1 - 1 |
Thin solid films - Preface Hilgers H, Knoll W, Luth H |
2 - 6 |
LPE growth and characterisation of GaInAsSb and GaAlAsSb quaternary layers on (100) GaSb substrates Piskorski M, Piotrowska A, Piotrowski TT, Golaszewska K, Papis E, Katcki J, Ratajczak J, Barcz A, Wawro A |
7 - 12 |
Deposition of epitaxial silicon carbide films using high vacuum MOCVD method for MEMS applications Lim DC, Jee HG, Kim JW, Moon JS, Lee SB, Choi SS, Boo JH |
13 - 16 |
Ion beam assisted MBE of GaN on epitaxial TiN films Gerlach JW, Hoche T, Frost FE, Rauschenbach B |
17 - 22 |
Deposition and in-situ characterization of ultra-thin films Voborny S, Kolibal M, Mach J, Cechal J, Babor PB, Prusa S, Spousta J, Sikola T |
23 - 27 |
Formation of iron-nitrides by irradiation of Fe-57/Si bilayers with N2+ ions Bibic N, Milinovic V, Dhar S, Lieb KP, Milosavljevic M, Siljegovic M, Perusko D, Schaaf P |
28 - 31 |
The effect of built-in electric field on As diffusion in HgCdTe graded-band-gap epitaxial layers Vlasov AR, Sokolovskii BS, Monastyrskii LS, Bonchyk OY, Barcz A |
32 - 36 |
The electronic properties of the interface between a thin conjugated oligomer film and SiO2/Si(111), studied by photoemission spectroscopies Papaefthimiou V, Siokou A, Kennou S |
37 - 40 |
High quality SiGe electronic material grown by low energy plasma enhanced chemical vapour deposition Chrastina D, Isella G, Rossner B, Bollani M, Muller E, Hackbarth T, von Kanel H |
41 - 47 |
Simulation and characterization on properties of AlN films for SOI application Song ZR, Yu YH, Zou SC, Zheng ZH, Shen DS, Luo EZ, Xie Z, Sundaravel B, Wong SP, Wilson IH |
48 - 52 |
Thickness dependent aggregation of Fe-silicide islands on Si substrate Molnar G, Dozsa L, Peto G, Vertesy Z, Koos AA, Horvath ZE, Zsoldos E |
53 - 57 |
Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formation Kropman D, Karner T, Abru U, Ugaste U, Mellikov E |
58 - 62 |
Electrical properties and microstructure of buried oxide (BOX) of SIMOX studied by Conducting Atomic Force Microscopy (C-AFM) Song ZR, Chen KW, Yu YH, Luo EZ, Shen DS |
63 - 66 |
Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers Li WJ, Song ZR, Tao K, Cheng XH, Yang WW, Yu YH, Wang X, Zou SC, Shen DS |
67 - 70 |
Scanning capacitance microscopy investigations of lnGaAs/InP quantum wells Douheret O, Maknys K, Anand S |
71 - 75 |
Improvement in ferroelectric properties of Pt/PZT/Pt capacitors etched as a function of Ar/O-2 gas mixing ratio intoCl(2)/CF4 plasma Lim KT, Koo SM, Kim KT, Kim DP, Kim CI |
76 - 81 |
The etching properties of SBT thin films in BCl3/Cl-2/Ar plasma Kim DP, Yeo JW, Kim CI |
82 - 85 |
Atomic exchange and magnetic properties of Co/Ag/Pt(111) Tzeng CL, Su CW, Ho HY, Shern CS |
86 - 89 |
Morphology of micro- and nanoparticles emitted by copper plants in Western Poland Konarski P, Cwil M, Iwanejko I, Mierzejewska A, Diduszko R |
90 - 94 |
Manipulation of Si oxide and electrically conducting carbon films by scanning probe microscopy (SPM): nano-lithography and nano-machining Myhra S |
95 - 99 |
A mechanistic approach to tip-induced nano-lithography of polymer surfaces Blach JA, Watson GS, Brown CL, Pham DK, Wright J, Nicolau DV, Myhra S |
100 - 105 |
Large area smoothing of optical surfaces by low-energy ion beams Frost F, Fechner R, Ziberi B, Flamm D, Schindler A |
106 - 110 |
Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion Ziberi B, Frost F, Tartz M, Neumann H, Rauschenbach B |
111 - 114 |
