Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.15, No.6 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (49 articles)

2831 - 2835	Fabrication of Excess PbO-Doped Pb(Zr0.52Ti0.48)O-3 Thin-Films Using Radio-Frequency Magnetron Sputtering Method Kim TS, Kim DJ, Lee JK, Jung HJ
2836 - 2841	Properties of Crystallized Si1-xGex Thin-Films Deposited by Sputtering Jelenkovic EV, Tong KY, Sun Z, Mak CL, Cheung WY
2842 - 2846	Direct-Current Magnetron-Sputtered W-AIN Cermet Solar-Absorber Films Zhang QC
2847 - 2853	Simulation of Sputter-Deposition at High-Pressures Smy T, Tan L, Winterton SS, Dew SK, Brett MJ
2854 - 2858	Time-Dependence and Spatial-Distribution of the Deposition Rate of YBa2Cu3O7 Thin-Films in 90-Degrees Off-Axis Sputtering Quigley PG, Rao RA, Eom CB
2859 - 2863	Mass and Energy Measurements of the Species Responsible for CBN Growth in RF Bias Sputter Conditions Tsuda O, Tatebayashi Y, Yamadatakamura Y, Yoshida T
2864 - 2874	Discharge Disruptions in a Helicon Plasma Source Shamrai KP, Virko VF, Blom HO, Pavlenko VP, Taranov VB, Jonsson LB, Hedlund C, Berg S
2875 - 2879	Development of an Energetic Ion-Assisted Mixing and Deposition Process for TiNx and Diamond-Like Carbon-Films, Using a Coaxial Geometry in Plasma Source Ion-Implantation Malik SM, Fetherston RP, Conrad JR
2880 - 2884	Influence on Selective SiO2/Si Etching of Carbon-Atoms Produced by CH4 Addition to a C4F8 Permanent-Magnet Electron-Cyclotron-Resonance Etching Plasma Den S, Kuno T, Ito M, Hori M, Goto T, Okeeffe P, Hayashi Y, Sakamoto Y
2885 - 2892	Characterization of an Azimuthally Symmetrical Helicon Wave High-Density Plasma Source Tynan GR, Bailey AD, Campbell GA, Charatan R, Dechambrier A, Gibson G, Hemker DJ, Jones K, Kuthi A, Lee C, Shoji T, Wilcoxson M
2893 - 2904	Structure and Chemical-Composition of Fluorinated SiO2-Films Deposited Using Sif4/O-2 Plasmas Han SM, Aydil ES
2905 - 2907	Characteristics of Spray Pyrolytic ZnO-in Thin-Films Grown from Zinc Acetate and Indium Nitrate Maldonado A, Olvera MD, Asomoza R, Zironi EP, Canetasortega J, Palaciosgomez J
2908 - 2914	Structure of Fluorine-Doped Silicon-Oxide Films Deposited by Plasma-Enhanced Chemical-Vapor-Deposition Yoshimaru M, Koizumi S, Shimokawa K
2915 - 2922	Interaction Between Water and Fluorine-Doped Silicon-Oxide Films Deposited by Plasma-Enhanced Chemical-Vapor-Deposition Yoshimaru M, Koizumi S, Shimokawa K
2923 - 2929	Parametrization of the Laframboise Theory for Cylindrical Langmuir Probe Analysis Mausbach M
2930 - 2937	Electrical Characterization of a Processing Plasma Chamber Roth WC, Carlile RN, Ohanlon JF
2938 - 2944	Investigation of Stored Energy in Plasma-Deposited TiNx Films Wulff H, Eggs C
2945 - 2948	Effect of Grain-Size and Pb Dopant on Luminescence in BaTiO3 Katiyar RS, Meng JF, Rai BK
2949 - 2958	Experimental Test of the Propagation of a He Pressure Front in a Long, Cryogenically Cooled Tube Wallen E
2959 - 2967	Transition-Metal Cleaning Using Thermal Beams Chang JP, Zhang Z, Xu H, Sawin HH, Butterbaugh JW
2968 - 2982	Doping of Amorphous and Microcrystalline Silicon Films Deposited by Hot-Wire Chemical-Vapor-Deposition Using Phosphine and Trimethylboron Brogueira P, Chu V, Ferro AC, Conde JP
2983 - 2987	Characterization of Carbon Nitride Produced by High-Current Vacuum-Arc Deposition Hartmann J, Siemroth P, Schultrich B, Rauschenbach B
2988 - 2992	Diamond Films Grown by Hot-Filament Chemical-Vapor-Deposition from a Solid Carbon Source Woo HK, Lee ST, Lee CS, Bello I, Lam YW
2993 - 2997	Dependence of Atomic Layer-Deposited Al2O3 Films Characteristics on Growth Temperature and Al Precursors of Al(CH3)(3) and AlCl3 Yun SJ, Lee KH, Skarp J, Kim HR, Nam KS
2998 - 3004	Kinetics of Adsorption and Photodesorption of Hydrogen on Copper Surfaces Bailey WH, Rahman TS, Strongin M, Davenport JW
