Thin Solid Films

Thin Solid Films, Vol.241, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (81 articles)

1 - 8	Large-Area Selective Thin-Film Deposition by Bias Sputtering Berg S, Katardjiev IV, Nender C, Carlsson P
9 - 11	Epitaxial-Growth, Structure and Properties of Ni Films Grown on MgO(100) by DC Bias Sputter-Deposition Qiu H, Kosuge A, Maruyama H, Adamik M, Safran G, Barna PB, Hashimoto M
12 - 15	Highly Pressurized Kr Agglomerates in Sputtered Si Films Greuter MJ, Niesen L, Vanveen A, Verwerft M, Dehosson JT
16 - 20	Composition of Thin-Films Deposited by Ion-Beam Sputtering of a Compound Target - Case of Y-Ba-Cu-O Benayoun S, Salmon E, Gaboriaud RJ
21 - 24	Alumina Coating on Polyethylene Terephthalate Bodino F, Baud G, Benmalek M, Besse JP, Dunlop HM, Jacquet M
25 - 29	Silicate Glass-Films Deposited by Reactive RF Magnetron Sputtering - Electrical Characterization Dellamea G, Rigato V, Colombo P, Dalmaschio R, Sighel C, Zandolin S, Mwose PK
30 - 33	TiNx Magnetron Sputter Coating Controlled by an in-Situ Eddy-Current Sensor Klumperwestkamp H, Mayr P
34 - 38	Silver Thin-Films Deposited by Magnetron Sputtering Marechal N, Quesnel E
39 - 43	Tin Layer Synthesis by Laser-Plasma Thomann AL, Hermann J, Boulmerleborgne C
44 - 46	Spectroscopic Ellipsometry Studies of Indium Tin Oxide and Other Flat-Panel Display Multilayer Materials Woollam JA, Mcgahan WA, Johs B
47 - 51	Electrical Characterization of Laser-Induced Deposits of Aluminum on Gallium-Arsenide Tonneau D, Cuniot M, Laroche JM, Orain H, Rommeluere JF, Bouree JE
52 - 56	Laser-Assisted Metallization of Polyphenylquinoxaline Shafeev G, Marine W, Dallaporta H, Bellard L, Cros A
57 - 60	Investigation of the Microstructure, Chemical-Composition and Lateral Growth-Kinetics of Tin Films Deposited by Laser-Induced Chemical-Vapor-Deposition Silvestre AJ, Parames ML, Conde O
61 - 66	SF6 Sensitized CO2-Laser Chemical-Vapor-Deposition of A-Ge-H Barth M, Hess P, Mollekopf G, Stafast H
67 - 70	Dependence of Deposition Kinetics on Precursor Concentration and Writing Speed in Pyrolytic Laser Deposition from Solution Geretovszky Z, Szorenyi T, Bali K, Toth A
71 - 75	Laser-Based Chemical-Vapor-Deposition of Titanium Nitride Coatings Illmann U, Ebert R, Reisse G, Freller H, Lorenz P
76 - 79	Laser-Assisted Nickel Deposition Onto Synthetic Diamonds Laptev VA, Pimenov SM, Shafeev GA
80 - 83	Tailoring Silicon-Oxide Film Properties by Tuning the Laser Beam-to-Substrate Distance in ArF Laser-Induced Chemical-Vapor-Deposition Szorenyi T, Gonzalez P, Garcia E, Pou J, Fernandez D, Serra J, Leon B, Perezamor M
84 - 87	Inplane Lattice-Constant Relaxation During Laser-Ablation of YBCO and Yttria-Stabilized Zirconia Karl H, Hartmann J, Stritzker B
88 - 91	Raman Analysis of the Modifications Induced by Laser Processing and Hydrogen Implantation in Carbon-Films Deposited by the Ablation Technique Antoni F, Prevot B, Forgarassy E, Deunamuno S
92 - 95	Deposition by Plasma-Assisted Laser-Ablation and Maskless Patterning of YBa2Cu3O7-X Superconducting Thin-Films Tejedor P, Cagigal M, Vicent JL, Briones F
96 - 99	Real-Time Emission-Spectroscopy During Laser-Ablation of BiSrCaCuO Targets Gonzalo J, Vega F, Afonso CN
