화학공학소재연구정보센터
Journal of Industrial and Engineering Chemistry, Vol.105, 393-404, January, 2022
A highly efficient multi-stage dielectric barrier discharge (DBD)-catalytic system for simultaneous toluene degradation and O3 elimination
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DBD-catalytic system has been widely studied for volatile organic compounds abatement, whereas how to obtain high mineralization rate and low zone emission synchronously remains a challenge. In view of this, a new type of multi-stage DBD-catalytic system (MS1) was established to abatement toluene in this study. The mineralization rates of reactors IPC (63.81%) and MS1 (61.14%) were much higher than MS2, PPC1 and PPC2 reactors, which were 48.36%, 46.84%, and 5.8% at 33.8 (Vp-p) kV, respectively. For export ozone concentration, IPC reactor had the highest concentration of 160 ppm, and the values of reactors MS1, MS2, PPC1, and PPC2 were 79, 34.2, 34.25 and 29 ppm, respectively. The catalyst filled in zone II can be utilized to further decompose the residual toluene and intermediates and also promote the decomposition of ozone, which lead to the superior performance of the MS1 reactor. The influence of applied voltage, adsorbed amount, and discharge time on the toluene removal performance was investigated to optimize the operation parameters of MS1 reactor, their appropriate values were 28.3-31.1 (Vpp) kV, 0.179-0.223 mmol, ~1 h, respectively. Lastly, the contribution of disparate zones in multi-stage DBD-catalytic system to the toluene degradation were elucidated on the basis of the GC-MS results.
  1. Edie R, Robertson AM, Soltis J, Field RA, Snare D, Burkhart MD, Murphy SM, Environ. Sci. Technol., 54, 1385 (2020)
  2. Liang X, Sun X, Xu J, Ye D, Sci. Total Environ., 745 (2020)
  3. Yue T, Gao X, Gao J, Tong Y, Wang K, Zuo P, Zhang X, Tong L, Wang C, Xue Y, Atmos. Environ., 184, 1 (2018)
  4. Pye HOT, D’Ambro EL, Lee BH, et al., Proc. Natl. Acad. Sci. USA, 116, 6641 (2019)
  5. Mozaffar A, Zhang YL, Fan M, Cao F, Lin YC, Atmos. Res., 240 (2020)
  6. Jin X, Fiore A, Boersma KF, Smedt I, Valin L, Environ. Sci. Technol., 54, 6518 (2020)
  7. Huang XF, Dai J, Zhu Q, Yu K, Du K, Environ. Sci. Technol., 54, 1425 (2020)
  8. Sakamoto Y, Sadanaga Y, Li J, et al., Environ. Sci. Technol., 53, 13629 (2019)
  9. Lyu X, Guo H, Wang Y, Zhang F, Nie K, Dang J, Liang Z, Dong S, Zeren Y, Zhou B, Gao W, Zhao S, Zhang G, Chemosphere, 246 (2020)
