Thin Solid Films

Thin Solid Films, Vol.455-56 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (153 articles)

1 - 2	3rd International Conference on Spectroscopic Ellipsometry, 2003 -Preface Fried M, Hingerl K, Humlicek J
3 - 13	Expanding horizons: new developments in ellipsometry and polarimetry Aspnes DE
14 - 23	Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle Chen C, An I, Ferreira GM, Podraza NJ, Zapien JA, Collins RW
24 - 32	Spectroscopic ellipsometry using the grating division-of-amplitude photopolarimeter (G-DOAP) Krishnan S, Hampton S, Azzam RMA
33 - 38	Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single system Mori T, Aspnes DE
39 - 42	Generalized magneto-optical ellipsometry in ferromagnetic metals Neuber G, Rauer R, Kunze J, Backstrom J, Rubhausen M
43 - 49	Mueller matrix spectroscopic ellipsometry: formulation and application Laskarakis A, Logothetidis S, Pavlopoulou E, Gioti A
50 - 53	Optical anisotropy relevant to rotating-compensator polarimeters: application to the monoplate retarder Asar M, Aspnes DE
54 - 60	Prism spectroscopic ellipsometer Azzam RMA, Sudradjat FF, Uddin MN
61 - 65	Accurate calibration and optimized measurement: use of an achromatic compensator in rotating polarizer spectroscopic ellipsometry Broch L, Naciri AE, Johann L
66 - 71	Precision in ellipsometrically determined sample parameters: simulation and experiment Johs B, Herzinger CM
72 - 77	Precision auto-alignment for incident angle of an ellipsometer using specimen stage Park S, Gweon DG, Kim YD
78 - 83	In situ calibration technique for photoelastic modulator in ellipsometry Wang MW, Tsai FH, Chao YF
84 - 89	New design of a spectroscopic ellipsometer by using a spectrometer with multiple gratings and a two-dimensional CCD array detector You HY, Jia JH, Chen JK, Han T, Ni WM, Wang SY, Li J, Zhang RJ, Yang YM, Chen LY, Lynch DW
90 - 94	Photo-interferometric spectroscopic ellipsometry Martinez-Anton JC, Esteban O
95 - 100	Evaluation of ellipsometric measurements using complex strategies Polgar O, Fried M, Lohner T, Barsony I
101 - 105	Error function for interpretations of ellipsometric measurements Polovinkin VG
106 - 111	Application of spectral and temporal weighted error functions for data analysis in real-time spectroscopic ellipsometry Zapien JA, Ferlauto AS, Collins RW
112 - 119	General methods for optimized design and calibration of Mueller polarimeters De Martino A, Garcia-Caurel E, Laude B, Drevillon B
120 - 123	Spectroscopic Mueller polarimeter based on liquid crystal devices Garcia-Caurel E, De Martino A, Drevillon B
124 - 131	Optical properties of anisotropic materials: an experimental approach Alonso MI, Garriga M
132 - 137	Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer An I, Zapien JA, Chen C, Ferlauto AS, Lawrence AS, Collins RW
138 - 142	Development and test of a new grating-polarimeter and its application in ellipsometric measurements Masetti E, Krasilnikova A
143 - 149	Far-infrared ellipsometry using a synchrotron light source - the dielectric response of the cuprate high T-c superconductors Bernhard C, Humlicek J, Keimer B
150 - 156	Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI Defranoux C, Emeraud T, Bourtault S, Venturini J, Boher P, Hernandez M, Laviron C, Noguchi I
157 - 160	Optical purity evaluation of the noble metal by the ellipsometric method Zhou P, Wang SY, Li J, Zhang RJ, You HY, Shen ZC, Chen LY
