Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.16, No.3 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (202 articles)

913 - 918	Electron transport and emission properties of diamond Yater JE, Shih A, Abrams R
919 - 921	Carbon based thin film cathodes for field emission displays Weber A, Hoffmann U, Klages CP
922 - 925	Field emission characteristics of patterned free-standing diamond films Kim SH, Han IT
926 - 931	Surface and intergallery catalytic properties of Cu(II)-exchanged hectorite : A scanning force microscope study Porter TL, Manygoats K, Bradley M, Eastman MP, Reynolds BP, Votava AE, Hagerman ME
932 - 936	Study of the desorption mechanism of alkylsiloxane self-assembled monolayers through isotopic labeling and high resolution electron energy-loss spectroscopy experiments Kluth GJ, Sander M, Sung MM, Maboudian R
937 - 942	Comparison of the initial oxidation of polycrystalline indium and ultrathin deposits of indium on the Au(111) surface Robinson MC, Slavin AJ
943 - 947	Adsorption of oxygen on Pd(111) : Precursor kinetics and coverage-dependent sticking Sjovall P, Uvdal P
948 - 950	State resolved dynamics of methyl desorption from GaAs Wang H, Zhu XY, Xin QS
951 - 955	Atomic force microscopy and scanning tunneling microscopy/spectroscopy investigations of molybdenum ditellurides Saidi A, Hasbach A, Raberg W, Wandelt K
956 - 960	Electronic structure calculations of small molecule adsorbates on (110) and (100) TiO2 Ferris KF, Wang LQ
961 - 963	Surface cleaning aluminum foil with ozone gas Momose T, Hayasaka E, Saitou K, Nagayama K, Abe S
964 - 967	Atomic force microscopy study of the faceting on MgO(110) surface Chern G, Huang JJ, Leung TC
968 - 973	Atomic force microscopy study of microcrystalline SiC fabricated by ion beam synthesis Wu W, Chen DH, Xu JB, Cheung WY, Wong SP, Wilson IH, Kwok RWM
974 - 978	Ellipsometric and low energy electron diffraction study of the layer growth of xenon physisorbed on Ag(111) surface Igarashi S, Abe Y, Irie Y, Hirayama T, Arakawa I
979 - 983	Desorption of metastable particles induced by electronic excitation at the surface of rare-gas solid with physisorbed hydrogen Hayama A, Kuninobu T, Hirayama T, Arakawa I
984 - 989	Ammonia decomposition on Ru(001) using gas-phase atomic hydrogen Hagedorn CJ, Weiss MJ, Weinberg WH
990 - 995	Novel electronic and magnetic properties of ultrathin chromium oxide films grown on Pt(111) Robbert PS, Geisler H, Ventrice CA, van Ek J, Chaturvedi S, Rodriguez JA, Kuhn M, Diebold U
996 - 999	Coadsorption of sodium and water on MgO(100)/Mo(100) studied by ultraviolet photoelectron and metastable impact electron spectroscopies Gunster J, Liu G, Kempter V, Goodman DW
A39 - A39	Vacuum, surfaces, and films - Papers from the 44th National Symposium of the American Vacuum Society, Part I - Preface Lucovsky G
1000 - 1005	Oxygen adsorption and oxide formation on Ni3Al(111) Becker C, Kandler J, Raaf H, Linke R, Pelster T, Drager M, Tanemura M, Wandelt K
1006 - 1009	Voltage-dependent scanning tunneling microscopy images of the Ge(111)-c(2x8) surface Lee G, Mai H, Chizhov I, Willis RF
1010 - 1013	Carbon monoxide oxidation on Ir(110) Burghaus U, Ding JQ, Weinberg WH
1014 - 1016	A fast x-ray photoelectron spectroscopy study of the NO-H-2 reaction over Rh(533) : Identifying surface species Cobden PD, Nieuwenhuys BE, Esch F, Baraldi A, Comelli G, Lizzit S, Kiskinova M
1017 - 1022	Near edge x-ray absorption fine structure study of benzene adsorbed on metal surfaces : Comparison to benzene cluster complexes Weiss K, Gebert S, Wuhn M, Wadepohl H, Woll C
1023 - 1030	Vibrational study of CH2 and CH3 radicals on the Cu(111) surface by high resolution electron energy loss spectroscopy Chan YL, Chuang P, Chuang TJ
