Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.12, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (187 articles)

3069 - 3074	Threading Dislocations in GaAs Grown with Free Sidewalls on Si Mesas Knall J, Romano LT, Krusor BS, Biegelsen DK, Bringans RD
3075 - 3083	Growth of Beryllium Doped AlxGa1-xAs GaAs Mirrors for Vertical-Cavity Surface-Emitting Lasers Peters MG, Thibeault BJ, Young DB, Gossard AC, Coldren LA
3084 - 3089	Nearly Ideal Characteristics of GaAs Metal-Insulator-Semiconductor Diodes by Atomic Layer Passivation Wada Y, Wada K
3090 - 3094	Surface Oxidation Sf Selenium Treated GaAs(100) Scimeca T, Watanabe Y, Maeda F, Berrigan R, Oshima M
3095 - 3102	Si-Indiffusion and O-Outdiffusion Processes at Si/SiO2/GaAs-Oxides/GaAs Structures - Implications in SiO2 Formation and GaAs Regrowth Jimenez I, Sacedon JL
3103 - 3106	Electroreflectance of Ag/GaAs Wang DP
3107 - 3111	Dead-Time-Free Selective Dry-Etching of GaAs/AlGaAs Using BCl3/Chf3 Plasma Takenaka H, Oishi Y, Ueda D
3112 - 3117	Continuous Ultra-Dry Process for Enhancing the Reliability of Ultrathin Silicon-Oxide Films in Metal-Oxide Semiconductors Yamada H
3118 - 3137	Investigation of Electron Source and Ion Flux Uniformity in High Plasma-Density Inductively-Coupled Etching Tools Using 2-Dimensional Modeling Ventzek PL, Grapperhaus M, Kushner MJ
3138 - 3144	Profile Simulation of Electron-Cyclotron-Resonance Planarization of an Interlevel Dielectric Labun AH
3145 - 3148	Morphology of Anodically Etched Si(111) Surfaces - A Structural Comparison of NH4F Versus HF Etching Houbertz R, Memmert U, Behm RJ
3149 - 3159	Solid Source Diffusion from Agglomerating Silicide Sources .2. Experimental Results and Analysis Tsai JY, Osburn CM, Canovai CA
3160 - 3165	Advanced Fabrication Techniques of 3-Dimensional Microstructures for Future Electronic Devices Ugajin R, Ishibashi A, Mori Y
3166 - 3170	Nanofabrication on Electron-Beam Resist Using Scanning-Tunneling-Microscopy Archer A, Hetrick JM, Nayfeh MH, Adesida I
3171 - 3175	Fabrication of Noble-Metal Nanoconstrictions and Observation Conductance Fluctuations Scheer E, Vonlohneysen H, Hein H
3176 - 3181	Atomic-Force Microscope Tip Radius Needed for Accurate Imaging of Thin-Film Surfaces Westra KL, Thomson DJ
3182 - 3186	Microfabrication of Arrays of Scanning Electron-Microscopes Feinerman AD, Crewe DA, Crewe AV
3187 - 3190	Reliable Tip Preparation for High-Resolution Scanning-Tunneling-Microscopy Albrektsen O, Salemink HW, Morch KA, Tholen AR
3191 - 3195	Reduced Effects of Laser Illumination on Field-Emission Due to the Finite Duration of Quantum Tunneling Hagmann MJ
3196 - 3201	Submicron Patterning of Thin Cobalt Films for Magnetic Storage New RM, Pease RF, White RL
3202 - 3207	Structure of Fe/Delta-Mn Superlattices Grown by Molecular-Beam Epitaxy Pohl J, Malang EU, Scheele B, Kohler J, Luxsteiner MC, Bucher E
3208 - 3213	Reactive Ion Etching of RuO2, Thin-Films Using the Gas-Mixture O-2 Cf3Cfh2 Pan W, Desu SB
3214 - 3217	Effects of Sulfur Passivation and Rapid Thermal Annealing on the Electrical-Properties of InP Metal-Insulator-Semiconductor Schottky Diodes Eftekhari G
3218 - 3219	SiC Microcomponents via Reaction of C-60 with Silicon Balooch M, Hamza AV
3220 - 3222	Elimination of Long-Term Calibration Drift in Molecular-Beam Epitaxy by Cooling the Source Flange Larkins EC, Thaden H, Betsche H, Eichin G, Ralston JD
3235 - 3235	Papers from the 38th International-Symposium on Electron, Ion, and Photon Beams - Preface Adesida I
3237 - 3241	Ultra-Large-Scale Integration Device Scaling and Reliability Hu CM
