L3 - L3 |
Room-temperature ionic liquids with high conductivities and wide electrochemical windows - N-alkyl-N-methylpyrrolidinium and N-alkyl-N-methylpiperidinium fluorohydrogenates (vol 7, pg E41, 2004) Matsumoto K, Hagiwara R, Ito Y |
B35 - B38 |
Comparison of the effects of implanted and aqueous Cl on aluminum pitting behavior Wall FD, Johnson CM, Barbour JC, Martinez MA |
B39 - B41 |
Protective properties of organic coatings on plasma-treated cold rolled aluminum Monetta T, Mitton DB, Bellucci F |
B42 - B44 |
Deposition of high dielectric barium-doped titanium silicon oxide films on silicon using hexafluorotitanic acid and barium nitrate Lee MK, Tung KW, Yu CM |
D19 - D21 |
Synthesis of DLC films by electrolysis of dimethyl sulfoxide Jiang HQ, Huang LN, Wang SJ, Zhang ZJ, Xu T, Liu WM |
D22 - D24 |
Electrodeposited biaxially textured Ni layer for YBCO superconductor oxide films Bhattacharya R, Chen J, Spagnol P, Chaudhuri T |
E45 - E47 |
Rectified ion currents through ultrathin polyelectrolyte complex: Toward chemical transistors Salloum DS, Schlenoff JB |
E48 - E50 |
Conductive property of multiwall carbon nanotubes-PEO-salt nanocomposite film Zhao F, Wang MK, Dong SJ |
E51 - E53 |
Fabrication and electrochemical behavior of nanodisk electrode arrays with controlled interval using ideally ordered porous alumina Matsumoto F, Harada M, Koura N, Nishio K, Masuda H |
F67 - F69 |
Pt nanocrystalline interfacial layer in an SBT/Pt/Ti ferroelectric capacitor Leu CC, Chien CH, Hsu CC, Leu CF, Hsu FY, Hu CT |
F70 - F72 |
SrTiO3 thin films deposited by CLCB in combination with sol-gel processing Kang H, Park S, Kim K, Sung MY, Choi H |
F73 - F76 |
Characteristics of TiO2 films prepared by ALD with and without plasma Lim JW, Yun SJ, Lee JH |
H49 - H51 |
Uniform void-free epitaxial CoSi2 formation on STI bounded narrow Si(100) lines by template layer stress reduction Ho CS, Pey KL, Tung CH, Zhang BC, Tee KC, Karunasiri G, Chua SJ |
H52 - H54 |
Anomalous increase of grain size in Ni-mediated crystallization of amorphous silicon Oh JH, Choi JH, Kim KH, Cheon JH, Jang J |
A385 - A388 |
Performance of a pore-filling electrolyte membrane in hydrogen-oxygen PEFC Nishimura H, Yamaguchi T |
A389 - A390 |
Performance of microtubular DMFCs Kunimatsu M, Okada T |
A391 - A393 |
Single chamber electrolyte supported SOFC module Suzuki T, Jasinski P, Anderson HU, Dogan F |
A394 - A396 |
Surface-modified nanopore glass membrane as electrolyte for DMFCs Ioroi T, Kuraoka K, Yasuda K, Yazawa T, Miyazaki Y |
A397 - A399 |
The use of carbon nanofiber electrodes prepared by electrospinning for electrochemical supercapacitors Kim C, Yang KS, Lee WJ |
A400 - A403 |
Hydrothermal synthesis of V2O5 center dot 1.9H(2)O single crystals with novel electrochemical characteristics Hu CC, Chang KH |
A404 - A407 |
Nanostructured conducting polyaniline tubules as catalyst support for Pt particles for possible fuel cell applications Rajesh B, Thampi KR, Bonard JM, Mathieu HJ, Xanthopoulos N, Viswanathan B |
A408 - A411 |
Visualization of liquid water transport in a PEFC Yang XG, Zhang FY, Lubawy AL, Wang CY |
A412 - A415 |
New generation of ordered polymer electrolytes for lithium batteries Golodnitsky D, Livshits E, Kovarsky R, Peled E, Chung SH, Suarez S, Greenbaum SG |
A416 - A420 |
Synthesis of a polyanion cathode material, Li2Co2(MoO4)(3), and its electrochemical properties for lithium batteries Prabaharan SRS, Michael MS, Begam KM |
A421 - A424 |
Electrochemical transformation of SWNT/Nafion composites Liu P, Lee SH, Yan YF, Gennett T, Landi BJ, Dillon AC, Heben MJ |
A425 - A428 |