161 - 166	Infrared dielectric functions and crystal orientation of a-plane ZnO thin films on r-plane sapphire determined by generalized ellipsometry Bundesmann C, Ashkenov N, Schubert M, Rahm A, Wenckstern HV, Kaidashev EM, Lorenz M, Grundmann M
167 - 171	FTIR phase-modulated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nanoparticles Canillas A, Pinyol A, Sancho-Parramon J, Ferre-Borrull J, Bertran E
172 - 176	Infrared study of YBa2Cu3O7/La0.67Ca0.33MnO3 superlattices Dubroka A, Cristiani G, Habermeier HU, Humlicek J
177 - 182	Diffraction effects in infrared ellipsometry of conducting samples Humlicek J, Bernhard C
183 - 186	Infrared ellipsometry of SiC/Si heterostructures with Ge modified interfaces Zgheib C, Forster C, Weih R, Cimalla V, Kazan M, Masri R, Ambacher O, Pezoldt J
187 - 195	Optical properties of silicon carbide polytypes below and around bandgap Kildemo M
196 - 200	Simultaneous determination of bulk isotropic and surface-induced anisotropic complex dielectric functions of semiconductors from high speed Mueller matrix ellipsometry Chen C, An I, Collins RW
201 - 206	Optical characterization of aluminum-doped zinc oxide films by advanced dispersion theories Pflug A, Sittinger V, Ruske F, Szyszka B, Dittmar G
207 - 212	Fine art painting characterization by spectroscopic ellipsometry: preliminary measurements on varnish layers Christofides C, Castellon B, Othonos A, Polikreti K, de Deyne C
213 - 216	Optical properties study of MgB2 Chvostova D, Zelezny V, Pajasova L, Tarasenko A, Plecenik A, Kus P, Satrapinsky L
217 - 221	Optical constants and interband transitions of Ge1-xSnx alloys (x < 0.2) grown on Si by UHV-CVD Cook CS, Zollner S, Bauer MR, Aella P, Kouvetakis J, Menendez J
222 - 227	Parametric modeling of the dielectric functions of Cd1-xMgxTe alloy films Ihn YS, Kim TJ, Ghong TH, Kim YD, Aspnes DE, Kossut J
228 - 230	Optical properties of ZnSe and Zn0.87Mn0.13Se epilayers determined by spectroscopic ellipsometry Kvietkova J, Daniel B, Hetterich M, Schubert M, Spemann D
231 - 234	Hydrogen implantation in InGaNAs studied by spectroscopic ellipsometry Leibiger G, Gottschalch V, Razek N, Schindler A, Schubert M
235 - 238	Infrared to vacuum ultraviolet optical properties of 3C, 4H, and 6H silicon carbide measured by spectroscopic ellipsometry Lindquist OPA, Schubert M, Arwin H, Jarrendahl K
239 - 243	Ion implantation-caused damage in SiC measured by spectroscopic ellipsometry Petrik P, Shaaban ER, Lohner T, Battistig G, Fried M, Lopez JG, Morilla Y, Polgar O, Gyulai J
244 - 247	Phase-modulated spectroscopic ellipsometry and polarized transmission intensity studies of wide-gap biaxial CaGa2S4 Shim YG, Mamedov N, Yamamoto N
248 - 255	Optical properties of bulk c-ZrO2, c-MgO and a-AS(2)S(3) determined by variable angle spectroscopic ellipsometry Synowicki RA, Tiwald TE
256 - 260	IR ellipsometry and photoluminescence investigations of Zn1-xBexSe and Zn1-x-yBexMnySe mixed crystals Wronkowska AA, Bejtka K, Arwin H, Wronkowski A, Firszt E, Legowski S, Meczynska H, Marasek A
261 - 265	Gate oxide metrology and silicon piezooptics Zollner S, Liu R, Volinsky AA, White T, Nguyen BY, Cook CS
266 - 271	Structure analysis of organic films by mid-infrared ellipsometry Hinrichs K, Roseler A, Gensch M, Korte EH