  10. Zheng H, Kong S, Yan Y, et al., Sci. Total. Environ., 703 (2020)
  11. Cui P, Schito G, Cui Q, J. Clean Prod., 244 (2020)
  12. Li QQ, Su GJ, Li CQ, Wang MJ, Tan L, Gao LR, Wu MG, Wang QL, J. Hazard. Mater., 375, 52 (2019)
  13. Ji Y, Gao F, Wu Z, Li L, Li D, Zhang H, Zhang Y, Gao J, Bai Y, Li H, J. Environ. Sci., 95, 225 (2020)
  14. Krishnamurthy A, Adebayo B, Gelles T, Rownaghi A, Rezaei F, Catal. Today, 350, 100 (2020)
  15. Li S, Dang X, Yu X, Abbas G, Zhang Q, Cao L, Chem. Eng. J., 388 (2020)
  16. Pemen AJM, Nair SA, Yan K, van Heesch EJM, Ptasinski KJ, Drinkenburg AAH, J. Adv. Oxid. Technol., 7, 123 (2004).
  17. Magureanu M, Mandache NB, Gaigneaux E, Paun C, Parvulescu VI, J. Appl. Phys., 99 (2006)
  18. Kim KH, Szulejko JE, Kumar P, Kwon EE, Adelodun AA, Reddy PAK, Environ. Pollut., 225, 729 (2017)
  19. Adelodun AA, J. Ind. Eng. Chem., 92, 41 (2020)
  20. Xiao G, Xu WP, Wu RB, Ni MJ, Du CM, Gao X, Luo ZY, Cen KF, Plasma Chem. Plasma Process., 34(5), 1033 (2014)
  21. Dang XQ, Li SJ, Yu X, Guo H, Qin CH, Cao L, Chem. Eng. Res. Des., 155, 80 (2020)
  22. Parvizi N, Rahemi N, Allahyari S, Tasbihi M, J. Ind. Eng. Chem., 84, 167 (2020)
  23. Sultana S, Vandenbroucke A, Leys C, De Geyter N, Morent R, Catalysts, 5, 718 (2015)
  24. Kogelschatz U, Eliasson B, Egli W, J. Phys. IV France, 7, 47 (1997)
  25. Eliasson B, Kogelschatz U, IEEE Trans. Plasma Sci., 19, 1063 (1991)
  26. Lee B, Kim DW, Park DW, Chem. Eng. J., 357, 188 (2019)
  27. Zhang HB, Li K, Li L, Liu LZ, Meng XL, Sun TH, Jia JP, Fan MH, Chem. Eng. J., 343, 759 (2018)
  28. Yu X, Dang X, Li S, Zhang J, Zhang Q, Cao L, J. Clean Prod., 276 (2020)
  29. Li S, Dang X, Yu X, Yu R, Abbasd G, Zhang Q, J. Hazard. Mater., 400 (2020)
  30. Veerapandian S, Leys C, De Geyter N, Morent R, Catalysts, 7, 113 (2017)
  31. Neyts EC, Plasma Chem. Plasma Process., 36(1), 185 (2016)
  32. Qin C, Guo H, Liu P, Bai W, Huang J, Huang X, Dang X, Yan D, J. Ind. Eng. Chem., 63, 449 (2018)
  33. Shou T, Li Y, Bernards MT, Becco C, Cao G, Shi Y, He Y, J. Hazard. Mater., 387 (2020)
  34. Liu K, Zheng ZF, Liu ST, Hu YY, Plasma Chem. Plasma Process., 39(5), 1255 (2019)
  35. Chen HL, Lee HM, Chen SH, Chang MB, Yu SJ, Li SN, Environ. Sci. Technol., 43, 2216 (2009)
  36. Sultana S, Vandenbroucke AM, Mora M, Jimenez-Sanchidrian C, Romero-Salguero FJ, Leys C, De Geyter N, Morent R, Appl. Catal. B: Environ., 253, 49 (2019)
  37. Huang H, Ye D, Leung DYC, IEEE T. Plasma Sci., 39, 877 (2011)
  38. Li X, Li M, Peng Z, Zheng K, Xu L, Dong J, Ren G, Cheng P, Chemosphere, 249 (2020)
  39. Karatum O, Deshusses MA, Chem. Eng. J., 294, 308 (2016)
  40. Wang B, Yao S, Peng Y, Xu Y, J. Environ. Chem. Eng., 6, 3819 (2018)
  41. Hosseini MS, Mahabadi HA, Yarahmadi R, Plasma Chem. Plasma Process., 39(1), 125 (2019)
  42. Qin C, Huang X, Dang X, Huang J, Teng J, Kang Z, Chemosphere, 162, 125 (2016)
  43. Qiu ZZ, Yu YX, Mi JG, Appl. Surf. Sci., 258(24), 9629 (2012)
  44. Cao X, Chen M, Ma J, Yin B, Xing X, Phys. Chem. Chem. Phys., 19, 196 (2016)
  45. Zhang J, Li Y, Zhang Y, Chen M, Wang L, Zhang C, He H, Sci. Rep., 5, 1290 (2015)
  46. Wang BF, Chen BX, Sun YH, Xiao HL, Xu XX, Fu ML, Wu JL, Chen LM, Ye DQ, Appl. Catal. B: Environ., 238, 328 (2018)
  47. Ausavasukhi A, Suwannaran S, Limtrakul J, Sooknoi T, Appl. Catal. A: Gen., 345(1), 89 (2008)
  48. Qin CH, Huang XM, Zhao JJ, Huang JY, Kang ZL, Dang XQ, J. Hazard. Mater., 334, 29 (2017)
  49. Zeng X, Li B, Liu R, Li X, Zhu T, Chem. Eng. J., 384 (2020)
  50. Chang T, Lu JQ, Shen ZX, Huang Y, Lu D, Wang X, Cao JJ, Morent R, Appl. Catal. B: Environ., 244, 107 (2019)
  51. Chang T, Shen ZX, Huang Y, Lu JQ, Ren DX, Sun J, Cao JJ, Liu HX, Chem. Eng. J., 348, 15 (2018)
  52. Mao LG, Chen ZZ, Wu XY, Tang XJ, Yao SL, Zhang XM, Jiang BQ, Han JY, Wu ZL, Lu H, Nozaki T, J. Hazard. Mater., 347, 150 (2018)
  53. Trushkin AN, Kochetov IV, Plasma Phys. Rep., 38, 407 (2012)