Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.12, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (296 articles)

895 - 896	The American Vacuum Society and the People Who Have Guided Its Development Singleton JH
897 - 903	Throughput-Type Pumps and Ultrahigh-Vacuum Hablanian MH
904 - 914	History of Ultrahigh-Vacuum Pressure Measurements Redhead PA
915 - 920	Some Important Developments in Capture Pumping Technology in the Last 40 Years Welch KM
921 - 927	Ultrahigh-Vacuum in the Semiconductor Industry Ohanlon JF
928 - 935	Historical-Perspective of Oriented and Epitaxial Thin-Films Francombe MH
936 - 945	History and Current Status of Vacuum Metallurgy Bunshah RF
946 - 952	Ultrahigh-Vacuum and Surface Science Palmberg PW
953 - 961	Perspective on Stresses in Magnetron-Sputtered Thin-Films Hoffman DW
962 - 978	Development of Ultrahigh-Vacuum Technology for Particle Accelerators and Magnetic Fusion Devices Dylla HF
979 - 985	Ultrahigh-Vacuum Chemical-Vapor-Deposition Epitaxy of Silicon and Germanium-Silicon Heterostructures Greve DW, Misra R, Strong R, Schlesinger TE
986 - 989	Silicon Shot Gas Epitaxy - Dose-Controlled Digital Epitaxy Kim KJ, Suemitsu M, Miyamoto N
990 - 994	Heteroepitaxial Growth of Si on Gap and GaAs-Surfaces by Remote, Plasma-Enhanced Chemical-Vapor-Deposition Habermehl S, Dietz N, Lu Z, Bachmann KJ, Lucovsky G
995 - 1002	III-V on Dissimilar Substrates - Epitaxy and Alternatives Deboeck J, Demeester P, Borghs G
A43 - A43	Papers from the 40th National Symposium of the American-Vacuum-Society .1. 15-19 November 1993 Orange-County-Convention-Center Orlando, Florida - Preface Lucovsky G
1003 - 1008	Molecular-Beam Epitaxy-Grown III-V Strain Relaxed Buffer Layers and Superlattices Characterized by Atomic-Force Microscopy Howard AJ, Fritz IJ, Drummond TJ, Olsen JA, Hammons BE, Kurtz SR, Brennan TM
1009 - 1014	Fabrication of Relaxed Si1-xGex Layers on Si Substrates by Rapid Thermal Chemical-Vapor-Deposition Dutartre D, Warren P, Provenier F, Chollet F, Perio A
1015 - 1019	Strain Compensated Heterostructures in the Si1-X-Ygexcy Ternary-System Regolini JL, Bodnar S, Oberlin JC, Ferrieu F, Gauneau M, Lambert B, Boucaud P
1020 - 1026	Low-Knudsen-Number Transport and Deposition Liao H, Cale TS
1027 - 1031	Comparison of Boranol and Silanol Reactivities in Boron-Doped SiO2 Chemical-Vapor-Deposition from Trimethyl Borate and Tetraethyl Orthosilicate Bartram ME, Moffat HK
1032 - 1038	W-Nucleation on Tin from Wf6 and SiH4 Lantz SL, Bell AE, Ford WK, Danielson D
1039 - 1044	Large Oscillator Strength of Spatially Indirect Electron-Hole Recombination at Type-II Heterojunctions - The InAlAs/InP Case Bimberg D, Bohrer J, Krost A
1045 - 1049	Ultraviolet Photosulfidation of III-V Compound Semiconductors for Electronic Passivation Zavadil KR, Ashby CI, Howard AJ, Hammons BE
1050 - 1053	Strain Relaxation Induced Deep Levels in In1-Xgaxas Thin-Films Raisanen A, Brillson LJ, Goldman RS, Kavanagh KL, Wieder HH
1054 - 1062	Amorphous Si-B Films - Microstructure and Electrical-Properties Yang GR, Soss SR, Nason TC, Ma XF, Cocoziello A, Tong BY, Zhu YT, Du J, Tjew KF
1063 - 1067	Electrochemical Sulfur Passivation of Visible (Similar-to-670 nm) AlGaInP Lasers Howard AJ, Ashby CI, Lott JA, Schneider RP, Corless RF
1068 - 1071	Characterization of Diamond-Like Carbon-Films Grown by Super-Wide Electron-Cyclotron-Resonance Plasma-Assisted Chemical-Vapor-Deposition Ishii A, Amadatsu S, Minomo S, Taniguchi M, Sugiyo M
1072 - 1078	Transport and Phototransport Properties of Plasma-Deposited Hydrogenated Amorphous-Silicon Nitrogen Alloys, A-Si,N-H Williams MJ, He SS, Cho SM, Lucovsky G
1079 - 1084	Preliminary Soft-X-Ray Studies of Beta-SiC Shek ML, Miyano KE, Dong QY, Callcott TA, Ederer DL
1085 - 1089	Monte-Carlo Simulation and Measurement of Silicon Reactive Ion Etching Profiles Tait RN, Dew SK, Smy T, Brett MJ
1090 - 1093	Investigation on the Effect of Isoelectronic Substitution in Zns1-xSex Alloys Nelson AJ
1094 - 1098	Structural Characterization of GaN and Gaasxn1-X Grown by Electron-Cyclotron-Resonance Metalorganic Molecular-Beam Epitaxy Bharatan S, Jones KS, Abernathy CR, Pearton SJ, Ren F, Wisk PW, Lothian JR
1099 - 1102	Posthydrogenation Study of A-Si Films Grown by Reactive Magnetron Sputtering Liang YH, Abelson JR
1103 - 1107	Sulfur Passivation of AlxGa1-xAs for Ohmic Contact Formation Fischer V, Ristolainen E, Holloway PH, Lampert WV, Haas TW
1108 - 1113	Kinetic and Mechanistic Study of the Chemical-Vapor-Deposition of Titanium-Dioxide Thin-Films Using Tetrakis-(Isopropoxo)-Titanium(IV) Fictorie CP, Evans JF, Gladfelter WL
1114 - 1119	Chemical-States of the GaAs/Si Interface Zhou HJ, Ho W
1120 - 1123	Be-Doped GaAs-Layers Grown at a High as/Ga Ratio by Molecular-Beam Epitaxy Zhang DH, Radhakrishnan K, Yoon SF, Li HM
1124 - 1128	Indium Desorption from Strained InGaAs/GaAs Quantum-Wells Grown by Molecular-Beam Epitaxy Radhakrishnan K, Yoon SF, Gopalakrishnan R, Tan KL
1129 - 1133	Effect of Substrate-Temperature on Dry-Etching of InP, GaAs, and AlGaAs in Iodine-Based and Bromine-Based Plasmas Chakrabarti UK, Ren F, Pearton SJ, Abernathy CR
