Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.25, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (115 articles)

633 - 644	Beyond beta-C3N4-fullerene-like carbon nitride: A promising coating material Neidhardt J, Hultman L
645 - 650	CO-D2O coadlayers on Pt(111): Vibrational studies at low coverages Hu YH, Norton PR, Griffiths K
651 - 658	Effects of substrate bias and nitrogen flow ratio on the resistivity and crystal structure of reactively sputtered ZrNx films at elevated temperature Jeng JS, Wang SH, Chen JS
659 - 665	Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers Stafford L, Lim WT, Pearton SJ, Chicoine M, Gujrathi S, Schiettekatte F, Kravchenko II
666 - 674	Role of energy in low-temperature high-rate formation of hydrophilic TiO2 thin films using pulsed magnetron sputtering Musil J, Sicha J, Herman D, Cerstvy R
675 - 679	Influence of electron irradiation and heating on secondary electron yields from non-evaporable getter films observed with in situ x-ray photoelectron spectroscopy Nishiwaki M, Kato S
680 - 685	Atomic simulation of SiC etching by energetic SiF3 Gou F, Meng CL, Chen LZ, Qian Q
686 - 691	Thermally regulated valve for minute flows Nguyen H, Bejhed J, Kohler J, Thornell G
692 - 700	Fabrication of long-range surface plasmon-polariton waveguides in lithium niobate on silicon Mattiussi G, Lahoud N, Charbonneau R, Berini P
701 - 705	Characterizations of InN films on Si(111) substrate grown by metal-organic chemical vapor deposition with a predeposited In layer and a two-step growth method Chang KJ, Chang JY, Chen MC, Lahn SM, Kao CJ, Li ZY, Uen WY, Chi GC
706 - 710	Sheet resistance and crystallinity of Ga- and Al-implanted zinc oxide thin films with postannealing Matsuda T, Furuta M, Hiramatsu T, Furuta H, Hirao T
711 - 720	Oxidation of arc-evaporated Al1-xCrxN coatings Reiter AE, Mitterer C, Sartory B
721 - 725	Effect of ambient pressure and nickel contamination on the dimer-dangling-bond surface state of Si(001)2 X 1 Kolditz B, Roos KR
726 - 730	Production of energetic ions in plasma by ambipolar fields: Application to etching Park W, Tolmachev YN, Volynets VN, Pashkovskiy VG
731 - 735	Resonances in electron stimulated desorption yield of cesium atoms from germanium monolayer-covered tungsten Ageev VN, Kuznetsov YA, Madey TE
736 - 745	Hydrogen and thermal deoxidations of InSb and GaSb substrates for molecular beam epitaxial growth Weiss E, Klin O, Grossman S, Greenberg S, Klipstein PC, Akhvlediani R, Tessler R, Edrei R, Hoffman A
746 - 750	Removal of carbon deposits in narrow gaps by oxygen plasmas at low pressure Ferreira JA, Tabares FL, Tafalla D
751 - 757	Microarea analysis of iron and phosphorus by resonance photoionization sputtered neutral mass spectrometry Shichi H, Osabe S, Sugaya M, Kanehori K, Kakibayashi H, Mitsui Y
758 - 762	Efficient numerical solution of the Clausing problem Mohan A, Tompson RV, Loyalka SK
763 - 768	Investigation of vacuum system requirements for a 5 km baseline gravitational-wave detector Sunil S, Blair DG
769 - 774	Improved understanding of an electron beam charge compensation method for magnetic sector secondary ion mass spectrometer analysis of insulators Zhu Z, Gu C, Stevie FA, Griffis DP
775 - 780	Investigation of atomic-layer-deposited ruthenium nanocrystal growth on SiO2 and Al2O3 films Zhang M, Chen W, Ding SJ, Wang XP, Zhang DW, Wang LK
781 - 790	Performance and analysis of an electron cyclotron resonance plasma cathode Hidaka Y, Foster JE, Getty WD, Gilgenbach RM, Lau YY