XI - XI	Papers Presented at the European-Materials-Research-Society 1993 Spring Conference, Symposium-C - Ion-Beam, Plasma, Laser and Thermally-Stimulated Deposition Processes, Strasbourg, France, May 4-7, 1993 - Preface Freller H, Martinezduart JM, Pauleau Y, Dieleman J
100 - 102	Deposition of YBa2Cu3O7-X Thin-Films by Channel-Spark Pulsed Electron-Beam Ablation Jiang QD, Matacotta FC, Konijnenberg MC, Muller G, Schultheiss C
103 - 108	Ablation Dynamics of Silicon-Based Targets in Oxygen and Nitrogen Atmospheres Marine W, Tokarev V, Gerri M, Sentis M, Fogarassy E
109 - 113	Peculiarities of Laser Melting and Evaporation of Superconducting Ceramics Mazhukin V, Smurov I, Flamant G, Dupuy C
114 - 118	Structural Characterization and Properties of Superconducting Thin-Films Produced by Pulsed-Laser Deposition Giardiniguidoni A, Ferro D, Gambardella U, Marotta V, Martino R, Morone A, Orlando S
119 - 125	Properties of Laser-Pulse Deposited Oxide-Films Reisse G, Keiper B, Weissmantel S, Johansen H, Scholz R, Martini T
126 - 128	Laser-Induced Ablation and Epitaxial-Growth of SnSe Teghil R, Giardiniguidoni A, Mele A, Piccirillo S, Pizzella G, Marotta V
129 - 133	Time-Resolved Measurements of Plume Shielding During ArF Laser-Ablation of Silicon Tokarev V, Marine W, Lunney JG, Sentis M
134 - 137	A New Method for the Reduction of Droplet Deposition Onto Laser-Deposited Thin Metal-Films Vanderiet E, Biermann UK, Dieleman J
138 - 141	SiC Films Prepared by Pulsed Excimer-Laser Deposition Zehnder T, Blatter A, Bachli A
142 - 150	Pulsed-Laser Induced Modifications of Metal Silicide Layers Baeri P
151 - 154	Segregation of Impurities and Defects in Hg0.8Cd0.2Te by Laser Annealing Ciach R, Faryna M, Kuzma M, Pociask M, Sheregii E
155 - 158	Preparation of Si1-xGex Thin Crystalline Films by Pulsed Excimer-Laser Annealing of Heavily Ge Implanted Si Repplinger F, Fogarassy E, Grob A, Grob JJ, Muller D, Prevot B, Stoquert JP, Deunamuno S
159 - 166	Advanced Scientific Semiconductor Processing Based on High-Precision Controlled Low-Energy Ion-Bombardment Ohmi T, Shibata T
167 - 170	Modeling of Layer-by-Layer Sputtering of Si(111) Surfaces Under Irradiation with Low-Energy Ions Zinovyev VA, Aleksandrov LN, Dvurechenskii AV, Heinig KH, Stock D
171 - 174	Microstructural Evolution of Non-Hydrogenated Amorphous-Carbon Under Ion-Beam Assistance Andre B, Rossi F, Vanveen A, Mijnarends PE, Schut H, Delplancke MP
175 - 178	XAs and XRD Structural Studies of Titanium-Oxide Thin-Films Prepared by Ion-Beam-Induced CVD Leinen D, Fernandez A, Espinos JP, Caballero A, Justo A, Gonzalezelipe AR
179 - 187	Ion Plating - Optimum Surface Performance and Material Conservation Ahmed NA
188 - 191	Morphological and Structural Studies of Beta-Fesi2 Films Grown by Ion-Beam-Assisted Deposition Terrasi A, Ravesi S, Spinella C, Grimaldi MG, Lamantia A
192 - 197	Ion-Beam Mixing with Chemical Guidance .3. Phase-Formation as a Kinetic Rather Than Thermodynamic Phenomenon Miotello A, Kelly R
198 - 201	Ion-Beam-Induced Chemical-Vapor-Deposition for the Preparation of Thin-Film Oxides Leinen D, Fernandez A, Espinos JP, Belderrain TR, Gonzalezelipe AR