1134 - 1138	Nanometer P-N-Junction Formation and Characterization Lau WM, Huang LJ, Chang WH, Bello I, Abraham T, King M
1139 - 1141	Growth and Characterization of Si1-xGex Si Multilayers on Patterned Si(001) Substrates Using Gas-Source Molecular-Beam Epitaxy Zhang J, Marinopoulou A, Hartung J, Lightowlers EC, Anwar N, Parry G, Xie MH, Mokler SM, Wu XD, Joyce BA
1142 - 1147	Si 1S X-Ray-Absorption Spectra of Epitaxial Si-Ge Atomic Layer Superlattice and Alloy-Films Hitchcock AP, Tyliszczak T, Rocco ML, Francis JT, Urquhart SG, Feng XH, Lu ZH, Baribeau JM, Jackman TE
1148 - 1151	Comparison of 2 Epitaxial Formation Mechanisms in the SiGe System and the Subsequent Defect Generation Prokes SM, Rai AK
1152 - 1157	Optical Anisotropy of Singular and Vicinal Si-SiO2 Interfaces and H-Terminated Si Surfaces Yasuda T, Aspnes DE, Lee DR, Bjorkman CH, Lucovsky G
1158 - 1169	CaF2 Overlayers to Preserve the Ideal Termination of Sb/GaAs(110) Green AM, Spicer WE, Kim C, Cao R, Pianetta P
1170 - 1175	GaAs Formation by Reduction of As2O3 and Ga2O3 at SiO2/GaAs Oxides/GaAs Interfaces Jimenez I, Moreno M, Martingago JA, Asensio MC, Sacedon JL
1176 - 1179	Real-Time Scanning Microprobe Reflection High-Energy Electron-Diffraction Observations of III-V Growth During Molecular-Beam Epitaxy Isu T, Morishita Y, Goto S, Nomura Y, Katayama Y
1180 - 1185	As Capture and the Growth of Ultrathin InAs Layers on InP Aspnes DE, Tamargo MC, Brasil MJ, Nahory RE, Schwarz SA
1186 - 1190	Comparison of Intrinsic and Extrinsic Carbon Doping Sources for GaAs and AlGaAs Grown by Metalorganic Molecular-Beam Epitaxy Abernathy CR, Pearton SJ, Ren F, Hobson WS, Wisk PW
1191 - 1200	Fundamental Research and Device Applications of Molecular-Beam Epitaxy-Grown Heterostructures Weisbuch C
1201 - 1203	Study of the Epitaxial-Growth of GaAs(110) Films by Molecular-Beam Epitaxy Fawcett PN, Neave JH, Zhang J, Joyce BA
1204 - 1208	Microloading Effect Prevention in SiO2 Contact-Hole Etching Kato S, Sato M, Arita Y
1209 - 1215	Short-Gas-Residence-Time Electron-Cyclotron-Resonance Plasma-Etching Tsujimoto K, Kumihashi T, Kofuji N, Tachi S
1216 - 1220	Modeling the Electromagnetic-Excitation of a Microwave Cavity Plasma Reactor Tan W, Grotjohn TA
1221 - 1228	Modeling and Inductively-Coupled Plasma Source Paranjpe AP
1229 - 1236	Modeling and Simulation of Glow-Discharge Plasma Reactors Lymberopoulos DP, Economou DJ
1237 - 1240	Oxygen-Plasma-Enhanced Crystallization of A-Si-H Films on Glass Yin AG, Fonash SJ
1241 - 1243	Super-Wide Electron-Cyclotron-Resonance Plasma Source Excited by Traveling Microwave as an Efficient Tool for Diamond-Like Carbon-Film Deposition Ishii A, Amadatsu S, Minomo S, Taniguchi M, Sugiyo M, Sakaguchi Y, Kobayashi T
1244 - 1251	Investigation of Thick, Low-Temperature Plasma-Deposited Silica Films for Wave-Guide Fabrication Tabasky M, Bulat ES, Tweed B, Herrick C
1252 - 1258	Examination of Hydrogen Etched Mercury Cadmium Telluride by Spectroscopic Ellipsometry Orloff GJ, Smith PB
1259 - 1264	Reactive Ion Etching of Copper with BCl3 and Sicl4 - Plasma Diagnostics and Patterning Howard BJ, Steinbruchel C
1265 - 1268	Tapered Aluminum Interconnect Etch Allen LR, Rickard R
1269 - 1274	Operation of DIII-D with All-Graphite Walls Holtrop KL, Jackson GL, Kellman AG, Lee RL, Hollerbach MA
1275 - 1280	Production and Characterization of Doped Mandrels for Inertial-Confinement Fusion Experiments Cook R, Overturf GE, Buckley SR, Mceachern R
1281 - 1286	Electron-Cyclotron-Resonance Plasma Source for Conductive Film Deposition Ono T, Nishimura H, Shimada M, Matsuo S
1287 - 1292	Fluorocarbon High-Density Plasmas .8. Study of the Ion Flux Composition at the Substrate in Electron-Cyclotron-Resonance Etching Processes Using Fluorocarbon Gases Kirmse KH, Wendt AE, Oehrlein GS, Zhang Y
1293 - 1301	Cryogenic Targets and Related Technologies at Ile Osaka-University Norimatsu T, Chen CM, Nakajima K, Takagi M, Izawa Y, Yamanaka T, Nakai S
1302 - 1308	Laser Fusion Target Shell Wall Thickness from Interference Fringe Shape-Analysis Stephens RB, Wittman MD
1309 - 1314	Electron-Cyclotron-Resonance Plasma and Thermal-Oxidation Mechanisms of Germanium Wang Y, Hu YZ, Irene EA
1315 - 1321	In-Situ Electron-Cyclotron-Resonance Plasma Surface Cleaning of Silicon Hu YZ, Buaud PP, Spanos L, Wang YQ, Li M, Irene EA
1322 - 1327	Helicon Wave Plasma Reactor Employing Single-Loop Antenna Jiwari N, Fukasawa T, Kawakami H, Shindo H, Horiike Y
1328 - 1333	Etching of Aluminum-Alloys in the Transformer-Coupled Plasma Etcher Ra YJ, Bradley SG, Chen CH
1334 - 1338	Damage to Thin Gate Oxide During Lightly Doped Drain Spacer Oxide Etching Gabriel CT, Weling MG
1339 - 1345	Thin-Oxide Degradation Along Feature Edges During Reactive Ion Etching of Polysilicon Gates Markus K, Osburn CM, Magill P, Bobbio SM
1346 - 1350	Characterization of Etch-Induced Damage for Si Etched in Cl-2 Plasma Generated by an Electron-Cyclotron-Resonance Source Sung KT, Pang SW
1351 - 1355	Investigation of Plasma Etch Induced Damage in Compound Semiconductor-Devices Shul RJ, Lovejoy ML, Hetherington DL, Rieger DJ, Vawter GA, Klem JF, Melloch MR
