systems Takeyama MB, Itoi T, Aoyagi E, Noya A |
455 - 460 |
Morphology and interfacial properties of microrelief metal-semiconductor interface Dmitruk NL, Borkovskaya OY, Dmitruk IN, Mamykin SV, Horvath ZJ, Mamontova IB |
461 - 466 |
Barrier height engineering of Ag/GaAs(100) Schottky contacts by a thin organic interlayer Kampen TU, Park S, Zahn DRT |
467 - 474 |
The passivation of atomic scale defects present on III-V semiconductor laser facets: an STM/STS investigation Wilks SP, Teng KS, Dunstan PR, Williams RH |
475 - 479 |
Metallization and Schottky-barrier formation for Se-passivated GaAs(100) interfaces Biel B, Benito I, Gonzalez C, Blanco JM, Ortega J, Perez R, Flores F |
480 - 484 |
Molecular-beam epitaxy on shallow mesa gratings patterned on GaAs(311)A and (100) substrates Gong Q, Notzel R, Schonherr HP, Ploog KH |
485 - 490 |
Highly stable passivation of a Si(111) surface using bilayer-GaSe Ueno K, Shirota H, Kawamura T, Shimada T, Saiki K, Koma A |
491 - 497 |
Control of polarity of heteroepitaxial ZnO films by interface engineering Hong SK, Hanada T, Chen YF, Ko HJ, Yao T, Imai D, Araki K, Shinohara M |
498 - 507 |
Low-energy electron-excited nanoluminescence studies of GaN and related materials Brillson LJ, Bradley ST, Goss SH, Sun X, Murphy MJ, Schaff WJ, Eastman LF, Look DC, Molnar RJ, Ponce FA, Ikeo N, Sakai Y |
508 - 512 |
Depth-resolved cathodoluminescence characterization of buried InGaP/GaAs heterointerfaces Ishikawa F, Hasegawa H |
513 - 516 |
Carrier dynamics around nano-scale Schottky contacts: a femtosecond near-field study Achermann M, Siegner U, Wernersson LE, Keller U |
517 - 520 |
Monte Carlo simulation for temperature dependence of Ga diffusion length on GaAs(001) Kangawa Y, Ito T, Taguchi A, Shiraishi K, Irisawa T, Ohachi T |
521 - 526 |
Surface and interface of Ti(film)/SiC (substrate) system: a soft X-ray emission and photoemission electron microscopy study Labis J, Ohi A, Kamezawa C, Yoshida K, Hirai M, Kusaka M, Iwami M |