화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.459, No.1-2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (71 articles)

1 - 1 Thin solid films - Preface
Hilgers H, Knoll W, Luth H
2 - 6 LPE growth and characterisation of GaInAsSb and GaAlAsSb quaternary layers on (100) GaSb substrates
Piskorski M, Piotrowska A, Piotrowski TT, Golaszewska K, Papis E, Katcki J, Ratajczak J, Barcz A, Wawro A
7 - 12 Deposition of epitaxial silicon carbide films using high vacuum MOCVD method for MEMS applications
Lim DC, Jee HG, Kim JW, Moon JS, Lee SB, Choi SS, Boo JH
13 - 16 Ion beam assisted MBE of GaN on epitaxial TiN films
Gerlach JW, Hoche T, Frost FE, Rauschenbach B
17 - 22 Deposition and in-situ characterization of ultra-thin films
Voborny S, Kolibal M, Mach J, Cechal J, Babor PB, Prusa S, Spousta J, Sikola T
23 - 27 Formation of iron-nitrides by irradiation of Fe-57/Si bilayers with N2+ ions
Bibic N, Milinovic V, Dhar S, Lieb KP, Milosavljevic M, Siljegovic M, Perusko D, Schaaf P
28 - 31 The effect of built-in electric field on As diffusion in HgCdTe graded-band-gap epitaxial layers
Vlasov AR, Sokolovskii BS, Monastyrskii LS, Bonchyk OY, Barcz A
32 - 36 The electronic properties of the interface between a thin conjugated oligomer film and SiO2/Si(111), studied by photoemission spectroscopies
Papaefthimiou V, Siokou A, Kennou S
37 - 40 High quality SiGe electronic material grown by low energy plasma enhanced chemical vapour deposition
Chrastina D, Isella G, Rossner B, Bollani M, Muller E, Hackbarth T, von Kanel H
41 - 47 Simulation and characterization on properties of AlN films for SOI application
Song ZR, Yu YH, Zou SC, Zheng ZH, Shen DS, Luo EZ, Xie Z, Sundaravel B, Wong SP, Wilson IH
48 - 52 Thickness dependent aggregation of Fe-silicide islands on Si substrate
Molnar G, Dozsa L, Peto G, Vertesy Z, Koos AA, Horvath ZE, Zsoldos E
53 - 57 Interaction between point defects, extended defects and impurities in the Si-SiO2 system during the process of its formation
Kropman D, Karner T, Abru U, Ugaste U, Mellikov E
58 - 62 Electrical properties and microstructure of buried oxide (BOX) of SIMOX studied by Conducting Atomic Force Microscopy (C-AFM)
Song ZR, Chen KW, Yu YH, Luo EZ, Shen DS
63 - 66 Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers
Li WJ, Song ZR, Tao K, Cheng XH, Yang WW, Yu YH, Wang X, Zou SC, Shen DS
67 - 70 Scanning capacitance microscopy investigations of lnGaAs/InP quantum wells
Douheret O, Maknys K, Anand S
71 - 75 Improvement in ferroelectric properties of Pt/PZT/Pt capacitors etched as a function of Ar/O-2 gas mixing ratio intoCl(2)/CF4 plasma
Lim KT, Koo SM, Kim KT, Kim DP, Kim CI
76 - 81 The etching properties of SBT thin films in BCl3/Cl-2/Ar plasma
Kim DP, Yeo JW, Kim CI
82 - 85 Atomic exchange and magnetic properties of Co/Ag/Pt(111)
Tzeng CL, Su CW, Ho HY, Shern CS
86 - 89 Morphology of micro- and nanoparticles emitted by copper plants in Western Poland
Konarski P, Cwil M, Iwanejko I, Mierzejewska A, Diduszko R
90 - 94 Manipulation of Si oxide and electrically conducting carbon films by scanning probe microscopy (SPM): nano-lithography and nano-machining
Myhra S
95 - 99 A mechanistic approach to tip-induced nano-lithography of polymer surfaces
Blach JA, Watson GS, Brown CL, Pham DK, Wright J, Nicolau DV, Myhra S
100 - 105 Large area smoothing of optical surfaces by low-energy ion beams
Frost F, Fechner R, Ziberi B, Flamm D, Schindler A
106 - 110 Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion
Ziberi B, Frost F, Tartz M, Neumann H, Rauschenbach B
111 - 114 Luminescence of two-dimensional ordered array of the ZnO quantum nanodots, obtained by means of the synthetic opal
Gruzintsev A, Volkov V, Emelchenko GA, Karpov IA, Maslov WM, Michailov GM, Yakimov EE
115 - 117 Selective plasma etching of powder coatings
Kunaver M, Mozetic M, Klanjsek-Gunde M
118 - 121 Surface modification for biomedical purposes utilizing dielectric barrier discharges at atmospheric pressure
Gessner C, Bartels V, Betker T, Matucha U, Penache C, Klages CP
122 - 126 Etching properties of Al2O3 films in inductively coupled plasma
Kim DP, Yeo JW, Kim CI
127 - 130 Etching characteristic and mechanism of BST thin films using inductively coupled Cl-2/Ar plasma with additive CF4 gas
Kim GH, Kim KT, Kim DP, Kim CI
131 - 136 Etching properties of ZnS thin films in Cl-2/CF4/Ar plasma
Kim DP, Kim CI, Kwon KH
137 - 140 Self-consistent modelling of plasma-solid interaction in electronegative plasmas
Hrach R, Sedlak D, Vicher M, Simek J
141 - 144 The influence of diffusion of fluorine compounds for silicon lateral etching
Verdonck P, Goodyear A, Braithwaite NS
145 - 148 Diamond-like carbon microoptics elements
Mousinho AP, Mansano RD, Cirino GA, Verdonck P
149 - 151 Further studies of N doped a-SiC : H films deposited by PECVD and annealed by pulse electron beam
Huran J, Hotovy I, Kobzev AP, Balalykin NI
152 - 155 Tribological behavior of duplex coating improved by ion implantation
Kakas D, Skoric B, Rakita M
156 - 159 Growth structure and magnetic property of CoPt films on GaAs(001) d.c.-sputter deposition
Nakajima H, Tanaka T, Hashimoto M, Shi J, Nakamura Y
160 - 164 Peculiarities of thin film deposition by means of reactive impulse plasma assisted chemical vapor deposition (RIPACVD) method
Werbowy A, Olszyna A, Zdunek K, Sokolowska A, Szmidt J, Barcz A
165 - 168 Structure and magnetic behavior of CoPt films prepared on MgO(001) substrates by dc plasma biased sputtering
Yamaguchi K, Zhao ZY, Chen CC, Hashimoto M, Shi J, Nakamura Y
169 - 173 Self-selection in size and structure in argon clusters formed on amorphous carbon
Krainyukova NV, van de Waal BW
174 - 177 Electrical and morphological properties of composite films near the percolation threshold: models of composite structures
Hrach R, Svec M, Novak S, Sedlak D
178 - 182 Modern refractory AlMo and AlMoSi coatings on steels with diffusion barrier
Wendler B, Danielewski M, Dabek J, Rylski A, Filipek R
183 - 186 Films of chalcogenide glassy semiconductors: new phenomena and new applications
Lyubin V, Klebanov A, Feigel A, Sfez B
187 - 190 Structure and magnetic properties of epitaxial ferrite film grown on MgO(001) by MBE
Kado T
191 - 194 The Curie temperature dependence on preparation conditions for Gd thin
Yamada Y, Okada M, Jin P, Tazawa M, Yoshimura K
195 - 199 Electrical behavior of silicon nitride sputtered thin films
Vila M, Prieto C, Ramirez R
200 - 202 Perpendicular magnetic anisotropy of CoPt-TiO2 composite film with nano-fiber structure
Chen CC, Sakurai R, Hashimoto M, Shi J, Nakamura Y
203 - 207 Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method
Martinez FL, Ruiz-Merino R, del Prado A, San Andres E, Martil I, Gonzalez-Diaz G, Jeynes C, Barradas NP, Wang L, Reehal HS
208 - 211 Structure and magnetic behavior of reactive sputter deposited nanocomposite FePt-TiN films
Sakurai R, Yamamoto Y, Chen CC, Hashimoto M, Shi J, Nakamura Y, Nittono O
212 - 215 Structure and mechanical properties of pure titanium film deposited onto TiNi shape memory alloy substrate by magnetron DC sputtering