791 - 801	Vacuum systems for the ILC helical undulator Malyshev OB, Scott DJ, Bailey IR, Barber DP, Baynham E, Bradshaw T, Brummitt A, Carr S, Clarke JA, Cooke P, Dainton JB, Ivanyushenkov Y, Malysheva LI, Moortgat-Pick GA, Rochford J
802 - 811	Impact of etching kinetics on the roughening of thermal SiO2 and low-k dielectric coral films in fluorocarbon plasmas Yin YP, Sawin HH
812 - 815	Sublimation behavior of SiO2 from low- and high-index silicon surfaces Moore JC, Skrobiszewski JL, Baski AA
816 - 823	TM01-mode microwave propagation property analysis for plasmas with disk-plate windows by a finite-difference time-domain method Okamura Y, Yamamoto Y, Fujita K, Miyoshi T, Teramoto K, Kawaguchi H, Kagami S, Furukawa M
824 - 830	Determination of the sticking probability of a Zr-V-Fe nonevaporable getter strip Day C, Luo X, Conte A, Bonucci A, Manini P
831 - 836	Influence of the normalized ion flux on the constitution of alumina films deposited by plasma-assisted chemical vapor deposition Kurapov D, Reiss J, Trinh DH, Hultman L, Schneider JM
837 - 842	Effects of bias on surface properties of TiN films fabricated by hollow cathode discharge Jiang HF, Tian XB, Yang SQ, Fu RKY, Chu PK
843 - 849	Oxygen plasma treatment and deposition of CNx on a fluorinated polymer matrix composite for improved erosion resistance Muratore C, Korenyi-Both A, Bultman JE, Waite AR, Jones JG, Storage TM, Voevodin AA
850 - 856	Molecular beam epitaxy growth of the dilute nitride GaAs1-xNx with a helical resonator plasma source Zangenberg N, Beaton DA, Tiedje T, Tixier S, Adamcyk M, Kumaran R, MacKenzie JA, Nodwell E, Young EC, Sproule G
857 - 861	a-plane MgxZn1-xO films deposited on r-sapphire and its surface acoustic wave characteristics Chen Y, Saraf G, Lu YC, Wielunski LS, Siegrist T
864 - 864	Papers from the 53rd international symposium of AVS - Preface Lucovsky G
866 - 871	Surface and depth profile investigation of a phosphorylcholine-based contact lens using time of flight secondary ion mass spectrometry Braun RM, Ingham SJ, Harmon PS, Hook DJ
872 - 877	Interfacial interactions of poly(ether ketone ketone) polymer coatings, onto oxide-free phosphate films on an aluminum surface Asunskis AL, Sherwood PMA
878 - 885	Application of multivariate statistical analysis methods for improved time-of-flight secondary ion mass spectrometry depth profiling of buried interfaces and particulate Lloyd KG
886 - 892	Fundamental study of erucamide used as a slip agent Chen J, Li J, Hu T, Walther B
893 - 902	Surface potential measurement of human hair using Kelvin probe microscopy Lodge RA, Bhushan B
903 - 907	Large-area pulsed-laser deposition of dielectric and ferroelectric thin films Sakai S, Takahashi M, Motohashi K, Yamaguchi Y, Yui N, Kobayashi T
908 - 911	Ordered Au(111) layers on Si(111) Silva A, Pedersen K, Diekhoner L, Morgen P, Li ZS
912 - 916	Study of photocatalytic activity of TiO2 thin films prepared in various Ar/O-2 ratio and sputtering gas pressure Biswas S, Prabakar K, Takahashi T, Nakashima T, Kubota Y, Fujishima A
917 - 921	Review on electron stimulated surface chemical reaction mechanism for phosphor degradation Swart HC, Terblans JJ, Coetsee E, Ntwaeaborwa OM, Dhlamini MS, Nieuwoudt S, Holloway PH
922 - 926	Synthesis and characterization of erbia doped metal oxide nanofibers for applications in thermophotovoltaics Bender ET, Wang R, Aljarrah MT, Evans EA, Ramsier RD
