1 - 2 |
Special Issue - Secondary Ion Mass Spectrometry SIMS XIV - Proceedings of the Fourteenth International Conference on Secondary Ion Mass Spectrometry and Related Topics - San Diego, California, USA, September 14-19, 2003 - Preface Hunter J, Schueler BW, Stevie FA |
3 - 12 |
Challenges in localized high precision isotope analysis by SIMS Slodzian G |
13 - 21 |
Collisions of organic ions at surfaces Cooks RG, Jo SC, Green J |
22 - 28 |
Sputtering simulations of organic overlayers on metal substrates by monoatomic and clusters projectiles Postawa Z |
29 - 38 |
Molecular dynamics simulation of silicon sputtering: sensitivity to the choice of potential Thijsse BJ, Klaver TPC, Haddeman EFC |
39 - 43 |
A comparison of molecular dynamic simulations and experimental observations: the sputtering of gold {100} by 20 keV argon McQuaw CM, Smiley EJ, Garrison BJ, Winograd N |
44 - 47 |
Molecular dynamics simulations to explore the role of mass matching in the keV bombardment of organic films with polyatomic projectiles Harper S, Krantzman KD |
48 - 53 |
Sputtering of a polycyclic hydrocarbon molecule: TOF-SIMS experiments and molecular dynamic simulations Solomko V, Delcorte A, Garrison BJ, Bertrand P |
54 - 58 |
Cluster secondary ion mass spectrometry: an insight into super-efficient" collision cascades Rickman RD, Verkhoturov SV, Schweikert EA |
59 - 63 |
Energetic cluster induced desorption from a graphite surface Webb R |
64 - 67 |
Sputtering of ag under C60(+) and Ga+ projectile bombardment Sun S, Szakal C, Smiley EJ, Postawa Z, Wucher A, Garrison BJ, Winograd N |
68 - 71 |
Molecular depth profiling in ice matrices Using C-60 projectiles Wucher A, Sun S, Szakal C, Winograd N |
72 - 77 |
Emission of ionic water clusters from water ice films bombarded by energetic projectiles Wojciechowski IA, Kutliev U, Sun SX, Szakal C, Winograd N, Garrison BJ |
78 - 81 |
Non-additive effects in secondary-ion emission from V, Nb and Ta under gold-cluster bombardment Morozov SN, Rasulev UK |
82 - 85 |
Detection of the diatomic dications SiH2+ and AM(2+) Franzreb K, Sobers RC, Lorincik J, Williams P |
86 - 89 |
Secondary ion emission from polycrystalline Al under Cs+ irradiation van der Heide PAW |
90 - 93 |
Factors affecting the retention of Cs+ primary ions in Si van der Heide PAW, Lupu C, Kutana A, Rabalais JW |
94 - 96 |
Positive ionization probabilities of sputtered Ag and Ta clusters Ferleger VK |
97 - 100 |
Secondary ion emission and work function measurements over the transient region from n and p type Si under Cs+ irradiation van der Heide PAW |
101 - 105 |
On the trends in kinetic energies of secondary ions produced by polyatomic ion bombardment Veryovkin IV, Belykh SF, Adriaens A, Zinovev AV, Adams F |
106 - 112 |
Characterization of surface structure by cluster coincidental ion mass spectrometry Rickman RD, Verkhoturov SV, Balderas S, Bestaoui N, Clearfield A, Schweikert EA |
113 - 116 |
Nanodomain analysis via coincidence ion mass spectrometry Verkhoturov SV, Rickman RD, Balderas S, Schweikert EA |
117 - 121 |
Detection of sputtered molecular doubly charged anions: a comparison of secondary-ion mass spectrometry (SIMS) and accelerator mass spectrometry (AMS) Gnaser H, Golser R, Kutschera W, Priller A, Steier P, Vockenhuber C |
122 - 126 |
Emission processes of molecule-metal cluster ions from self-assembled monolayers of octanethiols on gold and silver Arezki B, Delcorte A, Bertrand P |
127 - 130 |