1356 - 1359	Magnetron Enhanced Reactive Ion Etching of GaAs in CH4/H2/Ar - Surface Damage Study Mclane GF, Buchwald WR, Casas L, Cole MW
1360 - 1364	Critical Ion Energy and Ion Flux in the Growth of Films by Plasma-Enhanced Chemical-Vapor-Deposition Martinu L, Klembergsapieha JE, Kuttel OM, Raveh A, Wertheimer MR
1365 - 1370	Carbon Content of Silicon-Oxide Films Deposited by Room-Temperature Plasma-Enhanced Chemical-Vapor-Deposition of Hexamethyldisiloxane and Oxygen Theil JA, Brace JG, Knoll RW
1371 - 1379	Low-Temperature Plasma-Assisted Oxidation Combined with in-Situ Rapid Thermal Oxide Deposition for Stacked-Gate Si-SiO2 Heterostructures - Integrated Processing and Device Studies Misra V, Hattangady SV, Yasuda T, Xu XL, Hornung B, Lucovsky G, Wortman JJ
1380 - 1386	Computer-Simulation of Mass-Selective Plasma-Source Ion-Implantation Shohet JL, Wickesberg EB, Kushner MJ
1387 - 1396	2-Dimensional Self-Consistent Fluid Simulation of Radio-Frequency Inductive Sources Dipeso G, Vahedi V, Hewett DW, Rognlien TD
1397 - 1402	Effects of Particle Clouds in a Plasma Etch System on Silicon Dioxide Wafer Contamination Collins SM, Ohanlon JF, Carlile RN
1403 - 1407	Plasma Impedance and Microwave Interferometric Measurements of Electron Concentrations in Dual-Frequency Powered Sulfur-Hexafluoride Plasmas Jaiprakash VC, Thompson BE
1408 - 1416	Effects of Ion-Induced Electron-Emission on Magnetron Plasma Instabilities Hendricks MB, Smith PC, Ruzic DN, Leybovich A, Poole JE
1417 - 1424	Role of Ions in Reactive Ion Etching Coburn JW
1425 - 1430	Importance of the Molecular Identity of Ion Species in Reactive Ion Etching at Low Energies Bello I, Chang WH, Lau WM
1431 - 1434	Real-Time Observation of Ultrathin Silicon-Oxide Film Growth Using Rapid Ellipsometry Kuroki H, Nakamura KG, Kamioka I, Kawabe T, Kitajima M
1435 - 1438	Energetic Particles in the Sputtering of an Indium Tin Oxide Target Tominaga K, Chong M, Shintani Y
1439 - 1445	Optical Thin-Films for Wave-Guide Applications Mir JM, Agostinelli JA
1446 - 1450	Deposition of Nonlinear-Optical Films of Potassium Titanyl Phosphate (KtiOPO4) by Pulsed Excimer-Laser Ablation Xiong FL, Hagerman M, Zhou H, Kozhevnikov V, Wong GK, Poeppelmeier K, Ketterson JB, Chang RP, White CW
1451 - 1456	Inert-Gases in Sputtered Tungsten - A Test of Predictive Capability Hoffman DW, Park JS, Morley TS
1457 - 1462	Estimations and Results of Energetic Condensation Processes in Relation to Hard Carbon Deposition Rother B
1463 - 1469	In-Situ Measurement of Thin-Film Conductivity During and After Energetic Condensation Mausbach M, Vankronenberg G, Ehrich H
1470 - 1473	Infrared-Absorption and Nuclear-Magnetic-Resonance Studies of Carbon Nitride Thin-Films Prepared by Reactive Magnetron Sputtering Li D, Chung YW, Yang ST, Wong MS, Adibi F, Sproul WD
1474 - 1479	One-Point Numerical Modeling of Microwave Plasma Chemical-Vapor-Deposition Diamond Deposition Reactors Hyman E, Tsang K, Drobot A, Lane B, Casey J, Post R
1480 - 1486	Properties of Chemical-Vapor Infiltration Diamond Deposited in a Diamond Powder Matrix Panitz JK, Tallant DR, Hills CR, Staley DJ
1487 - 1490	Interfacial Reactions of Ion-Beam Deposited AC Films on ZnS Bruce T, Huang LJ, Bello I, Lau WM, Panchhi P, Strnad V, High M
1491 - 1495	Deposition and Characterization of Nanocrystalline Diamond Films Gruen DM, Pan XZ, Krauss AR, Liu SZ, Luo JS, Foster CM
1496 - 1500	Auger-Electron Spectroscopy of Laser-Deposited AC, A-C-H, Microcrystalline Diamond Kovarik P, Bourdon EB, Prince RH
1501 - 1506	Dependence of Material Properties of Radiofrequency Magnetron-Sputtered, Cu-Doped, ZnTe Thin-Films on Deposition Conditions Gessert TA, Li X, Coutts TJ, Mason AR, Matson RJ
1507 - 1512	Study of Ion-Beam-Sputtered ZnO Films as a Function of Deposition Temperature Qu Y, Gessert TA, Coutts TJ, Noufi R
1513 - 1518	Reaction Layer Formation and Fracture at Chemically Vapor-Deposited Diamond Metal Interfaces Perry SS, Somorjai GA
1519 - 1522	Interface Studies of the Diamond Film Grown on the Cobalt Cemented Tungsten Carbide Pan FM, Chen JL, Chou T, Lin TS, Chang L
1523 - 1527	Sputtering Yield of Optical-Materials - Sigmund Model and Experimental Results Scaglione S, Caneve L, Sarto F
1528 - 1534	High-Temperature Behavior of Reactively Sputtered AlN Films on Float Glass Substrates Arbab M, Finley JJ
1535 - 1541	Raman-Spectroscopic Study of the Formation of T-Mosi2 from Mo/Si Multilayers Cai M, Allred DD, Reyesmena A
1542 - 1546	Preferential Sputtering of Silicon from Metal Silicides at Elevated-Temperatures Hedlund C, Carlsson P, Blom HO, Berg S, Katardjiev IV
1547 - 1550	Accelerator Based Secondary-Ion Mass-Spectrometry for Impurity Analysis Anthony JM, Kirchhoff JF, Marble DK, Renfrow SN, Kim YD, Matteson S, Mcdaniel FD
1551 - 1556	Direct-Current Sputter-Deposition of Titanium Nitride Controlled in-Situ by Soft-X-Ray Emission-Spectroscopy Legrand PB, Dauchot JP, Hecq M, Charbonnier M, Romand M
1557 - 1564	Studies of Thin-Film Growth, Adsorption, and Oxidation by in-Situ, Real-Time, and Ex-Situ Ion-Beam Analysis Lin YP, Krauss AR, Auciello O, Nishino Y, Gruen DM, Chang RP, Schultz JA
