Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.21, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (129 articles)

L1 - L3	Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon monofluoride ions on silicon dioxide surfaces Ishikawa K, Karahashi K, Tsuboi H, Yanai K, Nakamura M
831 - 837	Thermal stability and hydrogen atom induced etching of nanometer-thick a-Si : H films grown by ion-beam deposition on Si(100) surfaces Biener J, Lutterloh C, Wicklein M, Dinger A, Kuppers J
838 - 841	Photoluminescence of Mg-doped GaN grown by metalorganic chemical vapor deposition Qu BZ, Zhu QS, Sun XH, Wan SK, Wang ZG, Nagai H, Kawaguchi Y, Hiramatsu K, Sawaki N
842 - 845	Energetic deposition of niobium thin film by ecr-plasma Wu G, Phillips HL, Sundelin RM
846 - 850	Effect of sputtering pressure on residual stress in Ni films using energy-dispersive x-ray diffraction Alfonso JA, Greaves ED, Lavelle B, Sajo-Bohus L
851 - 859	Structural and mechanical properties of diamond-like carbon films deposited by direct current magnetron sputtering Broitman E, Hellgren N, Czigany Z, Twesten RD, Luning J, Petrov I, Hultman L, Holloway BC
860 - 865	X-ray photoemission spectra and x-ray excited Auger spectrum investigation of the electronic structure of Pd-3(PS4)(2) Grasso V, Silipigni L
866 - 873	Laser desorption time-of-flight mass spectrometry of fluorocarbon films synthesized by C4F8/H-2 plasmas Shibagaki K, Maeda T, Takada N, Sasaki K, Kadota K
874 - 880	Pulsed laser ultrahigh vacuum deposited silicon in the presence of excess cesium and oxygen studied with x-ray photoelectron spectroscopy and atomic force microscopy Choo CK, Tanaka K, Suzuki H, Saotome N, Ichida K
881 - 891	Edison's vacuum technology patents Waits RK
892 - 894	Low temperature pulsed etching of large glass substrates Dubost L, Bellinger A, Perrin J, Boswell RW
895 - 899	Effects of Si addition on the microstructural evolution and hardness of TI-Al-Si-N films prepared by the hybrid system of arc ion plating and sputtering techniques Park IW, Choi SR, Lee MH, Kim KH
900 - 905	Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)(3)Cl precursor and mixtures Ar/O-2 as plasma gas Barranco A, Cotrino J, Yubero F, Girardeau T, Camelio S, Clerc C, Gonzalez-Elipe AR
906 - 910	Microstructural and optical properties of aluminum oxide thin films prepared by off-plane filtered cathodic vacuum arc system Zhao ZW, Tay BK, Lau SP, Xiao CY
911 - 921	Feature profile evolution in high-density plasma etching of silicon with Cl-2 Jin WD, Sawin HH
922 - 936	Determination of Ti+-flux and Ar+-flux of ionized physical vapor deposition of titanium from multiscale model calibration with test structures Jacobs W, Kersch A, Ruf A, Urbansky N
937 - 946	Comparison of the stability of hot and cold cathode ionization gauges Li DT, Jousten K
947 - 954	Mechanism of hardening in Cr-Al-N-O thin films prepared by pulsed laser deposition Hirai M, Suzuki T, Suematsu H, Jiang W, Yatsui K
955 - 966	Etching silicon by SF6 in a continuous and pulsed power helicon reactor Herrick A, Perry AJ, Boswell RW
967 - 972	X-ray diffraction study of residual stresses and microstructure in tungsten thin films sputter deposited on polyimide Villain P, Goudeau P, Ligot J, Benayoun S, Badawi KF, Hantzpergue JJ
973 - 978	Standards for surface analysis: ASTM committee E-42 on surface analysis Czanderna AW
979 - 982	Raman and photoluminescence of ZnO films deposited on Si(111) using low-pressure metalorganic chemical vapor deposition Ye JD, Gu SL, Zhu SM, Chen T, Liu W, Qin F, Hu LQ, Zhang R, Shi Y, Zheng YD
983 - 987	Surface morphology and dynamic scaling in growth of iron nitride thin films deposited by dc magnetron sputtering Wang X, Zheng WT, Gao LJ, Wei L, Guo W, Bai YB, Fei WD, Meng SH, He XD, Han JC
988 - 993	Ionic densities and ionization fractions of sputtered titanium in radio frequency magnetron sputtering Okimura K, Nakamura T