927 - 931	Synthesis and characterization of nanoscale Al-Si-O gradient membranes Trouillet V, TroBe H, Bruns M, Nold E, White RG
932 - 937	Effect of cross-linking ultrahigh molecular weight polyethylene: Surface molecular orientation and wear characteristics Sambasivan S, Fischer DA, Hsu SM
938 - 942	Surface characterization of plasma-polymerized cyclohexane thin film Choi CR, Yeo SH, Shon HK, Kim JW, Moon DW, Jung DG, Lee TG
943 - 949	Interface bonding, chemical reactions, and defect formation at metal-semiconductor interfaces Brillson LJ
950 - 954	Varying the Schottky barrier of thin film Mg/H : p-Si(111) contacts: Properties and applications Nienhaus H, Krix D, Glass S
955 - 960	Transparent conducting zinc oxide thin films doped with aluminum and molybdenum Duenow JN, Gessert TA, Wood DM, Barnes TM, Young M, To B, Coutts TJ
961 - 966	Optimized reactive ion etch process for high performance SiC bipolar junction transistors Goulakov AB, Zhao F, Perez-Wurfl I, Torvik JT, Van Zeghbroeck B
967 - 970	Carrier concentration and surface electron accumulation in indium nitride layers grown by high pressure chemical vapor deposition Bhatta RP, Thoms BD, Weerasekera A, Perera AGU, Alevli M, Dietz N
971 - 975	Micro-optical switch device based on semiconductor-to-metallic phase transition characteristics of W-doped VO2 smart coatings Soltani M, Chaker M, Haddad E, Kruzelecky R, Margot J
976 - 979	Implantation damage study in ferromagnetic Mn-implanted Si Awo-Affouda C, Bolduc M, LaBella VP
980 - 985	Effect of additive gases and injection methods on chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F-2 remote plasmas Yun YB, Park SM, Kim DJ, Lee NE, Kim KS, Bae GH
986 - 989	Etch induced sidewall damage evaluation in porous low-k methyl silsesquioxane films Kong B, Choi T, Sirard S, Kim DJ, Lee NE
990 - 995	Effects of additive C4F8 during inductively coupled BCl3/C4F8/Ar plasma etching of TaN and HfO2 for gate stack patterning Ko JH, Kim DY, Park MS, Lee NE, Lee SS, Ahn J, Mok H
996 - 998	Chemical structure of the bilayer Ag/Li2O cathode interface in organic light emitting diodes Joo MH, Baik MK, Choi JK, Park KH, Lee JM, Sung CJ, Kim MS, Yang JH, Kim ST
999 - 1002	Electrical properties of organic light-emitting diodes by indium tin oxide chemical-mechanical polishing process Choi GW, Seo YJ, Lee KY, Lee WS
1003 - 1012	Optimization of biomimetic attachment system contacting with a rough surface Kim TW, Bhushan B
1013 - 1018	Virtual integrated processing for integrated circuit manufacturing Chalupa R, Jiang L, Simka H, Shankar S, Thakurta D
1019 - 1024	Electrochemical planarization of copper surfaces with submicron features Chalupa R, Andryushchenko T, Han J, Ghosh T, Shankar S, Fischer P
1025 - 1028	Glass nanoimprint using amorphous Ni-P mold etched by focused-ion beam Mekaru H, Kitadani T, Yamashita M, Takahashi M
1029 - 1033	Annealing effect on structural, morphological, and optical properties of reactive sputtered WO3 films for mediated heterogeneous photocatalyst Prabakar K, Takahashi T, Takahashi K, Nezuka T, Nakashima T, Kubota Y, Fujishima A
1034 - 1037	Controlled chemical mechanical polishing of polysilicon and silicon dioxide for single-electron device Joshi V, Orlov AO, Snider GL
1038 - 1041	Synthesis of In2O3 nanocrystal chains and annealing effect on their optical properties Ko TS, Chu CP, Chen JR, Chang YA, Lu TC, Kuo HC, Wang SC
1042 - 1047	Topographical studies of nanoscale secondary structure of electrochemical anodized aluminum surface Kato H, Sugiyama T, Takemura S, Watanabe Y, Takarai Y, Ishii A, Kimura S, Okumura T, Kobayakawa D, Hiramatsu T, Nanba N, Nishikawa O, Taniguchi M