202 - 205	Optical-Properties of Ion-Assisted Deposited SiO Thin-Films Decastro AJ, Lopez F, Melendez J, Fernandez M
206 - 210	Voids in Epitaxial Silicon Films Grown Under Different Thermal Conditions - Void Detection by Thermal Helium Desorption Vanveen A, Reader AH, Gravesteijn DJ, Vangorkum AA
211 - 217	Effect of Ion-Bombardment on Cr-Si-O Layers - An X-Ray Photoelectron Spectroscopic Study Bertoti I, Toth A, Mohai M, Kelly R, Marletta G
218 - 221	Degradation of Thin-Films - Comparison Between Low-Earth-Orbit Experiments and Laboratory Simulations of the Space Environment Woollam JA, Synowicki RA, Hale JS, Ianno NJ, Spady BL, Moore AW, Hambourger P
222 - 229	Comparative Investigation by Laser Profilometry, Scanning Electron-Microscopy and Atomic-Force Microscopy of Wear on Solar-Beam-Irradiated Partially Oxidized Tin Coatings Oberlander BC, Franck M, Campbell P, Celis JP, Roos J, Hellemans L, Snauwaert J
230 - 233	Microhardness and Spectroscopy Studies of Surface Modification of Titanium-Alloys by Melted Metaphosphates Deffontainesfourez M, Deffontaines B, Chicot D, Iost A
234 - 239	In-Situ Spectroscopic Ellipsometry Studies of Interfaces of Thin-Films Deposited by PECVD Drevillon B
240 - 246	Chemical-Vapor-Deposition in High-Density Low-Pressure Plasmas - Reactor Scale-Up and Performance Pelletier J, Lagarde T
247 - 250	Electron-Cyclotron-Resonance Plasma Deposition of Sin(X) for Optical Applications Bulkin PV, Swart PL, Lacquet BM
251 - 254	Millitorr Range PECVD of Alpha-SiO(2) Films Using Teos and Oxygen Templier F, Vallier L, Madar R, Oberlin JC, Devine RA
255 - 259	Raman-Spectroscopy on Nitrogen-Incorporated Amorphous Hydrogenated Carbon-Films Mariotto G, Freire FL, Achete CA
260 - 263	In-Situ Monitoring by Soft-X-Ray Spectrometry of Amorphous-Carbon Plasma Deposition Legrand PB, Dauchot JP, Hecq M
264 - 268	Amorphous Hydrogenated Carbon-Films Elaborated by Plasma-Assisted Chemical-Vapor-Deposition - Characterization of Composition by Nuclear Methods Deshayes L, Charbonnier M, Romand M, Petit T, Chevarier N, Chevarier A
269 - 273	Plasma Processes in Methane Discharges During RF Plasma-Assisted Chemical-Vapor-Deposition of A-CH Thin-Films Dekempeneer EH, Smeets J, Meneve J, Eersels L, Jacobs R
274 - 277	Optimization of A-Si1-Xcxh Films Prepared by Ultrahigh-Vacuum Plasma-Enhanced Chemical-Vapor-Deposition for Electroluminescent Devices Demichelis F, Crovini G, Pirri CF, Tresso E, Amato G, Coscia U, Ambrosone G, Rava P
278 - 281	Plasma-Enhanced Chemical-Vapor-Deposition of Boron-Nitride Onto InP Bath A, Baehr O, Barrada M, Lepley B, Vanderput PJ, Schoonman J
282 - 286	Thin-Film Deposition of Conductive Tin Oxide from Tetramethyltin in a Low-Pressure Glow-Discharge Diode Reactor Farber Y, Khonsariarefi F, Amouroux J
287 - 290	Plasma-Enhanced Chemical-Vapor-Deposition of Amorphous-Silicon Nitride for Thin-Film Diode Active-Matrix Liquid-Crystal Displays Oversluizen G, Lodders WH, French ID
291 - 294	Correlations Between Process Parameters, Chemical-Structure and Electronic-Properties of Amorphous Hydrogenated Gexc1-X Films Prepared by Plasma-Enhanced Chemical-Vapor-Deposition in a 3-Electrode Reactor Tyczkowski J, Kazimierski P, Szymanowski H
