97 - 109 |
Engineering analysis of microdefect formation during silicon crystal growth Brown RA, Wang ZH, Mori T |
XI - XI |
Proceedings of the Twelfth American Conference on Crystal Growth and Epitaxy Vail, Colorado, USA, 13-18 August 2000 - Preface Matthiesen DH |
110 - 113 |
ZnO Schottky ultraviolet photodetectors Liang S, Sheng H, Liu Y, Huo Z, Lu Y, Shen H |
114 - 117 |
Semiconductor crystal optimization of gamma detection Lachish U |
118 - 123 |
Thick films of X-ray polycrystalline mercuric iodide detectors Schieber M, Hermon H, Zuck A, Vilensky A, Melekhov L, Shatunovsky R, Meerson E, Saado Y, Lukach M, Pinkhasy E, Ready SE, Street RA |
124 - 128 |
Performance of TAS crystal for AOTF imaging Singh NB, Suhre D, Gupta N, Rosch W, Gottlieb M |
129 - 133 |
Characterization of thallium bromide crystals for radiation detector applications Hitomi K, Matsumoto M, Muroi O, Shoji T, Hiratate Y |
134 - 140 |
Pendeo-epitaxial growth of thin films of gallium nitride and related materials and their characterization Davis RF, Gehrke T, Linthicum KJ, Zheleva TS, Preble EA, Rajagopal P, Zorman CA, Mehregany M |
141 - 144 |
Thermodynamics and nucleation kinetics of AlxGa1-xN/GaN and InxGa1-xN/GaN heterostructures Varadarajan E, Dhanasekaran R, Ramasamy P |
145 - 149 |
Effect of diluted ammonia flow rate on undoped GaN epitaxial films grown by MOCVD Juang FS, Chu TK |
150 - 154 |
Growth of high quality GaN layers with AlN buffer on Si(111) substrates Chen P, Zhang R, Zhao ZM, Xi DJ, Shen B, Chen ZZ, Zhou YG, Xie SY, Lu WF, Zheng YD |
155 - 161 |
High-temperature solution growth of intermetallic single crystals and quasicrystals Canfield PC, Fisher IR |
162 - 167 |
Growth of single crystals (Ca,Sr)(10)Cu17O29 by "melted band" method from Bi-containing fluxes and formation of subsidiary phases Maltsev V, Leonyuk L, Babonas GJ, Reza A, Dapkus L |
168 - 172 |
Growth of phthalocyanine doped anthracene crystal using a three-zone furnace by vacuum sublimation method Selvaraj SL, Xavier FP |
173 - 177 |
Preparation of (001)-oriented PZT thin films on silicon wafers using pulsed laser deposition Zhao J, Lu L, Thompson CV, Lu YF, Song WD |
178 - 182 |
Surface engineering along the close-packed direction of SrTiO3 Doan TD, Giocondi JL, Rohrer GS, Salvador PA |
183 - 189 |
Thermodynamic stability and kinetics of Y-Ba-Cu-O film growth at high rates in atomic and molecular oxygen Jo W, Peng LSJ, Wang W, Ohnishi T, Marshall AF, Hammond RH, Beasley MR, Peterson EJ |
190 - 196 |
Substrate preparations in epitaxial ZnO film growth Zhu S, Su CH, Lehoczky SL, Harris MT, Callahan MJ, McCarty P, George MA |
197 - 201 |
Control of morphology and orientation of ZnO thin films grown on SiO2/Si substrates Muthukumar S, Gorla CR, Emanetoglu NW, Liang S, Lu Y |
202 - 207 |
Study of defects and interfaces in epitaxial ZnO films on (1 1 (2)over-bar 0) Al2O3 grown by electron cyclotron resonance-assisted molecular beam epitaxy Lim SH, Shindo D, Kang HB, Nakamura K |
208 - 213 |
Structural characterization of epitaxial ZnO films grown on (0001) Al2O3 by electron cyclotron resonance-assisted molecular beam epitaxy Lim SH, Shindo D, Kang HB, Nakamura K |
