화학공학소재연구정보센터

Solid-State Electronics

Solid-State Electronics, Vol.103 Entire volume, number list
ISSN: 0038-1101 (Print) 

In this Issue (39 articles)

1 - 6 A finite state machine read-out chip for integrated surface acoustic wave sensors
Rakshit S, Iliadis AA
7 - 14 Experimental developments of A2RAM memory substrates cells on SOI and bulk substrates
Rodriguez N, Gamiz F, Navarro C, Marquez C, Andrieu F, Faynot O, Cristoloveanu S
15 - 18 Superconducting platinum suicide for electron cooling in silicon
Prest MJ, Richardson-Bullock JS, Zhao QT, Muhonen JT, Gunnarsson D, Prunnila M, Shah VA, Whall TE, Parker EHC, Leadley DR
19 - 29 On the effect of technology scaling on variation-resilient sub-threshold circuits
Reynders N, Dehaene W
30 - 39 Analytical modeling of multi-layered Printed Circuit Board dedicated to electronic component thermal characterization
Monier-Vinard E, Laraqi N, Dia CT, Nguyen MN, Bissuel V
40 - 43 Comparison of electron-phonon and hole-phonon energy loss rates in silicon
Richardson-Bullock JS, Prest MJ, Shah VA, Gunnarsson D, Prunnila M, Dobbie A, Myronov M, Morris RJH, Whall TE, Parker EHC, Leadley DR
44 - 48 GaN-InGaN LED efficiency reduction from parasitic electron currents in p-GaN
Togtema G, Georgiev V, Georgieva D, Gergova R, Butcher KSA, Alexandrov D
49 - 53 High-voltage AlGaN/GaN Schottky barrier diodes on silicon using a post-process O-2 treatment
Seok O, Han MK, Byun YC, Kim J, Shin HC, Ha MW
54 - 58 Fabrication of assembled ZnO/TiO2 heterojunction thin film transistors using solution processing technique
Liau LCK, Lin YG
59 - 63 Model of current-limited negative differential resistance in oxide-based resistance-switching devices
Chen FT
64 - 72 50 nm AlxOy ReRAM program 31% energy, 1.6x endurance, and 3.6x speed improvement by advanced cell condition adaptive verify-reset
Ning SY, Iwasak TO, Takeuchi K
73 - 78 A Built-In Self-Test Structure (BIST) for Resistive RAMs characterization: Application to bipolar OxRRAM
Aziza H, Bocquet M, Moreau M, Portal JM
79 - 82 Stable single mode operation of quantum cascade lasers by complex-coupled second-order distributed feedback grating
Liu YH, Zhang JC, Jia ZW, Yao DY, Yan FL, Liu FQ, Wang LJ, Liu JQ, Wang ZG
83 - 89 Analytical models of on-resistance and breakdown voltage for 4H-SiC floating junction Schottky barrier diodes
Yuan H, Tang XY, Song QW, Zhang YM, Zhang YM, Yang F, Niu YX
90 - 97 Interface pn junction arrays with high yielded grown p-Si microneedles by vapor-liquid-solid method at low temperature
Islam MS, Ishida M
98 - 103 Impact of p-body length on the electrical characteristics of high-voltage MOSFET with a lateral asymmetric channel
Baek KJ, Na KY, Lee YJ, Kim YS
104 - 109 N-well resistance modelling in Q-factor of doughnut-shaped PN varactors
Marrero-Martin M, Gonzalez B, Garcia J, Hernandez A
110 - 114 Integration of crystalline orientated gamma-Al2O3 films and complementary metal-oxide-semiconductor circuits on Si(100) substrate
Oishi K, Akai D, Ishida M
115 - 121 Estimation of the accuracy of the microwave FET equivalent circuit using the quasi-hydrodynamic model of electron transport
Garber GZ
122 - 126 Design, fabrication and test of novel LDMOS-SCR for improving holding voltage