3242 - 3246	Digital Micromirror Device and Its Application to Projection Displays Sampsell JB
3247 - 3250	Evaluation of Overlay Accuracy for the X-Ray Stepper Toxs-1 Hirano R, Higashiki T, Nomura H, Kuwabara O, Nishizaka T, Uchida N
3251 - 3255	Design and Test of a Through-the-Mask Alignment Sensor for a Vertical Stage X-Ray Aligner Nelson M, Kreuzer JL, Gallatin G
3256 - 3260	Overlay Accuracy of a Synchrotron-Radiation Stepper Evaluated by 2-Mask Double-Exposure Fukuda M, Suzuki M, Kanai M, Tsuyuzaki H, Shibayama A, Ishihara S
3261 - 3264	Subnanometer Alignment System for X-Ray-Lithography Zhou H, Feldman M, Bass R
3265 - 3269	Combined Lithographies for the Reduction of Stitching Errors in Lithography Koops HW, Kretz J, Weber M
3270 - 3274	Atomic-Hydrogen Resist Process with Electron-Beam Lithography for Selective Al Patterning Masu K, Tsubouchi K
3275 - 3279	Deep-Ultraviolet Damage to Fused-Silica Schenker R, Schermerhorn P, Oldham WG
3280 - 3284	Fabrication of Atomic-Scale Metallic Microstructures by Retarding-Field Focused Ion-Beams Woodham RG, Ahmed H
3285 - 3288	Micromechanical Structures for Electron-Beam and Ion-Beam Irradiation Phenomena Ogo I, Macdonald NC
3289 - 3293	Locally Focused Electron-Beam Deposition Shaw JL, Gray HF
3294 - 3299	3-Dimensional Laser Direct Writing - Applications to Multichip Modules Nassuphis N, Mathews RH, Palmacci ST, Ehrlich DJ
3300 - 3305	Pulse-Time Modulated Electron-Cyclotron-Resonance Plasma-Etching for Highly Selective, Highly Anisotropic, and Less-Charging Polycrystalline Silicon Patterning Samukawa S, Terada K
3306 - 3310	Reflectance Modeling for in-Situ Dry Etch Monitoring of Bulk SiO2 and III-V Multilayer Structures Hicks SE, Parkes W, Wilkinson JA, Wilkinson CD
3311 - 3316	Effect of Superlattices on the Low-Energy Ion-Induced Damage in GaAs/Al(Ga)as Structures - Channeling or Diffusion Green DL, Hu EL, Stoffel NG
3317 - 3321	Characterization of Chemically Assisted Ion-Beam Etching of InP Youtsey C, Grundbacher R, Panepucci R, Adesida I, Caneau C
3322 - 3326	Reactive Ion Etching-Induced Damage in InAlAs/InGaAs Heterostructure Field-Effect Transistors Processed in HBr Plasma Fay P, Agarwala S, Scafidi C, Adesida I, Caneau C, Bhat R
3327 - 3331	High-Aspect-Ratio Dry-Etching for Microchannel Plates Snider GL, Then AM, Seave RJ, Tasker GW
3332 - 3336	Process Technology for InGaAs/InAlAs Modulation-Doped Field-Effect Transistors on InP Substrates Fink T, Raynor B, Haupt M, Kohler K, Braunstein J, Grun N, Hornung J
3337 - 3341	Investigation of Modulated Radio-Frequency Plasma-Etching of GaAs Using Langmuir Probes Law VJ, Braithwaite NS, Ingram SG, Clary DC, Jones GA
3342 - 3346	Plasma-Immersed Oxygen-Ion Implantation of Iron-Doped Glass for Nonmetallic Magnetic Hard Disks Zhang L, Booske JH, Cooper RF, Shohet JL, Jacobs JR, Anderson FS, Goeckner MJ, Wicksberg EB, Was G
3347 - 3350	Electron-Cyclotron-Resonance Ion Stream Etching with High Uniformity and Accuracy for Metal-Oxide-Semiconductor Gate Fabrication Takahashi C, Matsuo S
3351 - 3355	Effects of Etch Chemistry on SF6-Based Tungsten Etching by Electron-Cyclotron-Resonance Reactive Ion Etching Eddy CR, Kosakowski J, Shirey LM, Dobisz EA, Rhee KW, Chu W, Foster KW, Marrian CR, Peckerar MC
3356 - 3362	Basis of Macroscopic and Microscopic Surface Shaping and Smoothing by Plasma-Assisted Chemical Etching Zarowin CB
3363 - 3368	Etched Profile Distortions in High-Density Electron-Cyclotron-Resonance Plasma Yoneda M, Maruyama T, Fujiwara N
