Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.14, No.2 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (71 articles)

267 - 270	Dynamic Rate and Thickness Metrology During Poly-Si Rapid Thermal Chemical-Vapor-Deposition from SiH4 Using Real-Time in-Situ Mass-Spectrometry Tedder LL, Rubloff GW, Cohaghan BF, Parsons GN
271 - 277	Optical-Temperature Measurement by Grating Expansion for Rotating Semiconductor Wafers Huang C, Lang M, Brueck SR
278 - 285	Adsorption Induced Gas-Transport Phenomena in Narrow Air Channels Recorded with Work Function Detectors Flietner B, Doll T, Lechner J, Eisele I
286 - 292	Irradiation-Induced Decomposition of Al2O3 During Auger-Electron Spectroscopy Analysis Park JW, Pedraza AJ, Allen WR
293 - 298	Characterization of Low-Resistivity Indium Oxide-Films by Auger-Electron Spectroscopy, X-Ray Photoelectron-Spectroscopy, and X-Ray-Diffraction and Correlation Between Their Properties, Composition, and Texture Jeong JI, Moon JH, Hong JH, Kang JS, Fukuda Y, Lee YP
299 - 305	X-Ray Photoelectron-Spectroscopy Studies of Alkoxide-Derived Lithium-Niobate Kaufherr N, Eichorst DJ, Payne DA
306 - 311	Chemical-Vapor-Deposition of Aluminum and Gallium Nitride Thin-Films from Metalorganic Precursors Hoffman DM, Rangarajan SP, Athavale SD, Economou DJ, Liu JR, Zheng ZS, Chu WK
312 - 318	Nucleation Behavior in Molecular-Beam and Chemical-Vapor-Deposition of Silicon on Si(111)-(7X7) Andersohn L, Berke T, Kohler U, Voigtlander B
319 - 326	Enhanced Adherence of Area-Selective Electroless Metal Plating on Insulators Shafeev GA, Themlin JM, Bellard L, Marine W, Cros A
327 - 331	Role of Chemical Bonding in the Epitaxial-Growth of Noble-Metals on Ionic-Crystal Substrates Yamamoto K, Kasukabe Y, Takeishi R, Osaka T
332 - 335	Fabrication and Characterization of Extremely Smooth Large-Area Gold Surfaces Woodard NG, Lafyatis GP
336 - 345	Pure and Fluorine-Doped Silica Films Deposited in a Hollow-Cathode Reactor for Integrated-Optic Applications Bazylenko MV, Gross M, Simonian A, Chu PL
346 - 351	Development of 111 Texture in Al Films Grown on SiO2/Si(001) by Ultrahigh-Vacuum Primary-Ion Deposition Kim YW, Petrov I, Greene JE, Rossnagel SM
352 - 358	Effects of Oblique Energetic Bombardment on the Morphology and Microstructure of Triode Ion-Plated Titanium Films Gunasekhar KR, Krishna MG, Raju AR, Krishna KN, Mohan S
359 - 366	Chemical-Shifts and Optical-Properties of Tin Oxide-Films Grown by a Reactive Ion-Assisted Deposition Choi WK, Jung HJ, Koh SK
367 - 369	New Method of Tubular Material Inner Surface Modification by Plasma Source Ion-Implantation Sun M, Yang SZ, Li B
370 - 373	Ion Deposition by Inductively-Coupled Plasma-Mass Spectrometry Hu K, Houk RS
374 - 379	Pulsed Plasma Deposition of Chromium-Oxide Chromium-Cermet Coatings Gall D, Gampp R, Lang HP, Oelhafen P
380 - 383	Measurement of the Gas Temperature in Fluorocarbon Radio-Frequency Discharges Using Infrared-Absorption Spectroscopy Haverlag M, Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ
384 - 390	Production and Destruction of Cfx Radicals in Radiofrequency Fluorocarbon Plasmas Haverlag M, Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ
391 - 397	Measurements of Pulsed-Power Modulated Argon Plasmas in an Inductively-Coupled Plasma Source Ashida S, Shim MR, Lieberman MA