Positive secondary ion yield enhancement of metal elements using trichlorotrifluoroethane and tetrachloroethene backfilling Chi PH, Gillen G |
131 - 135 |
Desorption/ionization of molecular nanoclusters: SIMS versus MALDI Delcorte A, Hermans S, Devillers M, Lourette N, Aubriet F, Muller JF, Bertrand P |
136 - 140 |
Imaging by atomic force microscopy of the electrical properties difference of the facets of oxygen-ion-induced ripple topography in silicon Gautier B, Fares B, Prudon G, Dupuy JC |
141 - 145 |
Laboratory teaching of SIMS to university undergraduates Chater RJ, McPhail DS |
146 - 152 |
C-60 cluster ion bombardment of organic surfaces Weibel DE, Lockyer N, Vickerman JC |
153 - 158 |
Cluster primary ion bombardment of organic materials Kollmer F |
159 - 163 |
ToF-SIMS imaging with cluster ion beams Xu J, Ostrowski S, Szakal C, Ewing AG, Winograd N |
164 - 168 |
Investigation of secondary cluster ion emission from self-assembled monolayers of alkanethiols on gold with ToF-SIMS Schroder M, Sohn S, Arlinghaus HF |
169 - 173 |
Impact energy dependence of SF5+ ion beam damage of poly(methyl methacrylate) studied by time-of-flight secondary ion mass spectrometry Wagner MS, Gillen G |
174 - 178 |
Dynamic SIMS utilizing SF5+ polyatomic primary ion beams for drug delivery applications Mahoney CM, Roberson S, Gillen G |
179 - 182 |
Depth profiling studies of multilayer films with a C-60(+) ion source Sostarecz AG, Sun S, Szakal C, Wucher A, Winograd N |
183 - 185 |
C-60 molecular depth profiling of a model polymer Szakal C, Sun S, Wucher A, Winograd N |
186 - 190 |
Automated analysis of organic particles using cluster SIMS Gillen G, Zeissler C, Mahoney C, Lindstrom A, Fletcher R, Chi P, Verkouteren J, Bright D, Lareau RT, Boldman M |
191 - 195 |
Sputtering of indium using polyatomic projectiles Samartsev AV, Wucher A |
196 - 200 |
Polyatomic primary ion bombardment of organic materials: experiences in routine analysis Hagenhoff B, Pfitzer K, Tallarek E, Kock R, Kersting R |
201 - 206 |
Evaluation of a gold LMIG for detecting small molecules in a polymer matrix by ToF-SIMS Bryan SR, Belu AM, Hoshi T, Oiwa R |
207 - 216 |
Re-discovering surface mass spectrometry: chemical mapping from micro to macro Lloyd KG, O'Keefe DP |
217 - 223 |
Enhancing and automating TOF-SIMS data interpretation using principal component analysis Pachuta SJ |
224 - 229 |
Organic molecule characterization - G-SIMS Gilmore IS, Seah MP |
230 - 234 |
Multivariate statistical analysis of time-of-flight secondary ion mass spectrometry images using AXSIA Ohlhausen JAT, Keenan MR, Kotula PG, Peebles DE |
235 - 239 |
Principal component analysis of TOF-SIMS spectra, images and depth profiles: an industrial perspective Pacholski ML |
240 - 244 |
Optimal scaling of TOF-SIMS spectrum-images prior to multivariate statistical analysis Keenan MR, Kotula PG |
245 - 249 |
Multivariate statistical analysis of time-of-flight secondary ion mass spectrometry images-looking beyond the obvious Smentkowski VS, Ohlhausen JA, Kotula PG, Keenan MR |
250 - 255 |
Interest of silver and gold metallization for molecular SIMS and SIMS imaging Delcorte A, Bertrand P |
256 - 260 |
Organic SIMS: the influence of time on the ion yield enhancement by silver and gold deposition Adriaensen L, Vangaever F, Gijbels R |
261 - 264 |
Influence of primary ion bombardment conditions on the emission of molecular secondary ions Kersting R, Hagenhoff B, Kollmer F, Mollers R, Niehuis E |
265 - 268 |
Optimized conditions for selective gold flotation by ToF-SIMS and ToF-LIMS Chryssoulis SL, Dimov SS |