3369 - 3373	Effects of Cation Diffusion on the Monolayer Control of Chemical Beam Etching Chiu TH, Williams MD, Tsang WT, Kapre RM
3374 - 3377	Reactive-Ion-Beam Etching of InP in a Chlorine-Hydrogen Mixture Vawter GA, Ashby CI
3378 - 3381	Radical Beam Ion-Beam Etching of InAlAs/InP Using Cl-2 Yu DG, Hu EL, Hasnain G
3382 - 3387	Evaluation of Surface Damage on GaAs Etched with an Electron-Cyclotron-Resonance Source Ko KK, Pang SW, Brock T, Cole MW, Casas LM
3388 - 3392	Magnetically Confined Plasma Reactive Ion Etching of GaAs/AlGaAs/AlAs Quantum Nanostructures Song YP, Wang PD, Torres CM, Wilkinson CD
3393 - 3398	Dynamic Corrections in Mebes-4500 Pearcepercy H, Prior R, Abboud F, Benveniste A, Gasiorek L, Lubin M, Raymond F
3399 - 3403	Electron-Beam Cell Projection Lithography - Its Accuracy and Its Throughput Someda Y, Satoh H, Sohda Y, Nakayama Y, Saitou N, Itoh H, Sasaki M
3404 - 3408	Deflector and Correction Coil Calibrations in an Electron-Beam Block Exposure System Yamada A, Sakamoto K, Yamazaki S, Kobayashi K, Sago S, Oono M, Watanabe H, Yasuda H
3409 - 3412	100 kv Electron-Beam Lithography Using a Schottky Field-Emission Source Koek BH, Chisholm T, Somers J, Davey J, Romijn J, Vonrun AJ
3413 - 3417	Evaluation of Zr/O/W Schottky Emitters for Microcolumn Applications Kim HS, Kratschmer E, Yu ML, Thomson MG, Chang TH
3418 - 3424	Electron-Beam Technology - The Other End of the Spectrum Bakish R
3425 - 3430	High-Aspect-Ratio Aligned Multilayer Microstructure Fabrication Lee KY, Rishton SA, Chang TH
3431 - 3435	Emission Characteristics of Ultrasharp Cold Field Emitters Yu ML, Hussey BW, Kim HS, Chang TH
3436 - 3439	Overlay Enhancement with Product-Specific Emulation in Electron-Beam Lithography Tools Puisto D, Sturans M, Lawliss M
3440 - 3443	Application of a High-Throughput Electron-Beam System for 0.3 Mu-M Large-Scale Integration Mizuno F, Kato M, Hayakawa H, Sato K, Hasegawa K, Sakitani Y, Saitou N, Murai F, Shiraishi H, Uchino SI
3444 - 3448	Lithographic Performance of a Negative Resist Under Scattering with Angular Limitation for Projection Electron Lithography Exposure at 100 keV Tarascon RG, Bolan K, Blakey M, Camarda RM, Farrow RC, Fetter LA, Huggins HA, Kraus JS, Liddle JA, Mixon DA, Novembre AE, Watson GP, Berger SD
3449 - 3454	Interior Area Removal Method for Pyramid Lee SY, Cook BD
3455 - 3459	Spatial-Frequency Filtering Using Multiple-Pass Printing Ye J, Berglund CN, Pease RF
3460 - 3464	Electron-Beam Lithography of Curved Structures with an Enhanced Vector-Scan Pattern Generator Supporting Conic-Based Primitives Vasey F, Prongue D, Rothuizen H, Vettiger P
3465 - 3472	Address Data Reduction and Lithography Performance of Graybeam Writing Strategies for Raster Scan Mask Generation Muray A, Abboud F, Raymond F, Berglund CN
3473 - 3477	Surface Imaging by Silylation for Low-Voltage Electron-Beam Lithography Bottcher M, Bauch L, Stolberg I
3478 - 3482	100 kv Ghost Electron-Beam Proximity Correction on Tungsten X-Ray Masks Gesley MA, Mccord MA
3483 - 3488	Efficiency Enhancement of Monte-Carlo Simulation of Particle-Beam Interaction by Separation of Stochastic and Continuum Contributions Groves TR
3489 - 3493	Coulomb Effects in Retarding-Field Lenses Brodie AD
3494 - 3497	Coplanar Multiple-Ring Electrostatic Particle-Beam Lenses Moran MJ
3498 - 3502	Electron-Electron Scattering in Microcolumns Thomson MG
3503 - 3507	Sub-40 nm Resolution 1 keV Scanning Tunneling Microscope Field-Emission Microcolumn Kratschmer E, Kim HS, Thomson MG, Lee KY, Rishton SA, Yu ML, Chang TH
