1 - 4 |
Effects of Substrate-Temperature on the Structure and Properties of Reactive Pulsed-Laser Deposited Cnx Films Ong CW, Zhao XA, Tsang YC, Choy CL, Chan PW |
5 - 15 |
Growth-Structure Investigation of MgF2 and Ndf3 Films Grown by Molecular-Beam Deposition on CaF2(111) Substrates Kaiser U, Adamik M, Safran G, Barna PB, Laux S, Richter W |
16 - 19 |
Growth of PbS and CdS Thin-Films by Low-Pressure Chemical-Vapor-Deposition Using Dithiocarbamates Fainer NI, Kosinova ML, Rumyantsev YM, Salman EG, Kuznetsov FA |
20 - 25 |
XPS and X-Ray-Diffraction Studies of Aluminum-Doped Zinc-Oxide Transparent Conducting Films Islam MN, Ghosh TB, Chopra KL, Acharya HN |
26 - 36 |
Plasma-Enhanced Chemical-Vapor-Deposition of Thin-Films from Tetraethoxysilane and Methanol - Optical-Properties and XPS Analyses Zajickova L, Ohlidal I, Janca J |
37 - 42 |
Chemical-Mechanical Polishing of SiO2 Thin-Films Studied by X-Ray Reflectivity Wallace WE, Wu WL, Carpio RA |
43 - 50 |
Effect of N2O/SiH4 Ratio on the Properties of Low-Temperature Silicon-Oxide Films from Remote Plasma Chemical-Vapor-Deposition Park YB, Kang JK, Rhee SW |
51 - 55 |
Photoconductivity and Recombination in Amorphous Se/CdSe Multilayers Nesheva D |
56 - 60 |
Iron Pyrite Films Prepared by Sulfur Vapor Transport Dahman H, Khalifa M, Brunel M, Rezig B |
61 - 66 |
Pulsed-Laser Deposition of Bi2Te3 Thin-Films Dauscher A, Thomy A, Scherrer H |
67 - 75 |
Structural, Chemical, and Electrical Characterization of Reactively Sputtered Wsx Thin-Films Regula M, Ballif C, Moser JH, Levy F |
76 - 82 |
Epitaxially Grown Molybdenum Thin-Films Deposited by Laser-Ablation on (100)MgO Substrates Guillouxviry M, Perrin A, Padiou J, Sergent M, Rossel C |
83 - 85 |
Thickness Correlated Effects of the Crystal and Surface-Structure of C-60 Thin-Films Grown on Mica by Hot-Wall Epitaxy Stifter D, Sitter H |
86 - 89 |
Electrochemical Deposition of MoS2 Thin-Films by Reduction of Tetrathiomolybdate Ponomarev EA, Neumannspallart M, Hodes G, Levyclement C |
90 - 94 |
Implantation Effect of Diamond-Like Carbon-Films by 110 keV Nitrogen-Ions Wang WJ, Wang TM, Jing C |
95 - 100 |
A Theory for the Formation of Tetrahedral Amorphous-Carbon Including Deposition Rate Effects Yin Y, Mckenzie DR |
101 - 106 |
Ultrathin Silicon-Oxide Films Deposited by Synchrotron Irradiation of Condensed Layers of Silanes and Water Moore JF, Strongin DR |
107 - 111 |
MBE Growth and Characterization of Buried Silicon-Oxide Films on Si(100) Hacke M, Bay HL, Mantl S |
112 - 114 |
New Lacu0.5Mn0.5O3 Thin-Films Deposited by the Sol-Gel Process on Different Substrates Kovacheva D, Stambolova I, Konstantinov K, Donchev T |
115 - 116 |
Site Symmetry of Yb3+ in In0.5Ga0.5P Jeong BS, An JY, Choi JC, Park HL, Kim TW |
117 - 123 |
Graphite Formation on Ni Film by Chemical-Vapor-Deposition Yudasaka M, Kikuchi R, Matsui T, Ohki Y, Baxendale M, Yoshimura S, Ota E |
124 - 129 |
The Effect of the Isopoly Tungstate Anion on the Composition and Conductivity of Polypyrrole Composite Films Takahashi M, Tsuchida T, Ohtsuka T |
130 - 135 |
The Infrared Properties of Magnetron-Sputtered Diamond-Like Thin-Films Clarke GA, Xie Y, Eldridge JE, Parsons RR |
136 - 141 |
Grain-Size and Strain in Thin Sputter-Deposited Ni0.8Fe0.2 and Cu Films Neerinck DG, Deveirman AE, Slangen MH, Rijks TG, Kools JC |
142 - 146 |
