L79 - L82 |
Formation Mechanism of Tin by Reaction of Tetrakis(Dimethylamido)-Titanium with Plasma-Activated Nitrogen Weber A, Klages CP, Gross ME, Charatan RM, Brown WL |
L82 - L84 |
Microwriting of Gold Patterns with the Scanning Electrochemical Microscope Meltzer S, Mandler D |
L85 - L86 |
Co Oxidation on Pt-Ru/WO3 Electrodes Shen PK, Chen KY, Tseung AC |
L87 - L89 |
Chloride-Ion Catalysis of the Copper Deposition Reaction Nagy Z, Blaudeau JP, Hung NC, Curtiss LA, Zurawski DJ |
L90 - L92 |
Influence of Magnetic-Fields on the Voltammetric Response of Microelectrodes in Highly Concentrated Organic Redox Solutions Lee J, Gao XP, Hardy LD, White HS |
L93 - L95 |
The Quenching of Porous Silicon Photoluminescence by Group-15 Triaryl Derivatives - Effects of Surface Photooxidation Swerydakrawiec B, Cotter JL |
L95 - L97 |
Reversible Li Deposition on Ni in Ultrahigh-Vacuum Wang K, Ross P |
L98 - L99 |
Surface Photovoltage and Deep-Level Transient Spectroscopy Measurement of the Fe Impurities in Front-End Operations of the IC CMOS Process Nauka K, Gomez DA |
1733 - 1741 |
Electrochemical Destruction of Aniline and 4-Chloroaniline for Waste-Water Treatment Using a Carbon-PTFE O-2-Fed Cathode Brillas E, Bastida RM, Llosa E, Casado J |
1742 - 1746 |
Lithium-Ion Cells with Aqueous-Electrolytes Li W, Dahn JR |
1746 - 1752 |
The Study of Li-Graphite Intercalation Processes in Several Electrolyte Systems Using in-Situ X-Ray-Diffraction Aurbach D, Eineli Y |
1752 - 1757 |
Electrocatalyst Utilization in Phosphoric-Acid Fuel-Cells Fuller TF, Luczak FJ, Wheeler DJ |
1758 - 1765 |
Electrochemical and Spectroscopic Studies of Tungsten-Species in the AlCl3-Naclsat Melt Mamantov G, Chen GS, Xiao HM, Yang YH, Hondrogiannis E |
1766 - 1769 |
Electrochemical Redox Properties of Polypyrrole/Nafion Composite Film in a Solid Polymer Electrolyte Battery Momma T, Kakuda S, Yarimizu H, Osaka T |
1770 - 1776 |
Characterizing the Early Stages of Electrochemical Phase-Formation of Lead Sulfate Films Murugan K, Vanmathi G, Rangarajan SK |
1777 - 1783 |
Characterization of Spinel-Type Cobalt and Nickel-Oxide Thin-Films by X-Ray Near Grazing Diffraction, Transmission and Reflectance Spectroscopies, and Cyclic Voltammetry Nkeng P, Poillerat G, Koenig JF, Chartier P, Lefez B, Lopitaux J, Lenglet M |
1784 - 1788 |
Kinetics of Sulfur Transfer from H2S to Alpha-Ag2+xs Pareek VK, Ramanarayanan TA, Mumford JD |
1789 - 1798 |
Polyacrylonitrile-Based Electrolytes with Ternary Solvent Mixtures as Plasticizers Peramunage D, Pasquariello DM, Abraham KM |
1799 - 1805 |
Characterization of Potentiostatically Prepared Anodic Lead Oxide-Films on Lead Electrode in Hot Alkaline-Solution Veluchamy P, Minoura H |
1805 - 1813 |
Electrochemical Investigation of the Catalytical Processes in Sulfuric-Acid Production Bjerrum NJ, Petrushina IM, Berg RW |
1814 - 1819 |
Diffusivity of Oxygen in Liquid Sn and Ba0.35Cu0.65 Alloys Chou H, Chow TC, Tsay SF, Chen HS |
1819 - 1824 |
An Electrochemical Study on the Dissolution of Copper and Silver from Silver-Copper Alloys Guan YC, Han KN |
1824 - 1828 |
Composition Determination of Nico Alloys by the Rrde Method Andricacos PC |
1829 - 1833 |
Ion-Exchange in Poly(5-Amino-1-Naphthol) Probe Beam Deflection and Multiple Internal-Reflection Fourier-Transform Infrared Spectroscopic Studies Barbero C, Haas O, Mostefai M, Pham MC |
1834 - 1838 |
Reaction Pathways to CuInSe2 Formation from Electrodeposited Precursors Guillen C, Herrero J |