3508 - 3512	An Analytical Model of Stochastic Interaction Effects in Projection Systems Using a Nearest-Neighbor Approach Mkrtchyan MM, Liddle JA, Berger SD, Harriott LR, Schwartz AM, Gibson JM
3513 - 3517	Novel Electrostatic Column for Ion Projection Lithography Chalupka A, Stengl G, Buschbeck H, Lammer G, Vonach H, Fischer R, Hammel E, Loschner H, Nowak R, Wolf P, Finkelstein W, Hill RW, Berry IL, Harriott LR, Melngailis J, Randall JN, Wolfe JC, Stroh H, Wollnik H, Mondelli AA, Petillo JJ, Leung K
3518 - 3522	Minimum Feature Sizes and Ion-Beam Profile for a Focused Ion-Beam System with Post-Objective Lens Retarding and Acceleration Mode Kieslich A, Reithmaier JP, Forchel A
3523 - 3527	CoSi2 Microstructures by Means of a High-Current Focused Ion-Beam Bischoff L, Teichert J, Hesse E, Panknin D, Skorupa W
3528 - 3532	Stress-Induced Pattern-Placement Errors in Thin Membrane Masks Liddle JA, Volkert CA
3533 - 3538	Experimental Investigation of Stochastic Space-Charge Effects on Pattern Resolution in Ion Projection Lithography Systems Hammel E, Chalupka A, Fegerl J, Fischer R, Lammer G, Loschner H, Malek L, Nowak R, Stengl G, Vonach H, Wolf P, Brunger WH, Buchmann LM, Torkler M, Cekan E, Fallmann W, Paschke F, Stangl G, Thalinger F, Berry IL, Harriott LR, Finkelstein W, Hill RW
3539 - 3542	Contrast of Ion-Beam Proximity Printing with Nonideal Masks Stumbo DP, Wolfe JC
3543 - 3546	Pattern Distortions in Stencil Masks Randall JN
3547 - 3549	Ion Projection Lithography over Wafer Topography Brunger WH, Buchmann LM, Torkler MA, Finkelstein W
3550 - 3554	An Industrial Plasma Process for Avoiding Charge Effect Romand P, Weill A, Panabiere JP, Prola A
3555 - 3560	Secondary-Electron Line Scans over High-Resolution Resist Images - Theoretical and Experimental Investigation of Induced Local Electrical-Field Effects Grella L, Difabrizio E, Gentili M, Baciocchi M, Mastrogiacomo L, Maggiora R, Capodicci L
3561 - 3566	Design of an Atomic-Force Microscope with Interferometric Position Control Schneir J, Mcwaid TH, Alexander J, Wilfley BP
3567 - 3570	Edge Position Measurement with a Scanning Probe Microscope Griffith JE, Marchman HM, Hopkins LC
3571 - 3575	Force Probe Characterization Using Silicon 3-Dimensional Structures Formed by Focused Ion-Beam Lithography Edenfeld KM, Jarausch KF, Stark TJ, Griffis DP, Russell PE
3576 - 3579	Real-Time Observations of Extreme-Ultraviolet Aerial Images by Fluorescence Microimaging Lafontaine B, White DL, Wood OR, Macdowell AA, Tan ZQ, Taylor GN, Tennant DM, Hulbert SL
3580 - 3584	Yaw Compensation for an Electron-Beam Lithography System Innes R
3585 - 3590	Nanometer-Scale Dimensional Metrology for Advanced Lithography Marchman HM, Griffith JE, Guo JZ, Frackoviak J, Celler GK
3591 - 3594	Highly Accurate Critical Dimension Measurement for Sub-0.5-Mu-M Devices Yamashita H, Nakajima K, Nozue H
3595 - 3599	Inspection of Optical Phase-Shifting Masks with an Automated Electron-Beam System Brodie AD, Chen ZW, Jau J, Meisburger D, Grenon B
3600 - 3606	Diffractive Techniques for Lithographic Process Monitoring and Control Naqvi SS, Zaidi SH, Brueck SR, Mcneil JR
3607 - 3610	Nanometer-Scale Patterning of High-T-C Superconductors for Josephson Junction-Based Digital Circuits Wendt JR, Plut TA, Corless RF, Martens JS, Berkowitz S, Char K, Johansson M, Hou SY, Phillips JM
3611 - 3613	Fabrication Using X-Ray Nanolithography and Measurement of Coulomb-Blockade in a Variable-Sized Quantum-Dot Burkhardt M, Smith HI, Antoniadis DA, Orlando TP, Melloch MR, Rhee KW, Peckerar MC