1031 - 1036	Scanning tunneling microscopy study of benzene adsorption on Si(100)-(2x1) Self KW, Pelzel RI, Owen JHG, Yan C, Widdra W, Weinberg WH
1037 - 1042	Multiple bonding geometries and binding state conversion of benzene/Si(100) Lopinski GP, Fortier TM, Moffatt DJ, Wolkow RA
1043 - 1046	Surface segregation of low-energy ion-induced defects in Si Bedrossian PJ, de la Rubia TD
1047 - 1049	Lateral manipulation of single Cu atoms on flat and stepped copper surfaces Bartels L, Meyer G, Rieder KH
1050 - 1054	Photoexcited Fe2O3 surfaces : Properties and chemisorption Toledano DS, Dufresne ER, Henrich VE
1055 - 1058	Surface structure and bonding in the strongly correlated metal oxides NiO and UO2 Castell MR, Dudarev SL, Muggelberg C, Sutton AP, Briggs GAD, Goddard DT
1059 - 1065	Scanning tunneling microscopy of equilibrium crystal shapes Surnev S, Arenhold K, Coenen P, Voigtlander B, Bonzel HP, Wynblatt P
1066 - 1072	Reaction of 1,2-ethanedithiol on clean, sulfur-modified, and carbon-modified Mo(110) surfaces Roe CL, Schulz KH
1073 - 1077	Bonding nature between oxygen and sodium on Si(113) surface Hwang CC, An KS, Park RJ, Kim JS, Lee JB, Park CY, Kimura A, Kakizaki A
1078 - 1085	Nonstoichiometry on TiO2(110) and Cu-TiO2 interfaces Wagner M, Kienzle O, Bonnell DA, Ruhle M
1086 - 1090	Photoelectron microspectroscopy observations of a cleaved surface of semiconductor double heterostructure Kiyokura T, Maeda F, Watanabe Y, Kadota Y, Iketaki Y, Horikawa Y, Oshima M, Shigemasa E, Yagishita A
1091 - 1095	Auger electron spectroscopy depth profiling of Ge/Si multilayers using He+ and Ar+ ions Menyhard M, Sulyok A
1096 - 1102	Determination and application of the depth resolution function in sputter profiling with secondary ion mass spectroscopy and Auger electron spectroscopy Hofmann S, Schubert J
1103 - 1105	Tungsten silicide composition analysis by Rutherford backscattering spectroscopy, Auger electron spectroscopy, and x-ray photoelectron spectroscopy Bradbury CA, Fillmore DK
1106 - 1111	Quantitative uses of the x-ray photoelectron spectroscopy valence band region in the analysis of polymer blends Thomas EA, Fulghum JE
1112 - 1116	Valence band x-ray photoelectron spectroscopic investigation of surface cleanliness of aluminum metal and its alloys Havercroft NJ, Sherwood PMA
1117 - 1121	Ellipsomicroscopy for surface imaging : A novel tool to investigate surface dynamics Haas G, Pletcher TD, Bonilla G, Jachimowski TA, Rotermund HH, Lauterbach J
1122 - 1126	Two-dimensional imaging of surface morphology by energy-analyzed secondary electrons and Auger electron spectroscopy for stepped Si(111) surfaces Suzuki M, Mogi K, Homma Y
1127 - 1130	A plasma-polymerized protective film for transmission electron microscopy specimen preparation by focused ion beam etching Kato NI, Miura N, Tsutsui N
1131 - 1136	Measurement and control of sticking probability of H2O on stainless steel surfaces Shiokawa Y, Ichikawa M
1137 - 1138	Design of a low cost, low magnetic susceptibility, ultrahigh vacuum compatible, flanged electrical break Mapes M, Hseuh HC, Cameron P
1139 - 1144	Design and pumping characteristics of a compact titanium-vanadium non-evaporable getter pump Li YL, Hess D, Kersevan R, Mistry N
1145 - 1150	Measurements of the helium propagation at 4.4 K in a 480 m long stainless steel pipe Hseuh HC, Wallen E
1151 - 1156	Turbomolecular pump design for high pressure operation Spagnol M, Cerruti R, Helmer J
1157 - 1162	Miniature quadrupole residual gas analyzer for process monitoring at milliTorr pressures Holkeboer DH, Karandy TL, Currier FC, Frees LC, Ellefson RE
1163 - 1168	Stable cancellation of x-ray errors in Bayard-Alpert gauges Kendall BRF, Drubetsky E
1169 - 1171	Application of calculated physical adsorption isotherms to a radon sensor Hobson JP, Appleby A, Kim IS, Sigel GH