1839 - 1846 |
The Protection Ability of 11-Mercapto-1-Undecanol Self-Assembled Monolayer Modified with Alkyltrichlorosilanes Against Corrosion of Copper Itoh M, Nishihara H, Aramaki K |
1847 - 1850 |
Electrochemical and Quantum-Chemical Study of Propargyl Alcohol Adsorption on Iron Kutej P, Vosta J, Pancir J, Hackerman N |
1851 - 1858 |
Chaotic Analysis of Electrochemical Noise Measured on Stainless-Steel Legat A, Dolecek V |
1859 - 1868 |
The Measurement of a Complete Set of Transport-Properties for a Concentrated Solid Polymer Electrolyte Solution Ma YP, Doyle M, Fuller TF, Doeff MM, Dejonghe LC, Newman J |
1869 - 1873 |
On the Sigmoidal Shape of Current-Voltage Curves of Photoelectrochemical Solar-Cells Mao DL, Kim KJ, Frank AJ |
1874 - 1880 |
Enhancement of Electroluminescence from N-Type Porous Silicon and Its Photoelectrochemical Behavior Ogasawara K, Momma T, Osaka T |
1880 - 1884 |
On the Lack of Activity of Substitutional Sn Atoms Toward the Electrooxidation of Co on Pt Anodes - Molecular-Orbital Theory Anderson AB, Grantscharova E, Shiller P |
1885 - 1894 |
A Linear Kronig-Kramers Transform Test for Immittance Data Validation Boukamp BA |
1895 - 1901 |
In-Situ Membrane Resistance Measurements in Polymer Electrolyte Fuel-Cells by Fast Auxiliary Current Pulses Buchi FN, Marek A, Scherer GG |
1902 - 1908 |
Comparison of the AC-Impedance of Conducting Polymer-Films Studied as Electrode-Supported and Freestanding Membranes Deslouis C, Musiani MM, Tribollet B, Vorotyntsev MA |
1909 - 1914 |
Coulometry of a Mass-Transfer Limited Reaction with a Membrane-Covered Rotating-Disk Electrode Fedkiw PS, Song SH, Sharma S, Ye JH |
1915 - 1922 |
Electrochemical Engineering Analysis of Multisectioned Porous-Electrodes Matlosz M |
1923 - 1929 |
Sensing Behavior of an Amperometric Hydrogen Sensor - Theoretical Modeling and Experimental-Verification Tan Y, Tan TC |
1929 - 1933 |
Estimation of Sodium Sulfur Cell Characteristics Using Computed Tomograms from High-Energy X-Rays Tokoi H, Izumi S, Satoh K |
1933 - 1942 |
Mass-Transfer and Particle Motion in a Barrel Plater Zhou CD, Chin DT |
1943 - 1946 |
Electrochemical Processing of a New Class of Composite-Materials Gabriel JC, Bouteillon J, Poignet JC, Roman JM |
1946 - 1950 |
Stress Measurement in Al-Si-Cu Interconnection Layers Hara T, Okuda T, Nagano S, Ueda T |
1950 - 1951 |
Selective Nitrogen-Dioxide Gas Sensor-Based on Rare Earth Cuprate Semiconductors Imanaka N, Hirota Y, Adachi GY |
1952 - 1956 |
Surface Photochemical-Reactions of Dimethylgermane, Ge(CH3)(2)H-2, and Their Application to Stepwise Ge Growth Ishii H, Takahashi Y, Fujinaga K |
1957 - 1960 |
Deposition and Characterization of Photoconductive PZT Thin-Films Lin CT, Li L, Webb JS, Leung MS, Lipeles RA |
1961 - 1968 |
A Study of the Structure and the Morphology of Oxide-Films on Amorphous Al-Fe-Ce Alloys by XPS and SEM Mansour AN, Melendres CA |
1968 - 1970 |
Measurement of Mercury Bound in the Glass Envelope During Operation of Fluorescent Lamps Thaler EG, Wilson RH, Doughty DA, Beers WW |
1971 - 1976 |
Analysis of the Etching Mechanisms of Tungsten in Fluorine-Containing Plasmas Verdonck P, Swart J, Brasseur G, Degeyter P |
1976 - 1982 |
Deposition Mechanism of Silicon-Nitride in Direct Photoassisted Chemical-Vapor-Deposition Using a Low-Pressure Hg Lamp Yoshimoto M, Takubo K, Ohtsuki T, Komoda M, Matsunami H |
1983 - 1986 |