994 - 1003	Thermal plasma fabricated lithium niobate-tantalate films on sapphire substrate Kulinich SA, Yoshida T, Yamamoto H, Terashima K
1004 - 1008	Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation Cho MH, Shin JS, Roh YS, Lyo IW, Jeong K, Whang CN, Lee JS, Yoo JY, Lee NI, Fujihara K, Moon DW
1009 - 1016	Oxygen environmental Auger electron spectroscopy: Eliminating the electron beam effects on Al2O3 during Auger analysis Guo HS, Maus-Friedrichs W, Kempter V, Ji Y
1017 - 1023	Investigation of SrBi2Ta2O9 thin films etching mechanisms in Cl-2/Ar plasma Efremov AM, Kim DP, Kim CI
1024 - 1032	Substrate temperature effects on surface reactivity of SiFx (x=1,2) radicals in fluorosilane plasmas Williams KL, Fisher ER
1033 - 1037	Growth and effects of remote-plasma oxidation on thin films of HfO2 prepared by metal-organic chemical-vapor deposition Yamamoto K, Asai M, Horii S, Miya H, Niwa M
1038 - 1047	C4F8 dissociation in an inductively coupled plasma Radtke MT, Coburn JW, Graves DB
1048 - 1054	Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition Alpuim P, Chu V, Conde JP
1055 - 1063	Microstructure evolution of Al-Mg-B thin films by thermal annealing Tian Y, Constant A, Lo CCH, Anderegg JW, Russell AM, Snyder JE, Molian P
1064 - 1068	Comparison of silicon dioxide layers grown from three polymethylsiloxane precursors in a high-density oxygen plasma Qi Y, Xiao ZG, Mantei TD
1069 - 1072	A study for the bias control of indium-tin-oxide films synthesized by cesium assisted radio frequency magnetron sputtering Lee DY, Lee SJ, Song KM, Baik HK
1073 - 1075	Infrared thermal annealing device Gladys MJ, Clarke I, O'Connor DJ
1076 - 1076	Monitoring and purging dynamics of trace gaseous impurity in atmospheric pressure rapid thermal process (vol 21, pg 676, 2003) Hu YZ, Tay SP
1079 - 1079	Papers from the 49th International Symposium of the AVS - Preface Lucovsky G
1081 - 1086	Quantitative x-ray photoelectron spectroscopy: Simple algorithm to determine the amount of atoms in the outermost few nanometers Tougaard S
1087 - 1091	Chemical bonding of perfluoropolyether with carbon underlying layer induced by visible laser light Zhu L, Zhang J, Liew T, Ye KD
1092 - 1097	Development of radio-frequency magnetron sputtered indium molybdenum oxide Yoshida Y, Gessert TA, Perkins CL, Coutts TJ
1098 - 1102	Characterizing topography-induced contrast in photoelectron emission microscopy Siegrist K, Williams ED, Ballarotto VW
1103 - 1108	Progress in spectroscopic ellipsometry: Applications from vacuum ultraviolet to infrared Hilfiker JN, Bungay CL, Synowicki RA, Tiwald TE, Herzinger CM, Johs B, Pribil GK, Woollam JA
1109 - 1114	Surface analytical characterization of SiO2 gradient membrane coatings on gas sensor microarrays Bruns M, Frietsch M, Nold E, Trouillet V, Baumann H, White R, Wright A
1115 - 1119	dc field-emission analysis of GaAs and plasma-source ion-implanted stainless steel Hernandez C, Wang T, Siggins T, Bullard D, Dylla HF, Reece C, Theodore ND, Manos DM
1120 - 1125	Interfacial interactions of polymer coatings with oxide-free phosphate films on metal surfaces Wang YQ, Sherwood PMA
1126 - 1132	Valence-band x-ray photoelectron spectroscopic studies of different forms of sodium phosphate Asunskis AL, Gaskell KJ, Asunskis DJ, Sherwood PMA
1133 - 1138	Valence-band x-ray photoelectron spectroscopic studies of vanadium phosphates and the formation of oxide-free phosphate films on metallic vanadium Asunskis DJ, Sherwood PMA
1139 - 1144	Environment, health, and safety performance plays a vital role in sustaining the growth of the semiconductor industry Miller C, Worth W
1145 - 1151	Cell adhesion and spreading on polymer surfaces micropatterned by ion beams Satriano C, Carnazza S, Licciardello A, Guglielmino S, Marletta G