1172 - 1177	The morphology of duplex and quadruplex DNA on mica Muir T, Morales E, Root J, Kumar I, Garcia B, Vellandi C, Jenigian D, Marsh T, Henderson E, Vesenka J
1178 - 1182	Numerical simulation of the evolution of nanometer-scale surface topography generated by ion milling Winningham TA, Zou Z, Douglas K, Clark NA
1183 - 1188	Cell-based sensor microelectrode array characterized by imaging x-ray photoelectron spectroscopy, scanning electron microscopy, impedance measurements, and extracellular recordings Jung DR, Cuttino DS, Pancrazio JJ, Manos P, Cluster T, Sathanoori RS, Aloi LE, Coulombe MG, Czamaski MA, Borkholder DA, Kovacs GTA, Bey P, Stenger DA, Hickman JJ
1189 - 1195	Real-time monitoring of scattered laser light by a single particle of several tens of nanometers in the etching chamber in relation to its status with the equipment Uesugi F, Ito N, Moriya T, Doi H, Sakamoto S, Hayashi Y
1196 - 1200	Pit-free electropolishing of aluminum and its application for process chamber Tajiri K, Saito Y, Yamanaka Y, Kabeya Z
1201 - 1206	Self-consistent particle simulation of radio-frequency CF4 discharge with implementation of all ion-neutral reactive collisions Denpoh K, Nanbu K
1207 - 1212	Studies on structural, electrical, compositional, and mechanical properties of WSix thin films produced by low-pressure chemical vapor deposition Santucci S, Lozzi L, Passacantando M, Picozzi P, Petricola P, Moccia G, Alfonsetti R, Diamanti R
1213 - 1217	Properties of ZnO : In film prepared by sputtering of facing ZnO : In and Zn targets Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
1218 - 1221	P-type transparent conducting In2O3-Ag2O thin films prepared by rf magnetron sputtering Minami T, Shimokawa K, Miyata T
1222 - 1226	Reemission of sputtered refractory metals during deposition Tait RN
1227 - 1232	X-ray photoelectron spectroscopy characterization of the oxidation of electroplated and sputter deposited copper surfaces Apen E, Rogers BR, Sellers JA
1233 - 1238	Texture and surface morphology improvement of Al by two-stage chemical vapor deposition and its integration in an Al plug-interconnect scheme for sub 0.25 mu m metallization Naik M, Guo T, Chen L, Mosely R, Beinglass I
1239 - 1243	Submicron contacts for electrical characterization of semiconducting WS2 thin films Ballif C, Regula M, Levy F, Burmeister F, Schafle C, Matthes T, Leiderer P, Niedermann P, Gutmannsbauer W, Bucher R
1244 - 1246	Control of the preferred orientation of AlN thin films by collimated sputtering Rodriguez-Navarro A, Otano-Rivera W, Pilione LJ, Messier R, Garcia-Ruiz JM
1247 - 1250	Generation of vapor stream using a porous rod in an electron beam evaporation process Ohba H, Shibata T
1251 - 1257	Effects of CdCl2 treatment on the recrystallization and electro-optical properties of CdTe thin films Moutinho HR, Al-Jassim MM, Levi DH, Dippo PC, Kazmerski LL
1258 - 1261	Microstructure-dependent ferroelectric properties of SrBi2Ta2O9 thin films fabricated by radio frequency magnetron sputtering Cho KJ, Lee JK, Jung HJ, Park JW
1262 - 1267	X-ray photoelectron spectroscopy study of TiN films produced with tetrakis(dimethylamido)titanium and selected N-containing precursors on SiO2 Endle JP, Sun YM, White JM, Ekerdt JG
1268 - 1271	Large magnetoresistance effect in as-grown epitaxial LaxCa1-xMnO3 films prepared by a molecular beam epitaxy coevaporation technique Miniotas A, Karlsson UO, Brazdeikis A, Chu CW
1272 - 1276	Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer films Kusano E, Kitagawa M, Nanto H, Kinbara A
1277 - 1285	Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process Berg S, Nyberg T, Blom HO, Nender C
1286 - 1292	Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering Macak K, Nyberg T, Macak P, Olsson MK, Helmersson U, Berg S