269 - 273 |
Additive quantification on polymer thin films by ToF-SIMS: aging sample effects Poleunis C, Medard N, Bertrand P |
274 - 277 |
Characterization of poly(p-phenylene vinylene)/methanofullerene blends of polymer solar cells by time-of-flight secondary ion mass spectrometry Bulle-Lieuwma CWT, van Duren JKJ, Yang X, Loos J, Sieval AB, Hummelen JC, Janssen RAJ |
278 - 282 |
TOF-SIMS study of modified polymer surfaces Lee Y, Han S, Kwon MH |
283 - 288 |
Determination of oligomeric chain length distributions at surfaces using ToF-SIMS: segregation effects and polymer properties Gardella JA, Mahoney CM |
289 - 295 |
ToF-SIMS molecular characterization and nano-SIMS imaging of submicron domain formation at the surface of PS/PMMA blend and copolymer thin films Kailas L, Audinot JN, Migeon HN, Bertrand P |
296 - 301 |
Molecular weight evaluation of poly-dimethylsiloxane on solid surfaces using silver deposition/TOF-SIMS Inoue M, Murase A |
302 - 308 |
Effect of deep UV (172 nm) irradiation on PET: ToF/SIMS analysis Zhu ZM, Kelley MJ |
309 - 313 |
Additive behavior in ultrathin polymer films investigated by ToF-SIMS Medard N, Bertrand P |
314 - 317 |
ToF-SIMS investigation of functional mixed aromatic thiol monolayers on gold Auditore A, Tuccitto N, Quici S, Marzanni G, Puntoriero F, Campagna S, Licciardello A |
318 - 322 |
Static SIMS study of the behavior of K atoms on -CH3, -CO2H and-CO2CH3 terminated self-assembled monolayers Zhu Z, Haynie BC, Winograd N |
323 - 327 |
Aldehydes react with scribed silicon to form alkyl monolayers -Characterization by ToF-SIMS suggests an even-odd effect Lua YY, Fillmore WJJ, Linford MR |
328 - 331 |
Layer-by-layer characterization of ultrathin films with secondary ion mass spectrometry Li Z, Rickman RD, Verkhoturov SV, Schweikert EA |
332 - 335 |
Investigation of fomblin Z-Dol end-groups on the magnetic recording disks by ToF-SIMS Ishikawa M, Osawa Y, Ishiwata O |
336 - 341 |
TOF-SIMS characterization of lubricants used in magnetic recording media Zhang BC, Liu HK, Chang S |
342 - 347 |
ToF-SIMS analysis of anti-fretting films generated on the surface of ball bearings containing dithiocarbamate and dithiophosphate grease additives Duque RG, Wang ZY, Duell D, Fowler DE |
348 - 352 |
A comparative study of carbocyanine dyes measured with TOF-SIMS and other mass spectrometric techniques Adriaensen L, Vangaever F, Gijbels R |
353 - 356 |
Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations Man N, Okumura H, Oizumi H, Nagai N, Seki H, Nishiyama I |
357 - 361 |
Ga+ TOF-SIMS lineshape analysis for resolution enhancement of MALDI MS spectra of a peptide mixture Malyarenko DI, Chen H, Wilkerson AL, Tracy ER, Cooke WE, Manos DM, Sasinowski M, Semmes OJ |
362 - 365 |
A ToF-SIMS study of linseed oil bonded to mercapto silane treated aluminium Bexell U, Olsson M, Sundell PE, Johansson M, Carlsson P, Hellsing A |
366 - 376 |
Analysis of adsorbed proteins by static time-of-flight secondary ion mass spectrometry Wagner MS, Castner DG |
377 - 384 |
Progress in cellular analysis using ToF-SIMS Lockyer NP, Vickerman JC |
385 - 391 |
Quantitative TOF-SIMS imaging of DNA microarrays produced by bubble jet printing technique and the role of TOF-SIMS in life science industry Hashimoto H, Nakamura K, Takase H, Okamoto T, Yamamoto N |
392 - 396 |
Development of PNA microarrays for gene diagnostics with TOF-SIMS Arlinghaus HF, Schroder M, Feldner JC, Brandt O, Hoheisel JD, Lipinsky D |
397 - 401 |