1565 - 1568	In-Situ X-Ray Reflectivity Measurements of Thin-Film Structural Evolution Chason E, Chason M
1569 - 1575	Effect of Stoichiometry on the Phases Present in Boron-Nitride Thin-Films Hackenberger LB, Pilione LJ, Messier R, Lamaze GP
1576 - 1582	Deposition of Diamond-Like Carbon Using a Planar Radio-Frequency Induction Plasma Pappas DL, Hopwood J
1583 - 1586	Pull-Test Measurements of Diamond-Like Carbon-Films on Silicon-Carbide, Silicon-Nitride, Aluminum-Oxide, and Zirconium-Oxide Erck RA, Nichols FA, Dierks JF
1587 - 1594	Biased Magnetron Sputter-Deposition of Corrosion-Resistant Al-Zn Alloy Thin-Films Li L, Nowak WB
1595 - 1601	Multilayer, Multicomponent, and Multiphase Physical Vapor-Deposition Coatings for Enhanced Performance Sproul WD
1602 - 1607	(Ti1-xAlx)N Coatings by Plasma-Enhanced Chemical-Vapor-Deposition Lee SH, Ryoo HJ, Lee JJ
1608 - 1613	Microstructural Study of Sputter-Deposited CdTe Thin-Films Li X, Gessert TA, Matson RJ, Hall JF, Coutts TJ
1614 - 1617	Influence of Ion Mass and Ion Energy on Microstructure of Ion-Assisted Deposited Zinc Selenide Thin-Films Caneve L, Scaglione S, Flori D, Martelli S
1618 - 1622	Effects of Target Polycrystalline Structure and Surface Gas Coverage on Magnetron IV Characteristics Levbovich A, Kuniya T, Smih PC, Hendricks MB, Ruzic DN
1623 - 1627	Multiple Jets and Moving Substrates - Jet Vapor-Deposition of Multicomponent Thin-Films Halpern BL, Schmitt JJ
1628 - 1630	Advanced Electron-Beam Source for Ultrahigh-Vacuum (Molecular-Beam Epitaxy) and High-Vacuum Applications of Thin-Film Deposition Moore JW, Tsujimoto NK
1631 - 1634	Electron-Beam Evaporator Constructed from Aluminum-Alloy and the Gettering Effect of Chromium Films Nakada S, Yamaguchi M, Yamamoto M, Ishimaru H
1635 - 1638	Vacuum-System Design of the International Thermonuclear Experimental Reactor Pellet Fueling System Langley RA, Gouge MJ, Santeler DJ
1639 - 1643	Construction and Commissioning of the Synchrotron-Radiation-Research-Center Vacuum-System Hsiung GY, Huang JR, Shyy JG, Wang DJ, Chen JR, Liu YC
1644 - 1647	Vacuum Characteristics of an Oxygen-Free High-Conductivity Copper Duct at the KEK Photon Factory Ring Hori Y, Kobayashi M, Takiyama Y
1648 - 1652	Optimization of the Configuration of the Vacuum Pumps in the KEK 2.5-GeV LINAC Saito Y, Kakihara K, Horikoshi G
1653 - 1662	Early Vacuum-Systems and Process Descriptions Used to Deposit Optical Coatings Alexander C
1663 - 1672	Cold Beam Tube Photodesorption and Related Experiments for the Superconducting Super Collider Laboratory 20 TeV Proton Collider Anashin VV, Derevyankin G, Dudnikov VG, Malyshev OB, Osipov VN, Foerster CL, Jacobsen FM, Ruckman MW, Strongin M, Kersevan R, Maslennikov IL, Turner WC, Lanford WA
1673 - 1677	Photon Desorption Measurements of Copper and Copper Plated Beam Tubes for the Sscl-20 TeV Proton Collider Foerster CL, Lanni C, Maslennikov I, Turner W
1678 - 1685	Proposed Warm Bore Beam-Pipe Assemblies and Associated Vacuum-Systems for the Worlds 2 Largest Particle Detectors Chapman GR, Zhou JX
1686 - 1689	Detection of Small Pressure Pulses in an Ion Pumped Ultrahigh-Vacuum System Rupschus G, Niepraschk R, Jousten K, Kuhne M
1690 - 1694	Comparison Between Several New Molecular Drag Pumps and Turbomolecular Pumps Chu JG
1695 - 1698	Turbomolecular Pump with an Ultimate Pressure of 10(-12) Torr Ishimaru H, Hisamatsu H
1699 - 1704	Permeation of Argon, Carbon-Dioxide, Helium, Nitrogen, and Oxygen Through Mylar Windows Mapes M, Hseuh HC, Jiang WS
1705 - 1708	Sealing Technique for Aluminum to Stainless-Steel Cf Flange Pairs Ishigaki T, Shibuya K, Sakaue H, Be SH
1709 - 1713	Evaluation of Different Cleaning Techniques for Oxygen-Free High-Conductivity Copper Rao VP, Friedlander MP
1714 - 1718	Comparison of Photodesorption Yields Using Synchrotron-Radiation of Low Critical Energies for Stainless-Steel, Copper, and Electrodeposited Copper Surfaces Gomezgoni J, Grobner O, Mathewson AG
1719 - 1721	Vacuum Outgassing of Artificial Dielectric Ceramics Nguyentuong V
1722 - 1726	Performance of the Cold-Cathode Gauges in a High and Misaligned Magnetic-Field Hseuh HC, Jiang WS, Mapes M
1727 - 1733	Development of a Primary Standard Ultrahigh-Vacuum Calibration Station Levine PD, Sweda JR
1734 - 1739	Pressure Measurement by Laser Ionization - Direct Counting of Generated Ions by Imaging of Their Spatial-Distribution Ichimura S, Sekine S, Kokubun K, Shimizu H
1740 - 1743	Expanded-Range, Sealed Parts Leak Testing Technology for Helium Mass-Spectrometer Leak Detection Mahoney DG
1744 - 1749	Gas-Flow Experiments in the Transition Region Santeler DJ
1750 - 1754	Outgassing Behavior on Aluminum Surfaces - Water in Vacuum-Systems Chen JR, Huang JR, Hsiung GY, Wu TY, Liu YC
1755 - 1759	X-Ray Photoelectron-Spectroscopy Analysis of Aluminum and Copper Cleaning Procedures for the Advanced Photon Source Rosenberg RA, Mcdowell MW, Noonan JR
1760 - 1766	Characteristics of Extremely Fast Pump-Down Process in an Aluminum Ultrahigh-Vacuum System Miki M, Itoh K, Enomoto N, Ishimaru H
1767 - 1771	Study of Cleaning Agents for Stainless-Steel for Ultrahigh-Vacuum Use Herbert JD, Groome AE, Reid RJ