1152 - 1156	Fabrication of microstructured copper on an indium-tin-oxide surface using a micropatterned self-assembled monolayer as a template Asakura S, Hirota M, Fuwa A
1157 - 1161	Dynamic and static measurements on epitaxial Fe/Si/Fe Kuanr BK, Buchmeier M, Buergler DE, Gruenberg P, Camley R, Celinski Z
1162 - 1166	Correlation between microstructural and magnetic properties in Fe/KCoF3 bilayers Malkinski L, O'Keevan T, Camley RE, Celinski Z, He J, Zhou WL, Hecker M, Schneider CM, Szade J, Skrzypek D
1167 - 1171	High-frequency noise measurements in spin-valve devices Stutzke NA, Burkett SL, Russek SE
1172 - 1177	Metallization schemes for radio frequency microelectfornechanical system switches Leedy KD, Cortez R, Ebel JL, Strawser RE, Walker AP, DeSalvo GC, Young RM
1178 - 1182	Inorganic electret using SiO2 thin, films prepared by radio-frequency magnetron sputtering Minami T, Utsubo T, Miyata T, Ohbayashi Y
1183 - 1187	Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing Chang CH, Leou KC, Lin C, Lin TL, Tseng CW, Tsai CH
1188 - 1193	Nanoscale oxidation of zirconium surfaces: Kinetics and mechanisms Farkas N, Zhang G, Evans EA, Ramsier RD, Dagata JA
1194 - 1197	Surface electronic structure of a vicinal Cu crystal Lobo J, Michel EG, Bachmann AR, Speller S, Roca L, Kuntze J, Ortega JE
1198 - 1201	Surface modification of aligned carbon nanotube arrays for electrochemical sensing applications Soundarrajan P, Patil A, Dai LM
1202 - 1204	Effects of carbon-containing gases on the field-emission current of multiwalled carbon-nanotube arrays Sheng LM, Liu P, Liu YM, Qian L, Huang YS, Liu L, Fan SS
1205 - 1209	Energetic neutral fluxes towards surfaces-in a magnetically enhanced reactive ion etch-like reactor Sabisch W, Kratzer M, Brinkmann RP
1210 - 1217	Formation of polycrystalline silicon ciermanium/HfO2 gate stack structure using inductively coupled plasma etching Chen JH, Tan KM, Wu N, Yoo WJ, Chan DSH
1218 - 1224	Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge Buyle G, Depla D, Eufinger K, Haemers J, De Gryse R, De Bosscher W
1225 - 1229	Improvement of bond strength of plasma-sprayed hydroxyapatite/titanium composite coatings on titanium: Partial nitriding of titanium deposits by rf thermal plasma Inagaki M, Yokogawa Y, Kameyama T
1230 - 1236	Experimental study on a new sterilization process using plasma source ion implantation. with N-2 gas Yoshida M, Tanaka T, Watanabe S, Takagi T, Shinohara M, Fujii S
1237 - 1246	Improvement of luminance and luminous efficiency for optimal Penning gas mixtures in alternating current plasma display panels Lee SJ, Lee JK, Kang ES, Kim TW, Hwang HJ
1247 - 1252	Barium-strontium-titanate etching characteristics in chlorinated discharges Stafford L, Margot J, Langlois O, Chaker M
1253 - 1259	Measuring vacuum ultraviolet radiation-induced damage Lauer JL, Shohet JL, Hansen RW
1260 - 1265	Microhollow cathode discharges Schoenbach KH, Moselhy M, Shi W, Bentley R
1266 - 1271	High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor Schaepkens M, Selezneva S, Moeleker P, Iacovangelo CD
1272 - 1278	Stability of carbon subatomic films on metal surface against bombardment by low-energy gas ions Babaev VP, Suvorov AL, Zaluzhny AG, Dev'jatko JN, Lazarev NE, Zaluzhny AA
1279 - 1283	Shape transformation of silicon trenches during hydrogen annealing Kuribayashi H, Hiruta R, Shimizu R, Sudoh K, Iwasaki H
1284 - 1289	Kinetic Monte Carlo simulations of the autocatalytic adsorption effect: CO on ZnO Stephan J, Burghaus U
1290 - 1293	Oxygen adsorption on Cu-9 at. %Al(111) studied by low energy electron diffraction and Auger electron spectroscopy Yoshitake M, Bera S, Yamauchi Y, Song WJ
1294 - 1297	Bias voltage dependence of apparent local barrier height at constant tip-sample separation Yagyu S, Yoshitake M