214 - 220 |
High temperature X-ray diffraction study of LiGaO2 Rawn CJ, Chaudhuri J |
221 - 224 |
Dependence of temperature gradient on growth rate in CZ silicon Natsume A, Inoue N, Tanahashi K, Mori A |
225 - 230 |
Improved phosphorus injection synthesis for bulk InP Higgins WM, Iseler GW, Bliss DF, Bryant G, Tassev V, Jafri I, Ware RM, Carlson DJ |
231 - 235 |
Comparison of inductively coupled plasma-mass spectrometry, neutron activation analysis, and Hall effect techniques using antimony doped germanium Keefer LA, Matthiesen DH |
236 - 243 |
Solution growth of thick III-V antimonide alloy epilayers (InAsSb, InGaSb, InGaAsSb, AlGaAsSb, and InAsSbP) for "virtual substrates" Mauk MG, Tata AN, Cox JA |
244 - 248 |
Hydrogen neutralization effect in bulk n-type LEC InP materials Sun NF, Wu XW, Wu X, Zhao YW, Cao LX, Zhao Q, Guo WL, Zhang J, Bi KY, Sun TN |
249 - 256 |
Preparation conditions of chromium doped ZnSe and their infrared luminescence properties Burger A, Chattopadhyay K, Ndap JO, Ma X, Morgan SH, Rablau CI, Su CH, Feth S, Page RH, Schaffers KI, Payne SA |
257 - 263 |
Effect of pulling rates on the quality of YIG single crystal fibers Hu CC, Chen JC, Huang CH |
264 - 267 |
Oscillatory growth of directionally solidified ammonium chloride dendrites Gudgel KA, Jackson KA |
268 - 273 |
Quasi-thermodynamic model of SiGe epitaxial growth Segal AS, Karpov SY, Sid'ko AP, Makarov YN |
274 - 281 |
Numerical computation of sapphire crystal growth using heat exchanger method Lu CW, Chen JC |
282 - 288 |
Phase-field model of crystal grains Lobkovsky AE, Warren JA |
289 - 293 |
Phase-field approach to crystal growth in the presence of strain Kassner K, Misbah C, Muller J, Kappey J, Kohlert P |
294 - 298 |
Modeling of point defect behavior by the stress due to impurity doping in growing silicon Tanahashi K, Harada H, Koukitsu A, Inoue N |
299 - 306 |
Modeling of transport processes and kinetics of silicon carbide bulk growth Chen QS, Zhang H, Ma RH, Prasad V, Balkas CM, Yushin NK |
307 - 311 |
Virtual reactor as a new tool for modeling and optimization of SiC bulk crystal growth Bogdanov MV, Galyukov AO, Karpov SY, Kulik AV, Kochuguev SK, Ofengeim DK, Tsiryulnikov AV, Ramm MS, Zhmakin AI, Makarov YN |
312 - 316 |
Impact of source material on silicon carbide vapor transport growth process Wellmann PJ, Hofmann D, Kadinski L, Selder M, Straubinger TL, Winnacker A |
317 - 321 |
Growth related distribution of secondary phase inclusions in 6H-SiC single crystals Rost HJ, Dolle J, Doerschel J, Siche D, Schulz D, Wollweber J |
322 - 329 |
Numerical computation of sapphire crystal growth using heat exchanger method Lu CW, Chen JC |
330 - 334 |
Enhanced bulk polysilicon production using silicon tubes Jafri I, Chandra M, Zhang H, Prasad V, Reddy C, Amato-Wierda C, Landry M, Ciszek T |
335 - 339 |
High-quality and low-temperature epitaxial Si films deposited at very high deposition rate Bergmann RB, Oberbeck L, Wagner TA |
340 - 347 |
