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Papers Presented at the European-Materials-Research-Society 1996-Spring-Meeting, Symposium-D - Group-IV Heterostructures, Physics and Devices (Si, Ge, C, Alpha-Sn), Strasbourg, France, June 4-7, 1996 - Preface Lourtioz JM |
3 - 10 |
Line, Point and Surface Defect Morphology of Graded, Relaxed Gesi Alloys on Si Substrates Fitzgerald EA, Samavedam SB |
11 - 14 |
Single-Wafer Si and SiGe Processes for Advanced ULSI Technologies Bodnar S, Morin C, Regolini JL |
15 - 17 |
Atomic Layer Doping of SiGe by Low-Pressure (Rapid Thermal) Chemical-Vapor-Deposition Tillack B, Kruger D, Gaworzewski P, Ritter G |
18 - 21 |
Real-Time Control of Layer Thickness in LPCVD Si/Si.Ge-88.(12) HBT Structures Hope DA, Pickering C, Carline RT, Leong WY, Robbins DJ |
22 - 26 |
Growth Mechanisms of SiGe on (111)Si and (100)Si Substrates Gallas B, Berbezier I, Ronda A, Derrien J |
27 - 32 |
Defect-Free Strain Relaxation in Locally MBE-Grown SiGe Heterostructures Rupp T, Kaesen F, Hansch W, Hammerl E, Gravesteijn DJ, Schorer R, Silveira E, Abstreiter G, Eisele I |
33 - 36 |
Time-Resolved Dislocation-Related Luminescence in Strain-Relaxed SiGe/Si Fukatsu S, Mera Y, Inoue M, Maeda K |
37 - 42 |
Combined Characterization of Group-IV Heterostructures and Materials by Spectroscopic Ellipsometry and Grazing X-Ray Reflectance Boher P, Stehle JL, Hennet L |
43 - 46 |
Relaxed Epitaxial Si(1-X)Ge-X Grown by MBE Monakhov EV, Shiryaev SY, Larsen AN, Hartung J, Davies G |
47 - 49 |
Strain Relaxation and Thermal-Stability of the 3C-SiC(001)/Si(001) Interface - A Molecular-Dynamics Study Chirita V, Hultman L, Wallenberg LR |
50 - 53 |
Effects of Substrate Bias and Rapid Thermal-Processing on the Luminescence of Si/SiGe Multiple-Quantum Wells Grown by MBE Hartmann R, Grutzmacher D, Muller E, Gennser U, Dommann A |
54 - 58 |
Quantification of Germanium and Boron in Heterostructures Si/Si1-xGex/Si by SIMS Prudon G, Gautier B, Dupuy JC, Dubois C, Bonneau M, Delmas K, Vallard JP, Bremond G, Brenier R |
59 - 63 |
UHV-CVD Heteroepitaxial Growth of Si1-xGex Alloys on Si(100) Using Silane and Germane Vinh LT, Aubryfortuna V, Zheng Y, Bouchier D, Guedj C, Hincelin G |
64 - 68 |
Structural Disorder in SiGe Films Grown Epitaxially on Si by Ion-Beam Sputter-Deposition Parnis D, Zolotoyabko E, Kaplan WD, Eizenberg M, Mosleh N, Meyer F, Schwebel C |
69 - 71 |
Homoepitaxy of Silicon at Low-Temperature on Clean and Ga-Covered Substrates Gallas B, Berbezier I, Derrien J |
72 - 75 |
Cold-Walled UHV/CVD Batch Reactor for the Growth of Si1-xGex Layers Thomsen EV, Christensen C, Andersen CR, Pedersen EV, Eginton PN, Hansen O, Petersen JW |
76 - 79 |
Growth of Single-Crystal Si, Ge and SiGe Layers Using Plasma-Assisted CVD Thwaites MJ, Reehal HS |
80 - 83 |
HRTEM Study of Si1-xGex Werckmann J, Chelly R, Ulhaqbouillet C, Romeo M, Ghica C |
84 - 87 |
Growth of Epitaxial SiGe Nanostructures at Low-Temperature on Si(100) Using Hot-Wire Assisted Gas-Source Molecular-Beam Epitaxy Chelly R, Werckmann J, Angot T, Louis P, Bolmont D, Koulmann JJ |
88 - 92 |
Surface-Morphology and Reconstructions of Ultra-Thin Si Films Grown by Solid-Phrase Epitaxy Zhang Z, Kulakov MA, Bullemer B |
93 - 97 |