1772 - 1777	Model for Water Outgassing from Metal-Surfaces .2. Li MX, Dylla HF
1778 - 1781	Analysis of Offgassed Water - Calibration and Techniques Basford JA
1787 - 1789	Surface Alloying in Metal-on-Metal Epitaxial-Growth Engdahl C, Stoltze P, Jacobsen KW, Norskov JK, Skriver HL, Alden M
1790 - 1794	2-Dimensional Alloying of Au and Ag Overlayer on Ru(001) - Photoremission and Thermal-Desorption Spectroscopy Studies Bzowski A, Kuhn M, Sham TK, Tan KH
1795 - 1799	Investigation of Thin Ag/Cu-Alloy Films on Ru(0001) Schick M, Ceballos G, Pelzer T, Schafer J, Rangelov G, Stober J, Wandelt K
1800 - 1808	Nucleation and Growth in Metal-on-Metal Homoepitaxy - Rate-Equations, Simulations and Experiments Evans JW, Bartelt MC
1809 - 1817	Kinetics of Growth of Cu on Cu(001) Ernst HJ, Fabre F, Folkerts R, Lapujoulade J
1818 - 1824	Work-Function Oscillations During Cu Film Growth on an Oxygen Precovered Ru(0001) Surface - A Basically Old Technique as a Powerful Film Growth Monitor Schmidt M, Wolter H, Nohlen M, Wandelt K
1825 - 1831	Model for the Growth and Reactivity of Metal-Films on Oxide Surfaces - Cu on ZnO(0001)-O Campbell CT, Ludviksson A
1832 - 1837	Study of Epitaxial-Growth of Ag on Hydrogen-Terminated Si(111) and Si(100) Surfaces Naik R, Kota C, Rao BU, Auner GW
1838 - 1842	Growth and Energetics of Ga and Al Chains on Si(112) Jung TM, Prokes SM, Kaplan R
1843 - 1847	Structural Study of Monolayers of Sb on Ge(111) with Different Surface Reconstructions Kendelewicz T, Woicik JC, Miyano KE, Yoshikawa SA, Pianetta P, Spicer WE
1848 - 1854	Control of the Fermi-Level Position on the GaAs(001) Surface - Se Passivation Pashley MD, Li D
1855 - 1857	Interchain Vacancy Migration of GaAs(110) Lengel G, Weimer M, Gryko J, Allen RE
1858 - 1863	Role of Ga2O in the Removal of GaAs Surface Oxides Induced by Atomic-Hydrogen Ide Y, Yamada M
1864 - 1868	Characterization of Silicon Surface Microroughness and Tunneling Transport Through Ultrathin Gate Oxide Hirose M, Hiroshima M, Yasada T, Miyazaki S
1869 - 1875	Photoemission-Study of Au, Ge, and O2 Deposition on NH4F Etched Si(111) Terry J, Cao R, Wigren C, Pianetta P
1876 - 1881	Surface Cleaning with the Carbon-Dioxide Snow Jet Sherman R, Hirt D, Vane R
1882 - 1885	Electrochemical Study of Ultrathin Silica Films Supported on a Platinum Substrate Xu XP, Bojkov H, Goodman DW
1886 - 1890	Electrochemical and Vacuum Coadsorption of Carbon-Monoxide and Lead on Pt(111) Borup RL, Sauer DE, Stuve EM
1891 - 1894	Comparative-Study of the Internal Structures of Kevlar and Spider Silk by Atomic-Force Microscopy Li SF, Mcghie AJ, Tang SL
1895 - 1903	DNA Nanoconstructions Seeman NC, Zhang Y, Chen JH
1904 - 1909	Pt/Ti/Ge/Pd Ohmic Contacts to GaAs - A Structural, Chemical, and Electrical Investigation Cole MW, Han WY, Casas LM, Eckart DW, Jones KA
1910 - 1914	Hot-Electron Scattering Effects in Metal-Semiconductor Structures and Their Role in Interface Transport Ludeke R, Bauer A
1915 - 1919	Enhancement of Schottky-Barrier Height to N-GaAs Using NiAl, NiAl/Al/Ni, and Ni/Al/Ni Layer Structures Chen CP, Chang YA, Kuech TF
1920 - 1923	Growth Mode of Ge on GaAs(100) Wang XS, Self KW, Weinberg WH
1924 - 1931	Growth Ripples upon Strained SiGe Epitaxial Layers on Si and Misfit Dislocation Interactions Cullis AG, Robbins DJ, Barnett SJ, Pidduck AJ
1932 - 1937	Surfactant-Mediated Epitaxy of Ge on Si(111) - The Role of Kinetics and Characterization of the Ge Layers Voigtlander B, Zinner A
1938 - 1942	Real-Time in-Situ Epitaxial Film Thickness Monitoring and Control Using an Emission Fourier-Transform Infrared Spectrometer Zhou ZH, Yang I, Kim H, Yu F, Reif R
1943 - 1951	Pulsed Ion-Beam Surface-Analysis as a Means of in-Situ Real-Time Analysis of Thin-Films During Growth Krauss AR, Lin Y, Auciello O, Lamich GJ, Gruen DM, Schultz JA, Chang RP
1952 - 1956	Development of Artificial Neural Networks for in-Situ Ellipsometry of Films Growing on Unknown Substrates Urban FK, Tabet MF
1957 - 1961	Reactive Ion Etching Lag Investigation of Oxide Etching in Fluorocarbon Electron-Cyclotron-Resonance Plasmas Joubert O, Oehrlein GS, Surendra M, Zhang Y
1962 - 1965	Microloading Effect in Reactive Ion Etching Hedlund C, Blom HO, Berg S
1966 - 1972	Low-Energy, Ion-Enhanced Etching of III-vs for Nanodevice Applications Pearton SJ
1973 - 1977	Improved Epitaxial Layer Design for Real-Time Monitoring of Dry-Etching in III-V Compound Heterostructures with Depth Accuracy of +/-8 nm Vawter GA, Klem JF, Leibenguth RE
1978 - 1983	Hydrogen Uptake into Silicon from an Electron-Cyclotron-Resonance Plasma Wampler WR, Barbour JC
1984 - 1991	Intelligent Model-Based Control-System Employing in-Situ Ellipsometry Butler SW, Stefani J, Sullivan M, Maung S, Barna G, Henck S
1992 - 1997	Formation and Characterization of Epitaxial Phthalocyanine and Perylene Monolayers and Bilayers on Cu(100) - Low-Energy-Electron Diffraction and Thermal-Desorption Mass-Spectrometry Studies Schuerlein TJ, Armstrong NR
1998 - 2004	Nature of Super-Lubricating MoS2 Physical Vapor-Deposition Coatings Lemogne T, Donnet C, Martin JM, Tonck A, Millardpinard N, Fayeulle S, Moncoffre N