398 - 403	Simulation of Microloading in Aluminum Etching Aoki M, Sasamura Y
404 - 407	H2O Pumping by Sputter Discharge with a LaB6 Cathode Funato Y, Miyoshi M, Akaishi K, Kubota Y, Mushiaki M
408 - 414	Extraction of Oxygen from CO2 Using Glow-Discharge and Permeation Techniques Wu D, Outlaw RA, Ash RL
415 - 424	Mechanistic Studies of the Thermal-Decomposition of Metal-Carbonyls on Ni(100) Surfaces in Connection with Chemical-Vapor-Deposition Processes Xu MD, Zaera F
425 - 430	Crystallographic Tilting in High-Misfit (100) Semiconductor Heteroepitaxial Systems Riesz F
431 - 435	Characterization of Amorphous-Carbon Thin-Films Capano MA, Mcdevitt NT, Singh RK, Qian F
436 - 440	Aging of Photochemical Vapor-Deposited Silicon-Oxide Thin-Films Parada EG, Gonzalez P, Pou J, Serra J, Fernandez D, Leon B, Perezamor M
441 - 446	Strain-Measurements of Sigec Heteroepitaxial Layers on Si(001) Using Ion-Beam Analysis Sego S, Culbertson RJ, Smith DJ, Atzmon Z, Bair AE
447 - 452	Healing of Surface-Defects in Hard Materials by Thin Coatings Konyashin IY
453 - 461	Evaluation of the Dispersive Nature of Meshes Used for the Spherical-Aberration Correction of Electrostatic Lenses Kato M, Sekine T
462 - 464	Effects of Surface Oxide on the Rapid Thermal Nitridation of Si(001) Copel M, Tromp RM, Timme HJ, Penner K, Nakao T
465 - 470	Thermal-Stability of Silver in Ion-Exchanged Soda Lime Glasses Wang PW
471 - 473	Plasma-Enhanced Chemical-Vapor-Deposition of Thick Silicon-Nitride Films with Low-Stress on InP Shi L, Steenbergen CA, Devreede AH, Smit MK, Scholtes TL, Groen FH, Pedersen JW
474 - 477	Microwave Surfatron System for Plasma Processing Bardos L, Barankova H, Berg S
478 - 480	Particle Formation in the Remote Plasma-Enhanced Chemical-Vapor-Deposition of Si Films from Si2H6-Sif4-H-2 Kim DH, Rhee SW
481 - 484	Use of a Cu/Ag/Au Alloy as a Reference Material for the Calibration of X-Ray Photoelectron Spectrometers Strohmeier BR
485 - 486	A Novel Tilt Assembly for Ultrahigh-Vacuum Xyz-Rotary Manipulators Labanda JG, Barnett SA
489 - 489	Papers from the Dusty Plasmas - 95 Workshop on Generation, Transport, and Removal of Particles in Plasmas - Preface Carlile RN
490 - 495	Plasma Crystal Morfill GE, Thomas H
496 - 500	Wave-Propagation and Damping in Plasma Crystals Zuzic M, Thomas HM, Morfill GE
501 - 505	Solid-Liquid Gaseous-Phase Transitions in Plasma Crystals Thomas HM, Morfill GE
506 - 510	Coulomb Crystal-Formation from Growing Particles in a Plasma and the Analysis Hayashi Y, Tachibana K
511 - 518	Particle Simulation of 2-Dimensional Dust Crystal-Formation in a Mesothermal Plasma-Flow Melandso F, Goree J
519 - 524	Experimental Studies of 2-Dimensional and 3-Dimensional Structure in a Crystallized Dusty Plasma Pieper JB, Goree J, Quinn RA
525 - 528	Diagnostic of Dusty Plasma Conditions by the Observation of Mach Cones Caused by Dust Acoustic-Waves Havnes O, Li F, Melandso F, Aslaksen T, Hartquist TW, Morfill GE, Nitter T, Tsytovich V
529 - 534	Model for Ion-Induced Nucleation Based on Properties of Small Ionic Clusters Girshick SL, Rao NP, Kelkar M
535 - 539	Anionic Clusters in Dusty Hydrocarbon and Silane Plasmas Hollenstein C, Schwarzenbach W, Howling AA, Courteille C, Dorier JL, Sansonnens L