Polyaniline-MnO2 composite electrode for high energy density electrochemical capacitor Prasad KR, Miura N |
A429 - A431 |
A fabrication method for MEAs for PEFCs using Nafion precursor Saha MS, Kimoto K, Nishiki Y, Furuta T |
A432 - A434 |
Improved Li-battery electrolytes by heterogeneous doping of nonaqueous Li-salt solutions Bhattacharyya AJ, Dolle M, Maier J |
A435 - A438 |
C-MEMS for the manufacture of 3D microbatteries Wang CL, Taherabadi L, Jia GY, Madou M, Yeh YT, Dunn B |
A439 - A441 |
A low-cobalt AB(5)-type hydrogen storage alloy stabilized by an inert second phase for use in low-cost, high-performance NiMH cells Hu WK, Gao XP, Geng MM, Noreus D |
A442 - A446 |
Effect of morphology and current density on the electrochemical behavior of graphite electrodes in PC-based electrolyte containing VEC additive Hu YS, Kong WH, Wang ZX, Li H, Huang XJ, Chen LQ |
A447 - A450 |
Conductivity and capacitance properties of a supercapacitor based on Nafion electrolyte in a nonaqueous system Lufrano F, Staiti P |
A451 - A454 |
Mo6+-doped Li[Ni(0.5+x)Mn(1.5-2x)Mox]O-4 spinel materials for 5 V lithium secondary batteries prepared by ultrasonic spray pyrolysis Park SH, Oh SW, Myung ST, Sun YK |
C129 - C132 |
Highly selective etching of GaAs on Al0.2Ga0.8As using citric acid/H2O2/H2O etching system Liao CI, Houng MP, Wang YH |
C133 - C135 |
Formation of complex tungsten-silica microstructures by Ar+ laser processing Toth Z, Piglmayer K |
G241 - G243 |
Suppression of leakage current in InGaN/GaN multiple-quantum well LEDs by N2O plasma treatment Kim HM, Huh C, Kim SW, Park NM, Park SJ |
G244 - G246 |
RBS characterization of porous silicon multilayer interference filters Torres-Costa V, Paszti F, Climent-Font A, Martin-Palma RJ, Martinez-Duart JM |
G247 - G250 |
Interface modification for OTFTs using a statistical optimization method Hong WS, Koo B, Kang I |
G251 - G253 |
A novel distributed charge storage element fabricated by the oxidation of amorphous silicon carbide Chang TC, Yan ST, Chen YT, Liu PT, Sze SM |
G254 - G257 |
Improvements in reliability and leakage current properties of HfO2 gate dielectric films by in situ O-3 oxidation of Si substrate Park HB, Cho M, Park J, Lee SW, Park TJ, Hwang CS |
G258 - G260 |
Effect of Ni thickness dependence on NiSiFUSI metal gate characteristics Wen HC, Sim JH, Lu JP, Kwong DL |
G261 - G263 |
Fabrication and characterization of reactively sputtered TaN thin-film resistors for millimeter wave applications Mellberg A, Nicols SP, Rorsman N, Zirath H |
G264 - G265 |
Delineating structural defects in highly doped n-type 4H-SiC substrates using a combination of thermal diffusion and molten KOH etching Zhang ZH, Gao Y, Sudarshan T |
G266 - G268 |
Effects of temperature on InGaN/GaN LEDs with different MQW structures Huh C, Park SJ |
G269 - G271 |
Sulfur-doped indium phosphide on silicon substrate brown by ELOG Sun YT, Lourdudoss S, Avella M, Jimenez J |
G272 - G275 |
Nanostructured TaN(O)/TaN barrier film formed by oxygen plasma treatment for copper interconnect Ou KL, Lin MH, Chiou SY |
G276 - G278 |
Electrical investigation of Si/SiGe layers grown on a nanometer-thick SOI by CVD Fujinaga K |
G279 - G281 |
Mobility enhancement in ZnO-based TFTs by H treatment Bae HS, Kim JH, Im S |
G282 - G285 |
Detection of kite-shaped COPs in nitrogen-doped Czochralski-grown silicon wafers Lee WP, Yow HK, Tou TY |
G286 - G289 |
Selective sidewall airgap integration for deep submicrometer interconnects de Mussy JPG, Richard O, Beyer G, Maex K |
G290 - G293 |
Negative differential resistance of 2D electron gases in 0.1 mu m pseudomorphic HEMTs Kim SD, Oh JH, Han HJ, Lim BO, Rhee JK, Sul WS |