272 - 277	Infrared spectroscopic ellipsometry study of molecular orientation induced anisotropy in polymer substrates Bungay C, Tiwald TE
278 - 282	Temperature dependence of ellipsometric spectra of poly (methyl-phenylsilane) Zrzavecka OB, Nebojsa A, Navratil K, Nespurek S, Humlicek J
283 - 287	IR-FUV ellipsometry studies on the optical, electronic and vibrational properties of polymeric membranes Gioti M, Laskarakis A, Logothetidis S
288 - 291	Envelope analysis in spectroscopic ellipsometry of thin films. Application to a weakly-absorbing polymer film Martinez-Anton JC, Gomez-Pedrero JA, Alvarez-Herrero A
292 - 294	Swelling of a thin B+ implanted polyimide layer - a dynamic spectroscopic ellipsometry study Eichhorn K, Sabre K, Gunther M, Suchaneck G, Gerlach G
295 - 300	Infrared ellipsometry characterization of conducting thin organic films Schubert M, Bundesmann C, Jakopic G, Maresch H, Arwin H, Persson NC, Zhang F, Inganas O
301 - 312	Relationships among surface processing at the nanometer scale, nanostructure and optical properties of thin oxide films Losurdo M
313 - 317	Correlations between the microstructure of Ag-Si3N4 multilayers and their optical properties Girardeau T, Camelio S, Babonneau D, Toudert J, Barranco A
318 - 322	Characterization of interfacial layer of ultrathin Zr silicate on Si(100) using spectroscopic ellipsometry and HRTEM Ahn H, Chen HW, Landheer D, Wu X, Chou LJ, Chao TS
323 - 334	Ellipsometric characterisation of heterogeneous 2D layers Wormeester H, Kooij ES, Mewe A, Rekveld S, Poelsema B
335 - 338	Dielectric function of Si nanocrystals embedded in SiO2 Gallas B, Kao CC, Defranoux C, Fisson S, Vuye G, Rivory J
339 - 343	Spectroscopic ellipsometry of carbon nanotube formation in SiC surface decomposition Matsumoto K, Maeda H, Kawaguchi Y, Takahashi K, Aoyama M, Yamaguchi T, Postava K
344 - 348	Depth distribution of disorder and cavities in high dose helium implanted silicon characterized by spectroscopic ellipsometry Petrik P, Cayrel F, Fried M, Polgar O, Lohner I, Vincent L, Alquier D, Gyulai J
349 - 355	The simultaneous determination of n, k, and t from polarimetric data Flock K
356 - 360	Water adsorption in porous TiO2-SiO2 sol-gel films analyzed by spectroscopic ellipsometry Alvarez-Herrero A, Ramos G, del Monte E, Bernabeu E, Levy D
361 - 365	Determination of refractive index of printed and unprinted paper using spectroscopic ellipsometry Bakker JW, Bryntse G, Arwin H
366 - 369	Description of the porosity of inhomogeneous porous low-k films using solvent adsorption studied by spectroscopic ellipsometry in the visible range Bourgeois A, Bruneau AB, Jousseaume V, Rochat N, Fisson S, Demarets B, Rivory J
370 - 375	Visible and infrared ellipsometry applied to the study of metal-containing diamond-like carbon coatings Corbella C, Pascual E, Canillas A, Bertran E, Andujar JL
376 - 379	Application of in-situ ellipsometry to the fabrication of multi-layer optical coatings with sub-nanometre accuracy Dligatch S, Netterfield RP, Martin B
380 - 383	Complete wetting transition at the fluid-vapour interface of Ga-Bi studied by spectroscopic ellipsometry Dogel S, Nattland D, Freyland W
384 - 387	Spectroscopic ellipsometry characterization of ZnO-In(2)O3 systems El Rhaleb H, Naciri AE, Dounia R, Johann L, Hakam A, Addou M