1048 - 1051	Tuning metal surface diffusion on diblock copolymer films Darling SB, Hoffmann A
1052 - 1055	Room temperature crystallization of indium tin oxide films on glass and polyethylene terephthalate substrates using rf plasma Ohsaki H, Suzuki M, Shibayama Y, Kinbara A, Watanabe T
1056 - 1061	Low energy N-2 ion bombardment for removal of (HfO2)(x)(SiON)(1-x) in dilute HF Hwang WS, Cho BJ, Chan DSH, Yoo WJ
1062 - 1067	Control of atomic layer degradation on Si substrate Nakamura Y, Tatsumi T, Kobayashi S, Kugimiya K, Harano T, Ando A, Kawase T, Hamaguchi S, Iseda S
1068 - 1072	Impact of plasma damage on cobalt silicidation Kimura T, Kugimiya K, Ohchi T, Fuke K, Kataoka T, Tatsumi T, Kamide Y
1073 - 1077	Formation of silicon nitride nanopillars in dual-frequency capacitively coupled plasma and their application to Si nanopillar etching Park CK, Kim HT, Kim DY, Lee NE
1078 - 1083	Study of SiOxNy as a bottom antireflective coating and its pattern transferring capability Peng X, Wang Z, Dimitrov D, Boonstra T, Xue S
1084 - 1092	Chemical modification of the poly(vinylidene fluoride-trifluoroethylene) copolymer surface through fluorocarbon ion beam deposition Hsu WD, Jang I, Sinnott SB
1093 - 1097	Characterization of thin-film deposition in a pulsed acrylic acid polymerizing discharge Voronin SA, Bradley JW, Fotea C, Zelzer M, Alexander MR
1098 - 1102	Morphological evolution of Al whiskers grown by high temperature glancing angle deposition Suzuki M, Nagai K, Kinoshita S, Nakajima K, Kimura K, Okano T, Sasakawa K
1103 - 1107	Ti-Al-Si-N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets Miyamura A, Yamaguchi M, Hattori K, Sato Y, Nakamura S, Shigesato Y
1108 - 1117	Plasma polymerized thin films of maleic anhydride and 1,2-methylenedioxybenzene for improving adhesion to carbon surfaces Drews J, Goutianos S, Kingshott P, Hvilsted S, Rozlosnik N, Almdal K, Sorensen BF
1118 - 1122	Fabrication of structurally chiral SC2O3 films and observation of Bragg resonance at deep UV wavelengths De Silvaa L, Hodgkinson I
1123 - 1127	Multiply charged Al recoils with impact of 2.0 keV Si+ ions Chen X, Sroubek Z, Yarmoff JA
1128 - 1132	Characterization of orientation-selective-epitaxial CeO2 layers on Si(100) substrates by x-ray diffraction and cross-sectional transmission electron microscopy Inoue T, Nakata Y, Shida S, Kato K
1133 - 1136	K ion scattering from Au nanoclusters on TiO2(110) Liu GF, Karmakar P, Yarmoff JA
1137 - 1142	Surface modification of SKD-61 steel by ion implantation technique Wen FL, Lo YL, Yu YC
1143 - 1146	Reaction properties of NO and CO over an Ir(211) surface Nakamura I, Suzuki K, Takahashi A, Haneda M, Hamada H, Fujitani T
1147 - 1151	X-ray photoemission spectroscopy and Fourier transform infrared studies of electrochemical doping of copper phthalocyanine molecule in conducting polymer Kato H, Takemura S, Watanabe Y, Ishii A, Tsuchida I, Akai Y, Sugiyama T, Hiramatsu T, Nanba N, Nishikawa O, Taniguchi M
1152 - 1155	Cathodoluminescence degradation Of SiO2 : Ce,Tb powder phosphors prepared by a sol-gel process Ntwaeaborwa OM, Swart HC, Kroon RE, Botha JR, Holloway PH
1156 - 1160	Chemical interaction of H and D atoms with Ag/H : p-Si(111) thin film diodes Krix D, Nunthel R, Nienhaus H
1161 - 1165	Gate dielectric development for flexible electronics Joshi PC, Voutsas AT, Hartzell JW