540 - 545	Growth-Processes of Particles in High-Frequency Silane Plasmas Watanabe Y, Shiratani M, Kawasaki H, Singh S, Fukuzawa T, Ueda Y, Ohkura H
546 - 549	In-Situ Infrared-Absorption Spectroscopy of Dusty Plasmas Kroesen GM, Denboer JH, Boufendi L, Vivet F, Khouli M, Bouchoule A, Dehoog FJ
550 - 555	Particle Formation Rates in Sulfur-Hexafluoride Plasma-Etching of Silicon Garrity MP, Peterson TW, Ohanlon JF
556 - 561	Dust Formation and Charging in an Ar/SiH4 Radiofrequency Discharge Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ
562 - 566	A Model for Transport and Agglomeration of Particles in Reactive Ion Etching Plasma Reactors Huang FY, Hwang HH, Kushner MJ
567 - 571	Production of Nanometric Particles in Radio-Frequency Glow-Discharges in Mixtures of Silane and Methane Bertran E, Costa J, Viera G, Zhang RQ
572 - 576	Electrical Characterization and Modeling of a Dust Forming Plasma in a Radio-Frequency Discharge Boufendi L, Bouchoule A, Hbid T
577 - 581	Synthesis of Silicon-Nitride Particles in Pulsed Radio-Frequency Plasmas Buss RJ, Babu SV
582 - 587	Particle-Beam Mass-Spectrometer Measurements of Particle Formation During Low-Pressure Chemical-Vapor-Deposition of Polysilicon and SiO2-Films Mcmurry PH, Nijhawan S, Rao N, Ziemann P, Kittelson DB, Campbell S
588 - 594	Detection of Dust Particles in the Plasma by Laser-Induced Heating Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ
595 - 602	In-Situ Characterization of the Transient-Behavior of Particles in Low-Pressure Plasmas Schmidt UI, Graves DB
603 - 607	In-Situ Polarization-Sensitive Laser-Light-Scattering Method for Simultaneous Measurements of 2-Dimensional Spatial Size and Density Distributions of Particles in Plasmas Shiratani M, Kawasaki H, Fukuzawa T, Watanabe Y
608 - 614	Dynamic Laser-Light Scattering Studies of Dusty Plasmas in the Gaseous-Electronics-Conference-Reference-Cell Anderson HM, Radovanov SB
615 - 618	Production and Control of K-C-60 Plasma for Material Processing Hirata T, Hatakeyama R, Mieno T, Sato N
619 - 623	The Dust Direct-Current Self-Bias Potential in a Time-Varying Plasma Sheath Melandso F, Nitter T, Aslaksen T, Havnes O
624 - 630	Stochastic Charge Fluctuations in Dusty Plasmas Matsoukas T, Russell M, Smith M
631 - 633	Ion-Dust Streaming Instability in Processing Plasmas Rosenberg M
634 - 638	Particle Trapping, Transport, and Charge in Capacitively and Inductively-Coupled Argon Plasmas in a Gaseous-Electronics-Conference-Reference-Cell Collins SM, Brown DA, Ohanlon JF, Carlile RN
639 - 643	Mapping of Radio-Frequency Plasma Potential Throughout a Particle Trapping Region Using an Emissive Probe Kang JW, Carlile RN, Ohanlon JF, Collins SM
644 - 648	Cooling by Dust in Levitation Experiments and Its Effect on Dust Cloud Equilibrium Profiles Brattli A, Havnes O
649 - 654	Particle Contamination Characterization in a Helicon Plasma-Etching Tool Selwyn GS, Bailey AD
655 - 659	Experimental-Evidence for Nanoparticle Deposition in Continuous Argon-Silane Plasmas - Effects of Silicon Nanoparticles on Film Properties Cabarrocas PR, Gay P, Hadjadj A
660 - 665	Massively-Parallel Simulations of Brownian Dynamics Particle-Transport in Low-Pressure Parallel-Plate Reactors Choi SJ, Rader DJ, Geller AS