Titanium-Containing Hydrofluoric-Acid Pretreatment for Aluminum Chemical-Vapor-Deposition Sugai K, Okabayashi H, Kishida S, Shinzawa T |
147 - 151 |
Twinning of YBa2Cu3O7 Thin-Films on Different Substrates Schweitzer D, Bollmeier T, Stritzker B, Rauschenbach B |
152 - 159 |
The Use of Ce(Fod)(4) as a Precursor for the Growth of Ceria Films by Metal-Organic Chemical-Vapor-Deposition Mcaleese J, Plakatouras JC, Steele BC |
160 - 162 |
Electrodeposition of Cuins2 from Aqueous-Solution .1. Electrodeposition of Cu-S Film Yukawa T, Kuwabara K, Koumoto K |
163 - 166 |
Deposition of CeO2 Films Including Areas with the Different Orientation and Sharp Border Between Them Kotelyanskii IM, Luzanov VA, Dikaev YM, Kravchenko VB, Melekh BT |
167 - 170 |
Application of Rachinger Method to Separate Overlapped Doublets in the X-Ray Photoelectron-Spectrum Sreemany M, Ghosh TB |
171 - 177 |
Growth of Fe on Si (100) at Room-Temperature and Formation of Iron Silicide Ruhrnschopf K, Borgmann D, Wedler G |
178 - 182 |
Electronic-Properties of the Ge/RBF/GaAs System - The Effect of the RBF Intralayer Stankiewicz B |
183 - 187 |
Comparison Between Newly Developed and Classical Determinations of Index and Thickness of Thin-Films on Substrates by Ellipsometry Easwarakhanthan T, Remy M |
188 - 198 |
Microstructure of Plasma-Sprayed Ni-Al Alloy Coating on Mild-Steel Chen HC, Pfender E |
199 - 203 |
In-Situ Measurement of Stress Generated During Electrocrystallization of Fe-Ni Alloys Czerwinski F |
204 - 210 |
Mechanical-Properties of A-C-H and A-C-H/SiOx Nanocomposite Thin-Films Prepared by Ion-Assisted Plasma-Enhanced Chemical-Vapor-Deposition Lee JH, Kim DS, Lee YH, Farouk B |
211 - 220 |
Semiconducting and Structural-Properties of CrSi2 A-Type Epitaxial-Films on Si(111) Galkin NG, Velitchko TV, Skripka SV, Khrustalev AB |
221 - 226 |
Electroluminescent Zinc-Sulfide Devices Produced by Sol-Gel Processing Tang W, Cameron DC |
227 - 232 |
Degradation of Nicr/Cunimn/Nicr Films on Alumina Substrates Bruckner W, Edelmann J, Vinzelberg H, Reiss G, Knuth T |
233 - 237 |
Degradation of the Electrochromic Nickel-Oxide Film upon Redox Cycling Ushio Y, Ishikawa A, Niwa T |
238 - 243 |
A Trough with Radial Compression for Studies of Monolayers and Fabrication of Langmuir-Blodgett-Films Matsumoto M, Tsujii Y, Nakamura KI, Yoshimoto T |
244 - 248 |
Photoinduced Energy and Electron-Transfer of Covalently-Linked Zinc(II)-Pyropheophytin-Anthraquinone Molecules in Monolayers of Langmuir-Blodgett-Films Tkachenko NV, Tauber AY, Lemmetyinen H, Hynninen PH |
249 - 255 |
Langmuir-Blodgett-Films of Cu(II)-Tetrakis(3,3-Dimethylbutoxycarbonyl)Phthalocyanine - A Spectrophotometric and TEM Analysis of Their Structure and Morphology Manno D, Rella R, Troisi L, Valli L |
256 - 261 |
Electron-Emission Characterization of Diamond Thin-Films Grown from a Solid Carbon Source Jou S, Doerr HJ, Bunshah RF |
262 - 264 |
Low-Frequency Dispersion in GaSe Thin-Films Anis MK, Khan MS, Asim H |
265 - 270 |
Analysis of the Oxidation-Kinetics and Barrier Layer Properties of Zrn and Pt/Ru Thin-Films for DRAM Applications Alshareef HN, Chen X, Lichtenwalner DJ, Kingon AI |
271 - 277 |
Amorphous Semiconducting Film Containing Nanometer Particles of Cutcnq - Preparation, Characterization and Electrical Switching Property Liu SG, Liu YQ, Zhu DB |
278 - 283 |
Crystallization Kinetics of Sbxse100-X Thin-Films Dimitrov D, Ollacarizqueta MA, Afonso CN, Starbov N |