3614 - 3618	Silicon Point Contacts - Nanofabrication, Molecular-Beam Epitaxial-Growth, and Transport Measurements Maes JW, Caro J, Werner K, Radelaar S, Kozub VI, Zandbergen HW
3619 - 3622	Fabrication and Characterization of Single-Electron Transistors and Traps Ji L, Dresselhaus PD, Han SY, Lin K, Zheng W, Lukens JE
3623 - 3625	Fabrication of Nanostructures in Algasb InAs Using Electron-Beam Lithography and Chemically Assisted Ion-Beam Etching Arafa M, Youtsey C, Grundbacher R, Adesida I, Klem J
3626 - 3630	Writing Strategies of Circular Gratings for Surface-Emitting Lasers Using Focused Ion-Beam (X-Y Coordinate) and Electron-Beam (Polar Coordinate) Lithography Fallahi M, Templeton IM, Chatenoud F, Champion G, Dion M, Barber R
3631 - 3634	15 Nanometer Features by Sidewall Processing and Pattern Transfer Randall JN, Newell BL
3635 - 3638	High-Efficiency Diffractive Coupling Lenses by 3-Dimensional Profiling with Electron-Beam Lithography and Reactive Ion Etching Stemmer A, Zarschizky H, Knapek E, Lefranc G, Mayerhofer F
3639 - 3642	Fabrication of Single-Domain Magnetic Pillar Array of 35 nm Diameter and 65 Gbits/in(2) Density Krauss PR, Fischer PB, Chou SY
3643 - 3647	Multiple-Level Phase Gratings Fabricated Using Focused Ion-Beam Milling and Electron-Beam Lithography Shank SM, Chen FT, Skvarla M, Craighead HG, Cook P, Bussjager R, Haas F, Honey DA
3648 - 3652	Patterning a 50-nm Period Grating Using Soft-X-Ray Spatial-Frequency Multiplication Wei M, Attwood DT, Gustafson TK, Anderson EH
3653 - 3657	Low-Voltage Electron-Beam Lithography on GaAs Substrates for Quantum-Wire Fabrication Steffen R, Faller F, Forchel A
3658 - 3662	Luminescence Spectroscopy of Dry-Etched Single Dots and Wires Hubner B, Jacobs B, Greus C, Zengerle R, Forchel A
3663 - 3667	Electron-Beam Lithography with Monolayers of Alkylthiols and Alkylsiloxanes Lercel MJ, Redinbo GF, Pardo FD, Rooks M, Tiberio RC, Simpson P, Craighead HG, Sheen CW, Parikh AN, Allara DL
3668 - 3672	Electron-Beam Lithography for the Fabrication of Air-Bridged, Submicron Schottky Collectors Muller RE, Martin SC, Smith RP, Allen SA, Reddy M, Bhattacharya U, Rodwell MJ
3673 - 3676	Sub-0.1-Mu-M T-Shaped Gate Fabrication Technology Using Mixing-Layer Sidewalls in a Double-Layer Resist System Samoto N, Miura I, Makino Y, Yamanoguchi K
3677 - 3680	Progress in Mask Technology for Ion-Implantation Based Nanofabrication Burkard M, Griesinger UA, Menschig A, Schweizer H, Klein H, Bohm G, Trankle G, Weimann G
3681 - 3684	Fabrication of Arrays of Nanometer-Size Test Structures for Scanning Probe Microscope Tips Characterization Bogdanov AL, Erts D, Nilsson B, Olin H
3685 - 3688	High-Resolution Definition of Buried InGaAs/InP Wires by Selective Thermal Kerkel K, Oshinowo J, Forchel A, Weber J, Laube G, Gyuro I, Zielinski E
3689 - 3694	Advances in Near-Field Holographic Grating Mask Technology Tennant DM, Dreyer KF, Feder K, Gnall RP, Koch TL, Koren U, Miller BI, Vartuli C, Young MG
3695 - 3698	Study of Nanoscale Magnetic-Structures Fabricated Using Electron-Beam Lithography and Quantum Magnetic Disk Chou SY, Wei M, Krauss PR, Fischer PB
3699 - 3703	In-Situ GaAs/AlGaAs Patterning Using a Thin Epitaxial InGaAs Layer Mask as a Negative-Type Electron-Beam Resist in Cl-2 Gas Kohmoto S, Sugimoto Y, Takado N, Asakawa K
3704 - 3707	Luminescence Enhancement of InGaAs/InP Surface Quantum-Wells by Room-Temperature Ion-Gun Hydrogenation Chang YL, Tan IH, Reaves C, Hu E, Merz J, Denbaars S
3708 - 3711	Electron-Beam Fabrication and Focused Ion-Beam Inspection of Submicron Structured Diffractive Optical-Elements Dix C, Mckee PF, Thurlow AR, Towers JR, Wood DC, Dawes NJ, Whitney JT