ToF-SIMS characterization of hybridization onto self-assembled single-stranded DNA monolayers Samuel NT, Castner DG |
402 - 405 |
ToF-SIMS surface and interface characterization of the immobilized camel antibody (cAb) onto SAMs-COOH/Au substrates Azioune A, Pireaux J, Houssiau L |
406 - 410 |
Interpretation of static time-of-flight ion mass spectral images of adsorbed protein films on topographically complex surfaces Rangarajan S, Tyler BJ |
411 - 415 |
TOF-SIMS imaging of protein adsorption on dialysis membrane Aoyagi S, Hayama M, Hasegawa U, Sakai K, Hoshi T, Kudo M |
416 - 419 |
ToF-SIMS applied to probe bixin in Bixa orellana seeds Houssiau L, Felicissimo M, Bittencourt C, Pireaux JJ |
420 - 423 |
ToF-SIMS studies as a tool to discriminate between spores and vegetative cells of bacteria Thompson CE, Jungnickel H, Lockyer NP, Stephens GM, Vickerman JC |
424 - 427 |
Molecule-specific imaging analysis of carcinogens in breast cancer cells using time-of-flight secondary ion mass spectrometry Quong JN, Knize MG, Kulp KS, Wu KJ |
428 - 431 |
Quantitative imaging of atomic and molecular species in cancer cultures with TOF-SIMS and Laser-SNMS Fartmann M, Kriegeskotte C, Dambach S, Wittig A, Sauerwein W, Arlinghaus HF |
432 - 436 |
Detection of protein immobilization on biosensor surfaces by TOF-SIMS Aoyagi S, Oiw Y, Kudo M |
437 - 441 |
Application of TOF-SIMS to monitor coating processes on biological and organic surfaces Chatterjee R |
442 - 446 |
Simultaneous determination of drug surface concentration and polymer degradation kinetics in biodegradable polymer/drug membranes: a model drug delivery system Lee JW, Gardella JA |
447 - 451 |
Rapid identification of phthalates in blood bags and food packaging using ToF-SIMS Chen CY, Ghule AV, Chen WY, Wang CC, Chiang YS, Ling YC |
452 - 456 |
Imaging ToF-SIMS and synchrotron-based FT-IR micro spectroscopic studies of prostate cancer cell lines Gazi E, Lockyer NP, Vickerman JC, Gardner P, Dwyer J, Hart CA, Brown MD, Clarke NW, Miyan J |
457 - 461 |
Subcellular SIMS imaging of gadolinium isotopes in human glioblastoma cells treated with a gadolinium containing MRI agent Smith DR, Lorey DR, Chandra S |
462 - 466 |
Subcellular SIMS imaging of isotopically labeled amino acids in cryogenically prepared cells Chandra S |
467 - 469 |
3D subcellular SIMS imaging in cryogenically prepared single cells Chandra S |
470 - 474 |
TOF-SIMS investigation of metallic material surface after culturing cells Aoyagi S, Hiromoto S, Hanawa T, Kudo M |
475 - 478 |
Subcellular localization of aluminum and indium in the rat kidney Galle P, Levi-Setti R, Lamperti A, Bourahla K, Escaig F |
479 - 484 |
Ion microprobe imaging of Ca-44-labeled mammalian chromosomes Levi-Setti R, Gavrilov KL, Strissel PL, Strick R |
485 - 489 |
Specific Mg2+ binding at human and Indian muntjac chromosomal Giemsa bands Strissel PL, Strick R, Gavrilov KL, Levi-Setti R |
490 - 496 |
Imaging of arsenic traces in human hair by nano-SIMS 50 Audinot JN, Schneider S, Yegles M, Hallegot P, Wennig R, Migeon HN |
497 - 501 |
Accumulation of chromium in root tissues of Eichhornia crassipes (Mart.) Solms. in Cachoeira river - Brazil Mangabeira PAO, Labejof L, Lamperti A, de Almeida AAF, Oliveira AH, Escaig F, Severo MIG, Silva DD, Saloes M, Mielke MS, Lucena ER, Martins MC, Santana KB, Gavrilov KL, Galle P, Levi-Setti R |
502 - 505 |
Influence of hydrocarbons on element detection in ion images by SIMS microscopy Takaya K, Okabe M, Sawataishi M, Yoshida T |
506 - 509 |