1166 - 1171	Structure and chemical properties of molybdenum oxide thin films Ramana CV, Atuchin VV, Pokrovsky LD, Becker U, Julien CM
1172 - 1177	Transparent conducting Al-doped ZnO thin films prepared by magnetron sputtering with dc and rf powers applied in combination Minami T, Ohtani Y, Miyata T, Kuboi T
1178 - 1183	Effect of electrical properties on thermal diffusivity of amorphous indium zinc oxide films Ashida T, Miyamura A, Sato Y, Yagi T, Taketoshi N, Baba T, Shigesato Y
1184 - 1187	Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms Grachev SY, Kamminga JD, Janssen GCAM, Smy T, Tichelaar FD
1188 - 1192	Preparation and photocatalytic activity of TiOxNy/CdS heterojunctions Prabakar K, Takahashi T, Nezuka T, Takahashi K, Nakashima T, Kubota Y, Fujishima A
1193 - 1197	Preparation of transparent conducting B-doped ZnO films by vacuum arc plasma evaporation Miyata T, Honma Y, Minami T
1198 - 1202	Optimization of the microcrystalline silicon deposition efficiency Strahm B, Howling AA, Sansonnens L, Hollenstein C
1203 - 1207	B-doped be coatings for NIF target development Xu H, Moreno KA, Youngblood KP, Nikroo A, Hackenberg RE, Cooley JC, Alford CS, Letts SA
1208 - 1213	Growth and electrochemical properties of Li-Ni-Co-Al oxide films Ramana CV, Zaghib K, Julien CM
1214 - 1218	Tilted fiber texture in aluminum nitride thin films Deniz D, Harper JME, Hoehn JW, Chen F
1219 - 1225	Surface modification of porous nanocrystalline TiO2 films for dye-sensitized solar cell application by various gas plasmas Kim YS, Yoon CH, Kim KJ, Lee YH
1226 - 1230	Cathodoluminescence degradation of Y2SiO5 : Ce thin films Coetsee E, Swart HC, Terblans JJ
1231 - 1233	Soft-x-ray spectroscopy experiment of liquids Guo J, Tong T, Svec L, Go J, Dong C, Chiou JW
1234 - 1239	Use of getter-catalyst thin films for enhancing ion pump vacuum performances Mura M, Paolini C
1240 - 1245	Sensitivity factor of the axial-symmetric transmission gauge: Deviation and long-term variation Takahashi N, Tuzi Y
1246 - 1250	Quartz friction gauge for monitoring the concentration and viscosity of NaturalHy mixtures Kobayashi Y, Kurokawa A
1251 - 1255	Photon stimulated desorption from copper and aluminum chambers Gomez-Goni J
1256 - 1260	Benjamin Franklin and electrophotography Schein LB
1261 - 1266	Process-dependent electronic states at Mo/hafnium oxide/Si interfaces Walsh S, Fang L, Schaeffer JK, Brillson LJ
1267 - 1274	Velocity dependence and rest time effect on nanoscale friction of ultrathin films at high sliding velocities Tao Z, Bhushan B
1275 - 1284	Adhesion properties of polymer/silicon interfaces for biological micro-/nanoelectromechanical systems applications Palacio M, Bhushan B, Ferrell N, Hansford D
1285 - 1293	Nanotribological characterization of vapor phase deposited fluorosilane self-assembled monolayers deposited on polydimethylsiloxane surfaces for biomedical micro-/nanodevices Bhushan B, Cichomski M
1294 - 1297	Patterning of high density magnetic nanodot arrays by nanoimprint lithography Hu W, Wilson RJ, Xu L, Han SJ, Wang SX
1298 - 1301	Optimizing the dielectric performance of TiO2 thin films through control of plasma-enhanced chemical vapor deposition process conditions Yang WL, Monson A, Marino J, Wolden CA
1302 - 1308	Atomic layer deposition of hafnium silicate gate dielectric layers Delabie A, Pourtois G, Caymax M, De Gendt S, Ragnarsson LA, Heyns M, Fedorenko Y, Swerts J, Maes JW
1309 - 1311	Reducing SS 304/316 hydrogen outgassing to 2 x 10(-15) torr I/cm(2)S Sasaki YT