2005 - 2008	Cross-Sectional Scanning-Tunneling-Microscopy and Spectroscopy of Passivated III-V Heterostructures Gwo S, Smith AR, Chao KJ, Shih CK, Sadra K, Streetman BG
2009 - 2016	Imaging Extrinsic Defects at the Nisi2/Si(111) Metal-Semiconductor Interface Kubby JA, Greene WJ
2017 - 2022	Postdeposition Growth of a Uniquely Nanostructured Organic Film by Vacuum Annealing Debe MK, Poirier RJ
2023 - 2028	Scanning-Tunneling-Microscopy Studies of Thin-Film AgBr on Au(111) Mason MG, Hansen JC
2029 - 2036	Molecular-Interactions on Surfaces Wei DH, Skelton DC, Kevan SD
2037 - 2044	Neutrino-Recoil Induced Desorption Zhu L, Avci R, Lapeyre GJ, Hindi MM, Kozub RL, Robinson SJ
2045 - 2050	Experimental Tests of New Direct-Methods for Adsorbate Structure Determination Using Photoelectron Diffraction Hofmann P, Schindler KM, Fritzsche V, Bao S, Bradshaw AM, Woodruff DP
2051 - 2057	Direct Dimer-by-Dimer Identification of Clean and Monohydride Dimers on the Si(001) Surface by Scanning-Tunneling-Microscopy Wang YJ, Bronikowski MJ, Hamers RJ
2058 - 2062	Transition from Stranski-Krastanov to Quasi-Layer-by-Layer Growth in Pb Deposition on Cu(100) Zeng H, Vidali G, Biham O
2063 - 2068	Adsorption of the Cyclic Ether Trioxane on Cu(111) Hofmann M, Wegner H, Glenz A, Woll C, Grunze M
2069 - 2073	Interaction Properties of Molecules with Binary Alloy Surfaces Schneider U, Busse H, Linke R, Castro GR, Wandelt K
2074 - 2080	X-Ray Photoelectron-Spectroscopy Fourier-Transform Infrared-Spectroscopy Study of the Interaction of YBa2Cu3Ox with Co, No, and H2+co Lin J, Wee AT, Huan AC, Tan KL, Neoh KG
2081 - 2086	Oxidation of Liquid Gallium Surface - Nonequilibrium Growth-Kinetics in 2+1 Dimensions Wang YL, Doong YY, Chen TS, Haung JS
2087 - 2090	Growth of Thin Fi Films on W(110) and O/W(110) Herman GS, Peden CH
2091 - 2096	Adsorption of Sulfur and 1,3-Butanediol on Silver Thin-Films Using Atomic Resolution-Reduced-Temperature Scanning-Tunneling-Microscopy Chen XX, Frank ER, Hamers RJ
2097 - 2100	Intramolecular Structures of C-60 Adsorbed on the Cu(111)1X1 Surface Studied by the Field Ion-Scanning Tunneling Microscopy Hashizume T, Motai K, Wang XD, Shinohara H, Pickering HW, Sakurai T
2101 - 2106	Investigations into the Chemistry of Perfluorodiethoxymethane at Nickel and Nickel-Oxide Surfaces Jenks CJ, Jacobson JA, Thiel PA
2107 - 2113	Surface-Reactions of Tetraneopentyl Zirconium on Zirconium Carbide Thin-Films Parmeter JE, Smith DC, Healy MD
2114 - 2118	Infrared Study of Co on NiO(100) Vesecky SM, Xu XP, Goodman DW
2119 - 2123	Chemisorption of Hydrogen on the Ag(111) Surface Lee GS, Sprunger PT, Okada M, Poker DB, Zehner DM, Plummer EW
2124 - 2127	Multiphonon Scattering of Thermal-Energy He Atoms from the LiF(001) Surface Bishop GG, Gillman ES, Hernandez JJ, Baker J, Skofronick JG, Safron SA
2128 - 2133	Electron-Stimulated and Thermal-Desorption Study of Trimethylsilane from Si(100) Campbell JH, Ascherl MV, Craig JH
2134 - 2139	Surface Precipitation Process of Epitaxially Grown Graphite (0001) Layers on Carbon-Doped Nickel(111) Surface Fujita D, Yoshihara K
2140 - 2144	Decomposition of NO2 on Metal-Surfaces - Oxidation of Ag, Zn, and Cu Films Rodriguez JA, Hrbek J
2145 - 2148	Defect Structure of GaAs(111)B (2X2) Surface Observed by Scanning-Tunneling-Microscopy Kim JG, Gallagher MC, Willis RF, Fu JM, Miller DL
2149 - 2152	Particle Growth of Palladium on Epitaxial Tin Oxide Thin-Films Poirier GE, Cavicchi RE, Semancik S
2153 - 2158	Chemical-Properties of Zn on Ru(001) - Coadsorption with Cs, O, Cu, and Au Rodriguez JA, Hrbek J
2159 - 2163	Radiation-Damage of Epitaxial CaF2 Overlayers on Si(111) Studied by Photon-Stimulated Desorption - Formation of Surface-F Centers Chakarian V, Durbin TD, Varekamp PR, Yarmoff JA
2164 - 2169	Correlation Between the Surface Configurations and Hydrogenolysis - Aniline on the Pt(111) Surface Huang SX, Fischer DA, Gland JL
2170 - 2175	Synchronization in Oscillatory Surface-Reactions on Single-Crystal Surfaces Imbihl R, Veser G
2176 - 2182	Oscillating Behavior of No Reduction Reactions over Rhodium Studied on the Atomic-Level Vantol MF, Wouda PT, Nieuwenhuys BE
2183 - 2186	Quantum-Size Effects in Ultrathin Cu(100) Films Mankey GJ, Willis RF, Ortega JE, Himpsel FJ
2187 - 2189	Imaging the Surface-State of Cu(111) Qu Z, Ye L, Goonewardene A, Mainkar N, Subramanian K, Karunamuni J, Stockbauer RL, Kurtz RL
2190 - 2195	Layer-by-Layer Growth of Hg on W(110) Zhang JD, Li DQ, Dowben PA
2196 - 2200	Electronic-Structure of Surface-Defects in K0.3MoO3 Breuer K, Smith KE, Greenblatt M, Mccarroll W
2201 - 2204	Image-Potential-Induced Resonance on Al(111) Observed by 2-Photon Photoemission Spectroscopy Bulovic V, Quiniou B, Osgood RM
2205 - 2209	2-Step, Oxygen-Free Route to Higher Hydrocarbons from Methane over Ruthenium Catalysts Wu MC, Lenzsolomun P, Goodman DW
2210 - 2214	Observation of the Reaction of Gas-Phase Atomic-Hydrogen with Ru(001)-P(1X2)-O at 100-K Xie J, Mitchell WJ, Lyons KJ, Wang YQ, Weinberg WH
2215 - 2218	Dependence of X-Ray-Absorption Magnetic Circular-Dichroism on Layer Periodicity in Iron-Platinum Multilayers Jankowski AF, Waddill GD, Tobin JG