Luminescence of two-dimensional ordered array of the ZnO quantum nanodots, obtained by means of the synthetic opal Gruzintsev A, Volkov V, Emelchenko GA, Karpov IA, Maslov WM, Michailov GM, Yakimov EE |
115 - 117 |
Selective plasma etching of powder coatings Kunaver M, Mozetic M, Klanjsek-Gunde M |
118 - 121 |
Surface modification for biomedical purposes utilizing dielectric barrier discharges at atmospheric pressure Gessner C, Bartels V, Betker T, Matucha U, Penache C, Klages CP |
122 - 126 |
Etching properties of Al2O3 films in inductively coupled plasma Kim DP, Yeo JW, Kim CI |
127 - 130 |
Etching characteristic and mechanism of BST thin films using inductively coupled Cl-2/Ar plasma with additive CF4 gas Kim GH, Kim KT, Kim DP, Kim CI |
131 - 136 |
Etching properties of ZnS thin films in Cl-2/CF4/Ar plasma Kim DP, Kim CI, Kwon KH |
137 - 140 |
Self-consistent modelling of plasma-solid interaction in electronegative plasmas Hrach R, Sedlak D, Vicher M, Simek J |
141 - 144 |
The influence of diffusion of fluorine compounds for silicon lateral etching Verdonck P, Goodyear A, Braithwaite NS |
145 - 148 |
Diamond-like carbon microoptics elements Mousinho AP, Mansano RD, Cirino GA, Verdonck P |
149 - 151 |
Further studies of N doped a-SiC : H films deposited by PECVD and annealed by pulse electron beam Huran J, Hotovy I, Kobzev AP, Balalykin NI |
152 - 155 |
Tribological behavior of duplex coating improved by ion implantation Kakas D, Skoric B, Rakita M |
156 - 159 |
Growth structure and magnetic property of CoPt films on GaAs(001) d.c.-sputter deposition Nakajima H, Tanaka T, Hashimoto M, Shi J, Nakamura Y |
160 - 164 |
Peculiarities of thin film deposition by means of reactive impulse plasma assisted chemical vapor deposition (RIPACVD) method Werbowy A, Olszyna A, Zdunek K, Sokolowska A, Szmidt J, Barcz A |
165 - 168 |
Structure and magnetic behavior of CoPt films prepared on MgO(001) substrates by dc plasma biased sputtering Yamaguchi K, Zhao ZY, Chen CC, Hashimoto M, Shi J, Nakamura Y |
169 - 173 |
Self-selection in size and structure in argon clusters formed on amorphous carbon Krainyukova NV, van de Waal BW |
174 - 177 |
Electrical and morphological properties of composite films near the percolation threshold: models of composite structures Hrach R, Svec M, Novak S, Sedlak D |
178 - 182 |
Modern refractory AlMo and AlMoSi coatings on steels with diffusion barrier Wendler B, Danielewski M, Dabek J, Rylski A, Filipek R |
183 - 186 |
Films of chalcogenide glassy semiconductors: new phenomena and new applications Lyubin V, Klebanov A, Feigel A, Sfez B |
187 - 190 |
Structure and magnetic properties of epitaxial ferrite film grown on MgO(001) by MBE Kado T |
191 - 194 |
The Curie temperature dependence on preparation conditions for Gd thin Yamada Y, Okada M, Jin P, Tazawa M, Yoshimura K |
195 - 199 |
Electrical behavior of silicon nitride sputtered thin films Vila M, Prieto C, Ramirez R |
200 - 202 |
Perpendicular magnetic anisotropy of CoPt-TiO2 composite film with nano-fiber structure Chen CC, Sakurai R, Hashimoto M, Shi J, Nakamura Y |
203 - 207 |
Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method Martinez FL, Ruiz-Merino R, del Prado A, San Andres E, Martil I, Gonzalez-Diaz G, Jeynes C, Barradas NP, Wang L, Reehal HS |
208 - 211 |
Structure and magnetic behavior of reactive sputter deposited nanocomposite FePt-TiN films Sakurai R, Yamamoto Y, Chen CC, Hashimoto M, Shi J, Nakamura Y, Nittono O |
212 - 215 |
Structure and mechanical properties of pure titanium film deposited onto TiNi shape memory alloy substrate by magnetron DC sputtering Sonoda T, Watazu A, Zhu J, Shi W, Kato K, Asahina T |