3005 - 3014	Surface Processes Occurring on TiSi2 and CoSi2 in Fluorine-Based Plasmas - Reactive Ion Etching in CF4/Chf3 Plasmas Baklanov MR, Vanhaelemeersch S, Storm W, Kim YB, Vandervorst W, Maex K
3015 - 3023	Ion Distribution-Functions in Inductively-Coupled Radio-Frequency Discharges in Argon-Chlorine Mixtures Woodworth JR, Riley ME, Miller PA, Nichols CA, Hamilton TW
3024 - 3031	Analysis of the Etching of Silicon in an Inductively-Coupled Chlorine Plasma Using Laser Thermal-Desorption Choe JY, Herman IP, Donnelly VM
3032 - 3035	Ge Growth on Si(001) Studied by X-Ray Photoelectron-Spectroscopy Peak Shape-Analysis and Atomic-Force Microscopy Schleberger M, Simonsen AC, Tougaard S, Hansen JL, Larsen AN
3036 - 3043	Reflectance Anisotropy of the Si(100)1X2-as Surface - Discrete Dipole Calculation Patterson CH, Herrendorfer D
3044 - 3049	Na Impurity Chemistry in Photovoltaic Cigs Thin-Films - Investigation with X-Ray Photoelectron-Spectroscopy Niles DW, Ramanathan K, Hasoon F, Noufi R, Tielsch BJ, Fulghum JE
3050 - 3059	X-Ray Photoelectron-Spectroscopy Characterization of Semiconductor Thin-Films Using Simultaneous Mg/Zr Excitation Allgeyer DF
3060 - 3064	Preparation and Optical Studies on Flash Evaporated Sb2S3 Thin-Films Mahanty S, Merino JM, Leon M
3065 - 3068	Reflection Adsorption Infrared-Spectroscopy of the Oxidation of Thin-Films of Boron and Hafnium Diboride Grown on HF(0001) Belyansky M, Trenary M
3069 - 3081	Ultrahigh-Vacuum Deposition Reflectometer System for the in-Situ Investigation of Y/Mo Extreme-Ultraviolet Multilayer Mirrors Montcalm C, Sullivan BT, Ranger M, Pepin H
3082 - 3085	Low-Temperature Deposition of Epitaxial Titanium Carbide on MgO(001) by Coevaporation of C-60 and Ti Norin L, Mcginnis S, Jansson U, Carlsson JO
3086 - 3092	Roles of Ion Irradiation for Crystalline Growth and Internal-Stresses in Nickel Films Onto Silicon Substrates Prepared by the Ion-Beam and Vapor-Deposition Method Kuratani N, Murakami Y, Imai O, Ebe A, Nishiyama S, Ogata K
3093 - 3103	Temperature-Dependence of the Electron-Induced Gas Desorption Yields on Stainless-Steel, Copper, and Aluminum Gomezgoni J, Mathewson AG
3104 - 3114	Surface Kinetic-Study of Ion-Induced Chemical-Vapor-Deposition of Copper for Focused Ion-Beam Applications Chiang TP, Sawin HH, Thompson CV
3115 - 3119	Deconvolution of the Gaussian-Convoluted Profiles of Mercury Ions Implanted into Nickel Shi BR, Cue N, Wang KM
3120 - 3126	Kinetics of F Atoms and Fluorocarbon Radicals Studied by Threshold Ionization Mass-Spectrometry in a Microwave CF4 Plasma Tserepi A, Schwarzenbach W, Derouard J, Sadeghi N
3127 - 3133	Static Secondary-Ion Mass-Spectrometry Study of the Decomposition of Triethylgallium on GaAs(100) Wong KC, Jackson MS, Mcellistrem MT, Culp RD, Ekerdt JG
3134 - 3137	Plasma Fluorination of Polyimide Thin-Films Endo K, Tatsumi T
3138 - 3142	Improved Growth and Thermal-Stability of Parylene Films Ganguli S, Agrawal H, Wang B, Mcdonald JF, Lu TM, Yang GR, Gill WN
3143 - 3153	Electrical-Properties of Metal-Insulator-Semiconductor Structures with Silicon-Nitride Dielectrics Deposited by Low-Temperature Plasma-Enhanced Chemical-Vapor-Deposition Distributed Electron-Cyclotron-Resonance Hugon MC, Delmotte F, Agius B, Courant JL
3154 - 3157	Analysis and Characterization of Native-Oxide Growth on Epitaxial Si1-xGex Films After a Chemical Clean Lee IM, Takoudis CG
3158 - 3162	Energy-Spectra of Secondary Neutrals Obtained by Means of the Electrostatic Energy Filter of a Commercial Low-Pressure HF-Plasma Secondary Neutral Mass-Spectrometer Jenett H, Hodoroaba VD
3163 - 3169	Corrosion-Resistance of Titanium Nitride and Mixed Titanium Titanium Nitride Coatings on Iron in Humid SO2-Containing Atmospheres Agudelo AC, Gancedo JR, Marco JF, Hanzel D
3170 - 3170	3-Dimensional Deposition of Tin Film Using Low-Frequency (50 Hz) Plasma Chemical-Vapor-Deposition (Vol 15, Pg 1897, 1997) Shimozuma M, Date H, Iwasaki T, Tagashira H, Yoshino M, Yoshida K