Sonoda T, Watazu A, Zhu J, Shi W, Kato K, Asahina T
216 - 219 Medium range ordering of amorphous silicon-carbon alloys studied by GISAXS, optical spectroscopy and IBA
Gracin D, Dubcek P, Zorc H, Juraic K
220 - 223 Non-stoichiometric silicon oxide deposited at low gaseous N2O/SiH4 ratios
da Silva Zambom L, Lantin DG, Onoda E, Verdonck P
224 - 227 Nanocrystalline diamond-like carbon coatings produced on the Si3N4-TiC composites intended for the edges of cutting tools
Olszyna A, Smolik J
228 - 232 The brittle-to-ductile transition of As-S (Se) films under the action of light
Trunov ML, Bilanich VS
233 - 236 Electrochemical determination of corrosion protection ability of fullerene thin films treated by radiofrequency plasma
Sittner E, Enders B, Ensinger W
237 - 240 Determination of porosity of thin protective films on iron base materials and modelling of their development during aqueous corrosion
Lee YY, Enders B, Ensinger W
241 - 244 Thickness determination for SiO2 films on Si by X-ray reflectometry at the SiK edge
Krumrey A, Hoffmann M, Ulm G, Hasche K, Thomsen-Schmidt P
245 - 248 Residual stress and thermal stress observation in thin copper films
Hanabusa T, Kusaka K, Sakata O
249 - 253 Photoluminescence from photochemically etched highly resistive silicon
Hadjersi T, Gabouze N, Yamamoto N, Sakamaki K, Takai H
254 - 257 Raman spectra and structure of thin Cu-C-60 films
Dmytrenko OP, Kulish NR, Prylutskyy YI, Shpilevskiy EM, Belyi NM, Gubanov V, Hietschold M, Schulze S, Ulanski J, Wojciechowski R, Kozanecki M, Scharff P
258 - 261 Self-sustained magnetron co-sputtering of Cu and Ni
Posadowski WM
262 - 266 Stimulated emission from ZnO-SiO2-Si thin film nanoresonators obtained by magnetron sputtering method
Gruzintsev A, Volkov V, Barthou C, Benalloul R, Frigerio JM
267 - 270 Deposition and characterisation of Al-Cu-Fe thin films
Cekada M, Panjan P, Juric D, Dolinsek J, Zalar A
271 - 275 Metal-assisted chemical etching in HF/Na2S2O8 OR HF/KMnO4 produces porous silicon
Hadjersi T, Gabouze N, Kooij ES, Zinine A, Ababou A, Chergui W, Cheraga H, Belhousse S, Djeghri A
276 - 281 Solid state de-wetting observed for vapor deposited copper films on carbon substrates
Schrank C, Eisenmenger-Sittner C, Neubauer E, Bangert H, Bergauer A
282 - 285 Comparative studies of the feed gas composition effects on the characteristics of DLC films deposited by magnetron sputtering
Libardi J, Grigorov K, Massi M, Otani C, Ravagnani SP, Maciel HS, Guerino M, Ocampo JMJ
286 - 291 TiN thin films deposited by ion beam sputtering: effects of energetic particles bombardment
Popovic N, Bogdanov Z, Goncic B, Zec S, Rakocevic Z, Zlatanovic M, Perusko D
292 - 296 Amorphous Ta-Si-N diffusion barriers on GaAs
Kuchuk A, Kaminska E, Piotrowska A, Golaszewska K, Dynowska E, Lytvyn OS, Nowicki L, Ratajczak R
297 - 302 Zinc/manganese multilayer coatings for corrosion protection
Munz R, Wolf GK, Guzman L, Adami M
303 - 307 Investigation of Ta grain boundary diffusion in copper by means of Auger electron spectroscopy
Erdelyi G, Langer G, Nyeki J, Kover L, Tomastik C, Werner WM, Csik A, Stoeri H, Beke DL
308 - 312 Influence of defects in SiOx thin films on their barrier properties
Gruniger A, von Rohr PR
313 - 317 On the coating of polymers - basic investigations
Lugscheider E, Bobzin K, Maes M, Kramer A
318 - 322 High temperature ion beam erosion of polytetrafluoroethylene
Adami M, Guzman L, Man BY, Miotello A, Ossi PM