1293 - 1296	Atomistic simulations of organic thin film deposition through hyperthermal cluster impacts Qi LF, Sinnott SB
1297 - 1302	Determining thickness of thin metal films with spectroscopic ellipsometry for applications in magnetic random-access memory Tompkins HG, Zhu T, Chen E
1303 - 1310	In situ sputter deposition discharge diagnostics for tailoring ceramic film growth Aita CR
1311 - 1315	Growth of SiC and SiCxNy films by pulsed laser ablation of SiC in Ar and N-2 environments Soto G, Samano EC, Machorro R, Cota L
1316 - 1320	Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon : Surface modification for controlled nucleation Smith LL, Read WW, Yang CS, Srinivasan E, Courtney CH, Lamb HH, Parsons GN
1321 - 1326	Synergetic effects in ion beam energy and substrate temperature during hyperthermal particle film deposition Marton D, Boyd KJ, Rabalais JW
1327 - 1330	Seeded pulsed supersonic molecular beam growth of silicon carbide thin films Jamison KD, Kempel ML, Ballarotto VW, Kordesch ME
1331 - 1335	Cubic boron nitride thin film deposition by unbalanced magnetron sputtering and dc pulsed substrate biasing Otano-Rivera W, Pilione LJ, Zapien JA, Messier R
1336 - 1341	Structural and magnetic properties of Fe/Rh(001) sputter deposited multilayers Tomaz MA, Harp GR, Mayo E, Lederman D, Wu R, O'Brien WL
1342 - 1347	Co on stepped Cu(100) surfaces : A comparison of experimental data with Monte Carlo growth simulations Coyle ST, Scheinfein MR, Blue JL
1348 - 1354	Characterization and photoemission dichroism of epitaxially grown Gd(0001)/Y(0001) Mishra SR, Cummins TR, Waddill GD, Goodman KW, Tobin JG, Gammon WJ, Sherwood T, Pappas DP
1355 - 1358	Directly identifying the order of layer switching in magnetic multilayers Freeland JW, Chakarian V, Idzerda YU, Doherty S, Zhu JG, Wende H, Kao CC
1359 - 1363	Comparison of X-ray magnetic circular dichroism at the L and M edges of Mo, Ru, Rh, and Pd Tomaz MA, Lin T, Harp GR, Hallin E, Sham TK, O'Brien WL
1364 - 1367	Magnetization of ultrathin Fe films deposited on Gd (0001) Sherwood TS, Mishra SR, Popov AP, Pappas DP
1368 - 1373	Quantum-well states in high-quality Cu films deposited on Co (100) : A high resolution photoemission study Segovia P, Michel EG, Ortega JE
1374 - 1379	Magnetic nanostructures produced by electron beam patterning of direct write transition metal fluoride resists Streblechenko D, Scheinfein MR
1380 - 1383	Biaxially oriented conductive La0.5Sr0.5CoO3 thin films on SiO2/Si Jia QX, Arendt PN, Kwon C, Roper JM, Fan Y, Groves JR, Foltyn SR
1384 - 1387	Analysis of B-SiO2 films by highly charged ion based time-of-flight secondary ion mass spectrometry, standard secondary ion mass spectrometry and elastic recoil detection Schenkel T, Hamza AV, Barnes AV, Schneider DH, Walsh DS, Doyle BL
1388 - 1393	Sharing of Auger electron spectroscopy and x-ray photoelectron spectroscopy spectral data through the Internet Yoshihara K, Yoshitake M
1394 - 1401	The birth of electronics : Thermionic emission and vacuum Redhead PA
1403 - 1408	Doping scheme of semiconducting atomic chains Yamada T
1409 - 1413	Characterization of zinc implanted silica : Effects of thermal annealing and picosecond laser radiation Chen JL, Mu R, Ueda A, Wu MH, Tung YS, Gu Z, Henderson DO, White CW, Budai JD, Zuhr RA
1414 - 1419	Numerical study on near field imaging of fluorescence decay of near-surface molecule cluster Xiao MF
1420 - 1424	Interference in far-field radiation of two contra-propagating surface plasmon polaritons in the Kretchmann configuration Xiao MF, Machorro R, Siqueiros J
1425 - 1429	Imaging and direct manipulation of nanoscale three-dimensions features using the noncontact atomic force microscope Ramachandran TR, Madhukar A, Chen P, Koel BE