Ternary Sigec Alloys - Growth and Properties of a New Semiconducting Material Osten HJ, Kim M, Lippert G, Zaumseil P |
98 - 104 |
Pseudomorphic Si1-Ycy and Si1-X-Ygexcy Alloy Layers on Si Eberl K, Brunner K, Winter W |
105 - 111 |
Improved Growth-Morphology of Si-Ge-C Heterostructures Through the Use of Sb Surfactant-Assisted Molecular-Beam Epitaxy Croke ET, Hunter AT, Pettersson PO, Ahn CC, Mcgill TC |
112 - 117 |
Optical and Electrical-Properties of Si(1-X-Y)G(X)G(Y) Thin-Films and Devices Stamour A, Lanzerotti LD, Chang CL, Sturm JC |
118 - 121 |
Local Strains in Si1-X-Ygexcy Alloys as Deduced from Vibrational Frequencies Finkman E, Rucker H, Meyer F, Prawer SD, Bouchier D, Boulmer J, Bodnar S, Regolini JL |
122 - 124 |
Near-Band-Edge Photoluminescence from Pseudomorphic Tensially Strained Si0.985C0.015 Alloy Khan AS, Berger PR, Guarin FJ, Iyer SS |
125 - 128 |
Rtcvd Growth and Characterization of Sigec Multiquantum Wells Warren P, Dutoit M, Boucaud P, Lourtioz JM, Julien FH |
129 - 132 |
Carbon and Germanium Distributions in Si1-X-Ygexcy Layers Epitaxially Grown on Si(001) by Rtcvd Guedj C, Portier X, Hairie A, Bouchier D, Calvarin G, Piriou B |
133 - 136 |
Infrared-Spectroscopy of Strained Si1-Ycy Alloys (0-Less-Than-or-Equal-to-Y-Less-Than-or-Equal-to-0.015) Grown on Silicon Pressel K, Fischer GG, Zaumseil P, Kim M, Osten HJ |
137 - 140 |
Incorporation of Substitutional Carbon in Si and SiGe by Laser Processing in Methane and Propylene Boulmer J, Guedj C, Debarre D |
141 - 144 |
Fermi-Level Pinning in Schottky Diodes on IV-IV-Semiconductors - Effect of Ge-Incorporation and C-Incorporation Mamor M, Perrossier JL, Aubryfortuna V, Meyer F, Bouchier D, Bodnar S, Regolini JL |
145 - 148 |
Strain Compensation in Si1-X-Ygexcy Layers Prepared by Ion-Implantation and Excimer-Laser Annealing Grob A, Grob JJ, Muller D, Prevot B, Stuck R |
149 - 152 |
Comparison of Si1-Ycy Films Produced by Solid-Phase Epitaxy and Rapid Thermal Chemical-Vapor-Deposition Ray SK, Mcneill DW, Gay DL, Maiti CK, Armstrong GA, Armstrong BM, Gamble HS |
153 - 156 |
New Ge Substrate Cleaning Method for Si1-X-Ygexcy MOMBE Growth Akane T, Okumura H, Tanaka J, Matsumoto S |
157 - 159 |
Fabrication of a Nanosize Si-Tip Coated with a Thin Diamond-Like Carbon-Film Jung MY, Kim DW, Choi SS, Kim YS, Kuk Y, Park KC, Jang J |
160 - 165 |
Fully Pseudomorphic Si/SiGe/Si Heterostructures for P-Channel Field-Effect Devices Whall TE |
166 - 172 |
Novel Microscopic Properties and the Electronic-Structure of SiGe Heterostructures and Related Systems Shaw MJ, Briddon PR, Jaros M |
173 - 178 |
Spectroscopy of Intersubband Transitions in Si-Si1-xGex Quantum-Wells Boucaud P, Wu L, Julien FH, Lourtioz JM, Sagnes I, Campidelli Y, Prazeres R, Ortega JM |
179 - 181 |
Low-Field Magnetoresistance in Si/SiGe Quantum-Wells Prinz A, Brunthaler G, Sawicki M, Bauer G, Ismail K, Meyerson BS |
182 - 185 |
Thermoelectric-Power of the Si/Si0.8Ge0.2 2-Dimensional Hole Gas Mironov OA, Gerleman IG, Phillips PJ, Parker EH, Tsaousidou M, Butcher PN, Whall TE |
186 - 189 |
Optical-Spectra and Recombination in Si-Ge Heterostructures Corbin E, Williams C, Hagon JP, Jaros M, Presting H |
190 - 193 |
Local Electric-Field Effects in a SiGe Quantum-Well Investigated by Photoluminescence Nilsson S, Penner U, Schmalz K, Yassievich IN, Chang CY, Tsai WC |