2219 - 2223	Spin Ordering on a NiO(100) Surface Measured by Metastable He-2 S-3 Scattering Swan A, Marynowski M, Franzen W, Elbatanouny M, Martini KM
2224 - 2228	Scanning-Tunneling-Microscopy Study of the Faceting Dynamics of Stepped Ag(110) upon Oxygen Exposure Ozcomert JS, Pai WW, Bartelt NC, Reuttrobey JE
2229 - 2234	Low-Frequency Dynamics of Co/Cu Breakdown of Born-Oppenheimer Approximation Hirschmugl CJ, Chabal YJ, Hoffmann FM, Williams GP
2235 - 2239	Influence of Single Atomic Height Steps on F2 Reactions with Si(100)-2X1 Carter LE, Carter EA
2240 - 2245	Adsorbate-Induced Surface Stress Ibach H
2246 - 2249	Adsorption Site and the Role of Substrate Reconstruction for the Mo(110) P(2X2)-S System Toofan J, Tinseth GR, Watson PR
2250 - 2254	Dissociative Chemisorption of Oxygen on the Ru(001) Surface - Spectroscopic Identification of Precursor Intermediates at Low Surface Temperatures Mitchell WJ, Xie J, Lyons KJ, Weinberg WH
2255 - 2258	Existence of Metastable Molecular Precursors to Dissociative Oxygen-Chemisorption on Si(111) and Si(100) at 40-K Seo JM, Kim KJ, Yeom HW, Park C
2259 - 2264	Structural Characterization of Platinum Deposits Supported on Ordered Alumina Films Libuda J, Baumer M, Freund HJ
2265 - 2270	Surface-Chemistry of Diethylsilane and Diethylgermane on Si(100) - An Atomic Layer Epitaxy Approach Mahajan A, Kellerman BK, Russell NM, Banerjee S, Campion A, Ekerdt JG, Tasch A, White JM, Bonser DJ
2271 - 2275	Role of Ge in SiGe Epitaxial-Growth Using Silane Germane Gas-Source Molecular-Beam Epitaxy Suemitsu M, Kim KJ, Miyamoto N
2276 - 2280	Effect of Annealing on the Stoichiometry of SrTiO3(001) Liang Y, Rothman JB, Bonnell DA
2281 - 2286	Thermal-Decomposition of Diethylgermane on Si(100)-(2X1) Du W, Keeling LA, Michaelgreenlief C
2287 - 2292	Nonthermally Driven Surface-Chemistry of Phosphine on GaAs(100) Sun YM, Huett T, Sloan D, White JM
2293 - 2297	Photodesorption Dynamics of Ammonia from Ni(111) and NiO/Ni(111) Mackay RS, Junker KH, White JM
2298 - 2301	Investigation of the Growth and Structure of Aluminum Overlayers on TiO2 (100) by Scanning-Tunneling-Microscopy Carroll DL, Liang Y, Bonnell DA
2302 - 2307	Growth of Feox on Pt(111) Studied by Scanning-Tunneling-Microscopy Galloway HC, Benitez JJ, Salmeron M
2308 - 2313	Quantification of the Composition of Alloy and Oxide Surfaces Using Low-Energy Ion-Scattering Jacobs JP, Reijne S, Elfrink RJ, Mikhailov SN, Brongersma HH, Wuttig M
2314 - 2317	Thermal-Stability of Oxidized La on Pd(100) Ahmad M, Rahman MM, Rao BU, Graham GW
2318 - 2322	Ion Kinetic-Energy Distribution of Electron-Stimulated Desorption of O+ from TiO2(110)-SO2 Torquemada MC, Desegovia JL
2323 - 2326	Free-Electron Laser Spectroscopy of Semiconductors and Interfaces Mckinley JT, Albridge RG, Barnes AV, Chen GC, Davidson JL, Languell ML, Polavarapu PL, Smith JF, Yang X, Ueda A, Tolk N, Coluzza C, Baudat PA, Dupuy C, Gozzo F, Iilegems M, Martin D, Moriergenoud F, Rudra A, Tuncel E, Margaritondo G
2327 - 2331	Si(100)2X1+sb Surfaces Studied with Photoemission and Optical Spectroscopy Cricenti A, Bernhoff H, Purdie D, Reihl B
2332 - 2336	Quantitative X-Ray Photoelectron-Spectroscopy of Cuau, CoNi, and Cuni Alloys Using Theoretical Photoionization Cross-Sections or Reference Spectra Jansson C, Tougaard S
2337 - 2341	Comparison of Angle-Resolved X-Ray Photoelectron-Spectroscopy Auger-Electron Spectroscopy with Depth Profile Restoration from Inelastic Background Analysis Werner WS, Tilinin IS
2342 - 2347	Sharing of Auger-Electron Spectroscopy and X-Ray Photoelectron-Spectroscopy Spectral Data with the Common Data-Processing System Yoshihara K, Yoshitake M
2348 - 2351	Factors Influencing the Quantitative Compositional Analysis of Powders in Sputtered Neutral Mass-Spectrometry Dang TA, Hilliard C
2352 - 2356	Surface-Analysis by Photoionization at Very High Laser Intensities Becker CH, Hovis JS
2357 - 2362	Analysis and Removal of Impurities and Defects in Reactive Ion Etched Silicon Using a Novel Depth-Profiling Technique Chang WH, Huang LJ, Lau WM, Mitchell IV, Abraham T, King M
2363 - 2367	Secondary-Ion Mass-Spectrometry Analysis of a 3-Level Metal Structure Using Sample Rotation Stevie FA, Moore JL, Merchant SM, Bollinger CA, Dein EA
2368 - 2372	Study of Ion Mixing During Auger-Electron Spectroscopy Death Profiling of Ge-Si Multilayer System Menyhard M, Barna A, Biersack JP
2373 - 2377	Computer-Centric Rotational Depth Profiling Engle PD, Geller JD
2378 - 2387	Chemical Evaluation of Cu Polyimide Interfaces Davis GD, Rees BJ, Whisnant PL
2388 - 2391	Brass-Rubber Adhesive Interphase Investigated via Depth Profiling by Using Auger-Electron Spectroscopy Hammer GE, Shemenski RM, Hunt JD
2392 - 2397	Studies of the Effect of Size on Carbon-Fiber Surfaces Weitzsacker CL, Bellamy M, Sherwood PM
2398 - 2401	Effects of Corrosion and Recovery Processes on Chloride-Ion-Selective Electrode Surfaces Young VY, Schoenfeld DW, Weaver JF, Hoflund GB, Hoke S