388 - 392	Analytical model for optical functions of amorphous semiconductors and its implications for thin film solar cells Ferlauto AS, Ferreira GM, Pearce JM, Wronski CR, Collins RW, Deng X, Ganguly G
393 - 398	Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry Franta D, Ohlidal I, Bursikova V, Zajickova L
399 - 403	Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry Franta D, Ohlidal I, Klapetek P, Cabarrocas PRI
404 - 409	Dose-dependence of ion implantation-caused damage in silicon measured by ellipsometry and backscattering spectrometry Fried A, Petrik P, Lohner T, Khanh NQ, Polgar O, Gyulai J
410 - 416	Characterisation of porous silicon composite material by spectroscopic ellipsometry Gaillet M, Guendouz M, Ben Salah M, Le Jeune B, Le Brun G
417 - 421	Spectroellipsometric characterization of sol-gel TiO2-CuO thin coatings Gartner M, Scurtu R, Ghita A, Zaharescu M, Modreanu M, Trapalis C, Kokkoris M, Kordas G
422 - 428	Ex situ spectroscopic ellipsometry investigations of chemical vapor deposited nanocomposite carbon thin films Gupta S, Weiner BR, Morell G
429 - 432	Optical and magnetooptical properties of bismuth and gallium substituted iron garnet films Hansteen F, Helseth LE, Johansen TH, Hunderi O, Kirilyuk A, Rasing T
433 - 437	Contributions to the static dielectric constant of low-k xerogel films derived from ellipsometry and IR spectroscopy Himcinschi C, Friedrich M, Fruhauf S, Schulz SE, Gessner T, Zahn DRT
438 - 442	Study of structure and optical properties of silver oxide films by ellipsometry, XRD and XPS methods Gao XY, Wang SY, Li J, Zheng YX, Zhang RJ, Zhou P, Yang YM, Chen LY
443 - 449	Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurements Pribil GK, Johs B, Ianno NJ
450 - 452	Mn1-xFex alloy films studied by optical and magneto-optical spectroscopies Kim JB, Park SY, Lee YP, Kudryavtsev YV, Gontarz R, Szymanski B
453 - 456	Effect of ion irradiation on the optical properties and room temperature oxidation of copper surface Poperenko LV, Shaaban ER, Khanh NQ, Stashchuk VS, Vinnichenko MV, Yurgelevich IV, Nosach DV, Lohner T
457 - 461	Spectroscopic ellipsometry characterization of interface reactivity in GaAs-based superlattices Losurdo M, Giuva D, Giangregorio MM, Bruno G, Brown AS
462 - 467	The finite difference time domain method as a numerical tool for studying the polarization optical response of rough surfaces Lehner B, Hingerl K
468 - 472	Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films Masetti E, Bulir J, Gagliardi S, Janicki V, Krasilnikova A, Di Santo G, Coluzza C
473 - 477	Spectroscopic ellipsometry of TaNx and VN films Mistrik J, Takahashi K, Antos R, Aoyama M, Yamaguchi I, Anma Y, Fukuda Y, Takeyama MB, Noya A, Jiang ZT, Thurgate SM, Riessen GV
478 - 481	Spectroscopic ellipsometry of pulsed laser irradiated c-Ge surfaces Mistrik J, Antos R, Murakami K, Aoyama M, Yamaguchi T, Anma Y, Fukuda Y, Medvid A, Michko A
482 - 485	Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1-xCx : H after ultraviolet treatment in an Argon ambient Myong SY, Kim SS, Lim KS
486 - 490	Correlation between silicon nanocrystalline size effect and spectroscopic ellipsometry responses Naciri AE, Mansour A, Johann L, Grob JJ, Eckert C
491 - 494	Ellipsometry characterization of oxidized copper layers for chemical mechanical polishing process Nishizawa H, Tateyama Y, Saitoh T