194 - 197 |
Recombination Mechanisms via Deep Levels in Rtcvd Si/Si0.85Ge0.15/Si Double Heterostructures Gamezcuatzin H, Debarros O, Bremond G, Warren P, Dutartre D |
198 - 200 |
Si1-xGex/Si Valence-Band Offset Determination Using Current-Voltage Characteristics Chretien O, Apetz R, Souifi A, Vescan L |
201 - 203 |
Room-Temperature Electroluminescence from Dislocations in Silicon Sveinbjornsson EO, Weber J |
204 - 207 |
Local-Symmetry Effect on Light Emissivity from SiGe Quantum-Wells Miyao M, Nakagawa K, Kimura Y, Hirao M |
208 - 210 |
Electrophysical Studies of 2D-Hole Spectral Characteristics and Peculiarities of Scattering Mechanisms in Ge Layers of Ge-Ge1-Xsix Heterostructures Orlov LK, Potapov AV, Rubtsova RA, Arapov Y, Gorodilov N, Shelushinina N, Yang FH, Leotin J, Goiran M |
211 - 213 |
Thermal Emission of Holes from Confined Levels in Strained SiGe Channel P-MOSFETs Gamezcuatzin H, Marchand JJ, Bremond G, Garchery L, Campidelli Y, Berenguer M |
214 - 216 |
Electrical-Properties of Silicon-Nitride Films Grown on a SiGe Layer by Distributed Electron-Cyclotron-Resonance Plasma-Enhanced Chemical-Vapor-Deposition Dufourgergam E, Meyer F, Delmotte F, Hugon MC, Agius B, Warren P, Dutartre D |
217 - 219 |
Titanium Metallization of Si/Ge Alloys and Superlattices Freiman W, Beserman R, Dettmer K |
220 - 222 |
Erbium-Silicon Light-Emitting-Diodes Grown by Molecular-Beam Epitaxy - Optical-Properties Stimmer J, Reittinger A, Neufeld E, Abstreiter G, Holzbrecher H, Breuer U, Buchal C |
223 - 226 |
Erbium Doping of Si via Ion-Beam-Induced Epitaxial Crystallization - Another Route to Room-Temperature Photoluminescence Clerc C, Bernas H, Chaumont J, Boucaud P, Julien F, Lourtioz JM |
227 - 230 |
Highly Oriented Si Nanoparticles in SiO2 Created by Si Molecular-Beam Epitaxy with Oxygen Implantation Ishikawa Y, Shibata N, Fukatsu S |
231 - 234 |
DC Electric-Field-Induced 2nd-Harmonic Generation Spectroscopy of the Si(001)-SiO2 Interface - Separation of the Bulk and Surface Nonlinear Contributions Aktsipetrov OA, Fedyanin AA, Melnikov AV, Dadap JI, Hu XF, Anderson MH, Downer MC, Lowell JK |
235 - 237 |
DC Electric-Field-Induced 2nd-Harmonic Generation in Si-SiO2 Multiple-Quantum Wells Aktsipetrov OA, Fedyanin AA |
238 - 241 |
Effect of Annealing and H-2 Passivation on the Photoluminescence of Si Nanocrystals in SiO2 Neufeld E, Wang S, Apetz R, Buchal C, Carius R, White CW, Thomas DK |
242 - 245 |
SiGe/Sigeo2 Interface Defects Lebib S, Schoisswohl M, Cantin JL, Vonbardeleben HJ |
246 - 249 |
Recent Advances with SiGe Heterojunction Bipolar-Transistors Gruhle A, Schuppen A |
250 - 253 |
Integration of SiGe Heterojunction Bipolar-Transistors in a 200 mm Industrial BiCMOS Technology Deberranger E, Bodnar S, Chantre A, Kirtsch J, Monroy A, Granier A, Laurens M, Regolini JL, Mouis M |
254 - 258 |
Proposal for a New Process Flow for the Fabrication of Silicon-Based Complementary MOD-MOSFETs Without Ion-Implantation Augusto CJ, Demeyer K |
259 - 262 |
Study of Uniform and Graded SiGe Channel Heterojunction P-MOSFETs Using Monte-Carlo Simulation Dollfus P, Galdin S, Arbey ME, Hesto P |
263 - 266 |
Characterization of an N-Type Si/SiGe Modulation-Doped Field-Effect Transistor Kuznetsov VI, Werner K, Radelaar S, Metselaar JW |