1298 - 1301	Electronic structure of SixSn((1-x))/Si(111)-(root 3 X root 3)R30 degrees phases Lobo J, Tejeda A, Mugarza A, Michel EG
1302 - 1306	Using chemical probes to investigate properties of monolayer metal thin films Khan NA, Chen JG
1307 - 1311	Adsorption and reaction of NO on oxidized and reduced SrTiO3(100) surfaces Azad S, Szanyi J, Peden CHF, Wang LQ
1312 - 1316	Observation of an isotope effect in femtosecond laser-induced desorption of O-2/Pd(111) Quinn DP, Heinz TF
1317 - 1321	Effects of adsorbates on charge exchange in Li+ ion scattering from Ni(100) Yang Y, Yarmoff JA
1322 - 1325	Coadsorption of CO and hydrogen on the Zn-terminated surface of ZnO: A molecular beam study Kunat M, Burghaus U
1326 - 1331	Thermal stability of thin Ti films on Al single crystal surfaces Ramana CV, Choi BS, Smith RJ, Hutchinson R, Stuk SP, Park BS, Saleh AA, Jeon DR
1332 - 1335	Scanning tunneling microscopy studies of the Cu : Si(5512) system Woodworth PH, Moore JC, Baski AA
1336 - 1341	p-type semiconducting Cu2O-CoO thin films prepared by magnetron sputtering Suzuki S, Miyata T, Minami T
1342 - 1346	Chemical vapor deposition-formed p-type ZnO thin films Li X, Yan Y, Gessert TA, Perkins CL, Young D, DeHart C, Young M, Coutts TJ
1347 - 1350	Super-smooth indium-tin oxide thin films by negative sputter ion beam technology Sohn MH, Kim D, Kim SJ, Paik NW, Gupta S
1351 - 1354	Indium tin oxide films with low resistivity and low internal stress Takayama S, Sugawara T, Tanaka A, Himuro T
1355 - 1358	Role of carbon in boron suboxide thin films Music D, Kugler VM, Czigany Z, Flink A, Werner O, Schneider JM, Hultman L, Helmersson U
1359 - 1365	Effects of growth temperature on the properties of atomic layer deposition grown ZrO2 films Scarel G, Ferrari S, Spiga S, Wiemer C, Tallarida G, Fanciulli M
1366 - 1370	Atomic layer deposition of Al2O3 thin films using dimethylaluminum isopropoxide and water Cho W, Sung K, An KS, Lee SS, Chung TM, Kim Y
1371 - 1375	Origin of crystalline quality deterioration in epitaxial growth of CeO2 layers on Si substrates Inoue T, Sakamoto N, Horikawa A, Takakura H, Takahashi K, Ohashi M, Shida S
1376 - 1380	Large remanent polarization of cerium-modified bismuth-titanate thin films for ferroelectric random access memories Kim KT, Kim CI, Kang DH, Shim IW
1381 - 1385	Analysis of stresses in Ru thin films prepared by chemical vapor deposition Lim HJ, Kang SY, Hwang CS, Kim HJ
1386 - 1388	Effects of graphite content on carbon nitride films prepared by hot carbon filament chemical vapor deposition Aizawa S, Aono M, Kitazawa N, Watanabe Y, Shimizu O, Suda Y
1389 - 1392	Effects of starting material of aluminum doped zinc oxide underlayer on the electric properties of palladium doped silver film Oyama T, Maekawa M, Yanagisawa T
1393 - 1398	X-ray photoelectron spectroscopy study of the first stages of ZnO growth and nanostructure dependence of the effects of polarization at ZnO/SiO2 and ZnO/Al2O3 interfaces Martin-Concepcion AI, Yubero F, Espinos JP, Gonzalez-Elipe AR, Tougaard S
1399 - 1403	Properties of Co-deposited indium tin oxide and zinc oxide films using a bipolar pulse power supply and a dual magnetron sputter source Hwang MS, Jeong HS, Kim WM, Seo YW
1404 - 1408	High-rate deposition of ZnO thin films by vacuum arc plasma evaporation Miyata T, Ida S, Minami T
1409 - 1413	Photocatalytic properties of TiO2/WO3 bilayers deposited by reactive sputtering Takahashi T, Nakabayashi H, Yamada N, Tanabe J
1414 - 1418	Influence of working gas pressure on structure and properties of WO3 films reactively deposited by rf magnetron sputtering Takahashi T, Tanabe J, Yamada N, Nakabayashi H
1419 - 1423	Correlation between crystallographic orientations and Raman spectra of TiO2 sputtered films with changing degrees of plasma exposure Takahashi T, Nakabayashi H, Tanabe J, Yamada N, Mizuno W