495 - 499	Optical characterization of ferroelectric strontium-bismuth-tantalate (SBT) thin films Schmidt C, Petrik P, Schneider C, Fried M, Lohner T, Barsony I, Gyulai J, Ryssel H
500 - 504	UV-VUV spectroscopic ellipsometry of ternary MgxZn1-xO (0 <= x <= 0.53) thin films Schmidt-Grund R, Schubert M, Rheinlander B, Fritsch D, Schmidt H, Kaidashev EM, Lorenz M, Herzinger CM, Grundmann M
505 - 508	Vacuum ultraviolet spectroscopic ellipsometry investigations of guanine layers on H-passivated Si(111) surfaces Silaghi SD, Friedrich M, Scholz R, Kampen TU, Cobet C, Esser N, Richter W, Braun W, Zahn DRT
509 - 512	Spectroellipsometric study of the sol-gel nanocrystalline ITO multilayer films Stoica TF, Gartner M, Losurdo M, Teodorescu V, Blanchin M, Stoica T, Zaharescu M
513 - 518	Photopolarimetric investigations of liquid crystals-electrochromic oxides interface Strangi G, Versace C, Scaramuzza N, Cazzanelli E, Bruno V, Vena C, D'Elia S, Bartolino R
519 - 524	Spectroscopic ellipsometry (SE) and grazing X-ray reflectometry (GXR) analyses on tungsten carbide films for diffusion barrier in copper metallization schemes Sun LC, Fouere JC, Sammet T, Hatzistergos M, Efstathiadis H
525 - 529	Spectroscopic ellipsometry study on e-beam deposited titanium dioxide films Sun LC, Hou P
530 - 534	Spectroscopic ellipsometry investigation of amorphous carbon films with different sp(3) content: relation with protein adsorption Vinnichenko M, Gago R, Huang N, Leng YX, Sun H, Kreissig U, Kulish MP, Maitz MF
535 - 539	The ideal vehicle for optical model development: porous silicon multilayers Volk J, Fried M, Toth AL, Barsony I
540 - 544	Spectroscopic ellipsometry study of focused ion beam induced GaAs surface modification Basnar B, Lugstein A, Bertagnolli E, Gornik E
545 - 550	Ellipsometric analysis of gamma radiation effects on standard optical coatings used in aerospace applications Fernandez-Rodriguez M, Ramos G, del Monte E, Levy D, Alvarado CG, Nunez A, Alvarez-Herrero A
551 - 556	Determination of the anisotropic dielectric function for metal free phthalocyanine thin films Gordan OD, Friedrich M, Zahn DRT
557 - 562	Investigation of optical anisotropy of Langmuir-Blodgett films of long-chain acetylenic acids Badmaeva IA, Nenasheva LA, Polovinkin VG, Repinsky SM, Sveshnikova LL
563 - 570	Far-infrared magnetooptic generalized ellipsometry: determination of free-charge-carrier parameters in semiconductor thin film structures Schubert M, Hofmann T, Herzinger CM
571 - 575	Analysis of the optical properties and structure of sculptured thin films from spectroscopic Mueller matrix ellipsometry Podraza NJ, Chen C, An I, Ferreira GM, Rovira PI, Messier R, Collins RW
576 - 580	Anisotropic optical functions of pentaerythrytol, an uniaxial organic crystal Sassella A, Wagner T, Herzinger C, Su GB, He YP, Chen CJ
581 - 585	Generalized ellipsometry for the characterization of anisotropic materials: influence of the sample adjustment on the extracted optical indices Boher P, Piel JP, Sacepe B
586 - 590	VASE and IR spectroscopy: excellent tools to study biaxial organic molecular thin films: DiMe-PTCDI on S-passivated GaAs(100) Friedrich M, Himcinschi C, Salvan G, Anghel M, Paraian A, Wagner T, Kampen TU, Zahn DRT
591 - 595	Mueller-matrix characterization of liquid crystals Hilfiker JN, Herzinger CM, Wagner T, Marino A, Delgais G, Abbate G