267 - 270 |
Vertical Si P-MOS Transistor Selectively Grown by Low-Pressure Chemical-Vapor-Deposition Loo R, Vescan L, Behammer D, Moers J, Grabolla T, Langen W, Klaes D, Zastrow U, Kordos P |
271 - 273 |
Characterization of Si/SiGe Heterojunction Bipolar-Transistors by Deep-Level Transient Spectroscopy Debarros O, Souifi A, Letron B, Vincent G, Bremond G |
274 - 277 |
Use of Narrow Collector Layers in Si and Si1-xGex Bipolar-Transistors Leong WY, Churchill AC, Robbins DJ, Lambert A |
278 - 280 |
New-Type of Schottky Barriers Using NiTi Shape-Memory Alloy-Films Bendahan M, Seguin JL, Lollman D, Carchano H |
281 - 283 |
Non-One-Dimensional Effects in Tunnel MOS Devices Belov SV, Vexler MI, Grekhov IV, Shulekin AF |
284 - 290 |
Strained SiGe/Si Quantum-Well Dots and Wires Selectively Grown by LPCVD and Their Optical-Properties Vescan L |
291 - 295 |
Growth of Self-Assembled Homogeneous SiGe-Dots on Si(100) Schittenhelm P, Abstreiter G, Darhuber A, Bauer G, Werner P, Kosogov A |
296 - 299 |
X-Ray-Diffraction and Reflection from Self-Assembled Ge Dots Darhuber AA, Stangl J, Bauer G, Schittenhelm P, Abstreiter G |
300 - 303 |
Lattice Distortion in Dry-Etched Si/SiGe Quantum-Dot Array Studied by 2D Reciprocal Space Mapping Using Synchrotron X-Ray-Diffraction Ni WX, Birch J, Tang YS, Joelsson KB, Sotomayortorres C, Kvick A, Hansson GV |
304 - 307 |
Controlling the Strain and Light-Emission from Si-Si1-xGex Quantum Dots Tang YS, Hicks SE, Ni WX, Torres CM, Hansson GV, Wilkinson CD |
308 - 310 |
Self-Assembled Growth of Sn on Ge(001) Dondl W, Schittenhelm P, Abstreiter G |
311 - 314 |
Dislocation Patterning - A New Tool for Spatial Manipulation of Ge Islands Shiryaev SY, Pedersen EV, Jensen F, Petersen JW, Hansen JL, Larsen AN |
315 - 317 |
Collective Excitations of Electron Disks in Laterally Patterned Si/SiGe Modulation-Doped Heterojunctions Zanier S, Guldner Y, Berroir JM, Vieren JP, Faini G, Cambril E, Garchery L, Campidelli Y, Sagnes I |
318 - 324 |
Dynamical Behavior in a Shallow Quantum Confinement System Fukatsu S |
325 - 329 |
Prospects for Novel Si-Based Optoelectronic Devices - Unipolar and P-I-P-I Lasers Soref RA |
330 - 335 |
Ir Studies of P-Type Si/SiGe Quantum-Wells - Intersubband Absorption, Ir Detectors, and 2nd-Harmonic Generation Helm M, Kruck P, Fromherz T, Weichselbaum A, Seto M, Bauer G, Moussa Z, Boucaud P, Julien FH, Lourtioz JM, Nutzel JF, Abstreiter G |
336 - 339 |
Anomalous Photoluminescence of Pure-Ge/Si Type-II Coupled Quantum-Wells (II-Cqws) Sunamura H, Usami N, Shiraki Y, Fukatsu S |
340 - 342 |
Ir Absorption and Quantum Efficiency of Highly P-Doped SiGe Layers Uschmann J, Presting H, Kibbel H, Thonke K, Sauer R, Cabanski W, Jaros M |
343 - 346 |
Gesi Infrared Detectors Strong R, Greve DW, Misra R, Weeks M, Pellegrini P |
347 - 350 |
Lateral Photodetector Devices on Si/SiGe Heterostructures Engel C, Baumgartner P, Holzmann M, Nutzel JF, Abstreiter G |
351 - 353 |
Vertical MSM Photodiodes in Silicon-Based on Epitaxial Si/CoSi2/Si Ruders F, Kim J, Hacke M, Mesters S, Buchal C, Mantl S |
354 - 356 |
Infrared-Sensitive SiGe-Si Heterojunction Internal Photoemission Detectors Produced by Rapid Thermal Chemical-Vapor-Deposition Banisch R, Tillack B, Pressel K, Barth R, Erzgraber H |