Laser-SNMS analysis of apatite formation in vitro Dambach S, Fartmann M, Kriegeskotte C, Bruning C, Wiesmann HP, Lipinsky D, Arlinghaus F |
510 - 514 |
Room temperature corrosion of museum glass: an investigation using low-energy SIMS Fearn S, McPhail DS, Oakley V |
515 - 519 |
TOF-SIMS measurement for the complex particulate matter in urban air environment Tomiyasu B, Suzuki K, Gotoh T, Owari M, Nihei Y |
520 - 523 |
TOF-SIMS analysis of sea salt particles: imaging and depth profiling in the discovery of an unrecognized mechanism for pH buffering Gaspar DJ, Laskin A, Wang W, Hunt SW, Finlayson-Pitts BJ |
524 - 527 |
ToF-SIMS analysis of atmospherically relevant sulphuric acid hydrate films and reactions thereof Fletcher JS, Vickerman JC |
528 - 532 |
A comparative study on detection of organic surface modifiers on mineral grains by TOF-SIMS, VUVSALI TOF-SIMS and VUVSALI with laser desorption Dimov SS, Chryssoulis SL |
533 - 537 |
ToF-SIMS as an alternative tool for the qualitative and quantitative analysis of polar herbicides Botreau M, Guignard U, Hoffmann L, Migeon HN |
538 - 542 |
Application of a cryo-stage in the TOF-SIMS analysis of atmospheric aerosol surfaces Nair AP, Tyler BJ, Peterson RE |
543 - 551 |
Challenges for the characterization and integration of high-kappa dielectrics Wallace RM |
552 - 555 |
The influence of oxygen on the Hf signal intensity in the characterization of HfO2/Si stacks Huyghebaert C, Conard T, Vandervorst W |
556 - 560 |
Analysis of high-k hfO(2) and HfSiO4 dielectric films Nieveen W, Schueler BW, Goodman G, Schnabel P, Moskito J, Mowat I, Chao G |
561 - 564 |
Quantification of nitrogen profiles in HfSiON films for gate dielectrics Yamamoto T, Miyamoto T, Karen A |
565 - 568 |
Sputter rate variations in silicon under high-k dielectric films Bennett J, Beebe M, Sparks C, Gondran C, Vandervorst W |
569 - 573 |
On the reliability of SIMS depth profiles through HfO2-stacks Vandervorst W, Bennett J, Huyghebaert C, Conard T, Gondran C, De Witte H |
574 - 580 |
ToF-SIMS profiling of HfO2/Si stacks: influence of sputtering condition of profile shape Conard T, Huyghebaert C, Vandervorst W |
581 - 584 |
Nitrogen analysis in high-k stack layers: a challenge Conard T, Vandervorst W, De Witte H, Van Elshocht S |
585 - 589 |
ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides Houssiau L, Vitchev RG, Conard T, Vandervorst W, Bender H |
590 - 593 |
SIMS study on N diffusion in hafnium oxynitride Gui D, Kang JF, Yu HY, Lim HF |
594 - 597 |
Backside-SIMS profiling of dopants in thin Hf silicate film Hongo C, Takenaka M, Kamimuta Y, Suzuki M, Koyama M |
598 - 602 |
High resolution depth profiling of thin STO in high-k oxide material Ehrke U, Sears A, Alff L, Reisinger D |
603 - 608 |
Depth profiling of ZrO2/SiO2/Si stacks - a TOF-SIMS and computer simulation study Ignatova VA, Conard T, Moller W, Vandervorst W, Gijbels R |
609 - 613 |
Characterization of high-k dielectrics with ToF-SIMS Ferrari S |
614 - 617 |
Depth profiles of boron and nitrogen in SiON films by backside SIMS Sameshima J, Maeda R, Yamada K, Karen A, Yamada S |
618 - 631 |
Errors in near-surface and interfacial profiling of boron and arsenic Vandervorst W, Janssens T, Brijs B, Conard T, Huyghebaert C, Fruhauf J, Bergmaier A, Dollinger G, Buyuklimanli T, VandenBerg JA, Kimura K |
632 - 635 |
Arsenic shallow depth profiling: accurate quantification inSiO(2)/Si stack Barozzi M, Giubertoni D, Anderle M, Bersani A |
636 - 639 |
