Thin Solid Films

Thin Solid Films, Vol.287, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (49 articles)

1 - 7	Structural Characterization of SiC Films Prepared by Dynamic Ion Mixing Zaytouni M, Riviere JP, Denanot MF, Allain J
8 - 15	Microstructure and Physical-Properties of Iron Carbide Films Formed by Plasma-Enhanced Chemical-Vapor-Deposition Siriwardane H, Pringle OA, Newkirk JW, James WJ
16 - 24	The Tribological Characteristics of Titanium Carbonitride Coatings Prepared by Cathodic-Arc Ion Plating Technique Guu YY, Lin JF, Ai CF
25 - 31	Composition and Structure of Reactively Sputter-Deposited Molybdenum-Carbon Films Kacim S, Binst L, Reniers F, Bouillon F
32 - 35	Preparation of YBa2Cu3Ox Superconducting Thin-Films via Combustion Chemical-Vapor-Deposition Book GW, Carter WB, Polley TA, Kozaczek KJ
36 - 44	Microstructure and Phase Characterization of Diamond-Like Amorphous Hydrogenated Carbon-Films Using STM/STS Rusman I, Klibanov L, Burstein L, Rosenberg Y, Weinstein V, Benjacob E, Croitoru N, Seidman A
45 - 50	Scanning Probe Microscopy and Tunneling Measurements of Polycrystalline Tin Oxide-Films Wong TK, Man WK
51 - 56	Epitaxial-Growth of InSb Films by RF Magnetron Sputtering Miyazaki T, Kunugi M, Kitamura Y, Adachi S
57 - 64	Effect of Target Temperature on the Reactive DC-Sputtering of Silicon and Niobium Oxides Chan RY, Ho WS, Wolfe JC, Licon DL
65 - 73	Properties of Molecular Organo-Silicate Composites Submitted to Ion Irradiations Pivin JC, Brusatin G, Zalczer G
74 - 79	Characterization of RuO2 Thin-Films Deposited on Si by Metal-Organic Chemical-Vapor-Deposition Liao PC, Mar SY, Ho WS, Huang YS, Tiong KK
80 - 86	Mechanical Characteristics of Colored Film on Stainless-Steel by the Current Pulse Method Lin CJ, Duh JG
87 - 92	Ion-Assisted Low-Temperature (Less-Than-or-Equal-to-150 Degrees-C) Epitaxial-Growth of Tin on Cu by Reactive Magnetron Sputter-Deposition Ljungcrantz H, Benhenda S, Hakansson G, Ivanov I, Hultman L, Greene JE, Sundgren JE
93 - 100	Surface-Diffusion of Fe and Island Growth of Fesi2 on Si(111) Surfaces Wohllebe A, Hollander B, Mesters S, Dieker C, Crecelius G, Michelsen W, Mantl S
101 - 103	Effect of Oxygen-Pressure on the Orientation, Lattice-Parameters, and Surface-Morphology of Laser-Ablated BaTiO3 Thin-Films Zhang J, Cui DF, Zhou JL, Li L, Chen ZH, Szabadi M, Hess P
104 - 109	Yttria-Stabilized Zirconia Thin-Films Grown by Reactive RF Magnetron Sputtering Tomaszewski H, Haemers J, Denul J, Deroo N, Degryse R
110 - 114	Characterization of Pbxmn1-xS Thin-Films Prepared by Flash Evaporation Technique Swain PK, Sehgal HK
115 - 119	Characterization of Tin Films Prepared by a Conventional Magnetron Sputtering System - Influence of Nitrogen Flow Percentage and Electrical-Properties Kawamura M, Abe Y, Yanagisawa H, Sasaki K
120 - 124	Effects of Process Parameters on Titanium-Dioxide Thin-Film Deposited Using ECR MOCVD Lee JS, Song HW, Lee WJ, Yu BG, No K
125 - 129	Influence of the Power and Pressure on the Growth-Rate and Refractive-Index of A-C-H Thin-Films Deposited by RF Plasma-Enhanced Chemical-Vapor-Deposition Benmassaoud AA, Paynter RW
130 - 133	Photosensitive Zncds Nanoparticles in a CdS Matrix Formed by High-Temperature Sintering of ZnS and CdCl2 in Argon Sebastian PJ, Narvaez J
134 - 138	Thermochromic VO2 Thin-Films Studied by Photoelectron-Spectroscopy Christmann T, Felde B, Niessner W, Schalch D, Scharmann A
139 - 145	Electrical and Microstructural Characterization of Lead Titanate Thin-Films Deposited by Metal-Organic Chemical-Vapor-Deposition Onto Platinum and Magnesium-Oxide Vellaikal M, Kingon AI