3712 - 3715	Reduced Electron Transmission in Au/GaAs Diodes Damaged by Focused Ion-Beam Implantation Studied by Ballistic-Electron-Emission Microscopy Mcnabb JW, Skvarla M, Craighead HG
3716 - 3719	Atomic Desorption and Readsorption of Chlorine on a Si(111) 7X7 Surface with a Scanning Tunneling Microscope Baba M, Matsui S
3720 - 3724	25 nm Chromium-Oxide Lines by Scanning Tunneling Lithography in Air Song HJ, Rack MJ, Abugharbieh K, Lee SY, Khan V, Ferry DK, Allee DR
3725 - 3730	Proximal Probe Study of Self-Assembled Monolayer Resist Materials Perkins FK, Dobisz EA, Brandow SL, Koloski TS, Calvert JM, Rhee KW, Kosakowski JE, Marrian CR
3731 - 3734	Quantitative Study of Metal-Oxide-Semiconductor Field-Effect Transistor Damage-Induced by Scanning Tunneling Microscope Lithography Fayfield T, Higman TK
3735 - 3740	Nanometer-Scale Patterning and Oxidation of Silicon Surfaces with an Ultrahigh-Vacuum Scanning Tunneling Microscope Lyding JW, Abeln GC, Shen TC, Wang C, Tucker JR
3741 - 3745	Spatial-Phase-Locked Electron-Beam Lithography and X-Ray-Lithography Fabricating First-Order Gratings on Rib Wave-Guides Wong VV, Ferrera J, Damask JN, Carter JM, Moon EE, Haus HA, Smith HI, Rishton S
3746 - 3749	Laterally Coupled Distributed-Feedback Laser Fabricated with Electron-Beam Lithography and Chemically Assisted Ion-Beam Etching Tiberio RC, Chapman PF, Martin RD, Forouhar S, Lang RJ
3750 - 3754	Fabrication and Characterization of InAlAs InGaAs Striped-Channel Modulation-Doped Field-Effect Transistors Grundbacher R, Fay P, Adesida I
3755 - 3759	Nanostructure Fabrication and the Science Using Focused Ion-Beams Fujisawa T, Bever T, Hirayama Y, Tarucha S
3760 - 3764	A Novel Technique for Shifter Void Defect Repair by a Focused Ion-Beam Tool Jinbo H, Takushima K, Saito T, Ashida I, Tanaka Y
3765 - 3772	Molybdenum Silicide Based Attenuated Phase-Shift Masks Jonckheere R, Ronse K, Popa O, Vandenhove L
3773 - 3777	An Increased Effective Depth of Focus at Contact Mask for Nonvolatile Memories Using an Enhanced Planarization Scheme Cork C, Bacchetta M
3778 - 3782	Defocus Asymmetry in Projection Printing Barouch E, Hollerbach U, Orszag SA
3783 - 3792	Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase-Shifting Masks with Optimized Illumination Ronse K, Pforr R, Baik KH, Jonckheere R, Vandenhove L
3793 - 3798	Impact of Lens Aberrations on Phase-Shifting Masks Kostelak RL, Raab EL, Vaidya S
3799 - 3803	Practical Phase-Shifting Mask Technology for 0.3 Mu-M Large-Scale Integrations Mizuno F, Moriuchi N, Hoga M, Koizumi Y, Suga O, Nakaune H, Kamiyama K, Hasegawa N, Murai F, Itoh F
3804 - 3808	New Approach of rim Phase-Shifting Mask for High-Density Circuit Layout Dao G, Tam N, Hainsey R, Qian QD, Neff J, Nasreesfahani B, Deeter T, Fujimoto H, Troccolo P
3809 - 3813	Quarter-Micron Lithography with a Gapped Markle-Dyson System Owen G, Borkholder D, Knorr C, Markle DA, Pease RF
3814 - 3819	Characterization of a 193 nm Optical Lithography System for 0.18 Mu-M and Below Grenville A, Owen G, Pease RF
3820 - 3825	Characterization of an Expanded-Field Schwarzschild Objective for Extreme-Ultraviolet Lithography Kubiak GD, Tichenor DA, Raychaudhuri AK, Malinowski ME, Stulen RH, Haney SJ, Berger KW, Nissen RP, Wilkerson GA, Paul PH, Bjorkholm JE, Fetter LA, Freeman RR, Himel MD, Macdowell AA, Tennant DM, Wood OR, Waskiewicz WK, White DL, Windt DL, Jewell TE
3826 - 3832	Multilayer Facilities Required for Extreme-Ultraviolet Lithography Windt DL, Waskiewicz WK