1430 - 1434	The use of a Si-based resist system and Ti electrode for the fabrication of sub-10 nm metal-insulator-metal tunnel junctions Wada T, Haraichi S, Ishii K, Hiroshima H, Komuro M, Gorwadkar SM
1435 - 1439	Observation of channel shortening in n-metal-oxide-semiconductor field-effect transistors arising from interconnect plasma processing El Hassan MG, Awadelkarim OO, Werking J
1440 - 1443	Evaluation of plasma charging damage during polysilicon gate etching process in a decoupled plasma source reactor Ma SM, Jain M, Chinn JD
1444 - 1448	Probe diagnostics in a full wave resonator radio-frequency discharge Vinogradov GK, Menagarishvili VM, Yoneyama S
1449 - 1453	Dynamic images of plasma processes : Use of Fourier blobs for endpoint detection during plasma etching of patterned wafers Rietman EA, Lee JTC, Layadi N
1454 - 1458	Effect of upper hybrid waves on uniform electron cyclotron resonance plasmas Ueda Y, Kawai Y
1459 - 1463	Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch system Lercel MJ, Dang D, Marmillion N, Mlynko W
1464 - 1468	Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcher Buie MJ, Pender JTP, Dahimene M
1469 - 1472	Passivation role of fluorine on the anticorrosion of AlCu films after plasma etching Baek KH, Kim CI, Kwon KH, Kim TH, Chang EG, Yun SJ, Yoon YS, Kim SG, Nam KS
1473 - 1477	Hydrogen and disilane adsorption on low energy ion-roughened Si(100) Gong B, Jo S, Hess G, Parkinson P, Ekerdt JG
1478 - 1482	Etch characteristics of GaN using inductively coupled Cl-2/Ar and Cl-2/BCl3 plasmas Lee YH, Kim HS, Yeom GY, Lee JW, Yoo MC, Kim TI
1483 - 1488	Effects of argon addition to a platinum dry etch process Milkove KR, Coffin JA, Dziobkowski C
1489 - 1496	Study of platinum electrode patterning in a reactive ion etcher Chang LH, Apen E, Kottke M, Tracy C
1497 - 1501	Comparison of plasma chemistries for inductively coupled plasma etching of InGaAlP alloys Hong J, Lee JW, Abernathy CR, Lambers ES, Pearton SJ, Shul RJ, Hobson WS
1502 - 1508	Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolation Yeon CK, You HJ
1509 - 1513	Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials Kim K, Kwon DH, Nallapati G, Lee GS
1514 - 1518	Contact etch scaling with contact dimension McNevin SC, Cerullo M
1519 - 1524	Flow rate rule for high aspect ratio SiO2 hole etching Chinzei Y, Ogata M, Shindo H, Ichiki T, Horiike Y
1525 - 1528	Stability of Si-O-F low-K dielectrics : Attack by water molecules as function of near-neighbor Si-F bonding arrangements Yang H, Lucovsky G
1529 - 1536	Magnetically neutral loop discharged plasma sources and system Uchida T
1537 - 1541	Large-area high-density plasma excitation using standing pure and hybrid surface waves Ghanashev I, Nagatsu M, Morita S, Sugai H
1542 - 1546	High-rate etching of GaAs using chlorine atmospheres doped with a Lewis acid Franz G
1547 - 1551	Surface chemistry and damage in the high density plasma etching of gallium arsenide Leonhardt D, Eddy CR, Shamamian VA, Holm RT, Glembocki OJ, Butler JE
1552 - 1559	Proposal for an etching mechanism of InP in CH4-H-2 mixtures based on plasma diagnostics and surface analysis Feurprier Y, Cardinaud C, Grolleau B, Turban G
1560 - 1565	Spatially-averaged model for plasma etch processes : Comparison of different approaches to electron kinetics Ahlrichs P, Riedel U, Warnatz J
1566 - 1570	Visualization of etching mechanisms of a vicinal Cu surface using scanning tunneling microscopy Nakakura CY, Altman EI
1571 - 1576	Halogen uptake by thin SiO2 layers on exposure to HBr/O-2 and Cl-2 plasmas, investigated by vacuum transfer x-ray photoelectron spectroscopy Donnelly VM, Layadi N
1577 - 1581	Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry Pruette LC, Karecki SM, Reif R, Langan JG, Rogers SA, Ciotti RJ, Felker BS