Crystalline silicon thin-film (CSiTF) solar cells on SSP and on ceramic substrates Eyer A, Haas F, Kieliba T, Osswald D, Reber S, Zimmermann W, Warta W |
348 - 353 |
Electro-epitaxial lateral overgrowth of silicon from liquid-metal solutions Mauk MG, Curran JP |
354 - 358 |
Sulphur-terminated silicon surfaces for the epitaxial growth of chalcopyrite semiconductors Metzner H, Hahn T |
359 - 365 |
Selectively-grown InGaP/GaAs on silicon heterostructures for application to photovoltaic-photoelectrolysis cells Mauk MG, Tata AN, Feyock BW |
366 - 371 |
Epitaxial growth of (001)-oriented and (116)-oriented SrBi2Ta2O9 thin films by chemical solution deposition method Kim JH, Ha TJ, Cheon CI, Lange FF |
372 - 376 |
Epitaxial growth of BGaAs and BGaInAs by MOCVD Geisz JF, Friedman DJ, Kurtz S, Olson JM, Swartzlander AB, Reedy RC, Norman AG |
377 - 383 |
Evolution of surface structure and phase separation in GaInAsSb Wang CA, Calawa DR, Vineis CJ |
384 - 390 |
The growth and characterization of GaInAsSb and AlGaAsSb on GaSb by metal-organic chemical vapor deposition Biefeld RM, Cederberg JG, Peake GM, Kurtz SR |
391 - 396 |
Enabling terabit systems through MOVPE Campbell KT, Joyner CH, Ebert CW, Robertson A, Wilt DP, Zilko JL |
397 - 404 |
Metalorganic chemical vapor deposition of AlGaAs and InGaP heterojunction bipolar transistors Pan N, Welser RE, Lutz CR, DeLuca PM, Han B, Hong K |
405 - 409 |
Phase transitions of III-V compound semiconductor surfaces in the MOVPE environment Fu Q, Begarney MJ, Li CH, Law DC, Hicks RF |
410 - 414 |
A scanning tunneling microscopy study of As/Ge(mnn) and P/Ge(mnn) surfaces McMahon WE, Olson JM |
415 - 419 |
MOVPE growth of highly-strained piezoelectric InGaAs/GaAs quantum wells on [111]A-oriented substrates Kim J, Cho S, Sanz-Hervas A, Majerfeld A, Kim BW |
420 - 425 |
In-situ reflectance monitoring of GaSb substrate oxide desorption Vineis CJ, Wang CA, Jensen KF |
426 - 430 |
MOVPE of GaSb, (AlGa)Sb and (AlGa)(AsSb) in a multiwafer planetary reactor Agert C, Lanyi P, Bett AW |
431 - 434 |
The effect of diffusion on formation of self-assembled CdSe quantum dots Yang Y, Shen DZ, Zhang JY, Fan XW, Zhen ZH, Zhao XW, Zhao DX, Liu YN |
435 - 439 |
Optical absorption and electron paramagnetic resonance of Fe ions in KDP crystals Garces NY, Stevens KT, Halliburton LE, Yan M, Zaitseva NP, DeYoreo JJ |
440 - 444 |
Defect segregation in CdGeAs2 Schunemann PG, Setzler SD, Pollak TM, Ptak AJ, Myers TH |
445 - 448 |
Material and laser characterizations of intermediate compositions of Ce : LiSrxCa1-xAlF6 Castillo VK, Quarles GJ, Chang RSF |
449 - 453 |
Progress in the growth of Yb : S-FAP laser crystals Schaffers KI, Tassano JB, Waide PA, Payne SA, Morris RC |
454 - 457 |
Growth conditions and composition of terbium aluminum garnet single crystals grown by the micro pulling down technique Ganschow S, Klimm D, Epelbaum BM, Yoshikawa A, Doerschel J, Fukuda T |
458 - 464 |
Influence of [K]/[Li] and [Li]/[Nb] ratios in melts on the TSSG growth and SHG characteristics of potassium lithium niobate crystals Xu XW, Chong TC, Zhang GY, Kumagai H |
465 - 469 |