295 - 300	Surface Fluorination of Polyethylene Films by Different CF4 Glow-Discharges - Effects of Frequency and Electrode Configuration Khairallah Y, Arefi F, Amouroux J
301 - 304	Preparation of Low-Resistivity Tungsten Thin-Films Deposited by Microwave-Plasma-Enhanced Chemical-Vapor-Deposition from the Tungsten Hexafluoride Hydrogen System Belkacem A, Arnal Y, Pelletier J, Andre E, Oberlin JC
305 - 309	Electron-Cyclotron-Resonance Plasma Ion-Beam Effects on the Formation of SiC on Si(001) Characterized by in-Situ Photoemission Diani M, Aubel D, Bischoff JL, Kubler L, Bolmont D
310 - 317	The Surface-Chemistry and Kinetics of Tungsten Chemical-Vapor-Deposition and Selectivity Loss Creighton JR
318 - 323	Amorphous-Semiconductors - Deposition Chemistry and Bonding Hess P
324 - 328	Low-Temperature Selective Growth of Epitaxial Si and Si1-xGex Layers from SiH4 and GeH4 in an Ultrahigh-Vacuum, Very-Low Pressure Chemical-Vapor-Deposition Reactor - Kinetics and Possibilities Caymax M, Poortmans J, Vanammel A, Libezny M, Nijs J, Mertens R
329 - 334	Applications of Rapid Thermal Chemical-Vapor-Deposition Technology to ULSI Material Processing and Device Fabrication Snnikrishnan U, Yoon GW, Kwong DL
335 - 339	On the Relation Between Low-Temperature Epitaxial-Growth Conditions and the Surface-Morphology of Epitaxial Si and Si1-xGex Layers, Grown in an Ultrahigh-Vacuum, Very-Low Pressure Chemical-Vapor-Deposition Reactor Caymax M, Poortmans J, Vanammel A, Vanhellemont J, Libezny M, Nijs J, Mertens R
340 - 343	Growth Methodologies and Characterization of Different Polycrystalline Diamond Films on Ta Substrates Terranova ML, Rossi M, Sessa V, Vitali G
344 - 347	Low-Temperature Deposition of Glass Membranes for Gas Sensors Althainz P, Dahlke A, Goschnick J, Ache HJ
348 - 351	Silicon-Oxide Thin-Films Grown by Xe2-Asterisk Excimer Lamp Chemical-Vapor-Deposition - The Role of the Substrate-Temperature and the Window Substrate Distance Gonzalez P, Garcia E, Pou J, Fernandez D, Serra J, Leon B, Perezamor M
352 - 355	Growth of Iridium Films by Metal-Organic Chemical-Vapor-Deposition Gerfin T, Halg WJ, Atamny F, Dahmen KH
356 - 360	Chemical-Vapor-Deposition of Hafnium Carbide and Characterization of the Deposited Layers by Secondary-Neutral Mass-Spectrometry Ache HF, Goschnick J, Sommer M, Emig G, Schoch G, Wormer O
361 - 365	Chemical-Vapor-Deposition of Silicon-Carbide on Mesophase Pitch-Based Carbon-Fibers Emig G, Popovska N, Schoch G
366 - 369	Granular Films of Iron-Oxide Prepared by Aerosol Deposition for the Detection of Organic Vapors Althainz P, Schuy L, Goschnick J, Ache HJ
370 - 373	Photoassisted Metal-Organic Vapor-Phase Epitaxy of ZnTe on GaAs Dumont H, Quhen B, Bouree JE, Kuhn W, Gorochov O
374 - 377	Selective Deposition of Tungsten by Chemical-Vapor-Deposition from SiH4 Reduction of WF(6) Gouypailler P, Lami P, Morales R
378 - 382	The Influence of Deposits in a Metal-Organic Chemical-Vapor-Deposition Apparatus on the Stability of Precursors Lang FR, Dahmen KH
383 - 387	Oxide-Growth at a Si Surface Verdi L, Miotello A, Kelly R