1582 - 1587	Ultrahigh-selectivity silicon nitride etch process using an inductively coupled plasma source Wang Y, Luo L
1588 - 1593	Suppression of notching by lowering the bias frequency in electron cyclotron resonance plasma with a divergent magnetic field Morioka H, Matsunaga D, Yagi H
1594 - 1599	SiO2 etching in magnetic neutral loop discharge plasma Chen W, Itoh M, Hayashi T, Uchida T
1600 - 1603	Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma Lindley RA, Bjorkman CH, Shan H, Ke KH, Doan K, Mett RR, Welch M
1604 - 1608	Dielectric etching for 0.18 mu m technologies Berruyer P, Vinet F, Feldis H, Blanc R, Lerme M, Morand Y, Poiroux T
1609 - 1614	Doping of group III nitrides Ploog KH, Brandt O
1615 - 1620	Ultrahigh vacuum arcjet nitrogen source for selected energy epitaxy of group III nitrides by molecular beam epitaxy Grunthaner FJ, Bicknell-Tassius R, Deelman P, Grunthaner PJ, Bryson C, Snyder E, Giuliani JL, Apruzese JP, Kepple P
1621 - 1626	Selective inductively coupled plasma etching of group-III nitrides in Cl-2- and BCl3-based plasmas Shul RJ, Willison CG, Bridges MM, Han J, Lee JW, Pearton SJ, Abernathy CR, MacKenzie JD, Donovan SM, Zhang L, Lester LF
1627 - 1630	Effect of atomic hydrogen on Er luminescence from AlN Pearton SJ, Abernathy CR, MacKenzie JD, Hommerich U, Zavada JM, Wilson RG, Schwartz RN
1631 - 1635	Comparison of inductively coupled plasma Cl-2 and Cl-4/H-2 etching of III-nitrides Cho H, Vartuli CB, Donovan SM, Abernathy CR, Pearton SJ, Shul RJ, Constantine C
1636 - 1640	Electrical, optical, and structural properties of indium-tin-oxide thin films deposited on polyethylene terephthalate substrates by rf sputtering Kulkarni AK, Lim T, Khan M, Schulz KH
1641 - 1645	Wurtzite GaN surface structures studied by scanning tunneling microscopy and reflection high energy electron diffraction Smith AR, Ramachandran V, Feenstra RM, Greve DW, Shin MS, Skowronski M, Neugebauer J, Northrup JE
1646 - 1649	Enhanced Schottky barrier on InGaAs for high performance photodetector application He L, Costello MJ, Cheng KY, Wohlert DE
1650 - 1653	Growth of GaS on GaAs(100) surfaces using the [(Bu-t)GaS](4) molecular precursor in ultrahigh vacuum Yi SI, Chung CH, Weinberg WH
1654 - 1657	Analytic representations of the dielectric functions of crystalline and amorphous Si and crystalline Ge for very large scale integrated device and structural modeling Leng J, Opsal J, Chu H, Senko M, Aspnes DE
1658 - 1663	Spectroscopic and thermal studies of a-SiC : H film growth : Comparison of mono-, tri-, and tetramethylsilane Lee MS, Bent SF
1664 - 1669	Gate leakage current : A sensitive characterization parameter for plasma-induced damage detection in ultrathin oxide submicron transistors Jiang J, Awadelkarim OO, Werking J
1670 - 1675	Ultrathin Ta2O5 film growth by chemical vapor deposition of Ta(N(CH3)(2))(5) and O-2 on bare and SiOxNy-passivated Si(100) for gate dielectric applications Son KA, Mao AY, Kim BY, Liu F, Pylant ED, Hess DA, White JM, Kwong DL, Roberts DA, Vrtis RN
1676 - 1679	Pulsed supersonic molecular beam growth of AlN Ballarotto VW, Kordesch ME
1680 - 1685	Octadecyltrichlorosilane self-assembled-monolayer islands as a self-patterned-mask for HF etching of SiO2 on Si Komeda T, Namba K, Nishioka Y
1686 - 1691	Transition metal nitride formed by simultaneous physisorption and thermal evaporation; TiN/Si(100) Ahn S, Han JY, Seo JM
1692 - 1696	Measurements of epitaxially grown Pt/CaF2/Si(111) structures by ballistic electron emission microscopy and scanning tunneling microscopy LaBella VP, Shusterman Y, Schowalter LJ, Ventrice CA
1697 - 1701	Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCo Jung KB, Lambers ES, Childress JR, Pearton SJ, Jenson M, Hurst AT
1702 - 1709	Effects of "processing parameters" in plasma deposition : Acrylic acid revisited Candan S, Beck AJ, O'Toole L, Short RD
