673 - 673 |
Special issue Section-ULIS 2004 - Foreword De Meyer K, Collaert N |
674 - 683 |
Teaching cells to dance: the impact of transistor miniaturization on the manipulation of populations of living cells Abonnenc M, Altomare L, Baruffa M, Ferrarini V, Guerrieri R, Iafelice B, Leonardi A, Manaresi N, Medoro G, Romani A, Tartagni M, Vulto P |
684 - 694 |
Sub-band structure engineering for advanced CMOS channels Takagi S, Mizuno T, Tezuka T, Sugiyama N, Nakaharai S, Numata T, Koga J, Uchida K |
695 - 701 |
Scaling CMOS: Finding the gate stack with the lowest leakage current Kauerauf T, Govoreanu B, Degraeve R, Groeseneken G, Maes H |
702 - 707 |
Tunneling 1/f(gamma) noise in 5 nm HfO2/2.1 nm SiO2 gate stack n-MOSFETs Simoen E, Mercha A, Pantisano L, Claeys C, Young E |
708 - 715 |
On the great potential of non-doped MOSFETs for analog applications in partially-depleted SOICMOS process Kilchytska V, Levacq D, Vancaillie L, Flandre D |
716 - 720 |
Charge trapping memory structures with Al2O3 trapping dielectric for high-temperature applications Specht M, Reisinger H, Hofmann F, Schulz T, Landgraf E, Luyken RJ, Rosner W, Grieb M, Risch L |
721 - 726 |
Characterization of the effective mobility by split C(V) technique in sub 0.1 mu m Si and SiGePMOSFETs Romanjek K, Andrieu F, Ernst T, Ghibaudo G |
727 - 732 |
An improved semi-classical Monte-Carlo approach for nano-scale MOSFET simulation Palestri P, Eminente S, Esseni D, Fiegna C, Sangiorgi E, Selmi L |
733 - 739 |
Impact of scattering in'atomistic' device simulations Alexander C, Brown AR, Watling JR, Asenov A |
740 - 746 |
Impact of intrinsic parameter fluctuations in decanano MOSFETs on yield and functionality of SRAM cells Cheng B, Roy S, Roy G, Adamu-Lema F, Asenov A |
747 - 754 |
Simulation of interconnect structures using ghost-field solving methods Schoenmaker W, Meuris P, Janssens E, Verschaeve M |
755 - 762 |
Beyond the conventional transistor Wong HSP |
763 - 768 |
Shift and ratio method revisited: extraction of the fin width in multi-gate devices Collaert N, Dixit A, Anil KG, Rooyackers R, Veloso A, De Meyer K |
769 - 773 |
Ion implantation dose high-resolution monitoring in Si wafers using laser infrared photothermal radiometry with lock-in common-mode-rejection demodulation Mandelis A, Rabago F |
774 - 778 |
Characterization of Pd/Ni/Au ohmic contacts on p-GaN Cho HK, Hossain T, Bae JW, Adesida I |
779 - 789 |
Impact of floating silicon film on small-signal parameters of fully depleted SOI-MOSFETs biased into accumulation Wiatr M, Seegebrecht P |
790 - 794 |
Improvement of GaAs metal-semiconductor field-effect transistor drain-source breakdown voltage by oxide surface passivation grown by atomic layer deposition Ye PD, Wilk DG, Yang B, Chu SNG, Ng KK, Bude J |
795 - 801 |
Empirical model of data retention degradation in stacked-gate flash EEPROM cells with new interpoly dielectric of an Oxide-Nitride-Oxide-Nitride (ONON) layer Kim JH, Choi JB |
802 - 807 |
AlGaN/GaN field effect transistors with C-doped GaN buffer layer as an electrical isolation template grown by molecular beam epitaxy Haffouz S, Tang H, Bardwell JA, Hsu EM, Webb JB, Rolfe S |
808 - 812 |
An analytical threshold voltage roll-off equation for MOSFET by using effective-doping Shih CH, Chen YM, Lien CS |
813 - 817 |
Space charge limited current conduction in ZincPhthalocyanine (ZnPc) thin films Senthilarasu S, Sathyamoorthy R, Lalitha S, Subbarayan A |
818 - 824 |
A test circuit for measuring MOSFET threshold voltage mismatch Terada K, Eimitsu M, Fukeda K |
825 - 833 |
Analysis of variation in leakage currents of Lanthana thin films Kim Y, Ohmi S, Tsutsui K, Iwai H |
834 - 837 |
Effect of aspect ratio on forward voltage drop in trench insulated gate bipolar transistor Moon JW, Choi YK, Chung SK |
838 - 846 |
Enhanced passivation characteristics in OLEDs by modification of aluminum cathodes using Ar+ ion beam Jeong SM, Koo WH, Choi SH, Balk HK |
847 - 852 |
Space-charge-limited currents in GaN Schottky diodes Shen XM, Zhao DG, Liu ZS, Hu ZF, Yang H, Liang JW |
853 - 859 |
Printed polymeric passive RC filters and degradation characteristics Cui TH, Liu Y, Chen B, Zhu M, Varahramyan K |
860 - 864 |
Simulation study of the carbon nanotube field effect transistors beyond the complex band structure effect Xia TS, Register LF, Banerjee SK |