Yang L, Wang Y, Zhou AC, Jin XL
127 - 130 Analysis of slow de-trapping phenomena after a positive gate bias on AlGaN/GaN MIS-HEMTs with in-situ Si3N4/Al2O3 bilayer gate dielectrics
Wu TL, Marcon D, Ronchi N, Bakeroot B, You SZ, Stoffels S, Van Hove M, Bisi D, Meneghini M, Groeseneken G, Decoutere S
131 - 139 Thermoelectric generators from SiO2/SiO2 + Ge nanolayer thin films modified by MeV Si ions
Budak S, Gulduren E, Allen B, Cole J, Lassiter J, Colon T, Muntele C, Allan MA, Bhattacharjee S, Johnson RB
140 - 146 Energy capability improvement of power DMOS transistors operating in pulsed conditions
Costachescu D, Pfost M
147 - 153 A high performance compact Wilkinson power divider using GaAs-based optimized integrated passive device fabrication process for LTE application
Li Y, Wang C, Kim NY
154 - 161 Accurate analytical drain current model for a nanoscale fully-depleted SOI MOSFET
Anvarifard MK, Orouji AA
162 - 166 Alternative isolation-feature geometries and polarization-engineering of polar AlGaN/GaN HFETs
Loghmany A, Valizadeh P
167 - 172 The impact of stress-induced defects on MOS electrostatics and short-channel effects
Esqueda IS
173 - 177 The effect of nitrous oxide plasma treatment on the bias temperature stress of metal oxide thin film transistors with high mobility
Tseng WH, Fang SW, Lu CY, Chuang HY, Chang FW, Lin GY, Chen TW, Ma KH, Chen HS, Chen TK, Chen YH, Lee JY, Shih TH, Ting HC, Chen CY, Lin YH, Hong HJ
178 - 183 Polycrystalline silicon thin-film transistors fabricated by Joule-heating-induced crystallization
Hong WE, Ro JS
184 - 189 Luminescence and spectrum variations caused by thermal annealing in undoped and doped polyfluorene OLEDs
Jokinen K, Bykov A, Sliz R, Remes K, Fabritius T, Myllyla R
190 - 194 Switching characteristics in Cu:SiO2 by chemical soak methods for resistive random access memory (ReRAM)
Chin FT, Lin YH, Yang WL, Liao CH, Lin LM, Hsiao YP, Chao TS
195 - 198 Self-aligned coplanar amorphous indium zinc oxide thin-film transistors with high performance
Park JC, Lee HN
199 - 201 A novel scaling theory for fully depleted pi-gate (Pi G) MOSFETs
Chiang TK
202 - 208 Methodology for 1/f noise parameter extraction for high-voltage MOSFETs
Mavredakis N, Pflanzl W, Seebacher E, Bucher M
209 - 215 Different stress techniques and their efficiency on triple-gate SOI n-MOSFETs
Buuhler RT, Agopian PGD, Collaert N, Simoen E, Claeys C, Martino JA
216 - 221 Graphene-channel FETs for photonic frequency double-mixing conversion over the sub-THz band
Kawasaki T, Sugawara K, Dobroiu A, Eto T, Kurita Y, Kojima K, Yabe Y, Sugiyama H, Watanabe T, Suemitsu T, Ryzhii V, Iwatsuki K, Fukada Y, Kani J, Terada J, Yoshimoto N, Kawahara K, Ago H, Otsuji T
222 - 228 Integration of highly-strained SiGe materials in 14 nm and beyond nodes FinFET technology
Wang GL, Abedin A, Moeen M, Kolandouz M, Luo J, Guo YL, Chen T, Yin HX, Zhu HL, Li JF, Zhao C, Radamson HH
229 - 235 Magnetoresistance mobility characterization in advanced FD-SOI n-MOSFETs
Shin M, Shi M, Mouis M, Cros A, Josse E, Mukhopadhyay S, Piot B, Kim GT, Ghibaudo G
236 - 241 Multi-input intrinsic and extrinsic field effect transistor models beyond cutoff frequency
Ibrahim NY, Rafat NH, Elnahwy SEA