1710 - 1715	Surface studies of plasma source ion implantation treated polystyrene Lee Y, Han SH, Lee JH, Yoon JH, Lim HE, Kim KJ
1716 - 1720	Real-time core-level spectroscopy of initial thermal oxide on Si(110) Enta Y, Miyanishi Y, Irimachi H, Niwano M, Suemitsu M, Miyamoto N, Shigemasa E, Kato H
1721 - 1729	Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing Lucovsky G, Niimi H, Wu Y, Parker CR, Hauser JR
1730 - 1734	Second-harmonic generation at the interface between Si(100) and thin SiO2 layers Cundiff ST, Knox WH, Baumann FH, Evans-Lutterodt KW, Green ML
1735 - 1740	Localized degradation studies of ultrathin gate oxides Wen HJ, Ludeke R
1741 - 1744	Nanoscale scratch resistance of ultrathin protective overcoats on hard magnetic disks Anoikin EV, Yang MM, Chao JL, Elings JR, Brown DW
1745 - 1749	Study of substrate bias effect on corrosion susceptibility sf thin film magnetic disks by accelerated chemical tests Wang CC, Chia RWJ, Lee JK, Tang WT
1750 - 1756	Carbon overcoat composition and structure analysis by secondary ion mass spectrometry Erickson JW, Sheng J, Gao Y, Pham H, Singer IL
1757 - 1761	Interface studies of tungsten nitride and titanium nitride composite metal gate electrodes with thin dielectric layers Claflin B, Binger M, Lucovsky G
1762 - 1766	Secondary ion mass spectroscopy characterization of the deuterium sintering process for enhanced-lifetime complementary metal-oxide-semiconductor transistors Lee J, Aur S, Eklund R, Hess K, Lyding JW
1767 - 1771	Hydrogen in silicon : Fundamental properties and consequences for devices Van de Walle CG
1772 - 1774	Effects of surface phosphorus on the kinetics of hydrogen desorption from silane-adsorbed Si(100) surface at room temperatures Suemitsu M, Tsukidate Y, Nakazawa H, Enta Y
1775 - 1778	Formation of periodic step and terrace structure on Si(100) surface during annealing in hydrogen diluted with inert gas Kumagai Y, Namba K, Komeda T, Nishioka Y
1779 - 1784	Use of reactive ion sputtering to produce clean germanium surfaces in a carbon rich environment - an ion scattering study Smentkowski VS, Holecek JC, Schultz JA, Krauss AR, Gruen DM
1785 - 1789	Temperature-programmed desorption and high-resolution electron energy loss spectroscopy studies of the interaction of water with the GaAs(001)-(4x2) surface Chung CH, Yi SI, Weinberg WH
1790 - 1793	First principles calculations of the different structures of a monolayer of Sb on Si (111) Takeuchi N
1794 - 1800	Pseudo spin valve magnetoresistive random access memory Everitt BA, Pohm AV
1801 - 1805	Magnetoresistance of NiMnSb-based multilayers and spin valves Caballero JA, Park YD, Childress JR, Bass J, Chiang WC, Reilly AC, Pratt WP, Petroff F
1806 - 1811	Hybrid ferromagnet-semiconductor devices Johnson M
1812 - 1816	Giant magnetoresistance behavior of granular Fe and Co implanted Ag thin films Soares JC, Redondo LM, de Jesus CM, Marques JG, da Silva MF, de Azevedo MMP, Mendes JA, Rogalski MS, Sousa JB
1817 - 1819	Fabrication and domain imaging of iron magnetic nanowire arrays Tulchinsky DA, Kelley MH, McClelland JJ, Gupta R, Celotta RJ
1820 - 1824	Spectroscopic ellipsometry investigation of nickel silicide formation by rapid thermal process Hu YZ, Tay SP
1825 - 1831	Comparison of the submicron particle analysis capabilities of Auger electron spectroscopy, time-of-flight secondary ion mass spectrometry, and scanning electron microscopy with energy dispersive x-ray spectroscopy for particles deposited on silicon wafers with 1 mu m thick oxide layers Diebold AC, Lindley P, Viteralli J, Kingsley J, Liu BYH, Woo KS
1832 - 1837	Investigation of ice-solid interfaces by force microscopy : Plastic flow and adhesive forces Pittenger B, Cook DJ, Slaughterbeck CR, Fain SC
