Thin Solid Films

Thin Solid Films, Vol.419, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (37 articles)

1 - 4	Comparison of hafnium silicate thin films on silicon (100) deposited using thermal and plasma enhanced metal organic chemical vapor deposition Rangarajan V, Bhandari H, Klein TM
5 - 10	An original approach for the fabrication of Si/SiO2 multilayers using reactive magnetron sputtering Ternon C, Gourbilleau F, Portier X, Voivenel P, Dufour C
11 - 17	A new class of Ti-Si-C-N coatings obtained by chemical vapor deposition, Part III: 650-800 degrees C process Kuo DH, Liao WC
18 - 26	Molecular dynamics simulation of defect formation during energetic Cu deposition Gilmore CM, Sprague JA
27 - 32	Synthesis and ellipsometric characterization of insulating low permittivity SiO2 layers by remote-PECVD using radio-frequency glow discharge Dultsev FN, Solowjev AP
33 - 39	Low temperature metalorganic chemical vapor deposition of gallium nitride using dimethylhydrazine as nitrogen source Hsu YJ, Hong LS, Huang KF, Tsay JE
40 - 45	Monolayers and Langmuir-Blodgett films of amphiphilic tetracyano ruthenium (II) complex: towards two-dimensional Prussian Blue analogue Kobayashi K, Mitoma T, Okamoto K, Yamagishi A
46 - 53	Plasma deposition of amorphous carbon films from CH4 atmospheres highly diluted in Ar Jacobsohn LG, Capote G, Cruz NC, Zanatta AR, Freire FL
54 - 59	Preparation of SiNx and composite SiNx-TiN films from alkoxide solutions by liquid injection plasma CVD Shimada S, Tsukurimichi K
60 - 64	Thin films of photocatalytic TiO2 and ZnO deposited inside a tubing by spray pyrolysis Miki-Yoshida M, Collins-Martinez V, Amezaga-Madrid P, Aguilar-Elguezabal A
65 - 68	Structural analysis of TiO2 films grown using microwave-activated chemical bath deposition Fernandez-Lima F, Baptista DL, Zumeta I, Pedrero E, Prioli R, Vigil E, Zawislak E
69 - 75	Nitrogen doping of polycrystalline 3C-SiC films grown by single-source chemical vapor deposition Wijesundara MBJ, Stoldt CR, Carraro C, Howe RT, Maboudian R
76 - 81	Preparation of lead monoxide films by KrF laser chemical vapor deposition from lead bis-dipivaloylmethanate Watanabe A, Tsuchiya T, Imai Y
82 - 87	Ge-doped SiO2 thin films produced by helicon activated reactive evaporation Li WT, Bulla DAP, Charles C, Boswell R, Love J, Luther-Davies B
88 - 94	High deposition rate of epitaxial (100) iridium film on (100)YSZ/1 0 0)Si substrate by RF sputtering deposition Khoa TD, Horii S, Horita S
95 - 104	Creation and characterization of n-alkylthiol and n-alkylamine self-assembled monolayers on 316L stainless steel Ruan CM, Bayer T, Meth S, Sukenik CN
105 - 113	Small-angle X-ray scattering and wide-angle X-ray diffraction on thermally annealed nanostructured TiO2 films Lavcevic ML, Turkovic A
114 - 117	Bias enhanced deposition of highly oriented beta-SiC thin films using low pressure hot filament chemical vapour deposition technique George VC, Das A, Roy M, Dua AK, Raj P, Zahn DRT
118 - 123	Influence of magnetic field and type of substrate on the growth of ZnS films by chemical bath Vidal J, de Melo O, Vigil O, Lopez N, Contreras-Puente G, Zelaya-Angel O
124 - 136	GRANFILM: a software for calculating thin-layer dielectric properties and Fresnel coefficients Lazzari R, Simonsen I
137 - 143	Dominant effect of carbide rebounding on the carbon loss during high velocity oxy-fuel spraying of Cr3C2-NiCr Li CJ, Ji GC, Wang YY, Sonoya K
144 - 153	The role of initial flaw size, elastic compliance and plasticity in channel cracking of thin films Ambrico JM, Begley MR
154 - 159	Nanotribological characterization of industrial polytetrafluorethylene-based coatings by atomic force microscopy Podesta A, Fantoni G, Milani R, Guida C, Volponi S
160 - 165	Influence of tin doping on the structural and physical properties of indium-zinc oxides thin films deposited by pulsed laser deposition Naghavi N, Marcel C, Dupont L, Guery C, Maugy C, Tarascon JM
166 - 172	Structural, optical, and electrical properties of indium tin oxide films with corundum structure fabricated by a sol-gel route based on solvothermal reactions Yu DB, Yu WC, Wang DB, Qian YT
173 - 177	Multifunctional layer-by-layer self-assembly of conducting polymers and magnetic nanoparticles Kim HS, Sohn BH, Lee W, Lee JK, Choi SJ, Kwon SJ
178 - 182	Luminescent hybrid films obtained by covalent grafting of terbium complex to silica network Liu FY, Fu LS, Wang J, Liu Z, Li HR, Zhang HJ
183 - 188	Voltage tunable dielectric properties of rf sputtered Bi2O3-ZnO-Nb2O5 pyrochlore thin films Hong YP, Ha S, Lee HY, Lee YC, Ko KH, Kim DW, Hong HB, Hong KS
189 - 193	Photoluminescence from a system of multimolecular layers of the rare earth metal behenates Belyi VI, Rastorguev AA, Remova AA, Badmaeva IA, Repinsky SM, Sveshnikova LL
194 - 198	Colorimetric transition process of polydiacetylene/mannoside derivative Langmuir-Schaefer film by binding Escherichia jm 109 Zhang LG, Fan Y, Ma BL, Xu XY, Kong XG, Shen DZ, Li YJ
199 - 206	Energy density window for location controlled Si grains by dual-beam excimer laser Burtsev A, Ishihara R, Beenakker CIM
207 - 212	Spectroscopic interpretation on the UV-sensitivity of a spiroxazine-dispersed polymeric thin-film Hur Y, Ock K, Kim K, Jin S, Gal Y, Kim J, Kim S, Koh K
213 - 217	Thin-film Li-doped NiO for thermoelectric hydrogen gas sensor Matsumiya M, Qiu F, Shin W, Izu N, Murayama N, Kanzaki S
218 - 224	The impact of gate oxide scaling (3.2-1.2 nm) on sub-100 nm complementary metal-oxide-semiconductor field-effect transistors Yeh WK, Lin CY
225 - 229	Effects of niobium doping on microstructures and ferroelectric properties of bismuth titanate ferroelectric thin films Kim JK, Kim J, Song TK, Kim SS
230 - 236	Microstructure and physical properties of nanostructured tin oxide thin films grown by means of pulsed laser deposition Dolbec R, El Khakani MA, Serventi AM, Trudeau M, Saint-Jacques RG
237 - 241	Effect of annealing on the structural and optical properties of AgGaS2 thin films prepared by pulsed laser deposition Hsu HC, Chen HH, Kuo SY, Chang CS, Hsieh WF