3833 - 3840	Imaging of Extreme-Ultraviolet Lithographic Masks with Programmed Substrate Defects Nguyen KB, Mizota T, Haga T, Kinoshita H, Attwood DT
3841 - 3845	Wavelength Dependence of the Resist Sidewall Angle in Extreme-Ultraviolet Lithography Wood OR, Bjorkholm JE, Fetter L, Himel MD, Tennant DM, Macdowell AA, Lafontaine B, Griffith JE, Taylor GN, Waskiewicz WK, Windt DL, Kortright JB, Gullikson EK, Nguyen K
3846 - 3850	Fabrication of Diffractive Optical-Components for an Extreme-Ultraviolet Shearing Interferometer Spector SJ, Tennant DM, Tan Z, Bjorkholm JE
3851 - 3856	Negative-Tone Deep-Ultraviolet Resists Containing Benzylic Cross-Linkers - Experimental and Simulation Studies of the Cross-Linking Process Zenk AM, Neureuther AR, Lee SM, Frechet JM
3857 - 3862	Thermal and Acid-Catalyzed Deprotection Kinetics in Candidate Deep-Ultraviolet Resist Materials Wallraff G, Hutchinson J, Hinsberg W, Houle F, Seidel P, Johnson R, Oldham W
3863 - 3867	Effect of Photo Acid Generator Concentration on the Process Latitude of a Chemically Amplified Resist Petrillo KE, Pomerene AT, Babich ED, Seeger DE, Hofer D, Breyta G, Ito H
3868 - 3873	Application of Real-Time Infrared-Spectroscopy to Monitoring the Kinetics of Chemically Amplified Resists Howes GR, Gamsky CJ, Taylor JW
3874 - 3878	High-Speed Single-Layer-Resist Process and Energy-Dependent Aspect Ratios for 0.2-Mu-M Electron-Beam Lithography Murai F, Yamamoto J, Yamaguchi H, Okazaki S, Sato K, Hasegawa K, Hayakawa H
3879 - 3883	Acid Generation Process by Radiation-Induced Reaction in Chemically Amplified Resist Films Watanabe T, Yamashita Y, Kozawa T, Yoshida Y, Tagawa S
3884 - 3887	Photoresist Channel-Constrained Deposition of Electroless Metallization on Ligating Self-Assembled Films Calvert JM, Calabrese GS, Bohland JF, Chen MS, Dressick WJ, Dulcey CS, Georger JH, Kosakowski J, Pavelcheck EK, Rhee KW, Shirey LM
3888 - 3894	Effect of Acid Diffusion on Performance in Positive Deep-Ultraviolet Resists Fedynyshyn TH, Thackeray JW, Georger JH, Denison MD
3895 - 3899	Nanometer-Scale Imaging Characteristics of Novolak Resin-Based Chemical Amplification Negative Resist Systems and Molecular-Weight Distribution Effects of the Resin Matrix Shiraishi H, Yoshimura T, Sakamizu T, Ueno T, Okazaki S
3900 - 3904	Modeling and Simulations of a Positive Chemically Amplified Photoresist for X-Ray-Lithography Krasnoperova AA, Khan M, Rhyner S, Taylor JW, Zhu Y, Cerrina F
3905 - 3908	High-Speed Positive X-Ray Resist Suitable for Precise Replication of Sub-0.25-Mu-M Features Ban H, Nakamura J, Deguchi K, Tanaka A
3909 - 3913	Plasma-Polymerized All-Dry Resist Process for 0.25 Mu-M Photolithography Joubert O, Weidman T, Joshi A, Cirelli R, Stein S, Lee JT, Vaidya S
3914 - 3918	Quarter-Micron Lithography with a Wet-Silylated and Dry-Developed Commercial Photoresist Gogolides E, Tzevelekis D, Tsoi E, Hatzakis M, Goethals AM, Baik KH, Vanroey F
3919 - 3924	Positive-Tone Silylated, Dry-Developed, Deep-Ultraviolet Resist with 0.2 Mu-M Resolution Hutton RS, Stein SM, Boyce CH, Cirelli RA, Taylor GN, Baiocchi FA, Kovalchick J, Wheeler DR
3925 - 3929	Comparative-Evaluation of Chemically Amplified Resists for Electron-Beam Top Surface Imaging Use Irmscher M, Hofflinger B, Springer R
3930 - 3935	Updated System Model for X-Ray-Lithography Khan M, Mohammad L, Xiao J, Ocola L, Cerrina F
3936 - 3942	Comparison of Image Shortening Effects in X-Ray and Optical Lithography Dellaguardia R, Maldonado JR, Prein F, Zell T, Kluwe A, Oertel HK