596 - 600	Generalized spectroscopic ellipsometry and Mueller-matrix study of twisted nematic and super twisted nematic liquid crystals Hilfiker JN, Johs B, Herzinger CM, Elman JF, Montbach E, Bryant D, Bos PJ
601 - 604	Far-infrared dielectric function and phonon modes of spontaneously ordered (AlxGa1-x)(0.52)ln(0.48)P Hofmann T, Schuberta M, Gottschalch V
605 - 608	Concentration and size dependence of optical properties of Ag : Bi2O3 composite films by using the co-sputtering method Zhou P, You HY, Jia JH, Li J, Han T, Wang SY, Zhang RJ, Zheng YX, Chen LY
609 - 614	Ellipsometry on uniaxial ZnO and Zn1-xMgxO thin films grown on (0001) sapphire substrate Kang TD, Lee H, Park WI, Yi GC
615 - 618	Magneto-optical ellipsometry of systems containing thick layers Postava K, Zivotsky O, Pistora J, Yamaguchi I
619 - 623	Generalized ellipsometry for orthorhombic, absorbing materials: dielectric functions, phonon modes and band-to-band transitions of Sb2S3 Schubert M, Hofmann T, Herzinger CM, Dollase W
624 - 627	Mueller matrix ellipsometry study of uniaxial deuterated potassium dihydrogen phosphate (DKDP) Synowicki RA, Hilfiker JN, Whitman PK
628 - 631	Coherent and incoherent interference modelling and measurement of anisotropic multilayer stacks using conventional ellipsometry Touir H, Stchakovsky M, Ossikovski R, Warenghemb M
632 - 638	General virtual interface algorithm for in situ spectroscopic ellipsometric data analysis Johs B
639 - 644	Integrated rotating-compensator polarimeter for real-time measurements and analysis of organometallic chemical vapor deposition Flock K, Kim SJ, Asar M, Kim IK, Aspnes DE
645 - 649	Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometry Cho SJ, Snyder PG, Ianno NJ, Herzinger CM, Johs B
650 - 655	Spectroellipsometric evaluation of colour and oxidation resistance of TiMgN coatings Banakh O, Balzer M, Fenker M, Blatter A
656 - 660	An in situ study of mesostructured CTAB-silica film formation using infrared ellipsometry: evolution of water content Brunet-Bruneau A, Bourgeois A, Cagnol F, Grosso D, Sanchez C, Rivory J
661 - 664	In-situ spectroscopic ellipsometry investigation and control of GaN growth mode in metal-organic vapor phase epitaxy at low pressures of 20 Torr Cao B, Xu K, Ishitani Y, Yoshikawa A
665 - 669	Evaluation of compositional depth profiles in mixed-phase (amorphous plus crystalline) silicon films from real time spectroscopic ellipsometry Ferlauto AS, Ferreira GM, Koval RJ, Pearce JM, Wronski CR, Collins RW, Al-Jassim MM, Jones KM
670 - 674	Real-time studies of amorphous and microcrystalline Si : H growth by spectroscopic ellipsometry and infrared spectroscopy Fujiwara H, Kondo M, Matsuda A
675 - 678	Observation of the cascaded phase transformation of Ge-Sb-Te alloy at elevated temperature by using nanosecond time resolved ellipsometry Kim SJ, Park YD, An SH, Kim SY
679 - 683	In-situ studies of the growth of amorphous and nanocrystalline silicon using real time spectroscopic ellipsometry Levi DH, Nelson BP, Iwanizcko E, Teplin CW
684 - 687	In-situ growth monitoring by spectroscopy ellipsometry of MOCVD cubic-GaN(001) Ramil AM, Schmidegg K, Bonanni A, Sitter H, Stifter D, Li SF, As DJ, Lischka K
688 - 694	In situ ellipsometry for control of Hg1-xCdxTe nanolayer structures and inhomogeneous layers during MBE growth Shvets VA, Rykhlitski SV, Spesivtsev EV, Aulchenko NA, Mikhailov NN, Dvoretsky SA, Sidorov YG, Smirnov RN