1424 - 1430	Thermal behavior of hafnium-based ultrathin films on silicon Pezzi RP, Morais J, Dahmen SR, Bastos KP, Miotti L, Soares GV, Baumvol IJR, Freire FL
1431 - 1435	Epitaxial growth of thin Ag and Au films on Si(111) using thin copper silicide buffer layers Pedersen K, Morgen P, Pedersen TG, Li ZS, Hoffmann SV
1436 - 1441	Present status of the KEK B-factory vacuum system Suetsugu Y, Kanazawa K, Kato S, Hisamatsu H, Shimamoto M, Shirai M
1442 - 1446	Development of sputtering systems for large-area deposition of CuIn1-xGaxSe1-ySy thin-film solar cells Dhere NG, Gade VS, Jahagirdar AH, Kadam AA, Patil HP, Kulkarni SS
1447 - 1451	Vacuum chamber with distributed titanium sublimation pumping for the G-line wiggler at Cornell High Energy Synchrotron Source Li Y, He Y, Mistry NB
1452 - 1457	Comparison between Monte Carlo and analytical calculation of the conductance of cylindrical and conical tubes Gomez-Goni J, Lobo PJ
1458 - 1463	Pumping performance investigation of a turbobooster vacuum pump equipped with spiral-grooved rotor and inner housing by the computational fluids dynamics method Cheng HP, Chiang MT
1464 - 1468	Effects of high working pressure on dielectric properties of sputtered (Ba,Sr)TiO3 films on Ir electrodes Lai CH, Wu YC, Ma S
1469 - 1474	Study of damage reduction of (Ba-0.6,Sr-0.4)TiO3 thin films etched in Ar/CF4 plasmas Kang PS, Kim KT, Kim DP, Kim CI
1475 - 1481	Etch characteristics of Bi4-xEuxTi3O12 (BET) thin films using inductively coupled plasma Lim KT, Kim KT, Kim DP, Kim CI
1482 - 1487	Effect of N-2 annealing on AlZrO oxide Petry J, Richard O, Vandervorst W, Conard T, Chen J, Cosnier V
1488 - 1493	Potential application of tungsten carbides as electrocatalysts Hwu HH, Chen JGG
1494 - 1499	Investigation of oxide (V2O5) thin films as electrodes for rechargeable microbatteries using Li Talledo A, Valdivia H, Benndorf C
1500 - 1505	Combined atomic force microscope and acoustic wave devices: Application to electrodeposition Friedt JM, Francis L, Choi KH, Frederix F, Campitelli A
1506 - 1509	Scanning tunneling microscopy imaging of charged defects on clean Si(100)-(2X1) Brown GW, Grube H, Hawley ME, Schofield SR, Curson NJ, Simmons MY, Clark RG
1510 - 1514	Electrical contact behavior of Ni/C60/4H-SiC structures Lu WJ, Mitchel WC, Landis GR, Crenshaw TR, Collins WE
1515 - 1518	Self-assembly and magnetism in core-shell microspheres Bizdoaca EL, Spasova M, Farle M, Hilgendorff M, Liz-Marzan LM, Caruso F
1519 - 1523	Study of a magnetic cluster/superconducting matrix interface: Co/Nb system Dupuis V, Jamet M, Favre L, Tuaillon-Combes J, Melinon P, Perez A
1524 - 1527	Surface morphology and magnetization reversal Lukaszew RA, Zhang ZD, Cionca C, Stoica V, Clarke R
1528 - 1538	Adhesion and friction studies of microelectromechanical systems/nanoelectromechanical systems materials using a novel microtriboapparatus Liu HW, Bhushan B
1539 - 1544	Product development and yield enhancement through failure analysis of integrated circuits with scanning capacitance microscopy Tangyunyong P, Nakakura CY
1545 - 1549	In situ studies of the amorphous to microcrystalline transition of hot-wire chemical vapor deposition Si : H films using real-time spectroscopic ellipsometry Levi DH, Nelson BP, Perkins JD, Moutinho HR
1550 - 1562	Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems Rangelow IW
1563 - 1567	Reduction of etching damage in lead-zirconate-titanate thin films with inductively coupled plasma Lim KT, Kim KT, Kim DP, Kim CI
1568 - 1573	Inductively coupled Cl-2/Ar plasma: Experimental investigation and modeling Efremov AM, Kim DP, Kim CI
1574 - 1578	High-temperature fiber matrices: Electrospinning and rare-earth modification Kataphinan W, Teye-Mensah R, Evans EA, Ramsier RD, Reneker DH, Smith DJ
1579 - 1584	Profile coatings and their applications Liu C, Conley R, Assoufid L, Macrander AT, Ice GE, Tischler JZ, Zhang K