3943 - 3948	Application of Proximity Synchrotron Orbital Radiation Lithography and Deep-Ultraviolet Phase-Shifted-Mask Lithography to Sub-Quarter-Micron Complimentary Metal-Oxide-Semiconductor Devices Liebmann L, Ferguson R, Molless A, Lamberti A
3949 - 3953	Applicability Test for Synchrotron-Radiation X-Ray-Lithography in 64-MB Dynamic Random-Access Memory Fabrication Processes Fujii K, Yoshihara T, Tanaka Y, Suzuki K, Nakajima T, Miyatake T, Orita E, Ito K
3954 - 3958	Fabrication of Controlled Slope Attenuated Phase-Shift X-Ray Masks for 250 nm Synchrotron Lithography Gentili M, Difabrizio E, Grella L, Baciocchi M, Mastrogiacomo L, Maggiora R, Xiao J, Cerrina F
3959 - 3964	50-nm X-Ray-Lithography Using Synchrotron-Radiation Chen Y, Kupka RK, Rousseaux F, Carcenac F, Decanini D, Ravet MF, Launois H
3965 - 3969	Printability of Sub-150 nm Features in X-Ray-Lithography - Theory and Experiments Hector SD, Wong VV, Smith HI, Mccord MA, Rhee KW
3970 - 3974	Fabrication of 150-nm Gate-Length High-Electron-Mobility Transistors Using X-Ray-Lithography Haghirigosnet AM, Lafontaine H, Jin Y, Rousseaux F, Chaker M, Pepin H, Launois H
3975 - 3978	Novel Technique for the Separation of Mechanical-Properties and Intrinsic Stress of Pre-Irradiated and Post-Irradiated Membranes Chen HT, Engelstad RL, Cerrina F
3979 - 3985	High-Performance Multilevel Blazed X-Ray Microscopy Fresnel Zone Plates - Fabricated Using X-Ray-Lithography Difabrizio E, Gentili M, Grella L, Baciocchi M, Krasnoperova A, Cerrina F, Yun W, Lai B, Gluskin E
3986 - 3989	Parametric Modeling at Resist-Substrate Interfaces Ocola LE, Cerrina F
3990 - 3994	Effect of Brightener Concentration on the Thermal Distortion of Gold Plated X-Ray Masks Dauksher WJ, Resnick DJ, Seese PA, Cummings KD, Yanof AW, Johnson WA
3995 - 4000	Accelerated Radiation-Damage Studies of Antireflection Materials on SiC X-Ray Mask Membrane Shoki T, Ohkubo R, Kosuga H, Yamaguchi Y, Annaka N, Wells GM, Yamazaki K, Cerrina F
4001 - 4004	Sputtering of Fibrous-Structured Low-Stress Ta Films for X-Ray Masks Yoshihara T, Suzuki K
4005 - 4008	Experimental-Determination of the Effective Lithographic Contrast for X-Ray Masks Maldonado JR
4009 - 4012	Deep-Etch X-Ray-Lithography at the Advanced Light-Source - First Results Malek CK, Jackson K, Brennen RA, Hecht MH, Bonivert WD, Hruby J
4013 - 4017	Synchrotron-Radiation X-Ray-Lithography Beamline Optics Alignment Using the Hartmann Method Chen G, Yamazaki K, Waldo W, Welnak J, Wells GM, Cerrina F
4018 - 4023	Novel Single Mirror Condenser for X-Ray-Lithography Beam Lines Xiao JB, Cerrina F, Rippstein RP
4024 - 4027	Uniform-Stress Tungsten on X-Ray Mask Membranes via He-Backside Temperature Homogenization Mondol M, Li HY, Owen G, Smith HI
4028 - 4032	Evaluation of Temperature Rise and Thermal Distortions of X-Ray Mask for Synchrotron-Radiation Lithography Yamazaki K, Satoh F, Fujii K, Tanaka Y, Yoshihara T
4033 - 4037	Temperature Uniformity Across an X-Ray Mask Membrane During Resist Baking Resnick DJ, Cummings KD, Johnson WA, Chen HT, Choi B, Engelstad RL
4038 - 4043	Modeling Image-Formation - Application to Mask Optimization Xiao JB, Khan M, Nachman R, Wallace J, Chen Z, Cerrina F
4044 - 4050	Wavelength Dependence of Exposure Window and Resist Profile in X-Ray-Lithography Guo JZ, Celler GK, Maldonado JR, Hector SD
4051 - 4054	High-Performance Self-Aligned Sub-100 nm Metal-Oxide-Semiconductor Field-Effect Transistors Using X-Ray-Lithography Yang IY, Hu H, Su LT, Wong VV, Burkhardt M, Moon EE, Carter JM, Antoniadis DA, Smith HI, Rhee KW, Chu W