146 - 153	XPS Study of NbN and (NbTi)N Superconducting Coatings Jouve G, Severac C, Cantacuzene S
154 - 163	Characterizations of Titanium-Oxide Films Prepared by Radio-Frequency Magnetron Sputtering Martin N, Rousselot C, Savall C, Palmino F
164 - 168	Electrolytic Oxygen Evolution on Ni-P-Sc2O3 Composite Layers Niedbala J, Budniok A, Surowka J, Gierlotka D
169 - 173	Plasma Polymerization of Tetraethoxysilane on Aluminum Granules for Corrosion Protection Iriyama Y, Ihara T, Kiboku M
174 - 183	The Effect of Electric-Field on the Formation of Hydroxyapatite Coatings Peaker AJ, Czernuszka JT
184 - 187	Changes in Surface-Composition of GaN by Impurity Doping Mori T, Ohwaki T, Taga Y, Shibata N, Koike M, Manabe K
188 - 192	High-Temperature Oxidation Behavior of (Ti1-Xcrx)N Coatings Otani Y, Hofmann S
193 - 201	Microstructure of BN-C Films Deposited on Si Substrates by Reactive Sputtering from a B4C Target Johansson MP, Hultman L, Daaud S, Bewilogua K, Luthje H, Schutze A, Kouptsidis S, Theunissen GS
202 - 207	Arc Evaporated Ti-N Films with Reduced Macroparticle Contamination Kourtev J, Pascova R, Weissmantel E
208 - 213	Elastic-Modulus of Tbdyfe Films - A Comparison of Nanoindentation and Bending Measurements Mencik J, Quandt E, Munz D
214 - 219	Micromachined Silicon Cantilever Beams for Thin-Film Stress Measurement Cardinale GF, Howitt DG, Clift WM, Mccarty KF, Medlin DL, Mirkarimi PB, Moody NR
220 - 224	Organically Modified Sol-Gel Materials for 2nd-Order Nonlinear Optics Choi DH, Lim SJ, Jahng WS, Kim N
225 - 231	Investigation of Ultra-Thin Ca/Cd-Arachidate Films by Grazing-Incidence Diffraction (Gid) with a Conventional X-Ray Tube and a Synchrotron-Radiation Source Claudius J, Gerber T, Weigelt J, Kinzler M
232 - 236	Structure-Fluorescence Properties of Some Naphthoylene-Benzimidazole-Based Langmuir-Blodgett-Films Bliznyuk VN, Neher D, Ponomarev II, Tsukruk VV
237 - 242	Structural Study of Langmuir-Blodgett-Films Built from Langmuir Monolayer and Bilayer of a Copper Phthalocyanine Derivative Valerio P, Albouy PA
243 - 246	Theoretical-Study on the Fabrication of a Microlens Using the Excimer-Laser Chemical-Vapor-Deposition Technique Wang QY, Zhang YS, Gao DS
247 - 251	Effect of Hydroxyl Substitution in Squaraine Dyes on Their Aggregation in Langmuir-Blodgett-Films Li JR, Li BF, Li XC, Tang JA, Jiang L
252 - 257	Fabrication and Characterization of MOS Devices on 3C-SiC Films Grown by Reactive Magnetron Sputtering on Si(111) Substrates Wahab Q, Turan R, Hultman L, Willander M, Sundgren JE
258 - 265	Microstructural Effect on NO2 Sensitivity of WO3 Thin-Film Gas Sensors .1. Thin-Film Devices, Sensors and Actuators Sun HT, Cantalini C, Lozzi L, Passacantando M, Santucci S, Pelino M
266 - 270	Cu Films Deposited by a Partially-Ionized Beam (Pie) Koh SK, Choi WK, Kim KH, Jung HJ
271 - 274	Influence of Arsenic in Silicon on Thermal-Oxidation Rate Choi SS, Park MJ, Chu WK
275 - 279	Growth and Branching of Wrinkles in Deposited Films Carter G, Martynenko Y, Moscovkin P
280 - 283	Electrical-Conductivity of in-Situ Hydrogen-Reduced and Structural-Properties of Zinc-Oxide Thin-Films Deposited in Different Ambients by Pulsed Excimer-Laser Ablation Ardakani HK
284 - 287	Some Characteristics of Silicon-Doped In0.52Al0.48As Grown Lattice-Matched on InP Substrates by Molecular-Beam Epitaxy Yoon SF, Miao YB, Radhakrishnan K
288 - 292	Electromagnetic-Field Resonance in Thin Amorphous Films - A Tool for Nondestructive Localization of Thin Marker Layers by Use of a Standard X-Ray Tube Difonzo S, Jark W, Lagomarsino S, Cedola A, Muller BR, Pelka JB
293 - 296	Interdiffusion in Compositionally Modulated Amorphous Nb/Si Multilayers Zhang M, Yu W, Wang WH, Wang WK