Improved near surface characterization of shallow arsenic distribution by SIMS depth profiling Buyuklimanli TH, Marino JW, Novak SW |
640 - 644 |
Toward accurate in-depth profiling of As and P ultra-shallow implants by SIMS Merkulov A, de Chambost E, Schuhmacher M, Peres P |
645 - 648 |
Ultra-shallow arsenic implant depth profiling using low-energy nitrogen beams Fearn S, Chater R, McPhail D |
649 - 652 |
Evaluation of BN-delta-doped multilayer reference materials for shallow depth profiling in SIMS: round-robin test Toujou F, Yoshikawa S, Homma Y, Takano A, Takenaka H, Tomita M, Li Z, Hasegawa T, Sasakawa K, Schuhmacher M, Merkulov A, Kim HK, Moon DW, Hong T, Won JY |
653 - 657 |
Sub-keV secondary ion mass spectrometry depth profiling: comparison of sample rotation and oxygen flooding Liu R, Wee ATS |
658 - 662 |
a-Si capping SIMS for shallow dopant profiles Miwa S |
663 - 667 |
Site-specific SIMS backside analysis Gu C, Garcia R, Pivovarov A, Stevie F, Griffis D |
668 - 672 |
Backside and frontside depth profiling of B delta doping, at low energy, using new and previous magnetic SIMS instruments Laugier F, Hartmann JM, Moriceau H, Holliger P, Truche R, Dupuy JC |
673 - 677 |
Accurate depth profiling for ultra-shallow implants using backside-SIMS Hongo C, Tomita M, Takenaka M |
678 - 683 |
Influence of surface orientation on the formation of sputtering-induced ripple topography in silicon Fares B, Gautier B, Baboux N, Prudon G, Holliger P, Dupuy JC |
684 - 687 |
O-2(+) versus Cs+ for high depth resolution depth profiling of III-V nitride-based semiconductor devices Kachan M, Hunter J, Kouzminov D, Pivovarov A, Gu J, Stevie F, Griffis D |
688 - 692 |
Effects of crystalline regrowth on dopant profiles in prearnorphized silicon Hopstaken MJP, Tamminga Y, Verheijen MA, Duffy R, Venezia VC, Heringa A |
693 - 697 |
Energy and angular dependence of the sputter yield and ionization yield of Ge bombarded by O-2(+) Huyghebaert C, Conard T, Vandervorst W |
698 - 703 |
SIMS depth profiling of SiGe : C structures in test pattern areas using low energy cesium with a Cameca IMS Wf Juhel M, Laugier F |
704 - 707 |
Matrix effects in SIMS depth profiles of SiGe relaxed buffer layers Sanchez-Almazan F, Napolitani E, Carnera A, Drigo AV, Isella G, von Kanel H, Berti M |
708 - 712 |
Impact of the Ge concentration on the Ge-ionisation probability and the matrix sputter yield for a, SiGe matrix under oxygen irradiation Huyghebaert C, Conard T, Brijs B, Vandervorst W |
713 - 715 |
Use of SIMS in SiGe process control Maul JL, Chou PF, Lu YH |
716 - 719 |
Quantifying residual and surface carbon using polyencapsulation SIMS Beebe M, Bennett J, Barnett J, Berlin A, Yoshinaka T |
720 - 724 |
Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS, ICP-MS, and TXRF Rostam-Khani P, Hopstaken MJP, Vullings P, Noij G, O'Halloran O, Claassen W |
725 - 728 |
Study on change in SIMS intensities near the interface between silicon-nitride film and silicon substrate Hasegawa T, Date T, Karen A, Masuda A |
729 - 733 |
Quantitative measurement of O/Si ratios in oxygen- sputtered silicon using O-18 implant standards Sobers RC, Franzreb K, Williams P |
734 - 737 |
Application of TXRF for ion implanter dose matching experiments Frost MR, French M, Harris W |
738 - 742 |
Secondary ion mass spectrometry characterization of indium-implanted silicon wafers Blackmer-Krasinski C, Morinville WR |
743 - 748 |
Optimization of SIMS analyses performed in the MCsx(+) mode by using an in situ deposition of Cs Wirtz T, Migeon HN |
749 - 753 |