2402 - 2409	Metal Overlayers on Organic Functional-Groups of Self-Organized Molecular Assemblies .3. X-Ray Photoelectron-Spectroscopy of Cr/CN on 12-Mercaptododecanenitrile and of Cr/CH3 on Octadecanethiol at Sample Temperatures from 173 to 373-K Jung DR, Czanderna AW
2410 - 2414	Metal Overlayers on Self-Organized Molecular Assemblies .4. Ion-Scattering Spectroscopy of the Ag/CH3 Interface Herdt GC, Czanderna AW
2415 - 2419	Secondary-Ion Mass-Spectrometry Relative Sensitivity Factors for Ru, Rh, Pr, Eu, TM, Lu, Re, Os, and Ir Wilson RG, Stevie FA, Chryssoulis SL, Irwin RB
2420 - 2424	Modifications in the Si Valence-Band After Ion-Beam-Induced Oxidation Alay JL, Vandervorst W
2425 - 2430	Sputtering of Neutral and Ionic Indium Clusters Ma Z, Coon SR, Calaway WF, Pellin MJ, Gruen DM, Vonnagyfelsobuki EI
2431 - 2435	Investigation of the Core Clad Interface of Coherent Fiber Optic Devices Using Secondary-Ion Mass-Spectrometry, Surface-Analysis by Laser Ionization, and Transmission Electron-Microscopy Kurz EA, Becker CH, Wu KJ, Becker O, Sommer B
2436 - 2440	Investigation of Vapor-Deposited Polyaniline Thin-Films Dillingham TR, Cornelison DM, Bullock E
2441 - 2445	Structure of Chemically Prepared Freestanding and Vacuum-Evaporated Polyaniline Thin-Films Porter TL, Caple K, Caple G
2446 - 2450	Oxidation of Tin in an Oxygen Plasma Asher Tompkins HG, Sellers JA
2451 - 2456	Compositional Change of (0001) Ws2 Surfaces Induced by Ion-Beam Bombardment with Energies Between 100 and 1500-eV Rumaner LE, Tazawa T, Ohuchi FS
2457 - 2461	Selectivity Variations of Electron-Beam Patterned Silicon Dioxide Films Kimball JF, Allen PE, Griffis DP, Radzimski ZJ, Russell PE
2462 - 2466	Morphology and Bonding Measured from Boron-Nitride Powders and Films Using Near-Edge X-Ray-Absorption Fine-Structure Terminello LJ, Chaiken A, Lapianosmith DA, Doll GL, Sato T
2467 - 2472	Angle-Resolved Self-Ratio Measurements on Ion-Implanted Depth Profiles by Synchrotron X-Ray-Fluorescence Spectrometry Schmitt W, Rothe J, Hormes J, Gries WH
2473 - 2477	Geometrical Structure of the Bi/Gap (110) Interface - An X-Ray Standing-Wave Triangulation Study of a Nonideal System Herreragomez A, Kendelewicz T, Woicik JC, Miyano KE, Pianetta P, Southworth S, Cowan PL, Karlin A, Spicer WE
2478 - 2485	Electron-Beam Effects on (CH2)17 Self-Assembled Monolayer SiO2/Si Specimens Baer DR, Engelhard MH, Schulte DW, Guenther DE, Wang LQ, Rieke PC
2486 - 2490	Low-Dose Nitrogen Ion-Implantation in Ti Permalloy Bilayer Films Chaug YS, Roy N
2491 - 2498	Secondary-Ion Mass-Spectrometry Time-of-Flight and in-Situ X-Ray Photoelectron-Spectroscopy Studies of Polymer Surface Modifications by a Remote Oxygen Plasma Treatment Lianos L, Parrat D, Hoc TQ, Duc TM
2499 - 2506	Ultrathin Self-Assembled Polymeric Films on Solid-Surfaces .3. Influence of Acrylate Dithioalkyl Side-Chain Length on Polymeric Monolayer Formation on Gold Sun F, Grainger DW, Castner DG
2507 - 2514	Surface-Chemistry of Polycarbonate Film and Adhesion of Ultraviolet-Cured Inks Burrell MC, Tilley MG
2515 - 2522	Static Secondary-Ion Mass-Spectrometry and X-Ray Photoelectron-Spectroscopy for the Characterization of Surface-Defects in Paper Products Istone WK
2523 - 2529	Effects of Substrate on Ultrathin Films of Poly(Gamma-Benzyl-L-Glutamate) by Scanning Probe Microscopy Musselman IH, Smith DL, Enriquez EP, Guarisco VF, Samulski ET
2530 - 2536	Aggregation Structure and Surface-Properties of Immobilized Organosilane Monolayers Prepared by the Upward Drawing Method Ge S, Takahara A, Kajiyama T
2537 - 2543	Analytical Performance of a Secondary-Neutral Microprobe with Electron-Gas Positionization and Magnetic-Sector Mass-Spectrometer Bieck W, Gnaser H, Oechsner H
2544 - 2548	Analysis of Oxide Film on Stainless-Steel via Position-Sensitive Atom-Probe Yoshimura T, Ishikawa Y, Ohkido S
2549 - 2553	Pulsed Desorption-Kinetics Using Micromachined Microhotplate Arrays Cavicchi RE, Poirier GE, Suehle JS, Gaitan M, Semancik S, Burgess DR
2554 - 2558	Micromachined Array of Electrostatic Energy Analyzers for Charged-Particles Stalder RE, Boumsellek S, Vanzandt TR, Kenny TW, Hecht MH, Grunthaner FE
2559 - 2564	Micromechanics via X-Ray Assisted Processing Guckel H, Skrobis KJ, Klein J, Christenson TR
2565 - 2571	Mesostructure of Photoluminescent Porous Silicon Ruiz F, Vazquezlopez C, Gonzalezhernandez J, Allred DD, Romeroparedes G, Penasierra R, Torresdelgado G
2572 - 2576	Characterization of SiO2 Layers on Si Wafers Using Atomic-Force Microscopy Zunigasegundo A, Ruiz F, Vazquezlopez C, Gonzalezhernandez J, Torresdelgado G, Tsu DV
2577 - 2580	Friction Properties of Aluminum-Based Composites Containing Cluster Diamond Ouyang Q, Okada K
2581 - 2585	Emitted Current Instability from Silicon Field-Emission Emitters Due to Sputtering by Residual-Gas Ions Karain WI, Knight LV, Allred DD, Reyesmena A
2586 - 2590	Fabrication of Nanometer-Scale Structures Using Atomic-Force Microscope with Conducting Probe Hattori T, Ejiri Y, Saito K, Yasutake M
2591 - 2594	High-Frequency Potential Probe Using Electrostatic Force Microscopy Said RA, Mittal M, Bridges GE, Thomson DJ
2595 - 2599	Electron Interference Effects in Electron Projection Microscopy Shedd GM