Bulk growth of high quality nonlinear optical crystals of L-arginine tetrafluoroborate (L-AFB) Owens C, Bhat K, Wang WS, Tan A, Aggarwal MD, Penn BG, Frazier DO |
470 - 473 |
Growth of vanillin crystals for second harmonic generation (SHG) applications in the near-IR wavelength region Singh OP, Singh YP, Singh N, Singh NB |
474 - 478 |
Crystal growth and hydration effects in morpholinium 4-hydroxybenzoate (M4HB) Bahra GS, Chaloner PA, Dutta LM, Healy W, Hitchcock PB |
479 - 483 |
Growth and spectra characterization of Ce and Eu doped SBN crystals Li MH, Chong TC, Xu XW, Kumagai H |
484 - 488 |
Nb : BST: Crystal growth and ferroelectric properties Varatharajan R, Madeswaran S, Jayavel R |
489 - 494 |
Blue SHG characteristics and homogeneity of the TSSG grown potassium lithium niobate (KLN) crystal with high Li2O content Chong TC, Xu XW, Zhang GY, Kumagai H |
495 - 500 |
Cracking mechanism of the potassium lithium niobate crystal related to its internal structure Zhang GY, Chong TC, Xu XW, Kumagai H |
501 - 504 |
New wide-band nonlinear optics CsGeCl3 crystal Gu QT, Fang CS, Shi W, Wu XW, Pan QW |
505 - 511 |
Preparation and thermophysical properties of AgGaTe2 crystals Burger A, Ndap JO, Cui Y, Roy U, Morgan S, Chattopadhyay K, Ma X, Faris K, Thibaud S, Miles R, Mateen H, Goldstein JT, Rawn CJ |
512 - 515 |
Thermal conductivity measurement in lead bromide Singh NB, Coriell SR, Duval WMB, Mani SS, Green K, Glicksman ME |
516 - 521 |
Effect of void location on segregation patterns in microgravity solidification Kassemi M, Barsi S, Kaforey M, Matthiesen D |
522 - 527 |
Gravity-related transport process in off-axis sputtering deposition Zhu S, Su CH, Carpenter P, Lehoczky S |
528 - 533 |
GaAs-on-silicon conformal vapor-phase epitaxy using reversible transport and selective etching reactions with water vapour Mauk MG, Feyock BW, Cotter JE |
534 - 539 |
Epitaxially grown Fe/Ag ultrathin films on GaAs and their application to wideband microwave notch filter Wu W, Lee CC, Tsai CS, Su J, So W, Yoo HJ, Chuang R, Hopster HJ |
540 - 543 |
Effect of H-2 addition on characteristics of TiN films deposited by APCVD Huang HH, Hon MH |
544 - 549 |
As-soak control of the InAs-on-GaSb interface Kaspi R, Steinshnider J, Weimer M, Moeller C, Ongstad A |
550 - 555 |
Multiple quantum wells and laser structures containing InAs quantum dots grown by molecular-beam epitaxy Chang CA, Wu CZ, Wang PY, Guo XJ, Wu YT, Liang CY, Hwang FC, Jiang WC, Lay FJ, Sung LW, Lin HH |
556 - 560 |
Response surface modeling of the composition of AlAsySb1-y alloys grown by molecular beam epitaxy Gopaladasu P, Cecchi JL, Malloy KJ, Kaspi R |
561 - 565 |
200 mm GaAs crystal growth by the temperature gradient controlled LEC method Seidl A, Eichler S, Flade T, Jurisch M, Kohler A, Kretzer U, Weinert B |
566 - 571 |
Shaped crystal growth of 50 cm diameter silicon thin-walled cylinders by edge-defined film-fed growth (EFG) Garcia D, Ouellette M, Mackintosh B, Kalejs JP |
572 - 579 |
Growth of the world's largest sapphire crystals Khattak CP, Schmid F |
580 - 585 |
Multiple batch recharging for industrial CZ silicon growth Fickett B, Mihalik G |