Cesium/xenon dual beam depth profiling with TOF-SIMS: measurement and modeling of M+, MCs+, and (MCS2)-C-2 (+) yields Brison J, Conard T, Vandervorst W, Houssiau L |
754 - 757 |
Cation Mass Spectrometer (CMS): recent developments for quantitative analyses of positive and negative secondary ions Philipp P, Wirtz T, Migeon HN, Scherrer H |
758 - 761 |
Hydrogen redistribution in CVD SiO2 during post-oxidation annealing investigated by SIMS Kawashima Y, Kawano H, Terashima K, Hamada K, Aoyagi S, Kudo M |
762 - 767 |
Sputtered depth scales of multi-layered samples with in situ laser interferometry: arsenic diffusion in Si/SiGe layers Ronsheim PA, Loesing R, Madan A |
768 - 771 |
Short-term and long-term RSF repeatability for CAMECA SC-Ultra SIMS measurements Barozzi M, Giubertoni D, Anderle A, Bersani A |
772 - 775 |
Front- and back-end process characterization by SIMS to achieve electrically matched devices Budri T, Kouzminov D |
776 - 780 |
Effects of contamination on selective epitaxial growth MacDonald BJ, Paton E, Adem E, En B |
781 - 785 |
Utilization of electron impact ionization of gaseous and sputtered species in the secondary ion acceleration region of a magnetic sector SIMS instrument Pivovarov A, Gu C, Stevie F, Griffis D |
786 - 790 |
Improved charge neutralization method for depth profiling of bulk insulators using O-2(+) primary beam on a magnetic sector SIMS instrument Pivovarov AL, Stevie FA, Griffis DP |
791 - 795 |
SIMS study of Cu trapping and migration in low-k dielectric films Li YP, Hunter J, Tate TJ |
796 - 799 |
Optimization of SIMS analysis conditions for Na, S, P and N in Cu films Li YP |
800 - 803 |
Deconvolution analysis of dopant depth profile of Si at AlGaAs/GaAs interface using Al composition profile as reference Kawashima Y, Ide T, Aoyagi S, Kudo M |
804 - 807 |
Copper-indium-gallium-diselenide/molybdenum layers analyzed by corrected SIMS depth profiles Bilger G, Grabitz PO, Strohm A |
808 - 812 |
Characterization of light element impurities in gallium-nitride-phosphide by SIMS analysis Reedy RC, Geisz JF, Ptak AJ, Keyes BM, Metzger WK |
813 - 816 |
Characterization of silicon nanocrystals embedded in thin oxide layers by TOF-SIMS Perego M, Ferrari S, Fanciulli M, Ben Assayag G, Bonafos C, Carrada M, Claverie A |
817 - 820 |
Cluster ion emission from nitrogen-doped GaAs and optimization of SIMS conditions for nitrogen analysis Guryanov GM |
821 - 825 |
Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach Alberici SG, Zonca R, Pashmakov B |
826 - 828 |
Zinc determination in A(3)B(5) semiconductors Yu KD, Kovarsky AP |
829 - 833 |
The role of dynamic SIMS in process development for high-temperature superconducting wire Ericson RE |
834 - 839 |
Oxygen isotopic tracer measurements in ceramics and ceramic composites with a fine focus gallium primary ion gun Chater RJ, McPhail DS |
840 - 844 |
TOF-SIMS study of pyridine intercalated nanorods of bismuth molybdate Ghule AV, Chen CY, Mei FD, Ling YC |
845 - 849 |
Reaction monitoring of polyaniline film formation on carbon nanotubes with TOF-SIMS Chen WY, Chen CY, Hsu KY, Wang CC, Ling YC |
850 - 853 |
ToF-SIMS depth profiling of alumina scales formed on a FeCrAl high-temperature alloy Engkvist J, Bexell U, Grehk TM, Olsson M |
854 - 858 |
Effect of low level contamination on TiAl alloys studied by SIMS Teodoro OMND, Barbosa J, Naia MD, Moutinho AMC |
859 - 863 |
SIMS analyses on Co : ns-C thin films Lamperti A, Garvilov KL, Levi-Setti R, Bongiorno G, Blomqvist M, Ossi PM, Bottani CE |
