379 - 383 |
Determination of density and distribution of high-voltage stress-induced traps in O-2-, NO- and NO/O-2/NO-plasma grown oxides on strained Si Bera LK, Senapati B, Maikap S, Maiti CK |
385 - 389 |
An improved method for determining the critical energy for interface trap generation of n-MOSFETs under V-g = V-d/2 stress mode Mu FC, Mao LF, Wei JL, Tan CH, Xu MZ |
391 - 397 |
A simple subthreshold swing model for short channel MOSFETs Godoy A, Lopez-Villanueva JA, Jimenez-Tejada JA, Palma A, Gamiz F |
399 - 404 |
Implanted collector profile optimization in a SiGeHBT process Malm BG, Johansson T, Arnborg T, Norstrom H, Grahn JV, Ostling M |
405 - 410 |
Schottky rectifiers fabricated on free-standing GaN substrates Johnson JW, LaRoch JR, Ren F, Gila BP, Overberg ME, Abernathy CR, Chyi JI, Chou CC, Nee TE, Lee CM, Lee KP, Park SS, Park YJ, Pearton SJ |
411 - 415 |
Fabrication and characteristics of Au/PZT/BIT/p-Si ferroelectric memory diode Yu J, Wang H, Dong XM, Zhou WL, Wang YB, Zheng YK, Zhao JH |
417 - 421 |
Influence of the AlN buffer layer growth on AlGaN/GaN films deposited on (111)Si substrates Liaw HM, Venugopal R, Wan J, Melloch MR |
423 - 426 |
Probing the microscopic compositions at Ga2O3(Gd2O3)/GaAs interface by core level photoelectron spectroscopy Lay TS, Huang KH, Hung WH, Hong M, Kwo J, Mannaerts JP |
427 - 430 |
Characterization of p-type InxGa1-xN grown by metalorganic chemical vapor deposition Wen TC, Lee WI, Sheu JK, Chi GC |
431 - 433 |
1/f noise behaviors of NO-nitrided n-MOSFETs Xu JP, Lai PT, Cheng YC |
435 - 439 |
A novel method for determining the effect of interface trap generation on the degradation of n-MOSFETs under different hot-carrier stress modes Mu FC, Xu MZ, Tan CH |
441 - 446 |
Geometry optimization of interdigitated Schottky-barrier metal-semiconductor-metal photodiode structures Averine SV, Chan YC, Lam YL |
447 - 452 |
S-shaped negative differential resistance in 650 nm quantum well laser diodes Yin M, Smowton PM, Blood P, McAuley B, Button CC |
453 - 459 |
Temperature dependence of turn-on processes in 4H-SiC thyristors Levinshtein ME, Mnatsakanov TT, Ivanov PA, Agarwal AK, Palmour JW, Rumyantsev SL, Tandoev AG, Yurkov SN |
461 - 465 |
Effects of post-deposition treatments on ultrathin nitride/oxide gate stack prepared by RTCVD for ULSI devices Chen CH, Fang YK, Yang CW, Ting SF, Tsair YS, Wang MF, Chen SC, Yu CH, Liang MS |
467 - 470 |
Effect of N-2 plasma treatments on dry etch damage in n- and p-type GaN Kent DG, Lee KP, Zhang AP, Luo B, Overberg ME, Abernathy CR, Ren F, Mackenzie KD, Pearton SJ, Nakagawa Y |
471 - 474 |
Interface properties of N2O-annealed SiC metal oxide semiconductor devices Chakraborty S, Lai PT, Xu JP, Chan CL, Cheng YC |
475 - 482 |
Comparison of titanium and platinum Schottky barrier heights to Ga0.47In0.53As obtained from Franz Keldysh oscillations and Schottky diode characteristics Shamir N, Sheinman B, Ritter D, Gershoni D |
483 - 488 |
Modelling and characterisation of the input I-V curves of bipolar JFET structures showing a negative resistance behaviour Bellone S, Daliento S, Sanseverino A |
489 - 494 |
Investigation of an InGaP/GaAs resonant-tunneling heterojunction bipolar transistor Pan HJ, Feng SC, Wang WC, Lin KW, Yu KH, Wu CZ, Laih LW, Liu WC |
495 - 505 |
Microphotonic components for a mm-wave receiver Cohen DA, Levi AFJ |
507 - 510 |
Threshold voltage definition and extraction for deep-submicron MOSFETs Zhou X, Lim KY, Qian W |
511 - 517 |
An analytical method for the thermal layout optimisation of multilayer structure solid-state devices Pesare M, Giorgio A, Perri AG |
519 - 523 |
Room temperature simulation of a novel quantum wire transistor Haque A, Quddus MR |
525 - 526 |
A note on the relation between discrete and resonance energies in quantum structures Dargys A, Cimmperman P |
527 - 529 |
On the mobility extraction for HMOSFETs Straube UN, Evans AGR, Braithwaite G, Kaya S, Watling J, Asenov A |
531 - 534 |
Numerical analysis for root-mean-square roughness of SiO2/Si interface on direct tunneling current in ultrathin MOSFETs Mao LF, Tan CH, Xu MZ |
535 - 536 |
Comments on "A closed form expression for punch-through limited breakdown voltage of parallel-plane junction" He J, Zhang X, Huang R, Wang YY |
537 - 537 |
Comments on "A closed form expression for punch-through limited breakdown voltage of parallel-plane junction" - Response to the comments Chung SK |