Charge Instability of Bonded Silicon Dioxide Layer Induced by Wet-Processing Afanasev VV, Revesz AG, Brown GA, Hughes HL |
1987 - 1991 |
TiSi2 Integration Ina Submicron CMOS Process .1. Salicide Formation Brun N, Kalnitsky A, Brun A |
1992 - 1996 |
TiSi2 Integration in a Submicron CMOS Process .2. Integration Issues Kalnitsky A, Brun N, Brun A, Gonchond JP |
1996 - 1999 |
Thermal-Wave Imaging to Characterize the Formation of Titanium Disilicide on Monocrystalline, Poly-Silicon, and Crystallized Amorphous-Silicon Substrates Brun A, Brun N, Kalnitsky A |
2000 - 2006 |
Investigation on the Distribution of Fluorine and Boron in Polycrystalline Silicon Silicon Systems Chen TP, Lei TF, Chang CY, Hsieh WY, Chen LJ |
2007 - 2012 |
The Effect of Temperature on Electron-Capture Cross-Sections and Densities in Irradiated (2.4 Mrads(SiO2)) Igfets Kim HS, Reisman A, Williams CK, Brush H |
2013 - 2019 |
3-Percent Ti-Tungsten Diffusion-Barriers .2. The Effect of Deposition Temperature and Nitrogen Inclusion Leet DM, Evans DR |
2020 - 2028 |
Anisotropic Reactive Ion Etching of Silicon Using SF6/O-2/Chf3 Gas Mixtures Legtenberg R, Jansen H, Deboer M, Elwenspoek M |
2028 - 2031 |
Effects of Drying Methods and Wettability of Silicon on the Formation of Water Marks in Semiconductor Processing Park JG, Pas MF |
2032 - 2036 |
Optimizing Wafer Polishing Through Phenomenological Modeling Runnels SR, Olavson T |
2037 - 2046 |
Electrochemical Coupling Effects on the Corrosion of Silicon Samples in HF Solutions Torcheux L, Mayeux A, Chemla M |
2047 - 2051 |
A Polyimide Removal Process for Die Sealed in Ceramic Package Tsang YL, Perrin D |
2051 - 2054 |
Oxynitridation-Enhanced Diffusion of Phosphorus in (100) Silicon Chen NK, Lee C |
2055 - 2059 |
Evidence for Nonuniform Trap Distributions in Thin Oxides After High-Voltage Stressing Dumin DJ, Vanchinathan S, Mopuri S, Subramoniam R |
2059 - 2066 |
Gettering of Cu and Ni Impurities in Simox Wafers Jablonski J, Miyamura Y, Imai M, Tsuya H |
2067 - 2071 |
Plasma-Enhanced Chemical-Vapor-Deposition of Silicon Dioxide Deposited at Low-Temperatures Ceiler MF, Kohl PA, Bidstrup SA |
2071 - 2076 |
Infrared Study of the Effect of Rapid Thermal Annealing, Thermal Donor Formation, and Hydrogen on the Precipitation of Oxygen Maddalonvinante C, Vallard JP, Barbier D |
2077 - 2080 |
Evidence for Ostwald Ripening of Vacancy Clusters in Float-Zone Silicon Obtained from Preannealing Dependence of Gold Diffusion Behavior Monson TK, Vanvechten JA, Zhang QS |
2081 - 2085 |
Electrical-Properties of Rapid Thermal Annealing-Induced Defects in Silicon Susi E, Poggi A, Madrigali M |
2086 - 2094 |
Kinetic and Transport Modeling of the Metallorganic Chemical-Vapor-Deposition of InP from Trimethylindium and Phosphine and Comparison with Experiments Theodoropoulos C, Ingle NK, Mountziaris TJ, Chen ZY, Liu PL, Kioseoglou G, Petrou A |
2094 - 2101 |
Double-Crystal X-Ray-Diffraction, Electron-Diffraction, and High-Resolution Electron-Microscopy of Luminescent Porous Silicon Gardelis S, Bangert U, Harvey AJ, Hamilton B |
2101 - 2109 |
Low-Temperature Electrochemical Synthesis and Dielectric Characterization of Barium-Titanate Films Using Nonalkali Electrolytes Venigalla S, Bendale P, Adair JH |
L100 - L102 |
Wet Chemical Etching of Al0.5In0.5P Lee JW, Pearton SJ, Abernathy CR, Hobson WS, Ren F, Wu CS |
L102 - L103 |
Aerogels and Xerogels of V2O5 as Intercalation Hosts Le DB, Passerini S, Tipton AL, Owens BB, Smyrl WH |