864 - 867 |
Evaluation of oxygen in oxide materials by SIMS using O-18(2) gas Takeda S |
868 - 873 |
Characterization of nickel phosphorus surface by ToF-SIMS Zhang BC, Barth G, Liu HK, Chang S |
874 - 877 |
QSA influences on isotopic ratio measurements Slodzian G, Hillion F, Stadermann FJ, Zinner E |
878 - 882 |
Achieving high reproducibility isotope ratios with the Cameca IMS 1270 in the multicollection mode Schuhmacher M, Fernandes F, de Chambost E |
883 - 887 |
Multi-correlation analyses of TOF-SIMS spectra for mineralogical studies Engrand C, Lespagnol J, Martin P, Thirkell L, Thomas R |
888 - 892 |
Cryogenic SIMS and its applications in the earth sciences Wiedenbeck M, Rhede D, Lieckefett R, Witzki H |
893 - 898 |
FIB-SIMS analysis of micro-particle impacts on spacecraft materials returned from low-earth orbit Kettle S, Chater RJ, Graham GA, McPhail DS, Kearsley AT |
899 - 902 |
SIMS analyses of Mg, Cr, and Ni isotopes in primitive meteorites and short-lived radionuclides in the early solar system Guan Y, Huss GR, Leshin LA |
903 - 906 |
SIMS study of self-consisted fractionation of iron and titanium isotopes in ilmenites Didenko PI, Efremov AA |
907 - 911 |
Silicon isotopic zoning in silicon crystals caused by the isotopic fractionation at the crystal-melt interface Morishita Y, Satoh H |
912 - 916 |
Peak fitting to resolve CN- isotope ratios in biological and environmental samples using TOF-SIMS Cliff JB, Gaspar DJ, Bottomley PJ, Myrold DD |
917 - 920 |
Using SIMS to diagnose color changes in heat treated gem sapphires Novak SW, Magee CW, Moses T, Wang WY |
921 - 925 |
SIMION modeling of ion optical effects in Cameca ion microanalyzers: simulation of ion transmission losses Lorincik J, Franzreb K, Williams P |
926 - 929 |
High-resolution primary ion beam probe for SIMS Guharay SK, Douglass S, Orloff J |
930 - 935 |
Evaluation of the nano-beam SIMS apparatus Nojima M, Toi M, Maekawa A, Tomiyasu B, Sakamoto T, Owari M, Nihei Y |
936 - 939 |
The development of C-60 and gold cluster ion guns for static SIMS analysis Hill R, Blenkinsopp PWM |
940 - 944 |
Development of a column delivering a collimated stream of Cs-0 for SIMS purposes Wirtz T, Migeon HN |
945 - 948 |
Development of compact cluster ion sources using metal cluster complexes - Ionization properties of metal cluster complexes Mizota T, Nonaka H, Fujimoto T, Kurokawa A, Ichimura S |
949 - 953 |
Latest developments for the CAMECA ULE-SIMS instruments: IMS Wf and SC-Ultra de Chambost E, Merkulov A, Peres P, Rasser B, Schuhmacher M |
954 - 958 |
Accurate on-line depth calibration with a laser interferometer during SIMS profiling on the Cameca IMS WF instrument Merkulov A, Merkulova O, de Chambost E, Schuhmacher M |
959 - 961 |
Sample holder implement for very small samples on SC-ultra SIMS instrument Barozzi M, Giubertoni D, Sbetti M, Anderle M, Bersani M |
962 - 966 |
A new horizon in secondary neutral mass spectrometry: post-ionization using a VUV free electron laser Veryovkin IV, Calaway WF, Moore JF, Pellin MJ, Lewellen JW, Li YL, Milton SV, King BV, Petravic M |
967 - 971 |
Rapid characterisation of surface modifications and treatments using a benchtop SIMS instrument McPhail DS, Sokhan M, Rees EE, Cliff B, Eccles AJ, Chater RJ |
972 - 975 |
High mass resolution SIMS Maharrey S, Bastasz R, Behrens R, Highley A, Hoffer S, Kruppa G, Whaley J |
976 - 980 |
Development of an instrument for simultaneous detection of positive and negative scanning ion images Seki S, Tamura H, Kanoh T, Satoh T |