695 - 699	In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfaces Forster C, Schnabel F, Weih P, Stauden T, Ambacher O, Pezoldt J
700 - 704	Time-resolved microellipsometry for rapid thermal processes monitoring Spesivtsev E, Rykhlitsky SV, Shvets V, Chikichev SI, Mardezhov AS, Nazarov NI, Volodin V
705 - 709	Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometer Tsuru T, Tsutou I, Yamamoto M
710 - 715	In situ measurements of chemical sensor film dynamics by spectroscopic ellipsometry. Three case studies Zudans I, Heineman WR, Seliskar CJ
716 - 721	Protein monolayers monitored by internal reflection ellipsometry Poksinski M, Arwin H
722 - 725	Application of FTIR ellipsometry to detect and classify microorganisms Garcia-Caurel E, Nguyen J, Schwartz L, Drevillon B
726 - 730	Protein adsorption in porous silicon gradients monitored by spatially-resolved spectroscopic ellipsometry Karlsson LM, Schubert M, Ashkenov N, Arwin H
731 - 734	Spectroscopic ellipsometry on biological materials - investigation of hydration dynamics and structural properties Schulz B, Chan D, Backstrom J, Rubhausen M
735 - 741	In situ ellipsometric and electrochemical monitoring of the oxidation of a Pb-Ca-Sn alloy used in the lead acid batteries Stein N, Bourguignon G, Raboin L, Broch L, Johann L, Rocca E
742 - 746	Use of in-situ spectroscopic ellipsometry to study aluminium/oxide surface modifications in chloride and sulfuric solutions Van Gils S, Melendres CA, Terryn H, Stijns E
747 - 751	CO2 sorption of a ceramic separation membrane Wormeester H, Benes NE, Spijksma GI, Verweij H, Poelsema B
752 - 758	Reflection anisotropy spectroscopy of molecular assembly at metal surfaces Martin DS, Weightman R
759 - 763	Atomic-layer resolved monitoring of thermal oxidation of Si(001) by reflectance difference oscillation technique Yasuda T, Nishizawa M, Kumagai N, Yamasaki S, Oheda H, Yamabe K
764 - 764	Calculation of surface optical properties: from qualitative understanding to quantitative predictions Schmidt WG, Seino K, Hahn PH, Bechstedt E, Lu W, Wang S, Bernholc J
772 - 778	Industrial applications of spectroscopic ellipsometry Tompkins HG
779 - 783	Biplate artifacts in rotating-compensator ellipsometers Ebert K, Aspnes DE
784 - 789	Ellipsometric monitoring of molecular evolution in freely suspended films of M12/10 ferroelectric liquid crystal Bortchagovsky EG, Deineka A, Glogarova A, Hamplova V, Jastrabik L, Kaspar M
790 - 793	Performance analysis of ellipsometer systems Asinovski L
794 - 797	Spectroscopic ellipsometry for in-line monitoring of silicon nitrides Cook CS, Daly T, Liu R, Canonico M, Xie Q, Gregory RB, Zollner S
798 - 803	Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics Boher P, Evrard P, Condat O, Dos Reis C, Defranoux C, Piel JP, Stehle JL, Bellandi E
804 - 808	Application of the genetic algorithms in spectroscopic ellipsometry Kudla A
809 - 818	A new multiple wavelength ellipsometric imager: design, limitations and applications Boher P, Thomas O, Piel JP, Stehle JL
819 - 823	Oxidation behaviour of thin silver films deposited on plastic web characterized by spectroscopic ellipsometry (SE) Sahm H, Charton C, Thielsch R
824 - 827	A memory application of light reflection from anisotropic microstructured thin films Tazawa M, Xu G, Jin P, Arwin H
828 - 836	Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring Huang HT, Terry FL