1838 - 1841	Photoluminescence quenching of Alq(3) by metal deposition : A surface analytical investigation Choong VE, Park Y, Gao Y, Mason MG, Tang CW
1842 - 1851	Developments in equipment support technology Sullivan JJ, Gwizdak R, Gu Y, Culwell W, Baker JM, Hosch JW
1852 - 1856	Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy Chowdhury AI, Klein TM, Anderson TM, Parsons GN
1857 - 1862	Use of the quartz crystal microbalance to measure the mass of submonolayer deposits : Measuring the stoichiometry of surface oxides Narine SS, Slavin AJ
1863 - 1867	Film properties of Ti/TiN bilayers deposited sequentially by ionized physical vapor deposition Cerio F, Drewery J, Huang E, Reynolds G
1868 - 1872	Composition central by current modulation in dc-reactive sputtering Nyberg T, Nender C, Berg S
1873 - 1879	Simulations of BCl3/Cl-2 plasma in an inductively coupled gaseous reference cell Choi SJ, Veerasingam R
1880 - 1884	Film growth of nanostructured C-N/TiNx multilayers reactively sputtered in pure nitrogen Jensen H, Sobota J, Sorensen G
1885 - 1889	Diffusion bonding of steel to Ti-6Al-4V to produce hard wearing surface layers Church SC, Wild RK
1890 - 1900	Recent developments in the design, deposition, and processing of hard coatings Zabinski JS, Voevodin AA
1901 - 1906	Effect of temperature on Ti and TiN films deposited on a BN substrate Seal S, Underwood H, Uda M, Osawa H, Kanai A, Barr TL, Benko E, Krauss A, Perera RCC
1907 - 1911	Synthesis, composition, surface roughness and mechanical properties of thin nitrogenated carbon films Chan WC, Zhou BZ, Chung YW, Lee CS, Lee ST
1912 - 1916	Characteristics of amorphous and polycrystalline silicon films deposited at 120 degrees C by electron cyclotron resonance plasma-enhanced chemical vapor deposition Bae SH, Kalkan AK, Cheng SC, Fonash SJ
1917 - 1920	Plasma conditions for as-grown low temperature poly-Si formation on SiO2 substrate by sputtering and plasma enhanced chemical vapor deposition processes Takeya M, Park WS, Jong GS, Ohmi T
1921 - 1925	Real-time substrate misalignment monitor and automatic recalibration Hosokawa A, Demaray E, Mullapudi R, Inagawa M
1926 - 1933	Postdeposition reduction of noble metal doped ZnO films Exarhos GJ, Rose A, Wang LQ, Windisch CF
1934 - 1937	Twinned epitaxial layers formed on Si(111)root 3x root 3-B Hibino H, Sumitomo K, Ogino T
1938 - 1943	In situ observation of gas-source molecular beam epitaxy of silicon and germanium on Si(001) Goldfarb I, Owen JHG, Bowler DR, Goringe CM, Hayden PT, Miki K, Pettifor DG, Briggs GAD
1944 - 1948	Electron cyclotron resonance plasma etching of oxides and SrS and ZnS-based electroluminescent materials for flat panel displays Lee JW, Pathangey B, Davidson MR, Holloway PH, Lambers ES, Davydov A, Anderson TJ, Pearton SJ
1949 - 1955	Monolithic and multilayer Cr/CrN, Cr/Cr2N, and Cr2N/CrN coatings on hard and soft substrates Kuruppu ML, Negrea G, Ivanov IP, Rohde SL
1956 - 1962	Process controlled microstructural and binding properties of hard physical vapor deposition films Oechsner H
1963 - 1968	Thickness-dependent crystallinity of sputter-deposited titania DeLoach JD, Aita CR
1969 - 1975	Improved accuracy in monitoring Si monolayer incorporation in GaAs during molecular beam epitaxy Daweritz L, Schutzendube P, Reiche M, Ploog KH
1976 - 1979	Excimer laser cleaning of silicon wafer backside metallic particles Beaudoin F, Meunier M, Simard-Normandin M, Landheer D
1980 - 1990	Silicon field emitter cathodes : Fabrication, performance, and applications Temple D, Palmer WD, Yadon LN, Mancusi JE, Vellenga D, McGuire GE
1991 - 1997	Getters and gettering in plasma display panels Caloi RM, Carretti C
1998 - 2002	Ciliary microactuator array for scanning electron microscope positioning stage Darling RB, Suh JW, Kovacs GTA