1711 - 1715 |
Adaptation of the pseudo-MOS transistor for the characterization of silicon-on-sapphire films Hefyene N, Cristoloveanu S, Ghibaudo G, Gentil P, Moriyasu Y, Morishita T, Matsui M, Yasujima A |
1717 - 1722 |
Electrical fatigue response for ferroelectric ceramics under electrical cyclic load Qian R, Lukasiewicz S, Gao Q |
1723 - 1732 |
Fast gate turn-off in a merged thyristor-like structure Gordion IM, Gribnikov ZS, Korobov VA, Mitin VV |
1733 - 1741 |
Field emission characteristic studies of chemical vapor deposited diamond films Chen CL, Chen CS, Lue JT |
1743 - 1746 |
A DC current stress method to improve the voltage coefficient of resistance of the polysilicon resistor in high voltage CMOS technology Chen CH, Fang YK, Kuo MH, Hsu YL, Hsu SL |
1747 - 1752 |
Influence of transient enhanced diffusion of the intrinsic base dopant profile on SiGeHBT DC and HF characteristics Malm BG, Grahn JV, Ostling M |
1753 - 1764 |
An analytical model for the 3D-RESURF effect Ng R, Udrea F, Amaratunga G |
1765 - 1769 |
Optoelectronic properties of CdO/Si photodetectors Ortega M, Santana G, Morales-Acevedo A |
1771 - 1781 |
An electrostatic discharge failure mechanism in semiconductor devices, with applications to electrostatic discharge measurements using transmission line pulsing technique Lee JC, Hoque A, Croft GD, Liou JJ, Young R, Bernier JC |
1783 - 1787 |
Comprehensive investigations of high voltage non-punch-through double gate-injection enhanced gate transistor Bai YM, Huang AQ |
1789 - 1798 |
Thermal analysis of solid-state devices and circuits: an analytical approach Rinaldi N |
1799 - 1806 |
A physics-based electron gate current model for fully depleted SOI MOSFETs Sheu CJ, Jang SL |
1807 - 1818 |
Electrical characteristics of CoSi2/n-Si(100) Schottky barrier contacts formed by solid state reaction Zhu SY, Detavernier C, Van Meirhaeghe RL, Cardon F, Ru GP, Qu XP, Li BZ |
1819 - 1824 |
A MOSFET gate current model with the direct tunneling mechanism Sheu CJ, Jang SL |
1825 - 1831 |
Determination of SiO2-Si interface trap level density (D-it) by vibrating capacitor method Mizsei J |
1833 - 1836 |
On the use of appropriate boundary conditions to calculate the normalized wave functions in the inversion layers of MOSFETs with ultra-thin gate oxides Haque A, Rahman A, Chowdhury IB |
1837 - 1845 |
Effects of high current conduction in sub-micron Ti-silicided films Gan CL, Pey KL, Chim WK, Siah SY |
1847 - 1852 |
Impact of Ni/Ge/Au/Ti/Au and Ti/Pt/Au collector metal on GaInP/GaAs HBT characteristics Park JW, Mohammadi S, Pavlidis D |
1853 - 1856 |
Resonant-tunneling-diode relaxation oscillator Chen CL, Mathews RH, Mahoney LJ, Calawa SD, Sage JP, Molvar KM, Parker CD, Maki PA |
1857 - 1860 |
Sidegating mechanism as a function of the sidegate-to-channel spacing Prokhorov EF, Gorev NB, Kodzhespirova IF, Kovalenko YA |
1861 - 1864 |
Exact analytical solutions of the forward non-ideal diode equation with series and shunt parasitic resistances Ortiz-Conde A, Sanchez FJG, Muci J |
1865 - 1867 |
Similarity relation for I-V characteristics of FETs with different channel shape Dobrovolsky VN, Balucani M, Ferrari A |
1869 - 1873 |
Trade-off between the Kirk effect and the breakdown performance in resurfed lateral bipolar transistors for high voltage, high frequency applications Cao GJ, De Souza MM, Narayanan EMS |
1875 - 1878 |
Improved ohmic contact on n-type 4H-SiC Gao Y, Tang Y, Hoshi M, Chow TP |