216 - 219 |
Medium range ordering of amorphous silicon-carbon alloys studied by GISAXS, optical spectroscopy and IBA Gracin D, Dubcek P, Zorc H, Juraic K |
220 - 223 |
Non-stoichiometric silicon oxide deposited at low gaseous N2O/SiH4 ratios da Silva Zambom L, Lantin DG, Onoda E, Verdonck P |
224 - 227 |
Nanocrystalline diamond-like carbon coatings produced on the Si3N4-TiC composites intended for the edges of cutting tools Olszyna A, Smolik J |
228 - 232 |
The brittle-to-ductile transition of As-S (Se) films under the action of light Trunov ML, Bilanich VS |
233 - 236 |
Electrochemical determination of corrosion protection ability of fullerene thin films treated by radiofrequency plasma Sittner E, Enders B, Ensinger W |
237 - 240 |
Determination of porosity of thin protective films on iron base materials and modelling of their development during aqueous corrosion Lee YY, Enders B, Ensinger W |
241 - 244 |
Thickness determination for SiO2 films on Si by X-ray reflectometry at the SiK edge Krumrey A, Hoffmann M, Ulm G, Hasche K, Thomsen-Schmidt P |
245 - 248 |
Residual stress and thermal stress observation in thin copper films Hanabusa T, Kusaka K, Sakata O |
249 - 253 |
Photoluminescence from photochemically etched highly resistive silicon Hadjersi T, Gabouze N, Yamamoto N, Sakamaki K, Takai H |
254 - 257 |
Raman spectra and structure of thin Cu-C-60 films Dmytrenko OP, Kulish NR, Prylutskyy YI, Shpilevskiy EM, Belyi NM, Gubanov V, Hietschold M, Schulze S, Ulanski J, Wojciechowski R, Kozanecki M, Scharff P |
258 - 261 |
Self-sustained magnetron co-sputtering of Cu and Ni Posadowski WM |
262 - 266 |
Stimulated emission from ZnO-SiO2-Si thin film nanoresonators obtained by magnetron sputtering method Gruzintsev A, Volkov V, Barthou C, Benalloul R, Frigerio JM |
267 - 270 |
Deposition and characterisation of Al-Cu-Fe thin films Cekada M, Panjan P, Juric D, Dolinsek J, Zalar A |
271 - 275 |
Metal-assisted chemical etching in HF/Na2S2O8 OR HF/KMnO4 produces porous silicon Hadjersi T, Gabouze N, Kooij ES, Zinine A, Ababou A, Chergui W, Cheraga H, Belhousse S, Djeghri A |
276 - 281 |
Solid state de-wetting observed for vapor deposited copper films on carbon substrates Schrank C, Eisenmenger-Sittner C, Neubauer E, Bangert H, Bergauer A |
282 - 285 |
Comparative studies of the feed gas composition effects on the characteristics of DLC films deposited by magnetron sputtering Libardi J, Grigorov K, Massi M, Otani C, Ravagnani SP, Maciel HS, Guerino M, Ocampo JMJ |
286 - 291 |
TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment Popovic N, Bogdanov Z, Goncic B, Zec S, Rakocevic Z, Zlatanovic M, Perusko D |
292 - 296 |
Amorphous Ta-Si-N diffusion barriers on GaAs Kuchuk A, Kaminska E, Piotrowska A, Golaszewska K, Dynowska E, Lytvyn OS, Nowicki L, Ratajczak R |
297 - 302 |
Zinc/manganese multilayer coatings for corrosion protection Munz R, Wolf GK, Guzman L, Adami M |
303 - 307 |
Investigation of Ta grain boundary diffusion in copper by means of Auger electron spectroscopy Erdelyi G, Langer G, Nyeki J, Kover L, Tomastik C, Werner WM, Csik A, Stoeri H, Beke DL |
308 - 312 |
Influence of defects in SiOx thin films on their barrier properties Gruniger A, von Rohr PR |
313 - 317 |
On the coating of polymers - basic investigations Lugscheider E, Bobzin K, Maes M, Kramer A |
318 - 322 |
High temperature ion beam erosion of polytetrafluoroethylene Adami M, Guzman L, Man BY, Miotello A, Ossi PM |